JP2021086863A - 載置台、及び、検査装置 - Google Patents
載置台、及び、検査装置 Download PDFInfo
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- 238000007689 inspection Methods 0.000 title claims abstract description 49
- 239000011347 resin Substances 0.000 claims abstract description 83
- 229920005989 resin Polymers 0.000 claims abstract description 83
- 238000001816 cooling Methods 0.000 claims abstract description 40
- 238000010438 heat treatment Methods 0.000 claims abstract description 39
- 239000000523 sample Substances 0.000 claims abstract description 25
- 239000003507 refrigerant Substances 0.000 claims description 79
- 238000006073 displacement reaction Methods 0.000 abstract description 19
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 4
- 239000002826 coolant Substances 0.000 abstract 2
- 230000001629 suppression Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 92
- 239000010410 layer Substances 0.000 description 56
- 230000002093 peripheral effect Effects 0.000 description 33
- 238000012986 modification Methods 0.000 description 22
- 230000004048 modification Effects 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000000576 coating method Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- 238000012546 transfer Methods 0.000 description 11
- 230000003028 elevating effect Effects 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000004088 simulation Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- G—PHYSICS
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- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/44—Modifications of instruments for temperature compensation
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/007—Array of lenses or refractors for a cluster of light sources, e.g. for arrangement of multiple light sources in one plane
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07314—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
- G01R31/2875—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature related to heating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
- G01R31/2877—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature related to cooling
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
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- Environmental & Geological Engineering (AREA)
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- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
Description
図1から図3を参照して、検査装置1について説明する。図1は、検査装置1の構成例を示す図である。図2は、図1の検査装置1の平面図である。図3は、図1の検査装置1のウェハ搬送機構の構成例を示す図である。
図12は、第2実施形態の載置台200の構成の一例を示す断面図である。載置台200は、ベースプレート110、制御基板115、ミドルプレート120、LEDモジュール130、透明樹脂層240、トッププレート260、パイプ171、パイプ173、及び反射膜290を含む。載置台200は、ガラス板150(図4参照)を含まず、反射膜290を含む点が第1実施形態の載置台100と異なる。以下では、図中における上下方向を用いて説明する。また、平面視とは上方から下方を平面的に視ることをいう。
110 ベースプレート
120、220 ミドルプレート
130、130M1 LEDモジュール
130A LED
135 レンズ
140、240、240M 透明樹脂層
150 ガラス板
160、260 トッププレート
160A、260A 載置面
190、290 反射膜
190M 反射部材
195 黒色コーティング
Claims (10)
- 検査装置のプローブカードの接触端子が荷重を掛けて押し付けられる電子デバイスを有する被検査体が載置される載置台であって、
第1の冷媒流路が形成された第1の冷却プレートと、
前記第1の冷却プレートに搭載され、複数の発光素子を有し、前記被検査体を加熱する加熱源と、
前記加熱源の上に設けられ、前記加熱源が出力する光を透過する透過部材と、
前記透過部材の上に設けられ、前記被検査体を保持し、第2の冷媒流路が形成された第2の冷却プレートと、
