JP2019508220A - V及びSbを含む複合酸化物を含む選択的触媒還元(SCR)触媒、その製造方法、及び窒素酸化物除去のためのその使用方法 - Google Patents
V及びSbを含む複合酸化物を含む選択的触媒還元(SCR)触媒、その製造方法、及び窒素酸化物除去のためのその使用方法 Download PDFInfo
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- JP2019508220A JP2019508220A JP2018532146A JP2018532146A JP2019508220A JP 2019508220 A JP2019508220 A JP 2019508220A JP 2018532146 A JP2018532146 A JP 2018532146A JP 2018532146 A JP2018532146 A JP 2018532146A JP 2019508220 A JP2019508220 A JP 2019508220A
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- vanadium
- antimony
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- 239000003054 catalyst Substances 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 54
- 229910052720 vanadium Inorganic materials 0.000 title claims abstract description 50
- 229910052787 antimony Inorganic materials 0.000 title claims abstract description 48
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 238000010531 catalytic reduction reaction Methods 0.000 title claims abstract description 13
- 230000008569 process Effects 0.000 title description 20
- 238000002360 preparation method Methods 0.000 title description 5
- 239000000203 mixture Substances 0.000 claims abstract description 68
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims abstract description 64
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 46
- 238000002441 X-ray diffraction Methods 0.000 claims abstract description 31
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- 230000005855 radiation Effects 0.000 claims abstract description 8
- 239000002131 composite material Substances 0.000 claims abstract description 6
- 238000004458 analytical method Methods 0.000 claims abstract description 5
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 37
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 31
- 229910000410 antimony oxide Inorganic materials 0.000 claims description 29
- 239000000725 suspension Substances 0.000 claims description 29
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 27
- 239000007789 gas Substances 0.000 claims description 22
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 238000002485 combustion reaction Methods 0.000 claims description 8
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- 230000001376 precipitating effect Effects 0.000 claims description 3
- 238000006722 reduction reaction Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 238000001354 calcination Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000012360 testing method Methods 0.000 description 6
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- 229940125904 compound 1 Drugs 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
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- 238000001816 cooling Methods 0.000 description 4
