JP2021521651A - 半導体処理のための無線基板状ティーチングセンサ - Google Patents
半導体処理のための無線基板状ティーチングセンサ Download PDFInfo
- Publication number
- JP2021521651A JP2021521651A JP2020559518A JP2020559518A JP2021521651A JP 2021521651 A JP2021521651 A JP 2021521651A JP 2020559518 A JP2020559518 A JP 2020559518A JP 2020559518 A JP2020559518 A JP 2020559518A JP 2021521651 A JP2021521651 A JP 2021521651A
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- camera
- edge
- image
- wireless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000012545 processing Methods 0.000 title claims description 33
- 239000004065 semiconductor Substances 0.000 title claims description 30
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims description 85
- 238000003708 edge detection Methods 0.000 claims description 14
- 238000005286 illumination Methods 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 5
- 238000013459 approach Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 50
- 239000012636 effector Substances 0.000 description 13
- 238000004891 communication Methods 0.000 description 8
- 238000012546 transfer Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000005400 gorilla glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/16—Programme controls
- B25J9/1628—Programme controls characterised by the control loop
- B25J9/163—Programme controls characterised by the control loop learning, adaptive, model based, rule based expert control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/16—Programme controls
- B25J9/1694—Programme controls characterised by use of sensors other than normal servo-feedback from position, speed or acceleration sensors, perception control, multi-sensor controlled systems, sensor fusion
- B25J9/1697—Vision controlled systems
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N20/00—Machine learning
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/90—Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/26—Pc applications
- G05B2219/2602—Wafer processing
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10024—Color image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30164—Workpiece; Machine component
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Robotics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Automation & Control Theory (AREA)
- Mechanical Engineering (AREA)
- Software Systems (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Medical Informatics (AREA)
- Data Mining & Analysis (AREA)
- Evolutionary Computation (AREA)
- Artificial Intelligence (AREA)
- Quality & Reliability (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Manipulator (AREA)
