JP2020084282A - 原料タンクの監視装置及び原料タンクの監視方法 - Google Patents
原料タンクの監視装置及び原料タンクの監視方法 Download PDFInfo
- Publication number
- JP2020084282A JP2020084282A JP2018222448A JP2018222448A JP2020084282A JP 2020084282 A JP2020084282 A JP 2020084282A JP 2018222448 A JP2018222448 A JP 2018222448A JP 2018222448 A JP2018222448 A JP 2018222448A JP 2020084282 A JP2020084282 A JP 2020084282A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- temperature
- material tank
- unit
- determination unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1951—Control of temperature characterised by the use of electric means with control of the working time of a temperature controlling device
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B15/00—Systems controlled by a computer
- G05B15/02—Systems controlled by a computer electric
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1902—Control of temperature characterised by the use of electric means characterised by the use of a variable reference value
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1917—Control of temperature characterised by the use of electric means using digital means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
- G05D23/193—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
- G05D23/1931—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of one space
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
- G05D23/193—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
- G05D23/1932—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of a plurality of spaces
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B21/00—Alarms responsive to a single specified undesired or abnormal condition and not otherwise provided for
- G08B21/18—Status alarms
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B5/00—Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied
- G08B5/22—Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied using electric transmission; using electromagnetic transmission
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/90—Heating or cooling systems
- B01F2035/99—Heating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/81—Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F2110/00—Control inputs relating to air properties
- F24F2110/10—Temperature
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
- G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Remote Sensing (AREA)
- Electromagnetism (AREA)
- Business, Economics & Management (AREA)
- Emergency Management (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Testing And Monitoring For Control Systems (AREA)
Abstract
Description
原料タンクを備える成膜装置の一例について説明する。図1は、原料タンクを備える成膜装置の構成例を示す概略図である。
次に、装置制御部100のハードウェア構成について説明する。図2は、装置制御部100のハードウェア構成の一例を示す図である。
次に、装置制御部100の機能構成について説明する。図3は、装置制御部100の機能構成の一例を示す図である。
次に、原料タンク40の監視方法の一例として、装置制御部100のチャンネル判定部301、温度判定部302、時刻判定部303、設定部304及び出力部305により実行される温度逸脱監視処理について説明する。
次に、原料タンク40の監視方法の別の例として、装置制御部100のチャンネル判定部301、時刻判定部303、設定部304、出力部305、パワー判定部306及び格納部307により実行されるパワー監視処理について説明する。
次に、表示装置206に表示される警告画面の一例について説明する。
42 原料
44 タンク加熱手段
100 装置制御部
