JP2020122208A5 - - Google Patents
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- Publication number
- JP2020122208A5 JP2020122208A5 JP2019016362A JP2019016362A JP2020122208A5 JP 2020122208 A5 JP2020122208 A5 JP 2020122208A5 JP 2019016362 A JP2019016362 A JP 2019016362A JP 2019016362 A JP2019016362 A JP 2019016362A JP 2020122208 A5 JP2020122208 A5 JP 2020122208A5
- Authority
- JP
- Japan
- Prior art keywords
- mask according
- manufacturing
- vapor
- mask
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 27
- 238000007740 vapor deposition Methods 0.000 claims description 19
- 239000000853 adhesive Substances 0.000 claims description 14
- 230000001070 adhesive effect Effects 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 238000009713 electroplating Methods 0.000 claims description 6
- 229910001374 Invar Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 238000000427 thin-film deposition Methods 0.000 claims 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000000608 laser ablation Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 235000006408 oxalic acid Nutrition 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000005368 silicate glass Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019016362A JP7332301B2 (ja) | 2019-01-31 | 2019-01-31 | 蒸着マスク及び蒸着マスクの製造方法 |
| PCT/JP2019/042845 WO2020158082A1 (ja) | 2019-01-31 | 2019-10-31 | 蒸着マスク及び蒸着マスクの製造方法 |
| CN201980089786.XA CN113330134B (zh) | 2019-01-31 | 2019-10-31 | 蒸镀掩模和蒸镀掩模的制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019016362A JP7332301B2 (ja) | 2019-01-31 | 2019-01-31 | 蒸着マスク及び蒸着マスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020122208A JP2020122208A (ja) | 2020-08-13 |
| JP2020122208A5 true JP2020122208A5 (enrdf_load_stackoverflow) | 2022-02-02 |
| JP7332301B2 JP7332301B2 (ja) | 2023-08-23 |
Family
ID=71840042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019016362A Active JP7332301B2 (ja) | 2019-01-31 | 2019-01-31 | 蒸着マスク及び蒸着マスクの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7332301B2 (enrdf_load_stackoverflow) |
| CN (1) | CN113330134B (enrdf_load_stackoverflow) |
| WO (1) | WO2020158082A1 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102796671B1 (ko) * | 2021-06-30 | 2025-04-18 | 가부시키가이샤 재팬 디스프레이 | 증착 마스크 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000196243A (ja) * | 1998-12-28 | 2000-07-14 | Fujitsu Ltd | フレキシブル多層回路基板の製造方法 |
| JP2003107723A (ja) * | 2001-09-25 | 2003-04-09 | Eastman Kodak Co | メタルマスクの製造方法およびメタルマスク |
| JP4475496B2 (ja) * | 2003-05-21 | 2010-06-09 | 九州日立マクセル株式会社 | 有機ｅｌ素子用の蒸着マスクとその製造方法 |
| US8698303B2 (en) * | 2010-11-23 | 2014-04-15 | Ibiden Co., Ltd. | Substrate for mounting semiconductor, semiconductor device and method for manufacturing semiconductor device |
| JP6330377B2 (ja) * | 2014-03-06 | 2018-05-30 | 大日本印刷株式会社 | 基板付蒸着マスク装置の製造方法、基板付蒸着マスクおよびレジストパターン付基板 |
| CN109072411B (zh) * | 2016-02-10 | 2021-04-06 | 鸿海精密工业股份有限公司 | 蒸镀掩模的制造方法、蒸镀掩模及有机半导体元件的制造方法 |
-
2019
- 2019-01-31 JP JP2019016362A patent/JP7332301B2/ja active Active
- 2019-10-31 CN CN201980089786.XA patent/CN113330134B/zh active Active
- 2019-10-31 WO PCT/JP2019/042845 patent/WO2020158082A1/ja active Application Filing
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