- Electrophonic Musical Instruments (AREA)
- Indicating And Signalling Devices For Elevators (AREA)
Abstract
Description
ほとんどすべての現代の電子機器は、集積回路を使用する。これらの集積回路は、半導体処理施設で半導体材料、例えば、シリコンを使用して生産される。半導体は、一般的に、処理されて数百または数千の集積回路にされる潜在力がある丸い薄型ウェーハの形態で提供される。
Claims (36)
- 搬送座標をロボット基板ハンドリングシステムにティーチングするための無線基板状センサであって、センサが、:
ロボット基板ハンドリングシステムによってハンドリングされる基板のようなサイズおよび形状のベース部と;
ベース部に連結された電子機器ハウジングと;
電子機器ハウジング内に配置され、センサの構成要素に電力供給するように構成された電源モジュールと;
ベース部のエッジの近くに配置され、無線基板状センサの少なくとも一つのエッジカメラの視野内の対象物のアライメントフィーチャを撮像する視野を有する、少なくとも一つのエッジカメラと;
電子機器ハウジング内に配置され、少なくとも一つのエッジカメラに連結され、少なくとも一つのエッジカメラから画像を取得し、アライメントフィーチャの少なくとも一つの画像に基づいて対象物の場所を決定するように構成され、決定された場所を提供するように構成されるコントローラとを含む、
無線基板状センサ。 - 決定された場所がロボット基板ハンドリングシステムに提供される、請求項1記載の無線基板状センサ。
- 決定された場所がユーザに提供される、請求項1記載の無線基板状センサ。
- ベース部の中央領域に配置され、無線基板状センサの下に位置付けられた対象物の中央部分を撮像するように構成された追加のカメラをさらに含む、請求項1記載の無線基板状センサ。
- アライメントフィーチャがプロセスチャックの丸いエッジである、請求項1記載の無線基板状センサ。
- 対象物がプロセスチャックである、請求項1記載の無線基板状センサ。
- アライメントフィーチャが対象物上のアライメントマーキングを包含する、請求項1記載の無線基板状センサ。
- 無線基板状センサと対象物との間のレンジの示度を提供するために、ベース部に対して取り付けられ、コントローラに動作可能に連結された測距装置をさらに含む、請求項1記載の無線基板状センサ。
- 無線基板状センサの先端および傾斜を測定するために、コントローラに動作可能に連結された傾斜/先端センサをさらに含む、請求項8記載の無線基板状センサ。
- カメラ画像からXY座標を正確に報告するために、コントローラがレンジの示度を利用するように構成される、請求項9記載の無線基板状センサ。
- 少なくとも一つのエッジカメラが四つのエッジカメラを包含し、各々がベース部のエッジに接近して配置される、請求項1記載の無線基板状センサ。
- 一つまたは複数の点でZを決定するために、一つまたは複数の測距センサをさらに含む、請求項1記載の無線基板状センサ。
- ベース部に対して少なくとも一つのエッジカメラに接近して取り付けられた構造化イルミネータをさらに含み、構造化イルミネータが少なくとも一つのエッジカメラの視野内に構造化照明を発生させるように構成される、請求項1記載の無線基板状センサ。
- 無線基板状センサが少なくとも四つのエッジカメラと、各それぞれのエッジカメラに接近して配置される構造化イルミネータを含む、請求項13記載の無線基板状センサ。
- 構造化照明がドット、円、プラス記号、複数の平行線、XおよびYの少なくとも一つの方向に正弦的に変動する強度パターン、菱形形状および碁盤目状からなる群より選択される形態である、請求項13記載の無線基板状センサ。
- 構造化照明に基づいて見かけのレンジを校正するために、構造化照明が校正動作を可能にするように構成される、請求項13記載の無線基板状センサ。
- コントローラがエッジカメラと構造化イルミネータの各ペアに対して校正動作を実施するように構成される、請求項16記載の無線基板状センサ。
- カメラ画像内の構造化照明の外観に基づいて見かけのレンジを正しく計算するために、コントローラが保存された校正情報を利用するように構成される、請求項16記載の無線基板状センサ。
- カメラ画像からXY座標を正確に報告するために、コントローラが測定された見かけのレンジを利用するように構成される、請求項16記載の無線基板状センサ。
- 対象物の中央開口を撮像しようと試み、対象物の中央開口を撮像する試みが失敗した場合、少なくとも一つのエッジカメラを選択的に係合するために、コントローラがセンサベースの中心に接近してカメラを採用するように構成される、請求項1記載の無線基板状センサ。
- 少なくとも一つのエッジカメラがモノクロカメラである、請求項1記載の無線基板状センサ。
- 少なくとも一つのエッジカメラがカラーカメラである、請求項1記載の無線基板状センサ。
- センサが半導体ウェーハに実質的に類似した形態を有する、請求項1記載の無線基板状センサ。
- センサが半導体プロセスレチクルに実質的に類似した形態を有する、請求項1記載の無線基板状センサ。
- 半導体処理ツールのロボットマニピュレータによって保持されたセンサに対する半導体処理ツールのプロセスチャックの位置を測定する方法であって、方法が、:
少なくとも一つのエッジ検出カメラを有するセンサを提供する工程と;
少なくとも一つのエッジ検出カメラにプロセスチャックの丸い外表面の少なくとも一つの画像を取得させる工程と;
プロセスチャックの丸い外表面の少なくとも一つの画像を解析することに基づいてプロセスチャックの中心の位置を計算する工程と;
プロセスチャックの中心の計算された位置をロボットマニピュレータのコントローラに通信する工程と、
を含む方法。 - 少なくとも一つのエッジカメラの各々に対して構造化イルミネータを提供する工程と、測距のために各カメラ/イルミネータペアを校正するために、構造化照明を使用する工程とをさらに含む、請求項25記載の方法。
