JP2017525840A5 - - Google Patents
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- Publication number
- JP2017525840A5 JP2017525840A5 JP2016572630A JP2016572630A JP2017525840A5 JP 2017525840 A5 JP2017525840 A5 JP 2017525840A5 JP 2016572630 A JP2016572630 A JP 2016572630A JP 2016572630 A JP2016572630 A JP 2016572630A JP 2017525840 A5 JP2017525840 A5 JP 2017525840A5
- Authority
- JP
- Japan
- Prior art keywords
- precursor composition
- liquid precursor
- film
- metal
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 42
- 239000012705 liquid precursor Substances 0.000 claims 36
- 150000002736 metal compounds Chemical class 0.000 claims 17
- 238000000034 method Methods 0.000 claims 17
- 238000007740 vapor deposition Methods 0.000 claims 14
- 150000001875 compounds Chemical class 0.000 claims 13
- 238000004519 manufacturing process Methods 0.000 claims 10
- 229910001507 metal halide Inorganic materials 0.000 claims 9
- 239000003446 ligand Substances 0.000 claims 6
- -1 metal halide compound Chemical class 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 229910052783 alkali metal Inorganic materials 0.000 claims 5
- 150000001340 alkali metals Chemical class 0.000 claims 5
- 239000012535 impurity Substances 0.000 claims 5
- 239000012071 phase Substances 0.000 claims 5
- 239000000376 reactant Substances 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 150000005309 metal halides Chemical class 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 239000007788 liquid Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- LVEYOSJUKRVCCF-UHFFFAOYSA-N 1,3-bis(diphenylphosphino)propane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCP(C=1C=CC=CC=1)C1=CC=CC=C1 LVEYOSJUKRVCCF-UHFFFAOYSA-N 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims 2
- 238000000231 atomic layer deposition Methods 0.000 claims 2
- 238000004587 chromatography analysis Methods 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 230000007935 neutral effect Effects 0.000 claims 2
- 238000000746 purification Methods 0.000 claims 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 239000004615 ingredient Substances 0.000 claims 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 claims 1
- 238000005292 vacuum distillation Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20140072274 | 2014-06-13 | ||
| KR10-2014-0072274 | 2014-06-13 | ||
| PCT/KR2015/005945 WO2015190871A1 (en) | 2014-06-13 | 2015-06-12 | Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017525840A JP2017525840A (ja) | 2017-09-07 |
| JP2017525840A5 true JP2017525840A5 (enExample) | 2018-07-19 |
| JP6635950B2 JP6635950B2 (ja) | 2020-01-29 |
Family
ID=54833872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016572630A Active JP6635950B2 (ja) | 2014-06-13 | 2015-06-12 | 液体前駆体組成物、その製造方法、及び前記組成物を利用した膜の形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10014089B2 (enExample) |
| JP (1) | JP6635950B2 (enExample) |
| KR (2) | KR101936162B1 (enExample) |
| CN (1) | CN106460169B (enExample) |
| TW (1) | TWI682051B (enExample) |
| WO (1) | WO2015190871A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11476158B2 (en) * | 2014-09-14 | 2022-10-18 | Entegris, Inc. | Cobalt deposition selectivity on copper and dielectrics |
| TWI736631B (zh) * | 2016-06-06 | 2021-08-21 | 韋恩州立大學 | 二氮雜二烯錯合物與胺類的反應 |
| US11078224B2 (en) * | 2017-04-07 | 2021-08-03 | Applied Materials, Inc. | Precursors for the atomic layer deposition of transition metals and methods of use |
| KR102103346B1 (ko) * | 2017-11-15 | 2020-04-22 | 에스케이트리켐 주식회사 | 박막 증착용 전구체 용액 및 이를 이용한 박막 형성 방법. |
| KR102123331B1 (ko) * | 2018-12-19 | 2020-06-17 | 주식회사 한솔케미칼 | 코발트 전구체, 이의 제조방법 및 이를 이용한 박막의 제조방법 |
| WO2022211218A1 (ko) | 2021-04-02 | 2022-10-06 | 한국과학기술원 | 액체금속 전구체 용액, 이를 이용한 금속막 제조방법 및 이를 포함하는 전자소자 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006000823A1 (de) * | 2006-01-05 | 2007-07-12 | H. C. Starck Gmbh & Co. Kg | Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) |
| US8636845B2 (en) * | 2008-06-25 | 2014-01-28 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Metal heterocyclic compounds for deposition of thin films |
| US8485738B2 (en) * | 2009-07-31 | 2013-07-16 | Hewlett-Packard Development Company, L.P. | Optical fiber connector |
| US9822446B2 (en) * | 2010-08-24 | 2017-11-21 | Wayne State University | Thermally stable volatile precursors |
| US9255327B2 (en) * | 2010-08-24 | 2016-02-09 | Wayne State University | Thermally stable volatile precursors |
| CN103298971B (zh) * | 2010-11-17 | 2015-07-08 | Up化学株式会社 | 基于二氮杂二烯的金属化合物、其生产方法和使用其形成薄膜的方法 |
| WO2013046155A1 (en) | 2011-09-27 | 2013-04-04 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Tungsten diazabutadiene precursors, their synthesis, and their use for tungsten containing film depositions |
| KR20140085461A (ko) * | 2011-09-27 | 2014-07-07 | 레르 리키드 쏘시에떼 아노님 뿌르 레？드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 니켈 비스 디아자부타디엔 전구체, 그들의 합성, 및 니켈 함유 필름 침착을 위한 그들의 용도 |
| CN105392917A (zh) | 2013-05-24 | 2016-03-09 | Up化学株式会社 | 使用钨化合物沉积含钨膜的方法和用于沉积含钨膜的包含钨化合物的前体组合物 |
| US9067958B2 (en) * | 2013-10-14 | 2015-06-30 | Intel Corporation | Scalable and high yield synthesis of transition metal bis-diazabutadienes |
| US9236292B2 (en) * | 2013-12-18 | 2016-01-12 | Intel Corporation | Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD) |
-
2015
- 2015-06-12 JP JP2016572630A patent/JP6635950B2/ja active Active
- 2015-06-12 CN CN201580031286.2A patent/CN106460169B/zh active Active
- 2015-06-12 KR KR1020167012801A patent/KR101936162B1/ko active Active
- 2015-06-12 KR KR1020167001280A patent/KR20160017094A/ko not_active Withdrawn
- 2015-06-12 WO PCT/KR2015/005945 patent/WO2015190871A1/en not_active Ceased
- 2015-06-15 TW TW104119200A patent/TWI682051B/zh active
-
2016
- 2016-06-30 US US15/199,705 patent/US10014089B2/en active Active
-
2018
- 2018-06-07 US US16/002,304 patent/US10763001B2/en active Active
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