JP2020088391A - 酸化ケイ素腐食防止剤を有するエッチング溶液、及びその使用方法 - Google Patents
酸化ケイ素腐食防止剤を有するエッチング溶液、及びその使用方法 Download PDFInfo
- Publication number
- JP2020088391A JP2020088391A JP2019208645A JP2019208645A JP2020088391A JP 2020088391 A JP2020088391 A JP 2020088391A JP 2019208645 A JP2019208645 A JP 2019208645A JP 2019208645 A JP2019208645 A JP 2019208645A JP 2020088391 A JP2020088391 A JP 2020088391A
- Authority
- JP
- Japan
- Prior art keywords
- phenylenediamine
- nitrogen
- aniline
- triazole
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title claims abstract description 57
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 229910052814 silicon oxide Inorganic materials 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims description 34
- 239000003112 inhibitor Substances 0.000 title description 12
- 230000007797 corrosion Effects 0.000 title description 9
- 238000005260 corrosion Methods 0.000 title description 9
- -1 nitrogen-containing compound Chemical class 0.000 claims abstract description 71
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 54
- 229920005591 polysilicon Polymers 0.000 claims abstract description 53
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 150000001875 compounds Chemical class 0.000 claims abstract description 41
- 239000000908 ammonium hydroxide Substances 0.000 claims abstract description 31
- 229910001868 water Inorganic materials 0.000 claims abstract description 31
- 239000004094 surface-active agent Substances 0.000 claims abstract description 30
- 125000001453 quaternary ammonium group Chemical group 0.000 claims abstract description 29
- 238000004377 microelectronic Methods 0.000 claims abstract description 16
- 229920000768 polyamine Polymers 0.000 claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims description 110
- 239000004065 semiconductor Substances 0.000 claims description 19
- 229920002873 Polyethylenimine Polymers 0.000 claims description 15
- 239000005725 8-Hydroxyquinoline Substances 0.000 claims description 14
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 14
- 239000002131 composite material Substances 0.000 claims description 14
- 229960003540 oxyquinoline Drugs 0.000 claims description 14
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 12
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 12
- 150000003973 alkyl amines Chemical class 0.000 claims description 12
- 239000012964 benzotriazole Substances 0.000 claims description 12
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 10
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 9
- DGRGLKZMKWPMOH-UHFFFAOYSA-N 4-methylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1 DGRGLKZMKWPMOH-UHFFFAOYSA-N 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 9
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 8
- NBYLBWHHTUWMER-UHFFFAOYSA-N 2-Methylquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(C)=CC=C21 NBYLBWHHTUWMER-UHFFFAOYSA-N 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 8
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 claims description 8
