JP2020193368A5 - - Google Patents

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Publication number
JP2020193368A5
JP2020193368A5 JP2019099567A JP2019099567A JP2020193368A5 JP 2020193368 A5 JP2020193368 A5 JP 2020193368A5 JP 2019099567 A JP2019099567 A JP 2019099567A JP 2019099567 A JP2019099567 A JP 2019099567A JP 2020193368 A5 JP2020193368 A5 JP 2020193368A5
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Japan
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heater
region
container
heating device
control unit
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JP2019099567A
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English (en)
Japanese (ja)
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JP2020193368A (ja
JP7241604B2 (ja
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Priority to JP2019099567A priority Critical patent/JP7241604B2/ja
Priority claimed from JP2019099567A external-priority patent/JP7241604B2/ja
Priority to CN201911297341.9A priority patent/CN112011760A/zh
Priority to CN202510873651.XA priority patent/CN120575129A/zh
Priority to KR1020190170668A priority patent/KR20200136803A/ko
Publication of JP2020193368A publication Critical patent/JP2020193368A/ja
Publication of JP2020193368A5 publication Critical patent/JP2020193368A5/ja
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JP2019099567A 2019-05-28 2019-05-28 加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法 Active JP7241604B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019099567A JP7241604B2 (ja) 2019-05-28 2019-05-28 加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法
CN201911297341.9A CN112011760A (zh) 2019-05-28 2019-12-17 加热装置、蒸发源装置、成膜装置、成膜方法及电子器件的制造方法
CN202510873651.XA CN120575129A (zh) 2019-05-28 2019-12-17 加热装置、蒸发源装置、成膜装置、成膜方法及电子器件的制造方法
KR1020190170668A KR20200136803A (ko) 2019-05-28 2019-12-19 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019099567A JP7241604B2 (ja) 2019-05-28 2019-05-28 加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2020193368A JP2020193368A (ja) 2020-12-03
JP2020193368A5 true JP2020193368A5 (enrdf_load_stackoverflow) 2022-03-09
JP7241604B2 JP7241604B2 (ja) 2023-03-17

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JP2019099567A Active JP7241604B2 (ja) 2019-05-28 2019-05-28 加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法

Country Status (3)

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JP (1) JP7241604B2 (enrdf_load_stackoverflow)
KR (1) KR20200136803A (enrdf_load_stackoverflow)
CN (2) CN112011760A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102319130B1 (ko) * 2020-03-11 2021-10-29 티오에스주식회사 가변 온도조절 장치를 구비한 금속-산화물 전자빔 증발원
JP7604240B2 (ja) * 2021-01-15 2024-12-23 株式会社ジャパンディスプレイ 表示装置及び表示装置の製造方法
CN114182208B (zh) * 2021-12-10 2024-01-23 深圳市华星光电半导体显示技术有限公司 蒸镀源及蒸镀设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011162846A (ja) * 2010-02-10 2011-08-25 Mitsubishi Heavy Ind Ltd 真空蒸発源
CN102268642A (zh) * 2011-07-22 2011-12-07 上海奕瑞光电子科技有限公司 电阻加热式蒸发源
JP5557817B2 (ja) * 2011-09-30 2014-07-23 株式会社日立ハイテクノロジーズ 蒸発源および成膜装置
JP2014070227A (ja) * 2012-09-27 2014-04-21 Hitachi High-Technologies Corp 成膜装置とその蒸発源の温度制御方法及び温度制御装置
JP2014072005A (ja) * 2012-09-28 2014-04-21 Hitachi High-Technologies Corp 蒸発源、真空蒸着装置及び有機el表示装置製造方法
JP6223675B2 (ja) * 2012-11-29 2017-11-01 株式会社オプトラン 真空蒸着源及びそれを用いた真空蒸着方法
CN103757590B (zh) * 2013-12-31 2016-04-20 深圳市华星光电技术有限公司 一种镀膜机坩埚设备
JP6488928B2 (ja) * 2015-07-15 2019-03-27 アイシン精機株式会社 蒸着装置
JP6436544B1 (ja) * 2017-08-07 2018-12-12 キヤノントッキ株式会社 蒸発源装置およびその制御方法

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