- 229910052878 cordierite Inorganic materials 0.000 description 4
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- OGUCKKLSDGRKSH-UHFFFAOYSA-N oxalic acid oxovanadium Chemical compound [V].[O].C(C(=O)O)(=O)O OGUCKKLSDGRKSH-UHFFFAOYSA-N 0.000 description 2
- -1 spheres Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 101001041608 Streptomyces coelicolor (strain ATCC BAA-471 / A3(2) / M145) Peptide deformylase 4 Proteins 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910021550 Vanadium Chloride Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- ZQCWRQYQPFRZEI-UHFFFAOYSA-K [Cl-].[Cl-].[Cl-].[V+5].[O-2].[V+5] Chemical compound [Cl-].[Cl-].[Cl-].[V+5].[O-2].[V+5] ZQCWRQYQPFRZEI-UHFFFAOYSA-K 0.000 description 1
- NNTGNYIMRIVRSJ-UHFFFAOYSA-N [V].C(O)CN Chemical compound [V].C(O)CN NNTGNYIMRIVRSJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910000379 antimony sulfate Inorganic materials 0.000 description 1
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 1
- JRLDUDBQNVFTCA-UHFFFAOYSA-N antimony(3+);trinitrate Chemical compound [Sb+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O JRLDUDBQNVFTCA-UHFFFAOYSA-N 0.000 description 1
- MVMLTMBYNXHXFI-UHFFFAOYSA-H antimony(3+);trisulfate Chemical compound [Sb+3].[Sb+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O MVMLTMBYNXHXFI-UHFFFAOYSA-H 0.000 description 1
- WSXIMVDZMNWNRF-UHFFFAOYSA-N antimony;ethane-1,2-diol Chemical compound [Sb].OCCO WSXIMVDZMNWNRF-UHFFFAOYSA-N 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- JVLRYPRBKSMEBF-UHFFFAOYSA-K diacetyloxystibanyl acetate Chemical compound [Sb+3].CC([O-])=O.CC([O-])=O.CC([O-])=O JVLRYPRBKSMEBF-UHFFFAOYSA-K 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000003837 high-temperature calcination Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000009862 microstructural analysis Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- RPESBQCJGHJMTK-UHFFFAOYSA-I pentachlorovanadium Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[V+5] RPESBQCJGHJMTK-UHFFFAOYSA-I 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000001350 scanning transmission electron microscopy Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- YPMOSINXXHVZIL-UHFFFAOYSA-N sulfanylideneantimony Chemical compound [Sb]=S YPMOSINXXHVZIL-UHFFFAOYSA-N 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
- 229940041260 vanadyl sulfate Drugs 0.000 description 1
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Abstract
Description
本発明の目的は、NOx除去を改善した新規のSCR触媒を、特に移動型の又は固定された型の排ガス放出に適用する場合に提供することにある。本目的は、触媒組成物、その製造方法、窒素酸化物の選択的触媒還元のための触媒組成物の使用によって達成され得る。特に、本発明は下記局面に関する。
・TiO2を含む支持体
・CuのKα線照射を用いたX線回折(XRD)分析により決定される、VSbO4及びV0.92Sb0.92O4とは異なるルチル型構造を有する、バナジウム及びアンチモンを含む複合酸化物、及び
・任意に、ケイ素の酸化物、バナジウムの酸化物及びアンチモンの酸化物からなる群より選択される1つ以上
を含む触媒組成物の使用方法。
(i)バナジウム/アンチモン酸化物及び任意にケイ素源を、TiO2を含む支持体と共に溶媒中で混合し、懸濁液を得る段階;
