KR20180089515A - 전구체 화합물을 직접 재활용하는 ｄｌｉ-ｍｏｃｖｄ에 의한 코팅의 증착 공정 - Google Patents
전구체 화합물을 직접 재활용하는 ｄｌｉ-ｍｏｃｖｄ에 의한 코팅의 증착 공정 Download PDFInfo
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- KR20180089515A KR20180089515A KR1020187020519A KR20187020519A KR20180089515A KR 20180089515 A KR20180089515 A KR 20180089515A KR 1020187020519 A KR1020187020519 A KR 1020187020519A KR 20187020519 A KR20187020519 A KR 20187020519A KR 20180089515 A KR20180089515 A KR 20180089515A
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Classifications
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
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- B01D5/0057—Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes
- B01D5/006—Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes with evaporation or distillation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D8/00—Cold traps; Cold baffles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
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| FR1562862 | 2015-12-18 | ||
| FR1562862A FR3045673B1 (fr) | 2015-12-18 | 2015-12-18 | Procede de depot d'un revetement par dli-mocvd avec recyclage du compose precurseur |
| PCT/FR2016/053541 WO2017103546A1 (fr) | 2015-12-18 | 2016-12-17 | Procede de depot d'un revetement par dli-mocvd avec recyclage direct du compose precurseur |
Publications (1)
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| KR20180089515A true KR20180089515A (ko) | 2018-08-08 |
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| US (2) | US20190003048A1 (enExample) |
| EP (1) | EP3390686B1 (enExample) |
| JP (1) | JP6997711B2 (enExample) |
| KR (1) | KR20180089515A (enExample) |
| FR (1) | FR3045673B1 (enExample) |
| RU (1) | RU2699126C1 (enExample) |
| WO (1) | WO2017103546A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020050974A1 (en) * | 2018-09-03 | 2020-03-12 | Applied Materials, Inc. | Direct liquid injection system for thin film deposition |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2827830T3 (es) | 2016-09-28 | 2021-05-24 | Commissariat Energie Atomique | Componente nuclear con sustrato metálico, procedimiento de fabricación mediante DLI-MOCVD y usos contra la oxidación/hidruración |
| US11715572B2 (en) | 2016-09-28 | 2023-08-01 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Composite nuclear component, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation |
| WO2018060642A1 (fr) | 2016-09-28 | 2018-04-05 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Composant nucléaire avec revetement de crc amorphe, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration |
| EP3520118B1 (fr) | 2016-09-28 | 2020-08-05 | Commissariat à l'Énergie Atomique et aux Énergies Alternatives | Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration |
| US11560625B2 (en) * | 2018-01-19 | 2023-01-24 | Entegris, Inc. | Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor |
| FR3114588B1 (fr) * | 2020-09-29 | 2023-08-11 | Safran Ceram | Procédé de fabrication d’une barrière environnementale |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
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| SU1453950A1 (ru) * | 1987-01-07 | 1994-06-30 | А.И. Костылев | Парогазовая смесь для пиролитического нанесения защитных покрытий на основе хрома |
| FR2643071B1 (fr) * | 1989-02-16 | 1993-05-07 | Unirec | Procede de depot en phase vapeur a basse temperature d'un revetement ceramique du type nitrure ou carbonitrure metallique |
| SU1759958A1 (ru) * | 1990-04-19 | 1992-09-07 | Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения | Способ нанесени пиролитического карбидохромового покрыти на металлические поверхности |
| JPH0412525A (ja) * | 1990-05-02 | 1992-01-17 | Babcock Hitachi Kk | 有機金属化学気相成長装置 |
| WO2005028704A1 (en) * | 2003-09-19 | 2005-03-31 | Akzo Nobel N.V. | Metallization of substrate (s) by a liquid/vapor deposition process |
| KR101388817B1 (ko) * | 2006-03-14 | 2014-04-23 | 프랙스에어 테크놀로지, 인코포레이티드 | 증착 방법을 위한 온도 제어 콜드 트랩 및 그의 용도 |
| FR2904007B1 (fr) | 2006-07-21 | 2008-11-21 | Toulouse Inst Nat Polytech | Procede de depot de revetements ceramiques non oxydes. |
| FR2904006B1 (fr) * | 2006-07-21 | 2008-10-31 | Toulouse Inst Nat Polytech | Procede de depot de revetements metalliques durs |
| JP5277784B2 (ja) * | 2008-08-07 | 2013-08-28 | 東京エレクトロン株式会社 | 原料回収方法、トラップ機構、排気系及びこれを用いた成膜装置 |
| RU2513496C2 (ru) * | 2012-05-31 | 2014-04-20 | Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" | Износостойкое металлическое покрытие на основе хрома и способ его нанесения |
| WO2014074589A1 (en) * | 2012-11-06 | 2014-05-15 | Applied Materials, Inc. | Apparatus for spatial atomic layer deposition with recirculation and methods of use |
| JP6101958B2 (ja) * | 2013-02-13 | 2017-03-29 | 日本パイオニクス株式会社 | アンモニア及び水素の回収方法及び再利用方法 |
| JP2015151564A (ja) * | 2014-02-13 | 2015-08-24 | 東洋製罐グループホールディングス株式会社 | 原子層堆積成膜装置 |
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2015
- 2015-12-18 FR FR1562862A patent/FR3045673B1/fr active Active
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2016
- 2016-12-17 US US16/063,405 patent/US20190003048A1/en not_active Abandoned
- 2016-12-17 RU RU2018125304A patent/RU2699126C1/ru not_active IP Right Cessation
- 2016-12-17 EP EP16831495.3A patent/EP3390686B1/fr active Active
- 2016-12-17 WO PCT/FR2016/053541 patent/WO2017103546A1/fr not_active Ceased
- 2016-12-17 JP JP2018531355A patent/JP6997711B2/ja active Active
- 2016-12-17 KR KR1020187020519A patent/KR20180089515A/ko not_active Ceased
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2019
- 2019-10-31 US US16/669,854 patent/US11142822B2/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020050974A1 (en) * | 2018-09-03 | 2020-03-12 | Applied Materials, Inc. | Direct liquid injection system for thin film deposition |
| US11180849B2 (en) | 2018-09-03 | 2021-11-23 | Applied Materials, Inc. | Direct liquid injection system for thin film deposition |
| EP3847294A4 (en) * | 2018-09-03 | 2022-06-01 | Applied Materials, Inc. | DIRECT LIQUID INJECTION SYSTEM FOR THIN FILM DEPOSITION |
Also Published As
| Publication number | Publication date |
|---|---|
| US20190003048A1 (en) | 2019-01-03 |
| EP3390686A1 (fr) | 2018-10-24 |
| FR3045673A1 (fr) | 2017-06-23 |
| WO2017103546A1 (fr) | 2017-06-22 |
| RU2699126C1 (ru) | 2019-09-03 |
| JP6997711B2 (ja) | 2022-02-04 |
| US20200123655A1 (en) | 2020-04-23 |
| EP3390686B1 (fr) | 2019-11-20 |
| JP2019502023A (ja) | 2019-01-24 |
| FR3045673B1 (fr) | 2020-02-28 |
| US11142822B2 (en) | 2021-10-12 |
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