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 claims description 7
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 claims description 7
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims description 7
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 6
- ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 6
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 claims description 6
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 claims description 6
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 claims description 6
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 claims description 6
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 claims description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 6
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 5
- GDGIVSREGUOIJZ-UHFFFAOYSA-N 5-amino-3h-1,3,4-thiadiazole-2-thione Chemical compound NC1=NN=C(S)S1 GDGIVSREGUOIJZ-UHFFFAOYSA-N 0.000 claims description 5
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 5
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 claims description 5
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 5
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims description 5
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 claims description 4
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 claims description 4
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 4
- HHPDFYDITNAMAM-UHFFFAOYSA-N 2-[cyclohexyl(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)C1CCCCC1 HHPDFYDITNAMAM-UHFFFAOYSA-N 0.000 claims description 4
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims description 4
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 claims description 4
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 4
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims description 4
- 150000004986 phenylenediamines Chemical class 0.000 claims description 4
- 150000003248 quinolines Chemical class 0.000 claims description 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical group O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 4
- RXCOGDYOZQGGMK-UHFFFAOYSA-N (3,4-diaminophenyl)-phenylmethanone Chemical compound C1=C(N)C(N)=CC=C1C(=O)C1=CC=CC=C1 RXCOGDYOZQGGMK-UHFFFAOYSA-N 0.000 claims description 3
- NHAZGSRLKBTDBF-UHFFFAOYSA-N 1,2,4-triazol-1-amine Chemical compound NN1C=NC=N1 NHAZGSRLKBTDBF-UHFFFAOYSA-N 0.000 claims description 3
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 3
- XGNXYCFREOZBOL-UHFFFAOYSA-N 1,3-benzodioxol-5-amine Chemical compound NC1=CC=C2OCOC2=C1 XGNXYCFREOZBOL-UHFFFAOYSA-N 0.000 claims description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 3
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 claims description 3
- NXRIDTLKJCKPOG-UHFFFAOYSA-N 1,4-dihydroimidazole-5-thione Chemical compound S=C1CN=CN1 NXRIDTLKJCKPOG-UHFFFAOYSA-N 0.000 claims description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 3
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 claims description 3
