JP2019192885A - 配線基板、半導体装置及び配線基板の製造方法 - Google Patents
配線基板、半導体装置及び配線基板の製造方法 Download PDFInfo
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- JP2019192885A JP2019192885A JP2018087608A JP2018087608A JP2019192885A JP 2019192885 A JP2019192885 A JP 2019192885A JP 2018087608 A JP2018087608 A JP 2018087608A JP 2018087608 A JP2018087608 A JP 2018087608A JP 2019192885 A JP2019192885 A JP 2019192885A
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Abstract
Description
なお、添付図面は、便宜上、特徴を分かりやすくするために特徴となる部分を拡大して示している場合があり、各構成要素の寸法比率などが実際と同じであるとは限らない。また、断面図では、各部材の断面構造を分かりやすくするために、一部の部材のハッチングを梨地模様に代えて示し、一部の部材のハッチングを省略している。
図1(a)に示すように、配線基板10は、配線構造11と、配線構造11の下側に積層されたソルダーレジスト層12と、配線構造11の上側に積層された配線構造13と、配線構造13の上側に積層されたソルダーレジスト層14と、外部接続端子15とを有している。
配線構造11は、配線構造13よりも配線密度の低い配線層が形成された低密度配線層である。この配線構造11は、1層の絶縁層20と、配線層30と、密着層40と、絶縁層20を厚さ方向に貫通するビア配線50とを有している。
パッド部31は、凹部20Xの底面に形成されている。パッド部31は、凹部20Xの一部(上部)を充填するように形成されている。パッド部31の平面形状は、凹部20Xの平面形状と同様の形状(例えば、円形状)に形成されている。パッド部31の平面形状は、突出部32の平面形状よりも大きく形成されている。例えば、パッド部31は、突出部32よりも大径に形成されている。パッド部31の厚さは、凹部20Xの深さよりも薄く形成されている。具体的には、パッド部31の厚さは、凹部20Xの深さよりも密着層40の厚さ分だけ薄く形成されている。パッド部31は、例えば、その上面と下面31Bとが略同じ大きさの柱状(例えば、円柱状)に形成されている。
配線構造13は、絶縁層20の上面20Aに積層された配線構造である。配線構造13は、配線構造11よりも配線密度の高い配線層が形成された高密度配線層である。
ここで、絶縁層61,63の材料としては、例えば、フェノール系樹脂やポリイミド系樹脂等の感光性樹脂を主成分とする絶縁性樹脂を用いることができる。これら絶縁層61,63は、例えば、シリカやアルミナ等のフィラーを含有していてもよい。また、配線層60,62,64の材料としては、例えば、銅や銅合金を用いることができる。
半導体装置70は、配線基板10と、一つ又は複数の半導体チップ71と、アンダーフィル樹脂73とを有している。
次いで、図4(a)に示す工程では、金属層33をエッチングマスクとして、不要なシード層34をエッチング(例えば、ウェットエッチング)により除去する。ウェットエッチングのエッチング液としては、例えば、硫酸過水液(硫酸と過酸化水素水の混合水溶液)などの酸性水溶液を用いることができる。本工程により、ソルダーレジスト層12の上面12Aに密着層40を介して形成されたパッド部31と、そのパッド部31の下面31Bの一部から下方に突出して開口部12X内に突出する突出部32とを有する配線層30が形成される。この配線層30は、金属層33と、その金属層33の下面を被覆するシード層34とによって構成されている。このとき、配線層30とソルダーレジスト層12との間には密着層40が介在して設けられている。
続いて、図4(c)に示す工程では、配線層30の上面の一部が露出されるように絶縁層20の所定箇所に貫通孔20Yを形成する。この貫通孔20Yは、例えば、CO2レーザやUV−YAGレーザ等によるレーザ加工法によって形成することができる。
続いて、絶縁層63の上面63Aに、開口部14Xを有するソルダーレジスト層14を形成する。ソルダーレジスト層14は、例えば、感光性のソルダーレジストフィルムをラミネートし、又は液状のソルダーレジストを塗布し、当該レジストをフォトリソグラフィ法によりパターニングすることにより形成することができる。
次に、本実施形態の作用及び効果について説明する。
(1)外部接続用パッドP1として機能する配線層30とソルダーレジスト層12との間に、配線層30よりもソルダーレジスト層12との密着性が高い密着層40を介在させるようにした。この密着層40により、配線層30とソルダーレジスト層12との密着性を向上させることができる。このため、例えば配線基板10に反りや熱応力が発生した場合であっても、ソルダーレジスト層12が配線層30から剥離することを抑制できる。
上記実施形態は、以下のように変更して実施することができる。上記実施形態及び以下の変更例は、技術的に矛盾しない範囲で互いに組み合わせて実施することができる。
例えば図9に示すように、密着層40の下端面41Bを、突出部32の下端面32Bと略面一になるように形成してもよい。この場合には、突出部32の側面32S全面が密着層40によって被覆される。
例えば図10に示すように、外部接続端子15Aを、複数の金属層16,17,18によって構成するようにしてもよい。本例の外部接続端子15Aは、外部接続用パッドP1の表面から、金属層16と、金属層17と、金属層18とが順に積層された3層構造の金属層である。これら金属層16,17,18は、例えば、無電解めっき法によって形成することができる。
さらに、外部接続端子15Aでは、ソルダーレジスト層12の角部12Cを被覆する金属層16を、配線層30を構成する金属(ここでは、Cu)よりも弾性率の高い金属材料で構成するようにした。ここで、ソルダーレジスト層12の角部12Cは、応力が集中しやすい部分である。このような角部12Cを弾性率が比較的高い金属層16によって被覆するようにしたため、外部接続端子15Aが破損することを好適に抑制できる。
・上記実施形態では、低密度配線層である配線構造11の上に高密度配線層である配線構造13を形成するようにしたが、これに限定されない。
配線構造90は、ソルダーレジスト層12の上面12Aに、配線層30と、絶縁層20と、配線層91と、絶縁層92と、配線層93と、絶縁層94と、配線層95とが順次積層された構造を有している。
なお、配線構造90における配線層30,91,93,95及び絶縁層20,92,94の層数や配線の取り回しなどは様々に変形・変更することが可能である。
・上記実施形態では、配線基板10の最外層となる保護絶縁層の一例としてソルダーレジスト層12を例示したが、各種の感光性を有する絶縁性樹脂から保護絶縁層を形成することができる。
11 配線構造
12 ソルダーレジスト層(保護絶縁層)
12X 開口部
13 配線構造
15,15A 外部接続端子
20 絶縁層(第1絶縁層)
20X 凹部
30 配線層(第1配線層)
31 パッド部
32 突出部
40 密着層
64,85 配線層(最上層の配線層)
70 半導体装置
71 半導体チップ(電子部品)
100 支持基板
Claims (10)
- 第1絶縁層と、
前記第1絶縁層の下面に形成された凹部と、
前記凹部内に形成された第1配線層と、
前記第1配線層の一部を露出させる開口部を有し、前記第1絶縁層の下面に積層された保護絶縁層と、
前記第1配線層と前記保護絶縁層との間に介在され、前記第1配線層よりも保護絶縁層との密着性が高い密着層と、を有し、
前記第1配線層は、前記密着層を介して前記保護絶縁層の上面に形成され、前記凹部内に形成されたパッド部と、前記パッド部の下面の一部から前記開口部内に突出する突出部とを有し、
前記密着層は、前記パッド部の下面と前記突出部の側面とを被覆するとともに、前記突出部の下端面を露出するように形成されていることを特徴とする配線基板。 - 前記密着層の下端面は、前記突出部の下端面よりも上方に凹むように形成されていることを特徴とする請求項1に記載の配線基板。
- 前記開口部は、前記保護絶縁層の上面側から下面側に向かうに連れて開口幅が小さくなるように形成されていることを特徴とする請求項1又は2に記載の配線基板。
- 前記突出部の下端面は、前記保護絶縁層の下面よりも上方に位置するように設けられていることを特徴とする請求項1〜3のいずれか一項に記載の配線基板。
- 前記突出部の下端面は、前記保護絶縁層の下面よりも前記密着層の厚さ分だけ上方に位置するように設けられていることを特徴とする請求項4に記載の配線基板。
- 前記開口部から露出する前記突出部の下端面に接続された外部接続端子を有することを特徴とする請求項1〜5のいずれか一項に記載の配線基板。
- 前記外部接続端子は、前記密着層から露出する前記開口部の内側面を被覆するとともに、前記開口部の周縁に位置する前記保護絶縁層の下面を被覆するように形成されていることを特徴とする請求項6に記載の配線基板。
- 前記第1絶縁層の上面に積層され、前記第1配線層と電気的に接続された配線層と絶縁層とを含む配線構造を有することを特徴とする請求項1〜7のいずれか一項に記載の配線基板。
- 請求項8に記載の配線基板と、
前記配線構造の最上層の配線層に接続された電子部品と、
を有することを特徴とする半導体装置。 - 支持基板上に、前記支持基板の上面を露出する開口部を有する保護絶縁層を形成する工程と、
前記保護絶縁層の上面及び前記開口部の内面を被覆する密着層を形成する工程と、
前記密着層上に、前記開口部を充填する突出部と前記保護絶縁層の上面に前記密着層を介して形成されたパッド部とを有する第1配線層を形成する工程と、
前記第1配線層をマスクにして前記密着層を除去する工程と、
前記保護絶縁層の上面に、前記第1配線層及び前記密着層を被覆する第1絶縁層を形成する工程と、
前記支持基板を除去する工程と、
前記密着層を下面側から薄化して前記突出部の下端面を露出させる工程と、
を有することを特徴とする配線基板の製造方法。
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JP7459492B2 (ja) | 2019-11-29 | 2024-04-02 | 大日本印刷株式会社 | 配線基板 |
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US10978417B2 (en) * | 2019-04-29 | 2021-04-13 | Advanced Semiconductor Engineering, Inc. | Wiring structure and method for manufacturing the same |
JP2021093417A (ja) * | 2019-12-09 | 2021-06-17 | イビデン株式会社 | プリント配線板、及び、プリント配線板の製造方法 |
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