前記第1の冷却プレートと前記透過部材との間で、前記加熱源を覆うように充填される透明樹脂層と、
を含む、載置台。 - 前記透過部材の側部に設けられ、前記加熱源が出力する光を前記透過部材の内部に反射する反射部をさらに含む、請求項1に記載の載置台。
- 検査装置のプローブカードの接触端子が荷重を掛けて押し付けられる電子デバイスを有する被検査体が載置される載置台であって、
第1の冷媒流路が形成された第1の冷却プレートと、
前記第1の冷却プレートに搭載され、複数の発光素子を有し、前記被検査体を加熱する加熱源と、
前記第1の冷却プレートの上に設けられ、前記被検査体を保持し、第2の冷媒流路が形成された第2の冷却プレートと、
前記第1の冷却プレートと前記第2の冷却プレートとの間で前記加熱源を覆うように充填され、前記加熱源が出力する光を透過する透明樹脂層と、
を含む、載置台。 - 前記透明樹脂層の側部に設けられ、前記加熱源が出力する光を前記透明樹脂層の内部に反射する反射部をさらに含む、請求項3に記載の載置台。
- 前記反射部は、前記第2の冷却プレートの側部まで延在する、請求項4に記載の載置台。
- 前記第2の冷媒流路は、前記第2の冷却プレートの下面又は内部に形成されている、請求項1乃至5のいずれか一項に記載の載置台。
- 前記第2の冷却プレートの下面に設けられる吸熱膜をさらに含む、請求項1乃至6のいずれか一項に記載の載置台。
- 前記発光素子は、発光部に取り付けられるレンズを有する、請求項1乃至7のいずれか一項に記載の載置台。
- 被検査体にプローブカードの接触端子を荷重を掛けて押し付けて、前記被検査体の電子デバイスを検査する検査装置であって、
前記被検査体が載置される載置台を含み、
前記載置台は、
第1の冷媒流路が形成された第1の冷却プレートと、
前記第1の冷却プレートに搭載され、複数の発光素子を有し、前記被検査体を加熱する加熱源と、
前記加熱源の上に設けられ、前記加熱源が出力する光を透過する透過部材と、
前記透過部材の上に設けられ、前記被検査体を保持し、第2の冷媒流路が形成された第2の冷却プレートと、
前記第1の冷却プレートと前記透過部材との間で、前記加熱源を覆うように充填される透明樹脂層と、
を有する、検査装置。 - 被検査体にプローブカードの接触端子を荷重を掛けて押し付けて、前記被検査体の電子デバイスを検査する検査装置であって、
前記被検査体が載置される載置台を含み、
前記載置台は、
第1の冷媒流路が形成された第1の冷却プレートと、
前記第1の冷却プレートに搭載され、複数の発光素子を有し、前記被検査体を加熱する加熱源と、
前記第1の冷却プレートの上に設けられ、前記被検査体を保持し、第2の冷媒流路が形成された第2の冷却プレートと、
前記第1の冷却プレートと前記第2の冷却プレートとの間で前記加熱源を覆うように充填され、前記加熱源が出力する光を透過する透明樹脂層と、
を有する、検査装置。
Priority Applications (6)
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JP2019212654A JP7398935B2 (ja) | 2019-11-25 | 2019-11-25 | 載置台、及び、検査装置 |
TW109139847A TW202132780A (zh) | 2019-11-25 | 2020-11-16 | 載置台及檢查裝置 |
KR1020200153613A KR102571605B1 (ko) | 2019-11-25 | 2020-11-17 | 적재대 및 검사 장치 |
CN202011292452.3A CN112838041A (zh) | 2019-11-25 | 2020-11-18 | 载置台和检查装置 |
EP20208446.3A EP3825705A1 (en) | 2019-11-25 | 2020-11-18 | Reinforced temperature controlled stage |
US17/101,735 US11499993B2 (en) | 2019-11-25 | 2020-11-23 | Stage and inspection apparatus for inspecting electronic device |
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US11231452B2 (en) * | 2020-02-04 | 2022-01-25 | Lumentum Operations Llc | Testing apparatus for optical devices |
US11650246B1 (en) * | 2022-02-02 | 2023-05-16 | Western Digital Technologies, Inc. | Localized onboard socket heating elements for burn-in test boards |
Citations (3)
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JP2007043042A (ja) * | 2005-07-07 | 2007-02-15 | Sumitomo Electric Ind Ltd | ウェハ保持体およびその製造方法、ならびにそれを搭載したウェハプローバ及び半導体加熱装置 |
JP2018523305A (ja) * | 2015-06-29 | 2018-08-16 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 真空対応式led基板ヒータ |
JP2019153717A (ja) * | 2018-03-05 | 2019-09-12 | 東京エレクトロン株式会社 | 検査装置 |
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US3742174A (en) * | 1971-12-29 | 1973-06-26 | Gen Electric | Induction cooking appliance including cooking vessel having means for transmission of temperature data by light pulses |
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TW202132780A (zh) | 2021-09-01 |
CN112838041A (zh) | 2021-05-25 |
US20210156891A1 (en) | 2021-05-27 |
US11499993B2 (en) | 2022-11-15 |
KR102571605B1 (ko) | 2023-08-29 |
JP7398935B2 (ja) | 2023-12-15 |
EP3825705A1 (en) | 2021-05-26 |
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