- IFFLKGMDBKQMAH-UHFFFAOYSA-N 2,4-diaminopyridine Chemical compound NC1=CC=NC(N)=C1 IFFLKGMDBKQMAH-UHFFFAOYSA-N 0.000 claims description 3
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 claims description 3
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 claims description 3
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 claims description 3
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 claims description 3
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 claims description 3
- UFVLIVCXTIGACT-UHFFFAOYSA-N 2-aminoquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(N)=CC=C21 UFVLIVCXTIGACT-UHFFFAOYSA-N 0.000 claims description 3
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 claims description 3
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 claims description 3
- KIZQNNOULOCVDM-UHFFFAOYSA-M 2-hydroxyethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].C[N+](C)(C)CCO KIZQNNOULOCVDM-UHFFFAOYSA-M 0.000 claims description 3
- NFCPRRWCTNLGSN-UHFFFAOYSA-N 2-n-phenylbenzene-1,2-diamine Chemical compound NC1=CC=CC=C1NC1=CC=CC=C1 NFCPRRWCTNLGSN-UHFFFAOYSA-N 0.000 claims description 3
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 claims description 3
- YTZPUTADNGREHA-UHFFFAOYSA-N 2h-benzo[e]benzotriazole Chemical compound C1=CC2=CC=CC=C2C2=NNN=C21 YTZPUTADNGREHA-UHFFFAOYSA-N 0.000 claims description 3
- ULRPISSMEBPJLN-UHFFFAOYSA-N 2h-tetrazol-5-amine Chemical compound NC1=NN=NN1 ULRPISSMEBPJLN-UHFFFAOYSA-N 0.000 claims description 3
- JVSMPWHQUPKRNV-UHFFFAOYSA-N 2h-tetrazol-5-amine;hydrate Chemical compound O.NC=1N=NNN=1 JVSMPWHQUPKRNV-UHFFFAOYSA-N 0.000 claims description 3
- MBWYRMCXWROJMP-UHFFFAOYSA-N 3-(1-aminoethyl)aniline Chemical compound CC(N)C1=CC=CC(N)=C1 MBWYRMCXWROJMP-UHFFFAOYSA-N 0.000 claims description 3
- AXNUJYHFQHQZBE-UHFFFAOYSA-N 3-methylbenzene-1,2-diamine Chemical compound CC1=CC=CC(N)=C1N AXNUJYHFQHQZBE-UHFFFAOYSA-N 0.000 claims description 3
- KCHLDNLIJVSRPK-UHFFFAOYSA-N 3-methylsulfanylaniline Chemical compound CSC1=CC=CC(N)=C1 KCHLDNLIJVSRPK-UHFFFAOYSA-N 0.000 claims description 3
- IOCXBXZBNOYTLQ-UHFFFAOYSA-N 3-nitrobenzene-1,2-diamine Chemical compound NC1=CC=CC([N+]([O-])=O)=C1N IOCXBXZBNOYTLQ-UHFFFAOYSA-N 0.000 claims description 3
- IWFHBRFJOHTIPU-UHFFFAOYSA-N 4,5-dichlorobenzene-1,2-diamine Chemical compound NC1=CC(Cl)=C(Cl)C=C1N IWFHBRFJOHTIPU-UHFFFAOYSA-N 0.000 claims description 3
- XSZYBMMYQCYIPC-UHFFFAOYSA-N 4,5-dimethyl-1,2-phenylenediamine Chemical compound CC1=CC(N)=C(N)C=C1C XSZYBMMYQCYIPC-UHFFFAOYSA-N 0.000 claims description 3
- NJUAEGGYLOZMGV-UHFFFAOYSA-N 4,8-dimethyl-1h-quinolin-2-one Chemical compound C1=CC=C2C(C)=CC(=O)NC2=C1C NJUAEGGYLOZMGV-UHFFFAOYSA-N 0.000 claims description 3
- YKFROQCFVXOUPW-UHFFFAOYSA-N 4-(methylthio) aniline Chemical compound CSC1=CC=C(N)C=C1 YKFROQCFVXOUPW-UHFFFAOYSA-N 0.000 claims description 3
- DRYFDUUAYSVNSN-UHFFFAOYSA-N 4-(piperidin-1-ylmethyl)aniline Chemical compound C1=CC(N)=CC=C1CN1CCCCC1 DRYFDUUAYSVNSN-UHFFFAOYSA-N 0.000 claims description 3
