RU2699126C1 - Способ нанесения покрытия осаждением с помощью dli-mocvd с повторным применением соединения-предшественника - Google Patents

Способ нанесения покрытия осаждением с помощью dli-mocvd с повторным применением соединения-предшественника Download PDF

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RU2699126C1
RU2699126C1 RU2018125304A RU2018125304A RU2699126C1 RU 2699126 C1 RU2699126 C1 RU 2699126C1 RU 2018125304 A RU2018125304 A RU 2018125304A RU 2018125304 A RU2018125304 A RU 2018125304A RU 2699126 C1 RU2699126 C1 RU 2699126C1
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deposition
precursor
transition metal
paragraphs
reactor
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Фредерик ШУСТЕР
Франсис МОРИ
Александр МИШО
Мишель ПОН
Рафаэль БУАШО
Фернандо ЛОМЕЛЛО
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Коммиссариа А Л'Энержи Атомик Э Оз Энержи Альтернатив
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D5/00Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0057Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes
    • B01D5/006Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes with evaporation or distillation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D8/00Cold traps; Cold baffles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
RU2018125304A 2015-12-18 2016-12-17 Способ нанесения покрытия осаждением с помощью dli-mocvd с повторным применением соединения-предшественника RU2699126C1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1562862 2015-12-18
FR1562862A FR3045673B1 (fr) 2015-12-18 2015-12-18 Procede de depot d'un revetement par dli-mocvd avec recyclage du compose precurseur
PCT/FR2016/053541 WO2017103546A1 (fr) 2015-12-18 2016-12-17 Procede de depot d'un revetement par dli-mocvd avec recyclage direct du compose precurseur

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RU2699126C1 true RU2699126C1 (ru) 2019-09-03

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US (2) US20190003048A1 (enExample)
EP (1) EP3390686B1 (enExample)
JP (1) JP6997711B2 (enExample)
KR (1) KR20180089515A (enExample)
FR (1) FR3045673B1 (enExample)
RU (1) RU2699126C1 (enExample)
WO (1) WO2017103546A1 (enExample)

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ES2827830T3 (es) 2016-09-28 2021-05-24 Commissariat Energie Atomique Componente nuclear con sustrato metálico, procedimiento de fabricación mediante DLI-MOCVD y usos contra la oxidación/hidruración
US11715572B2 (en) 2016-09-28 2023-08-01 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composite nuclear component, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation
WO2018060642A1 (fr) 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire avec revetement de crc amorphe, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
EP3520118B1 (fr) 2016-09-28 2020-08-05 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
US11560625B2 (en) * 2018-01-19 2023-01-24 Entegris, Inc. Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor
JP2021536528A (ja) * 2018-09-03 2021-12-27 アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated 薄膜堆積のための直接液体注入システム
FR3114588B1 (fr) * 2020-09-29 2023-08-11 Safran Ceram Procédé de fabrication d’une barrière environnementale

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SU1759958A1 (ru) * 1990-04-19 1992-09-07 Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения Способ нанесени пиролитического карбидохромового покрыти на металлические поверхности
SU1453950A1 (ru) * 1987-01-07 1994-06-30 А.И. Костылев Парогазовая смесь для пиролитического нанесения защитных покрытий на основе хрома
WO2008009715A1 (fr) * 2006-07-21 2008-01-24 Institut National Polytechnique De Toulouse (I.N.P.T) Procede de depot de revetements ceramiques non oxydes
WO2008009714A1 (fr) * 2006-07-21 2008-01-24 Institut National Polytechnique De Toulouse (I.N.P.T) Procede de depot de revetements metalliques durs
RU2513496C2 (ru) * 2012-05-31 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" Износостойкое металлическое покрытие на основе хрома и способ его нанесения

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FR2643071B1 (fr) * 1989-02-16 1993-05-07 Unirec Procede de depot en phase vapeur a basse temperature d'un revetement ceramique du type nitrure ou carbonitrure metallique
JPH0412525A (ja) * 1990-05-02 1992-01-17 Babcock Hitachi Kk 有機金属化学気相成長装置
WO2005028704A1 (en) * 2003-09-19 2005-03-31 Akzo Nobel N.V. Metallization of substrate (s) by a liquid/vapor deposition process
KR101388817B1 (ko) * 2006-03-14 2014-04-23 프랙스에어 테크놀로지, 인코포레이티드 증착 방법을 위한 온도 제어 콜드 트랩 및 그의 용도
JP5277784B2 (ja) * 2008-08-07 2013-08-28 東京エレクトロン株式会社 原料回収方法、トラップ機構、排気系及びこれを用いた成膜装置
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JP6101958B2 (ja) * 2013-02-13 2017-03-29 日本パイオニクス株式会社 アンモニア及び水素の回収方法及び再利用方法
JP2015151564A (ja) * 2014-02-13 2015-08-24 東洋製罐グループホールディングス株式会社 原子層堆積成膜装置

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SU1453950A1 (ru) * 1987-01-07 1994-06-30 А.И. Костылев Парогазовая смесь для пиролитического нанесения защитных покрытий на основе хрома
SU1759958A1 (ru) * 1990-04-19 1992-09-07 Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения Способ нанесени пиролитического карбидохромового покрыти на металлические поверхности
WO2008009715A1 (fr) * 2006-07-21 2008-01-24 Institut National Polytechnique De Toulouse (I.N.P.T) Procede de depot de revetements ceramiques non oxydes
WO2008009714A1 (fr) * 2006-07-21 2008-01-24 Institut National Polytechnique De Toulouse (I.N.P.T) Procede de depot de revetements metalliques durs
RU2513496C2 (ru) * 2012-05-31 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" Износостойкое металлическое покрытие на основе хрома и способ его нанесения

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US20190003048A1 (en) 2019-01-03
EP3390686A1 (fr) 2018-10-24
FR3045673A1 (fr) 2017-06-23
KR20180089515A (ko) 2018-08-08
WO2017103546A1 (fr) 2017-06-22
JP6997711B2 (ja) 2022-02-04
US20200123655A1 (en) 2020-04-23
EP3390686B1 (fr) 2019-11-20
JP2019502023A (ja) 2019-01-24
FR3045673B1 (fr) 2020-02-28
US11142822B2 (en) 2021-10-12

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