(ii)任意に、懸濁液を基材上に適用する段階;
(iii)80乃至250℃の範囲の温度において乾燥させる段階;
(iv)少なくとも500℃の温度において焼成する段階;
を含む、上記1乃至6の局面の何れかに記載の触媒組成物を製造する方法。
(a)バナジウム酸化物(類)及びアンチモン酸化物(類)を含む懸濁液を準備する段階;
そして
(b)前記懸濁液を80℃乃至250℃の範囲の温度において乾燥させバナジウム/アンチモン酸化物を得る段階;
により製造される、上記8又は9の局面に記載の方法。
(a’)バナジウム源及びアンチモン源を含む懸濁液又は溶液を準備する段階;
(b’)前記懸濁液又は溶液からバナジウム/アンチモン酸化物を沈殿させそして分離する段階;
(c’)任意に、80℃乃至250℃の温度において乾燥させる段階;
により製造される、上記8又は9の局面に記載の方法。
<触媒組成物>
本発明は、
・TiO2を含む支持体
・CuKα線照射を用いたX線回折(XRD)分析により決定される、VSbO4及びV0.92Sb0.92O4とは異なるルチル型構造を有する、バナジウム及びアンチモンを含む複合酸化物、及び
・任意に、ケイ素の酸化物、バナジウムの酸化物及びアンチモンの酸化物からなる群より選択される1つ以上
を含む触媒組成物を提供する。
・TiO2を含む支持体
・CuKα線照射を用いたX線回折(XRD)分析により決定される、VSbO4及びV0.92Sb0.92O4とは異なるルチル型構造を有する、バナジウム及びアンチモンを含む複合酸化物、そして
・任意に、ケイ素の酸化物、バナジウムの酸化物及びアンチモンの酸化物からなる群より選択される1つ以上
を含む。
本発明の更なる目的において、本発明による触媒組成物の製造方法は、下記段階:
(i)バナジウム/アンチモン酸化物及び任意にケイ素源を、TiO2を含む支持体と共に溶媒中で混合し、懸濁液を得る段階;
(ii)任意に、懸濁液を基材上に適用する段階;
(iii)80乃至250℃の範囲の温度において乾燥させる段階;
(iv)少なくとも500℃の温度において焼成する段階;
を含む方法が提供される。
(a)バナジウム酸化物(類)及びアンチモン酸化物(類)を含む懸濁液を準備する段階;
及び
(b)前記懸濁液を80℃乃至250℃の範囲の温度において乾燥させて、バナジウム/アンチモン酸化物を得る段階;
により製造される。
(a’)バナジウム源及びアンチモン源を含む懸濁液又は溶液を準備する段階;
(b’)前記懸濁液又は溶液からバナジウム/アンチモン酸化物を沈殿させ、そして分離する段階;及び
(c’)任意に、80℃乃至250℃の温度において乾燥させる段階;
により製造される。
更なる局面において、本発明は、NOx、特に排ガス中のNOxの選択的触媒還元のための、本発明による触媒組成物又は本発明による方法により得られる/得られ得る触媒組成物の使用方法に関する。
V2O5 40.0g及びSb2O3 64.1gをDI水300g中で混合し、そして攪拌し懸濁液を生成させた。この懸濁液を200℃においてスプレードライし、V:Sbが1:1のモル比の酸化物の混合物を形成させた。
化合物1の10.4gをDI水100.0gに添加し、そしてその後30分間攪拌し、次いでTiO2粉末84.6g及び水性コロイド状SiO2溶液16.7g(30%のSiO2固形分)を加えた。このようにして得られた懸濁液を400/6のハニカム型コーディライト基材(数字400は、平方インチ当たりのセル数(cpsi)を表し、6は、チャネル間の壁厚ミルで表す。)に適用し、120℃の温度において終夜乾燥させ、次いで空気中で500℃にて3時間焼成を行った。室温に冷却した後、触媒1を得た。基材上のウォシュコートの総負荷量は、3.0g/in3であった。
焼成を650℃において3時間行った以外は実施例1を繰り返して、触媒2を得た。
焼成を700℃において3時間行った以外は実施例1を繰り返して、触媒3を得た。
化合物1の13.0gをDI水100.0gに添加し、そして30分間攪拌し、次いでTiO2粉末82.0g及び水性コロイド状SiO2溶液16.7g(30%のSiO2固形分)を加えた。このようにして得られた懸濁液を400/6のハニカム型コーディライト基材に適用し、120℃の温度において終夜乾燥させ、次いで空気中で500℃にて3時間焼成を行った。室温に冷却した後、触媒4を得た。基材上のウォシュコートの総負荷量は、3.0g/in3であった。
焼成を650℃において3時間行った以外は実施例4を繰り返して、触媒5を得た。
焼成を700℃において3時間行った以外は実施例4を繰り返して、触媒6を得た。
触媒1乃至6について、SCR活性の観点からNOx除去を試験した。全ての触媒を試験用の固定床の模擬実験装置に置いた。直径1インチ及び長さ3インチの円筒形中の触媒7gを、それぞれの試験に用いた。供給ガスは、NH3が500ppm、NOが500ppm、H2Oが5%、O2が10%そして残りがN2からなる。空間速度は、60,000h−1であった。活性試験結果を表2に纏める。
比較のため、追加の触媒組成物を製造した。
550℃で20時間前処理を行った化合物1の10.4gをDI水100.0gに添加し、そしてその後30分間攪拌し、次いでTiO2粉末84.6g及び水性コロイド状SiO2溶液16.7g(30%のSiO2固形分)を加えた。このようにして得られた懸濁液を400/6のハニカム型コーディライト基材に適用し、120℃の温度において終夜乾燥させ、次いで空気中で650℃にて3時間焼成を行った。室温に冷却した後、比較触媒1を得た。基材上のウォシュコートの総負荷量は、3.0g/in3であった。
焼成を700℃において3時間行った以外は比較例1を繰り返し、比較触媒2を得た。
典型的な合成方法において、シュウ酸バナジル溶液(11%V2O5固形分)22.73gをDI水100.1gに添加し、そしてその後水性コロイド状SiO2溶液(30%SiO2固形分)と混合した。この混合物を30分間攪拌し、次いでWO3/TiO2粉末92.5gを添加した。得られたペーストをDI水で希釈した。その後、このようにして得られたスラリーを400/6のハニカム型コーディライト基板に塗布し、120℃の温度において終夜乾燥させ、次いで空気中で450℃において3時間焼成を行った。室温に冷却した後、比較触媒3を得た。
比較触媒を上記の手順を経て試験し、その活性試験結果を表3に纏めた。
Claims (15)
- 窒素酸化物の選択的触媒還元のための、