- QSNSCYSYFYORTR-UHFFFAOYSA-N 4-chloroaniline Chemical compound NC1=CC=C(Cl)C=C1 QSNSCYSYFYORTR-UHFFFAOYSA-N 0.000 claims description 3
- VLVCDUSVTXIWGW-UHFFFAOYSA-N 4-iodoaniline Chemical compound NC1=CC=C(I)C=C1 VLVCDUSVTXIWGW-UHFFFAOYSA-N 0.000 claims description 3
- AGAHETWGCFCMDK-UHFFFAOYSA-N 4-methoxybenzene-1,2-diamine Chemical compound COC1=CC=C(N)C(N)=C1 AGAHETWGCFCMDK-UHFFFAOYSA-N 0.000 claims description 3
- AGWWTUWTOBEQFE-UHFFFAOYSA-N 4-methyl-1h-1,2,4-triazole-5-thione Chemical compound CN1C=NN=C1S AGWWTUWTOBEQFE-UHFFFAOYSA-N 0.000 claims description 3
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 claims description 3
- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 claims description 3
- RAUWPNXIALNKQM-UHFFFAOYSA-N 4-nitro-1,2-phenylenediamine Chemical compound NC1=CC=C([N+]([O-])=O)C=C1N RAUWPNXIALNKQM-UHFFFAOYSA-N 0.000 claims description 3
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 claims description 3
- ACYGZCHBIGKPGR-UHFFFAOYSA-N 4-octoxyaniline Chemical compound CCCCCCCCOC1=CC=C(N)C=C1 ACYGZCHBIGKPGR-UHFFFAOYSA-N 0.000 claims description 3
- ODGIMMLDVSWADK-UHFFFAOYSA-N 4-trifluoromethylaniline Chemical compound NC1=CC=C(C(F)(F)F)C=C1 ODGIMMLDVSWADK-UHFFFAOYSA-N 0.000 claims description 3
- YZTYEGCWRPJWEE-UHFFFAOYSA-N 5-(benzotriazol-2-yl)pentan-1-amine Chemical compound C1=CC=CC2=NN(CCCCCN)N=C21 YZTYEGCWRPJWEE-UHFFFAOYSA-N 0.000 claims description 3
- WZUUZPAYWFIBDF-UHFFFAOYSA-N 5-amino-1,2-dihydro-1,2,4-triazole-3-thione Chemical compound NC1=NNC(S)=N1 WZUUZPAYWFIBDF-UHFFFAOYSA-N 0.000 claims description 3
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 claims description 3
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 claims description 3
- HCEKEODXLSQFDV-UHFFFAOYSA-N 5-methyltriazol-1-amine Chemical compound CC1=CN=NN1N HCEKEODXLSQFDV-UHFFFAOYSA-N 0.000 claims description 3
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 claims description 3
- WXSBVEKBZGNSDY-UHFFFAOYSA-N 5-phenyl-2h-benzotriazole Chemical compound C1=CC=CC=C1C1=CC2=NNN=C2C=C1 WXSBVEKBZGNSDY-UHFFFAOYSA-N 0.000 claims description 3
- AJNQPSCMOSUVKK-UHFFFAOYSA-N 5-propan-2-yl-1h-1,2,4-triazole Chemical compound CC(C)C=1N=CNN=1 AJNQPSCMOSUVKK-UHFFFAOYSA-N 0.000 claims description 3
- ICKPMTNGWVNOGC-UHFFFAOYSA-N 7-bromoquinolin-8-ol Chemical compound C1=CN=C2C(O)=C(Br)C=CC2=C1 ICKPMTNGWVNOGC-UHFFFAOYSA-N 0.000 claims description 3
- WKRWEZSDSCUNMX-UHFFFAOYSA-N 8-Hydroxy-2-quinolinecarboxylic acid Natural products C1=CC(O)=CC2=NC(C(=O)O)=CC=C21 WKRWEZSDSCUNMX-UHFFFAOYSA-N 0.000 claims description 3
- UHBIKXOBLZWFKM-UHFFFAOYSA-N 8-hydroxy-2-quinolinecarboxylic acid Chemical compound C1=CC=C(O)C2=NC(C(=O)O)=CC=C21 UHBIKXOBLZWFKM-UHFFFAOYSA-N 0.000 claims description 3
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 claims description 3
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 3
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 claims description 3
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 claims description 3
- CWRVKFFCRWGWCS-UHFFFAOYSA-N Pentrazole Chemical compound C1CCCCC2=NN=NN21 CWRVKFFCRWGWCS-UHFFFAOYSA-N 0.000 claims description 3