302 温度判定部
304 設定部
305 出力部
306 パワー判定部
Claims (11)
- 固体又は液体の原料を貯留する原料タンクを加熱手段により設定温度に昇温する際の前記原料タンクの温度を監視する監視装置であって、
前記温度が前記設定温度を含む安定範囲内に到達したかを判定すると共に、前記温度が前記安定範囲内から逸脱したかを判定する温度判定部と、
前記温度判定部が、前記温度が前記安定範囲内から逸脱したと判定した時点から予め定めたタイムアウト時間が経過した場合に前記加熱手段の前記設定温度を0℃に設定する設定部と、
を有する、
原料タンクの監視装置。 - 前記温度判定部が、前記温度が前記安定範囲内から逸脱したと判定した時点から予め設定されたタイムアウト時間が経過した場合に警告画面を表示させる信号を出力する出力部を有する、
請求項1に記載の原料タンクの監視装置。 - 固体又は液体の原料を貯留する原料タンクを加熱手段により設定温度に昇温する際の前記原料タンクの温度を監視する監視装置であって、
所定時間における前記原料タンクの温度変化量と、前記所定時間における前記加熱手段の出力との関係に基づいて、前記加熱手段の異常を判定するパワー判定部と、
前記パワー判定部により前記加熱手段が異常であると判定された場合に前記加熱手段の前記設定温度を0℃に設定する設定部と、
を有する、
原料タンクの監視装置。 - 前記パワー判定部は、前記所定時間における前記加熱手段の出力が0%であり、且つ前記所定時間における前記原料タンクの温度変化量が第1の閾値以上である場合、前記加熱手段が異常であると判定する、
請求項3に記載の原料タンクの監視装置。 - 前記パワー判定部は、前記所定時間における前記加熱手段の出力が所定値以上であり、且つ前記所定時間における前記原料タンクの温度変化量が第2の閾値未満である場合、前記加熱手段が異常であると判定する、
請求項3又は4に記載の原料タンクの監視装置。 - 前記パワー判定部により前記加熱手段が異常であると判定された場合に警告画面を表示させる信号を出力する出力部を有する、
請求項3乃至5のいずれか一項に記載の原料タンクの監視装置。 - 前記警告画面は、操作を受け付ける操作領域を有し、前記操作領域が操作されていない状態において前記加熱手段の動作に関する設定の変更が無効化される、
請求項2又は6に記載の原料タンクの監視装置。 - 前記操作領域が操作されることなく前記加熱手段の動作に関する設定を変更する操作が行われた場合、前記出力部は、前記設定の変更が無効化されている旨の警告画面を表示させる信号を出力する、
請求項7に記載の原料タンクの監視装置。 - 前記加熱手段は、独立して制御できる複数のヒータを含み、
前記設定部は、前記加熱手段の全ての前記ヒータに対して前記設定温度を0℃に設定する、
請求項1乃至8のいずれか一項に記載の原料タンクの監視装置。 - 固体又は液体の原料を貯留する原料タンクを加熱手段により設定温度に昇温する際の前記原料タンクの温度を監視する監視方法であって、
前記温度が前記設定温度を含む安定範囲内に到達したかを判定するステップと、
前記温度が前記安定範囲内から逸脱したかを判定するステップと、
前記温度が前記安定範囲内から逸脱したと判定した時点から予め定めたタイムアウト時間が経過した場合に前記加熱手段の前記設定温度を0℃に設定するステップと、
を有する、
原料タンクの監視方法。 - 固体又は液体の原料を貯留する原料タンクを加熱手段により設定温度に昇温する際の前記原料タンクの温度を監視する監視方法であって、
所定時間における前記原料タンクの温度変化量と、前記所定時間における前記加熱手段の出力との関係に基づいて、前記加熱手段の異常を判定するステップと、
前記加熱手段が異常であると判定された場合、前記加熱手段の前記設定温度を0℃に設定するステップと、
を有する、
原料タンクの監視方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018222448A JP7154116B2 (ja) | 2018-11-28 | 2018-11-28 | 原料タンクの監視装置及び原料タンクの監視方法 |
US16/695,411 US11073851B2 (en) | 2018-11-28 | 2019-11-26 | Monitoring apparatus of raw material tank and monitoring method of raw material tank |
KR1020190156131A KR102629867B1 (ko) | 2018-11-28 | 2019-11-28 | 원료 탱크의 감시 장치 및 원료 탱크의 감시 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018222448A JP7154116B2 (ja) | 2018-11-28 | 2018-11-28 | 原料タンクの監視装置及び原料タンクの監視方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020084282A true JP2020084282A (ja) | 2020-06-04 |
JP7154116B2 JP7154116B2 (ja) | 2022-10-17 |
Family
ID=70769904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018222448A Active JP7154116B2 (ja) | 2018-11-28 | 2018-11-28 | 原料タンクの監視装置及び原料タンクの監視方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US11073851B2 (ja) |
JP (1) | JP7154116B2 (ja) |
KR (1) | KR102629867B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230019785A (ko) | 2021-08-02 | 2023-02-09 | 도쿄엘렉트론가부시키가이샤 | 열처리 시스템, 재료 공급 방법 및 열처리 장치 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113585269B (zh) * | 2021-09-27 | 2021-12-17 | 国能大渡河大数据服务有限公司 | 一种用于水电工程的施工安全监测方法及系统 |
CN117193443B (zh) * | 2023-11-06 | 2024-01-26 | 山东汇能新材料科技股份有限公司 | 一种基于人工智能的纯苯储存环境控制系统 |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6321836A (ja) * | 1986-07-15 | 1988-01-29 | Rohm Co Ltd | 半導体製造装置 |
