JP2020040017A - アクリル気化器 - Google Patents
アクリル気化器 Download PDFInfo
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- JP2020040017A JP2020040017A JP2018169332A JP2018169332A JP2020040017A JP 2020040017 A JP2020040017 A JP 2020040017A JP 2018169332 A JP2018169332 A JP 2018169332A JP 2018169332 A JP2018169332 A JP 2018169332A JP 2020040017 A JP2020040017 A JP 2020040017A
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- 239000006200 vaporizer Substances 0.000 title claims abstract description 29
- -1 Acryl Chemical group 0.000 title abstract 3
- 239000007788 liquid Substances 0.000 claims abstract description 176
- 239000002994 raw material Substances 0.000 claims abstract description 114
- 230000008016 vaporization Effects 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims description 57
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 25
- 239000004925 Acrylic resin Substances 0.000 claims description 24
- 229920000178 Acrylic resin Polymers 0.000 claims description 24
- 239000012159 carrier gas Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000009834 vaporization Methods 0.000 abstract description 4
- 230000007423 decrease Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/1686—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed involving vaporisation of the material to be sprayed or of an atomising-fluid-generating product
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0011—Heating features
- B01D1/0017—Use of electrical or wave energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0082—Regulation; Control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
- B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
また、液体マスフローコントローラと原料タンクとの間に真空脱気装置を設け、原料液中に溶解したガスを除去することが考えられる。
また、本発明は、前記密閉容器に設けられた原料液導入配管と、前記密閉容器の前記内部空間側の壁面に設けられたノズル装置と、を有し、前記原料液導入路は、前記原料液導入配管に設けられた第一の液導入孔と、前記密閉容器の天井に設けられた第二の液導入孔と、前記ノズル装置に設けられた第三の液導入孔とが連通して形成され、前記抵抗体は、前記第一〜第三の液導入孔のいずれか一個または複数個の内部に配置されたアクリル気化器である。
また、本発明は棒状の前記抵抗体の外径が、前記原料液導入路の内径より小さいアクリル気化器である。
また、本発明は前記抵抗体は前記原料液導入路の内部に設けられた支持部上に配置されたアクリル気化器である。
まず、アクリル樹脂膜製造装置10の動作の概要を説明すると、原料タンク52は、液体マスフローコントローラ53を介して、アクリル気化器2に接続されており、原料タンク52に蓄液された原料液が、液体マスフローコントローラ53によって流量制御された状態でアクリル気化器2に供給されると、アクリル気化器2の内部で液体の原料液が気化され、アクリル樹脂の原料である気体の原料ガスが生成される。
原料タンク52には、押圧ガス源51が接続されており押圧ガス源51から押圧ガスが原料タンク52に供給されると、原料タンク52に蓄液された原料液が押圧され、原料液は配管を流れて液体マスフローコントローラ53に到達する。
ここでは、抵抗体7は、第一の液導入孔13と第二の液導入孔14と第三の液導入孔15とにそれぞれ配置された棒状の第一〜第三の柱体で構成することができる。
5……加熱装置
6……原料液導入路
7……抵抗体
8……気化板
9……キャリアガス導入路
12……ノズル装置
13……第一の液導入孔
14……第二の液導入孔
15……第三の液導入孔
21……貯留部
22……支持部
24……第二のガス導入孔
25……噴出口
26……第一のガス導入孔
37……原料ガス供給配管
53……液体マスフローコントローラ
Claims (4)
- 液体マスフローコントローラで流量制御されたアクリル樹脂膜の原料液が流れる原料液導入路と、
前記原料液導入路に流れた前記原料液が到達する噴出口と、
前記噴出口にキャリアガスを供給するキャリアガス導入路と、
前記噴出口から前記原料液の小滴と前記キャリアガスとが噴出される内部空間を有する密閉容器と、
前記内部空間に配置され、前記原料液の小滴が接触する気化板と、
前記気化板を加熱する加熱装置と、
前記加熱装置によって前記加熱された前記気化板に前記小滴が接触して生成された前記原料液の気体である原料ガスが流れる原料ガス供給配管と、
を有し、
前記原料液導入路には棒状の抵抗体が配置され、前記原料液に対する前記原料液導入路のコンダクタンスが低下されたアクリル気化器。 - 前記密閉容器に設けられた原料液導入配管と、
前記密閉容器の前記内部空間側の壁面に設けられたノズル装置と、
を有し、
前記原料液導入路は、前記原料液導入配管に設けられた第一の液導入孔と、前記密閉容器の天井に設けられた第二の液導入孔と、前記ノズル装置に設けられた第三の液導入孔とが連通して形成され、
前記抵抗体は、前記第一〜第三の液導入孔のいずれか一個または複数個の内部に配置された請求項1記載のアクリル気化器。 - 棒状の前記抵抗体の外径が、前記原料液導入路の内径より小さい請求項2記載のアクリル気化器。
- 前記抵抗体は前記原料液導入路の内部に設けられた支持部上に配置された請求項3記載のアクリル気化器。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018169332A JP7201372B2 (ja) | 2018-09-11 | 2018-09-11 | アクリル気化器 |
CN201910852555.1A CN110882867B (zh) | 2018-09-11 | 2019-09-10 | 丙烯汽化器 |
US16/567,456 US20200080189A1 (en) | 2018-09-11 | 2019-09-11 | Acrylic vaporizer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018169332A JP7201372B2 (ja) | 2018-09-11 | 2018-09-11 | アクリル気化器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020040017A true JP2020040017A (ja) | 2020-03-19 |
JP7201372B2 JP7201372B2 (ja) | 2023-01-10 |
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JP2018169332A Active JP7201372B2 (ja) | 2018-09-11 | 2018-09-11 | アクリル気化器 |
Country Status (3)
Country | Link |
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US (1) | US20200080189A1 (ja) |
JP (1) | JP7201372B2 (ja) |
CN (1) | CN110882867B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2022134272A1 (zh) * | 2020-12-24 | 2022-06-30 | 广东黑金钢渗层纳米技术发展有限公司 | 一种提升铁制品材料性能的设备与技术 |
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2018
- 2018-09-11 JP JP2018169332A patent/JP7201372B2/ja active Active
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2019
- 2019-09-10 CN CN201910852555.1A patent/CN110882867B/zh active Active
- 2019-09-11 US US16/567,456 patent/US20200080189A1/en not_active Abandoned
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JP7201372B2 (ja) | 2023-01-10 |
CN110882867B (zh) | 2022-11-08 |
CN110882867A (zh) | 2020-03-17 |
US20200080189A1 (en) | 2020-03-12 |
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