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 claims description 3
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 claims description 3
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 claims description 3
- FKPSBYZGRQJIMO-UHFFFAOYSA-M benzyl(triethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC1=CC=CC=C1 FKPSBYZGRQJIMO-UHFFFAOYSA-M 0.000 claims description 3
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 claims description 3
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- 150000003077 polyols Chemical class 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940070891 pyridium Drugs 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- UELAIMNOXLAYRW-UHFFFAOYSA-M sodium;1,4-dicyclohexyloxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].C1CCCCC1OC(=O)C(S(=O)(=O)[O-])CC(=O)OC1CCCCC1 UELAIMNOXLAYRW-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000000391 spectroscopic ellipsometry Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- FBWNMEQMRUMQSO-UHFFFAOYSA-N tergitol NP-9 Polymers CCCCCCCCCC1=CC=C(OCCOCCOCCOCCOCCOCCOCCOCCOCCO)C=C1 FBWNMEQMRUMQSO-UHFFFAOYSA-N 0.000 description 1
- YNJQKNVVBBIPBA-UHFFFAOYSA-M tetrabutylazanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+](CCCC)(CCCC)CCCC YNJQKNVVBBIPBA-UHFFFAOYSA-M 0.000 description 1
- BVQJQTMSTANITJ-UHFFFAOYSA-N tetradecylphosphonic acid Chemical compound CCCCCCCCCCCCCCP(O)(O)=O BVQJQTMSTANITJ-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YQIVQBMEBZGFBY-UHFFFAOYSA-M tetraheptylazanium;bromide Chemical compound [Br-].CCCCCCC[N+](CCCCCCC)(CCCCCCC)CCCCCCC YQIVQBMEBZGFBY-UHFFFAOYSA-M 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- AHNISXOXSNAHBZ-UHFFFAOYSA-M tetrakis-decylazanium;bromide Chemical compound [Br-].CCCCCCCCCC[N+](CCCCCCCCCC)(CCCCCCCCCC)CCCCCCCCCC AHNISXOXSNAHBZ-UHFFFAOYSA-M 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- JAJRRCSBKZOLPA-UHFFFAOYSA-M triethyl(methyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(CC)CC JAJRRCSBKZOLPA-UHFFFAOYSA-M 0.000 description 1
- 150000008648 triflates Chemical class 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
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- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66545—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
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Abstract
Description
本発明は、半導体デバイスの製造において用いられる水性エッチング溶液に関する。より具体的には、本発明は、少なくとも高誘電体材料膜と、ハフニウム、ジルコニウム、チタン、タンタル又はタングステンを含有する金属ゲートと置き換えられる、シリコンで製造されたダミーゲートとをラミネートすることにより形成されたダミーゲートラミネートを含む構造ボディーを用いてトランジスタを製造するプロセスにおいて、シリコンで製造されたダミーゲートを選択的にエッチングするために用いられるエッチング溶液、及びエッチング溶液を用いてトランジスタを製造する方法に関する。
この必要は本開示により満たされ、本発明者らは、ある界面活性剤及び窒素含有化合物が、ポリシリコンのエッチング速度を著しく抑制することなく、アルカリ性湿式化学品エッチング配合物における酸化物エッチング速度を著しく抑制することができることを発見した。
本開示で引用される出版物、特許出願、及び特許などのすべての参考文献は、各参考文献が、参照により組み込まれるように個々に具体的に示され、その全体において本開示に記載されたのと同程度に参照により本開示に組み込まれる。
本開発のエッチング組成物は水系であり、したがって水を含む。本発明において、水は様々に機能し、例えば、組成物の1つ又は複数の成分を溶解するため、成分のキャリアとして、残留物の除去の助剤として、組成物の粘度改質剤として、及び希釈液として機能する。好ましくは、洗浄組成物中で用いられる水は脱イオン(DI)水である。次の段落で説明する水の範囲は、あらゆる源由来の組成物中のすべての水を含む。
本発明のエッチング組成物は、水酸化第4級アンモニウムの少なくとも1種であるシリコンエッチャントを含む。また、水酸化第4級アンモニウムは、エッチング溶液にアルカリ性も与える。実施態様において、得られるエッチング溶液のpHは、約7.5〜14、約9.0〜14、及び約11〜14、又は以下のリスト:7.5、8、8.5、9、9.5、10、10.5、11、11.5、12、13、13.5及び14から選択される端点によって定義されるpH範囲の任意のpHである。
本発明のエッチング組成物は、少なくとも1種のアルカノールアミンを含むシリコンエッチャントを任意選択的に含む。
本発明のエッチング組成物は水混和性有機溶媒を含む。使用することができる水混和性有機溶媒の例は、エチレングリコール、プロピレングリコール、1,4−ブタンジオール、トリプロピレングリコールメチルエーテル、プロピレングリコールプロピルエーテル、ジエチレングリコールn−ブチルエーテル(BDG)(例えば販売名Dowanol(登録商標)DBの下で市販で入手可能)、ジプロピレングリコールメチルエーテル(DPM)ヘキシロキシプロピルアミン、ポリ(オキシエチレン)ジアミン、ジメチルスルホキシド(DMSO)、テトラヒドロフルフリルアルコール、グリセロール、アルコール、スルホラン、スルホキシド、又はこれらの混合物である。好ましい溶媒はアルコール、ジオール、又はこれらの混合物である。ほとんどの好ましい溶媒は、スルホラン、並びに例えばエチレングリコール及びプロピレングリコール等のジオール、及び例えばグリセロール等トリオールなどのポリオールである。
本発明のエッチング組成物は、C4〜12アルキルアミン、ポリアルキレンイミン、ポリアミン、窒素含有複素環式化合物、窒素含有芳香族化合物、窒素含有複素環式芳香族化合物から選択される(又はこれからなる群から選択される)少なくとも1種の窒素含有化合物を含む。窒素含有複素環式芳香族化合物は、芳香族複素環又は少なくとも1つの複素環及び少なくとも1つの芳香環を含んでもよい。
本発明のエッチング組成物は、任意選択的に少なくとも1種の界面活性剤を含む。界面活性剤は、エッチングから酸化ケイ素を保護するように機能する。本開示に記載された組成物で使用される界面活性剤としては、以下に制限されるものではないが、ビス(2−エチルヘキシル)リン酸塩、パーフルオロヘプタン酸、パーフルオロデカン酸、トリフルオロメタンスルホン酸、ホスホノ酢酸、ドデセニルコハク酸、ジオクタデシルリン酸水素、オクタデシル二水素リン酸塩、ドデシルアミン、ドデセニルコハク酸モノジエタノールアミド、ラウリン酸、パルミチン酸、オレイン酸、ビャクシン酸、12−ヒドロキシステアリン酸、及びドデシルリン酸塩などの両性塩、カチオン界面活性剤、アニオン界面活性剤、両性イオン界面活性剤、非イオン界面活性剤、及びこれらの組み合わせが挙げられる。
本発明のエッチング組成物は、以下の添加剤の1種又はそれより多くをさらに含むことができる:キレート剤、化学改質剤、染料、バイオサイド、及び他の添加剤。添加剤は、それらが組成物の性能に悪影響を及ぼさない程度に加えられてもよい。これらとしては、例えば、エチレンジアミン四酢酸(EDTA)、ブチレンジアミン四酢酸、(1,2−シクロヘキシレンジアミン)四酢酸(CyDTA)、ジエチレントリアミン五酢酸(DETPA)、エチレンジアミンテトラプロピオン酸、(ヒドロキシエチル)エチレンジアミン三酢酸(HEDTA)、N,N,N’,N’−エチレンジアミンテトラ(メチレンホスホン)酸(EDTMP)、トリエチレンテトラミン六酢酸(TTHA)、1,3−ジアミノ−2−ヒドロキシプロパン−N,N,N’,N’−四酢酸(DHPTA)、メチルイミノ二酢酸、プロピレンジアミン四酢酸、ニトロ三酢酸(NTA)、クエン酸、酒石酸、グルコン酸、糖酸、グリセリン酸、シュウ酸、フタル酸、マレイン酸、マンデル酸、マロン酸、乳酸、サリチル酸、没食子酸プロピル、ピロガロール、及びシステインが挙げられる。好ましいキレート剤は、EDTA、CyDTA、及びEDTMP等のアミノホスホン酸等のアミノカルボン酸である。
別の側面において、例えばシリコン及び酸化ケイ素を含む複合半導体デバイス等のマイクロ電子デバイスにおいて、水;水酸化第4級アンモニウム化合物の少なくとも1種;任意選択的に少なくとも1種のアルカノールアミン化合物;水混和性溶媒;C4〜12アルキルアミン、ポリアルキレンイミン、及びポリアミン、窒素含有複素環式化合物、窒素含有芳香族化合物、又は窒素含有複素環式芳香族化合物(からなる群)から選択される少なくとも1種の窒素含有化合物;及び任意選択的に界面活性剤を含むか、本質的にこれからなるか、これからなる組成物における複合半導体デバイスのエッチングにより酸化ケイ素に対するポリシリコンのエッチング速度を選択的に高める方法が提供される。
洗浄組成物を調製するための基本手順
本例の対象であるすべての組成物を、1”テフロン(登録商標)コーティング撹拌子を用いて250mLビーカー中で成分を混合することで調製した。典型的に、ビーカーに加えた第1の材料は脱イオン(DI)水であり、次いで特に順序はなく他の成分を加えた。
エッチング試験は、400rpmに設定された、1/2”円形テフロン(登録商標)撹拌子を備えた250mlビーカー中の100gのエッチング組成物を用いて実施された。エッチング組成物は、ホットプレート上で約50〜60℃の温度に加熱された。試験片は撹拌しつつ、約10分間組成物に浸漬された。
Claims (21)
- 水;
水酸化第4級アンモニウム化合物の少なくとも1種;
任意選択的に少なくとも1種のアルカノールアミン化合物;
少なくとも1種の水混和性有機溶媒;
C4〜12アルキルアミン、ポリアルキレンイミン、ポリアミン、窒素含有複素環式化合物、窒素含有芳香族化合物、及び窒素含有複素環式芳香族化合物から選択される少なくとも1種の窒素含有化合物;及び
任意選択的に界面活性剤
を含む、マイクロ電子デバイスからの酸化ケイ素に対するポリシリコンの選択的除去に適しているエッチング溶液。 - 少なくとも1種の水酸化第4級アンモニウム化合物が、水酸化ベンジルトリメチルアンモニウム、水酸化エチルトリメチルアンモニウム(ETMAH)、水酸化2−ヒドロキシエチルトリメチルアンモニウム、水酸化ベンジルトリエチルアンモニウム、水酸化ヘキサデシルトリメチルアンモニウム、及びこれらの混合物から選択され;
少なくとも1種のアルカノールアミン化合物が存在し、かつ、N−メチルエタノールアミン(NMEA)、モノエタノールアミン(MEA)、ジエタノールアミン、トリエタノールアミン、トリイソプロパノールアミン、2−(2−アミノエチルアミノ)エタノール、2−(2−アミノエトキシ)エタノール(AEE)、トリエタノールアミン、N−エチルエタノールアミン、N,N−ジメチルエタノールアミン、N,N−ジエチルエタノールアミン、N−メチルジエタノールアミン、N−エチルジエタノールアミン、シクロヘキシルアミンジエタノール、ジイソプロパノールアミン、シクロヘキシルアミンジエタノール、及びこれらの混合物から選択される、請求項1に記載のエッチング溶液。 - 水酸化第4級アンモニウム化合物の少なくとも1種が水酸化エチルトリメチルアンモニウムであり、アルカノールアミンが存在し、かつ、モノエタノールアミンである、請求項1に記載のエッチング溶液。
- 少なくとも1種の水混和性有機溶媒が、スルホラン、DMSO、及びプロピレングリコールから選択される、請求項3に記載のエッチング溶液。
- 少なくとも1種の窒素含有化合物が、ペンタメチルジエチレントリアミン、オクチルアミン、又はポリアルキレンイミンである、請求項4に記載のエッチング組成物。
- 少なくとも1種の窒素含有化合物が、アニリン、3,4−(メチレンジオキシ)アニリン、アニリン−2−スルホン酸、N−(2−ヒドロキシエチル)アニリン、4−(トリフルオロメチル)アニリン、4−(メチルチオ)アニリン、3−(メチルチオ)アニリン、3−(1−アミノエチル)アニリン、4−(オクチロキシ)アニリン、4−(ピペリジン−1−イルメチル)アニリン、p−トルイジン、n−エチル4−フルオロアニリン、4−イソプロピルアニリン、4−ニトロアニリン、p−アニシジン、4−クロロアニリン、4−ヨードアニリン、メチル4−アミノベンゾエート、N,N−ジエチル−p−フェニレンジアミン、N,N−ジメチル−p−フェニレンジアミン、o−フェニレンジアミン、N−フェニルエチレンジアミン、m−フェニレンジアミン、p−フェニレンジアミン、4,5−ジメチル−1,2−フェニレンジアミン、4−メチル−o−フェニレンジアミン、4−メチル−m−フェニレンジアミン、2−メチル−m−フェニレンジアミン、N−フェニル−o−フェニレンジアミン、4−ニトロ−o−フェニレンジアミン、3−ニトロ−1,2−フェニレンジアミン、4,5−ジクロロ−o−フェニレンジアミン、2,3−ジアミノトルエン、3,4−ジアミノトルエン、3,4−ジアミノベンゾフェノン、3,4−ジアミン安息香酸、3,4−ジアミノアニソール、キノリン、キノリン−8−メタノール、7−ブロモ−8−ヒドロキシキノリン、8−ヒドロキシキノリン(8−HQ)、8−ヒドロキシキノリン硫酸塩一水和物、8−キノリノールヘミ硫酸塩、5−クロロ−8−キノリノール、2−アミノ−8−キノリノール、4,8−ジメチル−2−ヒドロキシキノリン、2−メチル−8−キノリノール、8−ヒドロキシ−2−メチルキノリン、8−ヒドロキシ−5−ニトロキノリン、8−ヒドロキシ−2−キノリンカルボキシアルデヒド、8−ヒドロキシ−2−キノリンカルボン酸、2,8−キノリンジオール、ピリジン、ピリジン塩酸塩、4−(アミノメチル)ピリジン、2−(メチルアミノ)ピリジン、2−(ジメチルアミノ)ピリジン、4−(ジメチルアミノ)ピリジン、2−ピコリン酸、2−アミノピリジン、2,4−ジアミノピリジン、ベンゾイミダゾール、メルカプトベンゾイミダゾール、2−メルカプトベンゾイミダゾール(MBI)、4−メチル−2−フェニルイミダゾール、チオール−トリアゾール及びその誘導体、ベンゾトリアゾール(BTA)、トリルトリアゾール、5−フェニル−ベンゾトリアゾール、5−ニトロ−ベンゾトリアゾール、3−アミノ−5−メルカプト−1,2,4−トリアゾール、1−アミノ−1,2,4−トリアゾール、ヒドロキシベンゾトリアゾール、2−(5−アミノ−ペンチル)−ベンゾトリアゾール、1−アミノ−1,2,3−トリアゾール、1−アミノ−5−メチル−1,2,3−トリアゾール、3−アミノ−1,2,4−トリアゾール、3−メルカプト−1,2,4−トリアゾール、3−イソプロピル−1,2,4−トリアゾール、5−フェニルチオール−ベンゾトリアゾール、ハロ−ベンゾトリアゾール(ハロ=F、Cl、Br又はI)、ナフトトリアゾール、4−メチル−4H−1,2,4−トリアゾール−3−チオール、2−メルカプトベンゾチアゾール、2−メルカプトチアゾリン、5−アミノテトラゾール、メチルテトラゾール、5−アミノテトラゾール一水和物、1−フェニル−5−メルカプトテトラゾール、1,5−ペンタメチレンテトラゾール、5−アミノ−1,3,4−チアジアゾール−2−チオール、2,4−ジアミノ−6−メチル−1,3,5−トリアジン、チアゾール、トリアジン、1,3−ジメチル−2−イミダゾリジノン、ジアミノメチルトリアジン、イミダゾリンチオン、メルカプトベンゾイミダゾール、5−アミノ−1,3,4−チアジアゾール−2−チオール、1H−ピラゾール、又は1−(2−アミノエチル)ピペラジンから選択される、請求項1に記載のエッチング組成物。
- 少なくとも1種の窒素含有化合物が、8−HQ(8−ヒドロキシキノリン)、3,4−トルエンジアミン、4−イソプロピルアニリン、8−ヒドロキシ−2−メチルキノリン、ベンゾイミダゾール、又は1H−ピラゾールから選択される、請求項4に記載のエッチング組成物。
- ポリアルキレンイミンがポリエチレンイミンである、請求項5に記載のエッチング組成物。
- 窒素含有化合物が、ヘキシルアミン、ヘキシルアミンの界面活性剤塩、オクチルアミン、オクチルアミンの界面活性剤塩、デシルアミン、デシルアミンの界面活性剤塩、ドデシルアミン、及びドデシルアミンの界面活性剤塩、ペンタメチルジエチレントリアミン(PMDETA)、トリエチレンジアミン(TEDA)、トリエチレンテトラミン(TETA)、テトラメチルエチレンジアミン(TMEDA)、及びジエチレントリアミン(DETA)から選択される、請求項1に記載のエッチング組成物。
- 少なくとも1種の窒素含有化合物が、8−HQ(8−ヒドロキシキノリン)、3,4−トルエンジアミン、4−イソプロピルアニリン、8−ヒドロキシ−2−メチルキノリン、ベンゾイミダゾール又は1H−ピラゾールから選択される、請求項1に記載のエッチング組成物。
- 少なくとも1種の窒素含有化合物が、フェニレンジアミン、フェニレンジアミンの誘導体、キノリン又はキノリンの誘導体から選択される、請求項1に記載のエッチング組成物。
- 約1〜約15%の前記水酸化第4級アンモニウム化合物の少なくとも1種;
約5〜約15%の前記少なくとも1種のアルカノールアミン化合物;
約45〜約55%の前記少なくとも1種の水混和性有機溶媒;及び
約0.10〜約5%の、C4〜12アルキルアミン、ポリアルキレンイミン、ポリアミン、窒素含有複素環式化合物、窒素含有芳香族化合物、又は窒素含有複素環式芳香族化合物から選択される前記少なくとも1種の窒素含有化合物
を含む、請求項1に記載のエッチング組成物。 - ポリシリコン及び酸化ケイ素を含む複合半導体デバイスにおいて、酸化ケイ素に対するポリシリコンのエッチング速度を選択的に高める方法であって、
ポリシリコン及び酸化ケイ素を含む複合半導体デバイスを、水酸化第4級アンモニウム化合物の少なくとも1種;任意選択的に少なくとも1種のアルカノールアミン化合物;少なくとも1種の水混和性溶媒;C4〜12アルキルアミン、ポリアルキレンイミン、ポリアミン、窒素含有複素環式化合物、窒素含有芳香族化合物、及び窒素含有複素環式芳香族化合物から選択される少なくとも1種の窒素含有化合物;及び任意選択的に界面活性剤を含む水性組成物と接触させる工程と;
