JP2019102728A - ティーチング方法 - Google Patents
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- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/16—Programme controls
- B25J9/1628—Programme controls characterised by the control loop
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/16—Programme controls
- B25J9/1694—Programme controls characterised by use of sensors other than normal servo-feedback from position, speed or acceleration sensors, perception control, multi-sensor controlled systems, sensor fusion
- B25J9/1697—Vision controlled systems
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- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/42—Recording and playback systems, i.e. in which the programme is recorded from a cycle of operations, e.g. the cycle of operations being manually controlled, after which this record is played back on the same machine
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/36—Nc in input of data, input key till input tape
- G05B2219/36414—Compare image detected path with stored reference, difference corrects position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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Abstract
Description
本発明の実施形態に係るティーチング方法が適用される基板処理システムの一例として、枚葉で半導体ウエハ(以下「ウエハ」という。)にプラズマ処理等の各種処理を施すことが可能な基板処理システムについて説明する。
本発明の実施形態に係るティーチング方法について説明する。図2は、検査用ウエハを説明する図である。図3は、受け渡し位置でのステージと検査用ウエハとの間の位置関係を説明する図である。図3(b)は図3(a)の一部を拡大した断面図である。なお、以下の説明において、基板処理システム1の各構成要素の動作は、制御装置50によって制御される。
12 アーム
13 フォーク
20 プロセスモジュール
21 ステージ
22 リフトピン
40 ロードロックモジュール
41 ステージ
42 リフトピン
100 検査用ウエハ
101 ベースウエハ
102 カメラ
103 開口
104 プリズム
W ウエハ
Claims (12)
- 載置台に基板を搬送する搬送機構のティーチング方法であって、
外周縁部に複数の撮影手段を有する検査用基板を、前記搬送機構と前記載置台との間で前記基板を受け渡す受け渡し位置に搬送する搬送ステップと、
前記受け渡し位置で前記複数の撮影手段により前記載置台の外周を含む一部分を撮影する撮影ステップと、
前記複数の撮影手段により撮影された画像に基づいて、前記載置台の中心位置を算出する算出ステップと、
前記算出ステップで算出された前記載置台の中心位置と、前記受け渡し位置での前記検査用基板の中心位置と、に基づいて、前記受け渡し位置を補正する補正ステップと、
を有する、
ティーチング方法。 - 前記複数の撮影手段は、同一円周上に配置されている、
請求項1に記載のティーチング方法。 - 前記複数の撮影手段は、前記載置台の異なる部分を同時に撮影する、
請求項1又は2に記載のティーチング方法。 - 前記撮影手段は、反射手段を介して前記載置台を撮影する、
請求項1乃至3のいずれか一項に記載のティーチング方法。 - 前記載置台は、前記基板に対して所定の処理を行う処理室内に設けられている、
請求項1乃至4のいずれか一項に記載のティーチング方法。 - 前記受け渡し位置は、前記載置台における前記基板を載置する面から上方に所定距離だけ離間した位置である、
請求項1乃至5のいずれか一項に記載のティーチング方法。 - 前記搬送ステップ、前記撮影ステップ、前記算出ステップ及び前記補正ステップをこの順番に繰り返し実行する、
請求項1乃至6のいずれか一項に記載のティーチング方法。 - 前記搬送ステップの前に、前記検査用基板の位置合わせを行う位置合わせステップを有する、
請求項1乃至7のいずれか一項に記載のティーチング方法。 - 前記搬送ステップの前に、前記検査用基板における前記撮影手段が配置される設計上の位置に対する実際の取り付け位置のずれを較正する較正ステップを有する、
請求項1乃至8のいずれか一項に記載のティーチング方法。 - 前記検査用基板は、前記複数の撮影手段により撮影した画像を外部に送信する通信手段を有する、
請求項1乃至9のいずれか一項に記載のティーチング方法。 - 前記検査用基板は、前記基板と同一サイズである、
請求項1乃至10のいずれか一項に記載のティーチング方法。 - 前記検査用基板には、タッチセンサが取り付けられている、
請求項1乃至11のいずれか一項に記載のティーチング方法。
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JP2017234484A JP7097691B2 (ja) | 2017-12-06 | 2017-12-06 | ティーチング方法 |
US16/209,801 US11037810B2 (en) | 2017-12-06 | 2018-12-04 | Teaching method |
KR1020180154994A KR102239052B1 (ko) | 2017-12-06 | 2018-12-05 | 티칭 방법 |
CN201811488001.XA CN109994404B (zh) | 2017-12-06 | 2018-12-06 | 示教方法 |
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JP7097691B2 JP7097691B2 (ja) | 2022-07-08 |
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Cited By (10)
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JP2019161185A (ja) * | 2018-03-16 | 2019-09-19 | 株式会社東京精密 | プローバ |
WO2021050446A1 (en) * | 2019-09-09 | 2021-03-18 | Kla Corporation | Automatic teaching of substrate handling for production and process control tools |
KR20210103404A (ko) | 2020-02-13 | 2021-08-23 | 도쿄엘렉트론가부시키가이샤 | 티칭 방법 |
JP2021521651A (ja) * | 2018-04-24 | 2021-08-26 | サイバーオプティクス コーポレーション | 半導体処理のための無線基板状ティーチングセンサ |
CN114025913A (zh) * | 2019-07-16 | 2022-02-08 | 德马吉森精机有限公司 | 测量装置 |
US11284018B1 (en) | 2020-09-15 | 2022-03-22 | Applied Materials, Inc. | Smart camera substrate |
CN114514094A (zh) * | 2019-08-19 | 2022-05-17 | 应用材料公司 | 处理系统对准器站的校准 |
KR20220122496A (ko) | 2021-02-26 | 2022-09-02 | 도쿄엘렉트론가부시키가이샤 | 반송 시스템, 반송 장치 및 반송 방법 |
KR20230075643A (ko) * | 2021-11-23 | 2023-05-31 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
KR20240050374A (ko) | 2021-08-26 | 2024-04-18 | 도쿄엘렉트론가부시키가이샤 | 지그 기판 및 티칭 방법 |
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JP7246256B2 (ja) * | 2019-05-29 | 2023-03-27 | 東京エレクトロン株式会社 | 搬送方法及び搬送システム |
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US11766782B2 (en) | 2020-03-17 | 2023-09-26 | Applied Materials, Inc. | Calibration of an electronics processing system |
JP2022042122A (ja) * | 2020-09-02 | 2022-03-14 | 東京エレクトロン株式会社 | 基板処理システム及び状態監視方法 |
KR102635383B1 (ko) | 2020-09-21 | 2024-02-14 | 세메스 주식회사 | 기판 처리 장치 |
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KR20190067105A (ko) | 2019-06-14 |
CN109994404A (zh) | 2019-07-09 |
JP7097691B2 (ja) | 2022-07-08 |
US11037810B2 (en) | 2021-06-15 |
US20190172742A1 (en) | 2019-06-06 |
CN109994404B (zh) | 2023-06-06 |
KR102239052B1 (ko) | 2021-04-09 |
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