SG11201401495TA - Direct liquid deposition - Google Patents

Direct liquid deposition

Info

Publication number
SG11201401495TA
SG11201401495TA SG11201401495TA SG11201401495TA SG11201401495TA SG 11201401495T A SG11201401495T A SG 11201401495TA SG 11201401495T A SG11201401495T A SG 11201401495TA SG 11201401495T A SG11201401495T A SG 11201401495TA SG 11201401495T A SG11201401495T A SG 11201401495TA
Authority
SG
Singapore
Prior art keywords
direct liquid
liquid deposition
deposition
direct
liquid
Prior art date
Application number
SG11201401495TA
Inventor
Stephan Voser
Fabio Antonio Ravelli
Bruno Gaechter
Original Assignee
Oerlikon Advanced Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Advanced Technologies Ag filed Critical Oerlikon Advanced Technologies Ag
Publication of SG11201401495TA publication Critical patent/SG11201401495TA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/06—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in annular, tubular or hollow conical form
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/1686—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed involving vaporisation of the material to be sprayed or of an atomising-fluid-generating product
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
SG11201401495TA 2011-10-21 2012-10-19 Direct liquid deposition SG11201401495TA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161550013P 2011-10-21 2011-10-21
US201261642074P 2012-05-03 2012-05-03
PCT/EP2012/070711 WO2013057228A1 (en) 2011-10-21 2012-10-19 Direct liquid deposition

Publications (1)

Publication Number Publication Date
SG11201401495TA true SG11201401495TA (en) 2014-05-29

Family

ID=47022724

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201603129PA SG10201603129PA (en) 2011-10-21 2012-10-19 Direct liquid deposition
SG11201401495TA SG11201401495TA (en) 2011-10-21 2012-10-19 Direct liquid deposition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10201603129PA SG10201603129PA (en) 2011-10-21 2012-10-19 Direct liquid deposition

Country Status (8)

Country Link
US (2) US9593407B2 (en)
EP (1) EP2769000B1 (en)
JP (2) JP2015501378A (en)
KR (1) KR102144321B1 (en)
CN (1) CN104040017B (en)
SG (2) SG10201603129PA (en)
TW (1) TWI570253B (en)
WO (1) WO2013057228A1 (en)

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KR20160087390A (en) 2013-11-14 2016-07-21 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트 Apparatus and process for annealing of anti-fingerprint coatings
US9523151B2 (en) * 2014-02-21 2016-12-20 Tokyo Electron Limited Vaporizer unit with open cell core and method of operating
CN104711514B (en) * 2015-04-07 2017-05-31 合肥京东方光电科技有限公司 A kind of film formation device and method
KR101692347B1 (en) * 2015-04-17 2017-01-03 주식회사 에스엠뿌레 Sprayer and spray control apparatus
CN111317385B (en) * 2017-03-30 2021-05-07 珠海优特智厨科技有限公司 Seasoning batching system
US11713328B2 (en) 2018-08-23 2023-08-01 Versum Materials Us, Llc Stable alkenyl or alkynyl-containing organosilicon precursor compositions
JP7201372B2 (en) * 2018-09-11 2023-01-10 株式会社アルバック acrylic vaporizer
CN111137041B (en) * 2019-12-17 2021-10-08 纳晶科技股份有限公司 Film layer pretreatment method, device and ink-jet printing film forming method
CN114657540A (en) * 2020-12-24 2022-06-24 中国科学院微电子研究所 Method and apparatus for forming film on substrate surface and formed film

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US4392453A (en) * 1981-08-26 1983-07-12 Varian Associates, Inc. Molecular beam converters for vacuum coating systems
CH654596A5 (en) * 1983-09-05 1986-02-28 Balzers Hochvakuum EVAPORATOR CELL.
US5711816A (en) * 1990-07-06 1998-01-27 Advanced Technolgy Materials, Inc. Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
US5174825A (en) * 1990-08-23 1992-12-29 Texas Instruments Incorporated Uniform gas distributor to a wafer
US6110531A (en) * 1991-02-25 2000-08-29 Symetrix Corporation Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition
US5997642A (en) * 1996-05-21 1999-12-07 Symetrix Corporation Method and apparatus for misted deposition of integrated circuit quality thin films
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
US6011904A (en) * 1997-06-10 2000-01-04 Board Of Regents, University Of Texas Molecular beam epitaxy effusion cell
KR100570109B1 (en) * 1997-07-25 2006-04-12 시게이트 테크놀로지 엘엘씨 Method and apparatus for zone lubrication of magnetic media
US6663025B1 (en) * 2001-03-29 2003-12-16 Lam Research Corporation Diffuser and rapid cycle chamber
DE10211573A1 (en) * 2002-03-15 2003-10-16 Unaxis Balzers Ag Vacuum evaporation device
TW200304955A (en) 2002-04-05 2003-10-16 Matsushita Electric Ind Co Ltd Method and apparatus for producing resin thin film
JP4292777B2 (en) * 2002-06-17 2009-07-08 ソニー株式会社 Thin film forming equipment
JP4185015B2 (en) * 2003-05-12 2008-11-19 東京エレクトロン株式会社 Vaporized raw material supply structure, raw material vaporizer and reaction processing apparatus
WO2006098792A2 (en) * 2004-12-30 2006-09-21 Msp Corporation High accuracy vapor generation and delivery for thin film deposition
JP4601535B2 (en) * 2005-09-09 2010-12-22 株式会社リンテック A vaporizer capable of vaporizing liquid raw materials at low temperatures
US7914667B2 (en) * 2007-06-04 2011-03-29 Exxonmobil Chemical Patents Inc. Pyrolysis reactor conversion of hydrocarbon feedstocks into higher value hydrocarbons
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Also Published As

Publication number Publication date
SG10201603129PA (en) 2016-05-30
EP2769000B1 (en) 2022-11-23
WO2013057228A1 (en) 2013-04-25
JP2015501378A (en) 2015-01-15
CN104040017B (en) 2018-01-30
KR20140081876A (en) 2014-07-01
EP2769000A1 (en) 2014-08-27
KR102144321B1 (en) 2020-08-31
US20150376770A1 (en) 2015-12-31
US20130099020A1 (en) 2013-04-25
US10066287B2 (en) 2018-09-04
TWI570253B (en) 2017-02-11
JP6412186B2 (en) 2018-10-24
CN104040017A (en) 2014-09-10
US9593407B2 (en) 2017-03-14
TW201333233A (en) 2013-08-16
JP2017145507A (en) 2017-08-24

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