JPH06266410A (ja) * | 1993-03-11 | 1994-09-22 | Toshiba Corp | ビジュアルフィードバック制御装置 |
JPH08339881A (ja) * | 1995-06-09 | 1996-12-24 | Toto Ltd | 熱交換器とその故障検出方法 |
JPH10125447A (ja) * | 1996-10-18 | 1998-05-15 | Kokusai Electric Co Ltd | 電気炉の温度制御装置 |
JP2001077033A (ja) * | 1999-09-03 | 2001-03-23 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
JP2002299333A (ja) * | 2001-03-30 | 2002-10-11 | Tokyo Electron Ltd | ガス温調器,その制御方法および熱処理装置 |
JP2004349439A (ja) * | 2003-05-22 | 2004-12-09 | Renesas Technology Corp | 基板処理装置 |
JP2005258630A (ja) * | 2004-03-10 | 2005-09-22 | Seiko Epson Corp | データ転送装置、データ転送方法、及びプログラム |
JP2007088394A (ja) * | 2005-09-26 | 2007-04-05 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2007258630A (ja) * | 2006-03-27 | 2007-10-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2009149939A (ja) * | 2007-12-20 | 2009-07-09 | Yamatake Corp | 液体材料ガスの供給方法及び液体材料ガス供給システム |
JP2014007289A (ja) * | 2012-06-25 | 2014-01-16 | Tokyo Electron Ltd | ガス供給装置及び成膜装置 |
JP2014178071A (ja) * | 2013-03-15 | 2014-09-25 | Tokyo Electron Ltd | 熱処理装置の異常検知装置、熱処理装置及び熱処理装置の異常検知方法、並びに、異常検知方法のプログラム |
JP2018078271A (ja) * | 2016-10-31 | 2018-05-17 | 株式会社日立国際電気 | 基板処理装置、監視プログラム及び半導体装置の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000130975A (ja) * | 1998-10-23 | 2000-05-12 | Sekisui Chem Co Ltd | 熱輸送装置 |
JP4522138B2 (ja) * | 2004-05-07 | 2010-08-11 | キヤノン株式会社 | 加熱定着装置 |
JP2009235496A (ja) | 2008-03-27 | 2009-10-15 | Tokyo Electron Ltd | 原料ガスの供給システム及び成膜装置 |
US20140262949A1 (en) * | 2013-03-18 | 2014-09-18 | Allan G. Kem | Method for automated temperature control of reactor system |
-
2018
- 2018-11-28 JP JP2018222448A patent/JP7154116B2/ja active Active
-
2019
- 2019-11-26 US US16/695,411 patent/US11073851B2/en active Active
- 2019-11-28 KR KR1020190156131A patent/KR102629867B1/ko active IP Right Grant
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6321836A (ja) * | 1986-07-15 | 1988-01-29 | Rohm Co Ltd | 半導体製造装置 |
JPH06266410A (ja) * | 1993-03-11 | 1994-09-22 | Toshiba Corp | ビジュアルフィードバック制御装置 |
JPH08339881A (ja) * | 1995-06-09 | 1996-12-24 | Toto Ltd | 熱交換器とその故障検出方法 |
JPH10125447A (ja) * | 1996-10-18 | 1998-05-15 | Kokusai Electric Co Ltd | 電気炉の温度制御装置 |
JP2001077033A (ja) * | 1999-09-03 | 2001-03-23 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
JP2002299333A (ja) * | 2001-03-30 | 2002-10-11 | Tokyo Electron Ltd | ガス温調器,その制御方法および熱処理装置 |
JP2004349439A (ja) * | 2003-05-22 | 2004-12-09 | Renesas Technology Corp | 基板処理装置 |
JP2005258630A (ja) * | 2004-03-10 | 2005-09-22 | Seiko Epson Corp | データ転送装置、データ転送方法、及びプログラム |
JP2007088394A (ja) * | 2005-09-26 | 2007-04-05 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2007258630A (ja) * | 2006-03-27 | 2007-10-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2009149939A (ja) * | 2007-12-20 | 2009-07-09 | Yamatake Corp | 液体材料ガスの供給方法及び液体材料ガス供給システム |
JP2014007289A (ja) * | 2012-06-25 | 2014-01-16 | Tokyo Electron Ltd | ガス供給装置及び成膜装置 |
JP2014178071A (ja) * | 2013-03-15 | 2014-09-25 | Tokyo Electron Ltd | 熱処理装置の異常検知装置、熱処理装置及び熱処理装置の異常検知方法、並びに、異常検知方法のプログラム |
