JP6250940B2 - 蒸発源装置 - Google Patents
蒸発源装置 Download PDFInfo
- Publication number
- JP6250940B2 JP6250940B2 JP2013049258A JP2013049258A JP6250940B2 JP 6250940 B2 JP6250940 B2 JP 6250940B2 JP 2013049258 A JP2013049258 A JP 2013049258A JP 2013049258 A JP2013049258 A JP 2013049258A JP 6250940 B2 JP6250940 B2 JP 6250940B2
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- JP
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- Prior art keywords
- crucible
- opening
- heating
- temperature
- evaporation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000008020 evaporation Effects 0.000 title claims description 36
- 238000001704 evaporation Methods 0.000 title claims description 36
- 238000010438 heat treatment Methods 0.000 claims description 133
- 238000007740 vapor deposition Methods 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 37
- 230000008022 sublimation Effects 0.000 claims description 24
- 238000000859 sublimation Methods 0.000 claims description 24
- 230000008018 melting Effects 0.000 claims description 17
- 238000002844 melting Methods 0.000 claims description 17
- 238000005265 energy consumption Methods 0.000 claims description 11
- 230000001934 delay Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 7
- 230000003111 delayed effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
2 ルツボ本体
3 ルツボ開口部
4 本体加熱部
5 開口部加熱部
Claims (5)
- 蒸着材料が収容されるルツボ本体に、このルツボ本体に収容され加熱された前記蒸着材料を噴出するルツボ開口部を突設形成し、前記ルツボ本体を加熱する本体加熱部と前記ルツボ開口部を加熱する開口部加熱部とを備えた蒸発源装置であって、前記ルツボ開口部の加熱開始時間を前記ルツボ本体の加熱開始時間より遅らせ、且つ、前記ルツボ本体の温度が蒸着材料の溶融温度若しくは昇華温度に達する前に前記ルツボ開口部の加熱を開始するように、前記開口部加熱部を制御する加熱制御部を設けて、前記ルツボ本体の温度が蒸着材料の溶融温度若しくは昇華温度に達した際に、前記ルツボ開口部の温度が蒸着材料の溶融温度若しくは昇華温度に達しているように構成したことを特徴とする蒸発源装置。
- 前記ルツボ本体の熱容量に比し前記ルツボ開口部の熱容量が小さくなるように前記ルツボ開口部の形状を設定して、前記本体加熱部の消費エネルギーに比し前記開口部加熱部の消費エネルギーが少なくなるように構成したことを特徴とする請求項1記載の蒸発源装置。
- 前記ルツボ開口部の突出先端側ほど熱容量が小さくなるように前記ルツボ開口部の形状を設定したことを特徴とする請求項2記載の蒸発源装置。
- 前記ルツボ開口部は前記ルツボ本体より熱伝導率が大きい材質から成ることを特徴とする請求項1〜3のいずれか1項に記載の蒸発源装置。
- 前記開口部加熱部は、前記ルツボ開口部の周囲に設けられるメッシュ状の円筒部材と、この円筒部材の周囲に設けられる加熱ヒータと、この加熱ヒータの周囲に設けられる熱反射部材とを備えたことを特徴とする請求項1〜4のいずれか1項に記載の蒸発源装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013049258A JP6250940B2 (ja) | 2013-03-12 | 2013-03-12 | 蒸発源装置 |
KR1020157022798A KR102013013B1 (ko) | 2013-03-12 | 2014-03-11 | 증발원 장치 |
PCT/JP2014/056263 WO2014142097A1 (ja) | 2013-03-12 | 2014-03-11 | 蒸発源装置 |
TW103108654A TWI617683B (zh) | 2013-03-12 | 2014-03-12 | Evaporation source device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013049258A JP6250940B2 (ja) | 2013-03-12 | 2013-03-12 | 蒸発源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014173169A JP2014173169A (ja) | 2014-09-22 |
JP6250940B2 true JP6250940B2 (ja) | 2017-12-20 |
Family
ID=51536752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013049258A Active JP6250940B2 (ja) | 2013-03-12 | 2013-03-12 | 蒸発源装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6250940B2 (ja) |
KR (1) | KR102013013B1 (ja) |
TW (1) | TWI617683B (ja) |
WO (1) | WO2014142097A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104278239A (zh) * | 2014-10-31 | 2015-01-14 | 京东方科技集团股份有限公司 | 蒸镀坩埚装置 |
CN104694883A (zh) * | 2015-03-27 | 2015-06-10 | 京东方科技集团股份有限公司 | 一种坩埚 |
CN107217236B (zh) * | 2017-05-17 | 2023-10-20 | 大连交通大学 | 一种低温真空蒸发源 |
CN107779824A (zh) * | 2017-12-07 | 2018-03-09 | 合肥鑫晟光电科技有限公司 | 蒸发源、蒸镀装置以及有机电致发光显示器的生产设备 |
KR102590301B1 (ko) * | 2018-04-24 | 2023-10-18 | 주식회사 선익시스템 | 증착 장치용 증발원 |
CN108359941B (zh) * | 2018-05-11 | 2019-08-23 | 京东方科技集团股份有限公司 | 坩埚盖、坩埚盖组件、蒸发源、蒸镀方法 |
KR102150453B1 (ko) * | 2018-06-21 | 2020-09-01 | 주식회사 선익시스템 | 증착 장치용 증발원 |
JP2020002388A (ja) * | 2018-06-25 | 2020-01-09 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
CN110218977B (zh) * | 2019-07-03 | 2021-04-27 | Tcl华星光电技术有限公司 | 蒸镀装置 |
KR102319130B1 (ko) * | 2020-03-11 | 2021-10-29 | 티오에스주식회사 | 가변 온도조절 장치를 구비한 금속-산화물 전자빔 증발원 |
JP7162639B2 (ja) * | 2020-05-20 | 2022-10-28 | キヤノントッキ株式会社 | 蒸発源装置、蒸着装置、及び蒸発源装置の制御方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62169321A (ja) * | 1986-01-21 | 1987-07-25 | Hitachi Ltd | 真空蒸着用蒸発源 |
JP4442558B2 (ja) * | 2005-01-06 | 2010-03-31 | 三星モバイルディスプレイ株式會社 | 蒸発源の加熱制御方法,蒸発源の冷却制御方法および蒸発源の制御方法 |
KR100732850B1 (ko) * | 2005-01-06 | 2007-06-27 | 삼성에스디아이 주식회사 | 증착시스템의 증착원의 제어방법 |
JP4876212B2 (ja) * | 2005-01-11 | 2012-02-15 | 金子 博之 | 気化器及び気化器を有するプラズマ処理装置 |
KR101015277B1 (ko) * | 2008-12-10 | 2011-02-15 | 삼성모바일디스플레이주식회사 | 증발원 |
JP5414587B2 (ja) | 2010-03-23 | 2014-02-12 | 日立造船株式会社 | 蒸着装置 |
-
2013
- 2013-03-12 JP JP2013049258A patent/JP6250940B2/ja active Active
-
2014
- 2014-03-11 KR KR1020157022798A patent/KR102013013B1/ko active IP Right Grant
- 2014-03-11 WO PCT/JP2014/056263 patent/WO2014142097A1/ja active Application Filing
- 2014-03-12 TW TW103108654A patent/TWI617683B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2014142097A1 (ja) | 2014-09-18 |
JP2014173169A (ja) | 2014-09-22 |
KR20150123809A (ko) | 2015-11-04 |
TW201506177A (zh) | 2015-02-16 |
TWI617683B (zh) | 2018-03-11 |
KR102013013B1 (ko) | 2019-08-21 |
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