ポリシリコンが少なくとも部分的に除去された後、複合半導体デバイスをリンスする工程と
を含み、
酸化ケイ素に対するシリコンのエッチ選択性が1,000を超える方法。 - 半導体デバイスを乾燥させる工程をさらに含む、請求項13に記載の方法。
- 酸化ケイ素に対するシリコンのエッチ選択性が15,000を超える、請求項13に記載の方法。
- 酸化ケイ素に対する窒化ケイ素のエッチ選択性が20,000を超える、請求項13に記載の方法。
- 前記接触させる工程が、約25℃〜約100℃の温度で実施される、請求項13に記載の方法。
- 少なくとも1種の水酸化第4級アンモニウム化合物が、水酸化ベンジルトリメチルアンモニウム、水酸化エチルトリメチルアンモニウム(ETMAH)、水酸化2−ヒドロキシエチルトリメチルアンモニウム、水酸化ベンジルトリエチルアンモニウム、水酸化ヘキサデシルトリメチルアンモニウム、及びこれらの混合物からなる群から選択され;
少なくとも1種のアルカノールアミン化合物が存在し、かつ、N−メチルエタノールアミン(NMEA)、モノエタノールアミン(MEA)、ジエタノールアミン、トリエタノールアミン、トリイソプロパノールアミン、2−(2−アミノエチルアミノ)エタノール、2−(2−アミノエトキシ)エタノール(AEE)、トリエタノールアミン、N−エチルエタノールアミン、N,N−ジメチルエタノールアミン、N,N−ジエチルエタノールアミン、N−メチルジエタノールアミン、N−エチルジエタノールアミン、シクロヘキシルアミンジエタノール、ジイソプロパノールアミン、シクロヘキシルアミンジエタノール、及びこれらの混合物からなる群から選択される、請求項13に記載の方法。 - 水酸化第4級アンモニウム化合物の少なくとも1種が水酸化エチルトリメチルアンモニウムであり、アルカノールアミンが存在し、かつ、モノエタノールアミンである、請求項13に記載の方法。
- 少なくとも1種の水混和性有機溶媒が、スルホラン、DMSO、及びプロピレングリコールからなる群から選択される、請求項13に記載の方法。
- 少なくとも1種の窒素含有化合物が、ペンタメチルジエチレントリアミン、オクチルアミン、ポリアルキレンイミン、アニリン、3,4−(メチレンジオキシ)アニリン、アニリン−2−スルホン酸、N−(2−ヒドロキシエチル)アニリン、4−(トリフルオロメチル)アニリン、4−(メチルチオ)アニリン、3−(メチルチオ)アニリン、3−(1−アミノエチル)アニリン、4−(オクチロキシ)アニリン、4−(ピペリジン−1−イルメチル)アニリン、N,N−ジメチル−p−フェニレンジアミン、N−フェニルエチレンジアミン、p−トルイジン、4−エチル4−フルオロアニリンラニリン、4−イソプロピルアニリン、4−ニトロアニリン、p−アニシジン、4−クロロアニリン、4−ヨードアニリン、メチル4−アミノベンゾエート、N,N−ジエチル−p−フェニレンジアミン、o−フェニレンジアミン、m−フェニレンジアミン、p−フェニレンジアミン、4,5−ジメチル−1,2−フェニレンジアミン、4−メチル−o−フェニレンジアミン、4−メチル−m−フェニレンジアミン、2−メチル−m−フェニレンジアミン、N−フェニル−o−フェニレンジアミン、4−ニトロ−o−フェニレンジアミン、3−ニトロ−1,2−フェニレンジアミン、4,5−ジクロロ−o−フェニレンジアミン、2,3−ジアミノトルエン、3,4−ジアミノトルエン、3,4−ジアミノベンゾフェノン、3,4−ジアミン安息香酸、3,4−ジアミノアニソール、キノリン、キノリン−8−メタノール、7−ブロモ−8−ヒドロキシキノリン、8−ヒドロキシキノリン(8−HQ)、8−ヒドロキシキノリン硫酸塩一水和物、8−キノリノールヘミ硫酸塩、5−クロロ−8−キノリノール、2−アミノ−8−キノリノール、4,8−ジメチル−2−ヒドロキシキノリン、2−メチル−8−キノリノール、8−ヒドロキシ−5−ニトロキノリン、8−ヒドロキシ−2−キノリンカルボキシアルデヒド、8−ヒドロキシ−2−キノリンカルボン酸、2,8−キノリンジオール、ピリジン、ピリジン塩酸塩、4−(アミノメチル)ピリジン、2−(メチルアミノ)ピリジン、2−(ジメチルアミノ)ピリジン、4−(ジメチルアミノ)ピリジン、2−ピコリン酸、2−アミノピリジン、2,4−ジアミノピリジン、ベンゾイミダゾール、2−メルカプトベンゾイミダゾール、チオール−トリアゾール及びその誘導体、ベンゾトリアゾール(BTA)、トリルトリアゾール、5−フェニル−ベンゾトリアゾール、5−ニトロ−ベンゾトリアゾール、3−アミノ−5−メルカプト−1,2,4−トリアゾール、1−アミノ−1,2,4−トリアゾール、ヒドロキシベンゾトリアゾール、2−(5−アミノ−ペンチル)−ベンゾトリアゾール、1−アミノ−1,2,3−トリアゾール、1−アミノ−5−メチル−1,2,3−トリアゾール、3−アミノ−1,2,4−トリアゾール、3−メルカプト−1,2,4−トリアゾール、3−イソプロピル−1,2,4−トリアゾール、5−フェニルチオール−ベンゾトリアゾール、ハロ−ベンゾトリアゾール(ハロ=F、Cl、Br又はI)、ナフトトリアゾール、2−メルカプトベンゾイミダゾール(MBI)、2−メルカプトベンゾチアゾール、4−メチル−2−フェニルイミダゾール、2−メルカプトチアゾリン、5−アミノテトラゾール、5−アミノテトラゾール一水和物、5−アミノ−1,3,4−チアジアゾール−2−チオール、2,4−ジアミノ−6−メチル−1,3,5−トリアジン、チアゾール、トリアジン、メチルテトラゾール、1,3−ジメチル−2−イミダゾリジノン、1,5−ペンタメチレンテトラゾール、1−フェニル−5−メルカプトテトラゾール、ジアミノメチルトリアジン、イミダゾリンチオン、メルカプトベンゾイミダゾール、4−メチル−4H−1,2,4−トリアゾール−3−チオール、5−アミノ−1,3,4−チアジアゾール−2−チオール、1H−ピラゾール、又は1−(2−アミノエチル)ピペラジンから選択される、請求項13に記載の方法。
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KR102334924B1 (ko) | 2021-12-06 |
TWI731475B (zh) | 2021-06-21 |
EP3666852A3 (en) | 2020-08-19 |
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KR20200058314A (ko) | 2020-05-27 |
US20200157422A1 (en) | 2020-05-21 |
SG10201910848QA (en) | 2020-06-29 |
IL270708B2 (en) | 2024-03-01 |
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EP3666852B1 (en) | 2022-01-05 |
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