JP2018078271A (ja) * | 2016-10-31 | 2018-05-17 | 株式会社日立国際電気 | 基板処理装置、監視プログラム及び半導体装置の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230019785A (ko) | 2021-08-02 | 2023-02-09 | 도쿄엘렉트론가부시키가이샤 | 열처리 시스템, 재료 공급 방법 및 열처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR102629867B1 (ko) | 2024-01-25 |
US20200165720A1 (en) | 2020-05-28 |
US11073851B2 (en) | 2021-07-27 |
KR20200064026A (ko) | 2020-06-05 |
JP7154116B2 (ja) | 2022-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102629867B1 (ko) | 원료 탱크의 감시 장치 및 원료 탱크의 감시 방법 | |
US7751921B2 (en) | Semiconductor manufacturing apparatus, method of detecting abnormality, identifying cause of abnormality, or predicting abnormality in the semiconductor manufacturing apparatus, and storage medium storing computer program for performing the method | |
KR101604993B1 (ko) | 정전 용량 감지 특징을 갖는 정전 척 조립체 및 관련 작동 방법 | |
JP4791520B2 (ja) | クライオポンプ装置、真空処理装置及びクライオポンプ装置の動作方法 | |
US20070010906A1 (en) | Apparatus and system for monitoring a substrate processing, program for monitoring the processing and storage medium storing same | |
US9400794B2 (en) | Group management apparatus, substrate processing system and method of managing files of substrate processing apparatus | |
US20190204144A1 (en) | Substrate processing apparatus, vibration detection system and non-transitory computer-readable recording medium | |
JP2007058635A (ja) | 半導体製造装置,半導体製造装置の流量補正方法,プログラム | |
JP4882239B2 (ja) | 半導体製造装置、コンピュータプログラム及び記憶媒体 | |
JP7345353B2 (ja) | 故障検知システム及び故障検知方法 | |
US20150371914A1 (en) | Substrate processing apparatus and method of manufacturing semiconductor device | |
US20080288217A1 (en) | Data Logging Method | |
JP5401070B2 (ja) | 処理装置の管理システム | |
JP7229116B2 (ja) | 基板処理システム及びプロセスデータ監視方法 | |
JP4078982B2 (ja) | 処理システム及び流量測定方法 | |
JP2008091518A (ja) | 異常検出方法 | |
US11929269B2 (en) | Control method, measurement method, control device, and heat treatment apparatus | |
JP6727377B2 (ja) | 処理装置、処理方法および記憶媒体 | |
JP4293318B2 (ja) | 圧力制御異常検出方法、異常表示方法および半導体製造装置 | |
US20240061413A1 (en) | Information processing system, abnormality detection method, and heat treatment apparatus | |
JP2009130308A (ja) | 表面処理装置 | |
JP2906624B2 (ja) | 薄膜形成装置 | |
US20240020899A1 (en) | Display method and information processing apparatus | |
US20230366091A1 (en) | Processing apparatus, abnormality detecting method, method of manufacturing semiconductor device and substrate processing apparatus | |
KR102076293B1 (ko) | 온도보정기능을 가지는 센서 장착 웨이퍼 보관 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210415 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20211215 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220201 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220322 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220607 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220725 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220906 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221004 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7154116 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |