JP2019502023A5 - - Google Patents

Download PDF

Info

Publication number
JP2019502023A5
JP2019502023A5 JP2018531355A JP2018531355A JP2019502023A5 JP 2019502023 A5 JP2019502023 A5 JP 2019502023A5 JP 2018531355 A JP2018531355 A JP 2018531355A JP 2018531355 A JP2018531355 A JP 2018531355A JP 2019502023 A5 JP2019502023 A5 JP 2019502023A5
Authority
JP
Japan
Prior art keywords
transition metal
precursor
daughter
solution
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018531355A
Other languages
English (en)
Japanese (ja)
Other versions
JP6997711B2 (ja
JP2019502023A (ja
Filing date
Publication date
Priority claimed from FR1562862A external-priority patent/FR3045673B1/fr
Application filed filed Critical
Publication of JP2019502023A publication Critical patent/JP2019502023A/ja
Publication of JP2019502023A5 publication Critical patent/JP2019502023A5/ja
Application granted granted Critical
Publication of JP6997711B2 publication Critical patent/JP6997711B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018531355A 2015-12-18 2016-12-17 プリカーサ化合物の再利用を伴うdli-mocvdによる皮膜の成膜方法 Active JP6997711B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1562862 2015-12-18
FR1562862A FR3045673B1 (fr) 2015-12-18 2015-12-18 Procede de depot d'un revetement par dli-mocvd avec recyclage du compose precurseur
PCT/FR2016/053541 WO2017103546A1 (fr) 2015-12-18 2016-12-17 Procede de depot d'un revetement par dli-mocvd avec recyclage direct du compose precurseur

Publications (3)

Publication Number Publication Date
JP2019502023A JP2019502023A (ja) 2019-01-24
JP2019502023A5 true JP2019502023A5 (enExample) 2020-03-19
JP6997711B2 JP6997711B2 (ja) 2022-02-04

Family

ID=55948887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018531355A Active JP6997711B2 (ja) 2015-12-18 2016-12-17 プリカーサ化合物の再利用を伴うdli-mocvdによる皮膜の成膜方法

Country Status (7)

Country Link
US (2) US20190003048A1 (enExample)
EP (1) EP3390686B1 (enExample)
JP (1) JP6997711B2 (enExample)
KR (1) KR20180089515A (enExample)
FR (1) FR3045673B1 (enExample)
RU (1) RU2699126C1 (enExample)
WO (1) WO2017103546A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2827830T3 (es) 2016-09-28 2021-05-24 Commissariat Energie Atomique Componente nuclear con sustrato metálico, procedimiento de fabricación mediante DLI-MOCVD y usos contra la oxidación/hidruración
US11715572B2 (en) 2016-09-28 2023-08-01 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composite nuclear component, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation
WO2018060642A1 (fr) 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire avec revetement de crc amorphe, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
EP3520118B1 (fr) 2016-09-28 2020-08-05 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
US11560625B2 (en) * 2018-01-19 2023-01-24 Entegris, Inc. Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor
JP2021536528A (ja) * 2018-09-03 2021-12-27 アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated 薄膜堆積のための直接液体注入システム
FR3114588B1 (fr) * 2020-09-29 2023-08-11 Safran Ceram Procédé de fabrication d’une barrière environnementale

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1453950A1 (ru) * 1987-01-07 1994-06-30 А.И. Костылев Парогазовая смесь для пиролитического нанесения защитных покрытий на основе хрома
FR2643071B1 (fr) * 1989-02-16 1993-05-07 Unirec Procede de depot en phase vapeur a basse temperature d'un revetement ceramique du type nitrure ou carbonitrure metallique
SU1759958A1 (ru) * 1990-04-19 1992-09-07 Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения Способ нанесени пиролитического карбидохромового покрыти на металлические поверхности
JPH0412525A (ja) * 1990-05-02 1992-01-17 Babcock Hitachi Kk 有機金属化学気相成長装置
WO2005028704A1 (en) * 2003-09-19 2005-03-31 Akzo Nobel N.V. Metallization of substrate (s) by a liquid/vapor deposition process
KR101388817B1 (ko) * 2006-03-14 2014-04-23 프랙스에어 테크놀로지, 인코포레이티드 증착 방법을 위한 온도 제어 콜드 트랩 및 그의 용도
FR2904007B1 (fr) 2006-07-21 2008-11-21 Toulouse Inst Nat Polytech Procede de depot de revetements ceramiques non oxydes.
FR2904006B1 (fr) * 2006-07-21 2008-10-31 Toulouse Inst Nat Polytech Procede de depot de revetements metalliques durs
JP5277784B2 (ja) * 2008-08-07 2013-08-28 東京エレクトロン株式会社 原料回収方法、トラップ機構、排気系及びこれを用いた成膜装置
RU2513496C2 (ru) * 2012-05-31 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" Износостойкое металлическое покрытие на основе хрома и способ его нанесения
WO2014074589A1 (en) * 2012-11-06 2014-05-15 Applied Materials, Inc. Apparatus for spatial atomic layer deposition with recirculation and methods of use
JP6101958B2 (ja) * 2013-02-13 2017-03-29 日本パイオニクス株式会社 アンモニア及び水素の回収方法及び再利用方法
JP2015151564A (ja) * 2014-02-13 2015-08-24 東洋製罐グループホールディングス株式会社 原子層堆積成膜装置

Similar Documents

Publication Publication Date Title
JP2019502023A5 (enExample)
Barth et al. Precursors for direct-write nanofabrication with electrons
US10150789B2 (en) Molybdenum imide compound
TWI546308B (zh) A method for producing a film containing molybdenum oxide, a raw material for forming a film containing molybdenum oxide, and a compound of molybdenum amide (MOLYBDENUM AMIDE)
US11142822B2 (en) Method for depositing a coating by DLI-MOCVD with direct recycling of the precursor compound
US20160152649A1 (en) Metal amides of cyclic amines
JP2017025412A5 (enExample)
TW201704200A (zh) 二氮雜二烯基化合物、薄膜形成用原料、薄膜之製造方法及二氮雜二烯化合物
JP2014146786A5 (enExample)
US10556799B2 (en) Tritertbutyl aluminum reactants for vapor deposition
TWI579397B (zh) 製造含鎳薄膜的方法
KR101965219B1 (ko) 알루미늄 화합물 및 이를 이용한 알루미늄-함유 막의 형성 방법
CN110747448A (zh) 一种原子层沉积技术生长NbSx薄膜的方法
CN106460169B (zh) 液体前体组合物、其制备方法和使用该组合物形成层的方法
WO2016203887A1 (ja) 新規な化合物、薄膜形成用原料及び薄膜の製造方法
IL275283B2 (en) Process for the generation of metal-containing films
TW201535521A (zh) 鍺沈積技術
JPWO2007066546A1 (ja) ハフニウム系化合物、ハフニウム系薄膜形成材料、及びハフニウム系薄膜形成方法
JP6509128B2 (ja) ルテニウム化合物、薄膜形成用原料及び薄膜の製造方法
JP2017525840A5 (enExample)
US3437516A (en) Vapor deposition from perfluoroorganometallic compounds
Zharkova et al. O, N-coordinated Ni (II) beta-diketonate derivatives: Synthesis, thermal properties, MOCVD applications
JPH01257194A (ja) 単結晶薄膜の製造法
TW201412757A (zh) 製造含鎳薄膜的方法
WO2018042871A1 (ja) ジアザジエニル化合物、薄膜形成用原料及び薄膜の製造方法