- プロセスチャックの丸い外表面の少なくとも一つのその後の画像を取得するために、校正されたセンサを使用する工程をさらに含む、請求項26記載の方法。
- 横方向の(XY)およびレンジ(Z)距離を計算するために、保存された校正情報を使用する工程をさらに含む、請求項25記載の方法。
- 計算された位置を通信する工程が計算された位置を示唆している無線データをロボットマニピュレータのコントローラに送信することを包含する、請求項25記載の方法。
- 少なくとも一つのエッジ検出カメラが四つのエッジ検出カメラを包含し、チャックの位置を計算する工程が各エッジ検出カメラからの少なくとも一つの画像を解析することを包含する、請求項25記載の方法。
- 半導体処理ツールのロボットマニピュレータによって保持されたセンサに対する半導体処理ツール内の対象物の位置を測定する方法であって、方法が:
少なくとも一つのエッジ検出カメラを有するセンサを提供する工程と;
少なくとも一つのエッジ検出カメラに少なくとも一つのカメラの視野内に位置付けられた対象物のアライメントマークの少なくとも一つの画像を取得させる工程と;
アライメントマークの少なくとも一つの画像に基づいて対象物のアライメントマークの位置を計算する工程と;
計算された位置をロボットマニピュレータのコントローラに通信する工程と
を含む方法。 - 少なくとも一つのエッジカメラの各々に対して構造化イルミネータを提供する工程と、測距のために各カメラ/イルミネータペアを校正するために、構造化照明を使用する工程とをさらに含む、請求項31記載の方法。
- チャックエッジの少なくとも一つのその後の画像を取得するために校正されたセンサを使用する工程をさらに含む、請求項32記載の方法。
- 横方向の(XY)およびレンジ(Z)距離を計算するために、保存された校正情報を使用する工程をさらに含む、請求項31記載の方法。
- 計算された位置を通信する工程が計算された位置を示唆している無線データをロボットマニピュレータのコントローラに送信することを包含する、請求項31記載の方法。
- 少なくとも一つのエッジ検出カメラが四つのエッジ検出カメラを包含し、チャックの位置を計算する工程が各エッジ検出カメラからの少なくとも一つの画像を解析することを包含する、請求項31記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862661944P | 2018-04-24 | 2018-04-24 | |
US62/661,944 | 2018-04-24 | ||
US16/389,354 US11468590B2 (en) | 2018-04-24 | 2019-04-19 | Wireless substrate-like teaching sensor for semiconductor processing |
US16/389,354 | 2019-04-19 | ||
PCT/US2019/028464 WO2019209688A1 (en) | 2018-04-24 | 2019-04-22 | Wireless substrate-like teaching sensor for semiconductor processing |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021521651A true JP2021521651A (ja) | 2021-08-26 |
JP7161236B2 JP7161236B2 (ja) | 2022-10-26 |
Family
ID=68238076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020559518A Active JP7161236B2 (ja) | 2018-04-24 | 2019-04-22 | 半導体処理のための無線基板状ティーチングセンサ |
Country Status (9)
Country | Link |
---|---|
US (1) | US11468590B2 (ja) |
EP (2) | EP3785292A4 (ja) |
JP (1) | JP7161236B2 (ja) |
KR (1) | KR102439438B1 (ja) |
CN (1) | CN112534555A (ja) |
IL (1) | IL278170B1 (ja) |
SG (1) | SG11202010495QA (ja) |
TW (1) | TWI739093B (ja) |
WO (1) | WO2019209688A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11202108483YA (en) * | 2019-02-08 | 2021-09-29 | Lam Res Corp | Substrate location detection and adjustment |
US11295975B2 (en) * | 2019-09-13 | 2022-04-05 | Brooks Automation Us, Llc | Method and apparatus for substrate alignment |
CN111403318B (zh) * | 2020-03-19 | 2023-05-16 | 北京北方华创微电子装备有限公司 | 工艺腔室内晶圆状态的检测方法及装置 |
US11263755B2 (en) * | 2020-07-17 | 2022-03-01 | Nanya Technology Corporation | Alert device and alert method thereof |
JP7526940B2 (ja) * | 2020-09-11 | 2024-08-02 | パナソニックIpマネジメント株式会社 | 情報処理方法及び情報処理装置 |