・TiO2を含む支持体
・CuKα線照射を用いたX線回折(XRD)分析により決定される、VSbO4及びV0.92Sb0.92O4とは異なるルチル型構造を有する、バナジウム及びアンチモンを含む複合酸化物、及び
・任意に、ケイ素の酸化物、バナジウムの酸化物及びアンチモンの酸化物からなる群より選択される1つ以上
を含む触媒組成物の使用方法。 - バナジウム及びアンチモンを含む前記複合酸化物が、(110)又は(101)面のXRD回折ピークがVSbO4及びV0.92Sb0.92O4のものより少なくとも0.1°高い2θであることを特徴とする、請求項1に記載の使用方法。
- バナジウム及びアンチモンを含む前記複合酸化物が、(101)面のXRD回折ピークがVSbO4及びV0.92Sb0.92O4のものより少なくとも0.2°、好ましくは少なくとも0.3°、そしてより好ましくは少なくとも0.5°高い2θであることを特徴とする、請求項2に記載の使用方法。
- バナジウム及びアンチモンを含む前記複合酸化物が、(110)面のXRD回折ピークが2θにおいて27.25°乃至29.00°の範囲であり、そして(101)面のXRD回折ピークが2θにおいて35.43°乃至37.00°の範囲であることを特徴とする、請求項2に記載の使用方法。
- バナジウム及びアンチモンの複合酸化物及び任意のバナジウムの酸化物(類)の両方を含む前記バナジウムが、元素Vとして計算される0.5乃至6質量%、好ましくは1乃至4.5質量%、そしてより好ましくは2乃至4質量%の範囲で触媒組成物中に存在し;そして、バナジウム及びアンチモンの複合酸化物及び任意のアンチモンの酸化物(類)の両方を含む前記アンチモンが、元素Sbとして計算される0.8乃至16質量%、好ましくは3.5乃至14質量%、そしてより好ましくは5乃至10質量%の範囲で触媒組成物中に存在する、請求項1乃至4の何れか1項に記載の使用方法。
- 前記触媒組成物が、成形物の形態、好ましくは押出し成形物の形態であるか、又は基材上に担持される、請求項1乃至5の何れか1項に記載の使用方法。
- 前記窒素酸化物が、ディーゼルエンジン、発電所又は焼却炉のような内燃機関からの排ガス中に存在する、請求項1に記載の使用方法。
- 下記段階:
(i)バナジウム/アンチモン酸化物及び任意にケイ素源を、TiO2を含む支持体と共に溶媒中で混合し、懸濁液を得る段階;
(ii)任意に、懸濁液を基材上に適用する段階;
(iii)80乃至250℃の範囲の温度において乾燥させる段階;
(iv)少なくとも500℃の温度において焼成する段階;
を含む、請求項1乃至6の何れか1項に記載の触媒組成物を製造する方法。 - 前記段階(iv)の焼成が、500℃乃至700℃、より好ましくは550℃乃至700℃、更に好ましくは600℃乃至700℃、そして最も好ましくは650℃乃至700℃よりも高い範囲の温度において行われる、請求項8に記載の方法。
- 前記段階(i)で用いられるバナジウム/アンチモン酸化物が、
(a)バナジウム酸化物(類)及びアンチモン酸化物(類)を含む懸濁液を準備する段階;
及び
(b)前記懸濁液を80℃乃至250℃の範囲の温度において乾燥させて、バナジウム/アンチモン酸化物を得る段階;
により製造される、請求項8又は9に記載の方法。 - 前記段階(i)で用いられるバナジウム/アンチモン酸化物が、
(a’)バナジウム源及びアンチモン源を含む懸濁液又は溶液を準備する段階;
(b’)前記懸濁液又は溶液からバナジウム/アンチモン酸化物を沈殿させ、そして分離する段階;
(c’)任意に、80℃乃至250℃の温度において乾燥させる段階;
により製造される、請求項8又は9に記載の方法。 - 前記段階(ii)を含まず、そして成形物の触媒組成物を得るために成形の段階を任意に含む、請求項8乃至11の何れか1項に記載の方法。
- 請求項8乃至12の何れか1項に記載の方法により得られる/得られ得る触媒組成物。
- 窒素酸化物の選択的触媒還元のための請求項13に記載の触媒組成物の使用方法。
- 前記窒素酸化物が、ディーゼルエンジン、発電所又は焼却炉のような内燃機関からの排ガス中に存在する、請求項14に記載の使用方法。
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WO2015075083A1 (de) * | 2013-11-25 | 2015-05-28 | Umicore Ag & Co. Kg | Scr-katalysator |
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BR112013003348B1 (pt) | 2010-08-09 | 2021-06-22 | Cormetech, Inc | Corpo catalisador estrutural |
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US11260371B2 (en) | 2022-03-01 |
BR112018012274A2 (pt) | 2018-11-27 |
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CA3008738C (en) | 2023-10-03 |
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CN109070055A (zh) | 2018-12-21 |
JP6971985B2 (ja) | 2021-11-24 |
RU2018126200A (ru) | 2020-01-17 |
JP6971985B6 (ja) | 2021-12-22 |
BR112018012274B1 (pt) | 2021-01-05 |
EP3389855A1 (en) | 2018-10-24 |
WO2017101449A1 (en) | 2017-06-22 |
ZA201804736B (en) | 2022-10-26 |
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CA3008738A1 (en) | 2017-06-22 |
RU2730513C2 (ru) | 2020-08-24 |
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