US11284018B1 (en) * | 2020-09-15 | 2022-03-22 | Applied Materials, Inc. | Smart camera substrate |
US11538702B2 (en) * | 2021-01-04 | 2022-12-27 | Adaptive Plasma Technology Corp. | Apparatus for monitoring an exchanging process of a semiconductor part and a method for the same |
KR20230033129A (ko) * | 2021-08-27 | 2023-03-08 | 삼성전자주식회사 | 티칭 장치 및 이를 이용한 기판 정렬 장치 |
JP2024005400A (ja) * | 2022-06-30 | 2024-01-17 | 株式会社Screenホールディングス | 基板処理装置、搬送教示方法 |
US20240258141A1 (en) * | 2023-01-26 | 2024-08-01 | Applied Materials, Inc. | Methods and apparatus for calibration of substrate processing chamber placement via imaging |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004276151A (ja) * | 2003-03-13 | 2004-10-07 | Yaskawa Electric Corp | 搬送用ロボットおよび搬送用ロボットの教示方法 |
JP2005019963A (ja) * | 2003-06-03 | 2005-01-20 | Tokyo Electron Ltd | 基板処理装置及び基板受け渡し位置の調整方法 |
JP2006522476A (ja) * | 2003-03-11 | 2006-09-28 | アプライド マテリアルズ インコーポレイテッド | ウェーハ担持ロボットを較正するためのビジョンシステムおよび方法 |
JP2009212130A (ja) * | 2008-02-29 | 2009-09-17 | Tokyo Electron Ltd | 搬送手段のティーチング方法、記憶媒体及び基板処理装置 |
WO2009116383A1 (ja) * | 2008-03-17 | 2009-09-24 | 東京エレクトロン株式会社 | 制御装置及び制御方法 |
JP2010087358A (ja) * | 2008-10-01 | 2010-04-15 | Muratec Automation Co Ltd | 搬送システム及びズレ検出用治具 |
KR20130125158A (ko) * | 2012-05-08 | 2013-11-18 | 세메스 주식회사 | 기판 이송 로봇의 자동 티칭 장치를 구비하는 반도체 제조 설비 및 그의 티칭 방법 |
JP2019102728A (ja) * | 2017-12-06 | 2019-06-24 | 東京エレクトロン株式会社 | ティーチング方法 |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5497007A (en) * | 1995-01-27 | 1996-03-05 | Applied Materials, Inc. | Method for automatically establishing a wafer coordinate system |
JP4776783B2 (ja) * | 1999-05-07 | 2011-09-21 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
KR100391264B1 (ko) * | 2001-07-31 | 2003-07-12 | 삼성전자주식회사 | 웨이퍼 절단 장치 |
US7289230B2 (en) * | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
US7053355B2 (en) | 2003-03-18 | 2006-05-30 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
US7100954B2 (en) | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
US9691651B2 (en) * | 2005-01-28 | 2017-06-27 | Brooks Automation, Inc. | Substrate handling system for aligning and orienting substrates during a transfer operation |
TWI297920B (en) * | 2006-02-22 | 2008-06-11 | Advanced Semiconductor Eng | Compact camera module and its substrate |
DE102007018115B4 (de) * | 2006-05-16 | 2009-09-24 | Vistec Semiconductor Systems Gmbh | Verfahren zum Steigern der Messgenauigkeit beim Bestimmen der Koordinaten von Strukturen auf einem Substrat |
DE102007017630B4 (de) * | 2006-05-16 | 2009-08-20 | Vistec Semiconductor Systems Gmbh | Verfahren zum Steigern der Messgenauigkeit beim Bestimmen der Koordinaten von Strukturen auf einem Substrat |
JP5132904B2 (ja) * | 2006-09-05 | 2013-01-30 | 東京エレクトロン株式会社 | 基板位置決め方法,基板位置検出方法,基板回収方法及び基板位置ずれ補正装置 |
JP5236652B2 (ja) | 2006-09-29 | 2013-07-17 | サイバーオプティクス セミコンダクタ インコーポレイテッド | 基板と一体化された粒子センサ |
KR20090051423A (ko) | 2007-11-19 | 2009-05-22 | 세메스 주식회사 | 기판 이송 로봇의 자동 티칭 장치 및 그 방법 |
JP5300431B2 (ja) * | 2008-11-17 | 2013-09-25 | 株式会社日本マイクロニクス | 被検査基板のアライメント装置 |
JP5324231B2 (ja) * | 2009-01-08 | 2013-10-23 | 日東電工株式会社 | 半導体ウエハのアライメント装置 |
JP5445335B2 (ja) | 2010-05-31 | 2014-03-19 | 東京エレクトロン株式会社 | 基板処理装置のデータ取得方法及び基板処理システム |
US10128140B2 (en) | 2012-08-31 | 2018-11-13 | Semiconductor Technologies & Instruments Pte Ltd | System and method for automatically correcting for rotational misalignment of wafers on film frames |
KR101613135B1 (ko) * | 2012-10-29 | 2016-04-18 | 로제 가부시키가이샤 | 반도체 기판의 위치 검출 장치 및 위치 검출 방법 |
SG10201708537XA (en) | 2013-06-07 | 2017-11-29 | Asti Holdings Ltd | Systems and methods for automatically verifying correct die removal from film frames |
US9752992B2 (en) * | 2014-03-25 | 2017-09-05 | Kla-Tencor Corporation | Variable image field curvature for object inspection |
CN108780112A (zh) | 2016-03-11 | 2018-11-09 | 赛博光学公司 | 三维非接触式扫描系统的场校准 |
WO2017169826A1 (ja) | 2016-03-28 | 2017-10-05 | Groove X株式会社 | お出迎え行動する自律行動型ロボット |
JP6584356B2 (ja) * | 2016-03-30 | 2019-10-02 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理装置の処理方法 |
JP6515348B2 (ja) | 2016-05-16 | 2019-05-22 | Jfeスチール株式会社 | 表面検査装置用校正板及び表面検査装置の校正方法 |
DE102017109854A1 (de) * | 2017-05-08 | 2018-11-08 | Wobben Properties Gmbh | Verfahren zur Referenzierung mehrerer Sensoreinheiten und zugehörige Messeinrichtung |
JP6948873B2 (ja) * | 2017-07-31 | 2021-10-13 | 東京エレクトロン株式会社 | 測定器を較正する方法、及び、ケース |
CN113302725A (zh) * | 2019-01-23 | 2021-08-24 | 东丽工程株式会社 | 安装装置和安装方法 |
JP2021015850A (ja) * | 2019-07-10 | 2021-02-12 | 株式会社ディスコ | ウェーハ検査装置 |
JP7418080B2 (ja) * | 2019-10-04 | 2024-01-19 | キヤノン株式会社 | 位置検出装置、位置検出方法、リソグラフィ装置、及び物品の製造方法 |
JP2022011045A (ja) * | 2020-06-29 | 2022-01-17 | キヤノン株式会社 | 搬送装置、基板処理装置、および物品製造方法 |
-
2019
- 2019-04-19 US US16/389,354 patent/US11468590B2/en active Active
- 2019-04-22 SG SG11202010495QA patent/SG11202010495QA/en unknown
- 2019-04-22 TW TW108114000A patent/TWI739093B/zh active
- 2019-04-22 EP EP19793158.7A patent/EP3785292A4/en active Pending
- 2019-04-22 KR KR1020207031063A patent/KR102439438B1/ko active IP Right Grant
- 2019-04-22 EP EP24192696.3A patent/EP4435840A2/en active Pending
- 2019-04-22 JP JP2020559518A patent/JP7161236B2/ja active Active
- 2019-04-22 IL IL278170A patent/IL278170B1/en unknown
- 2019-04-22 WO PCT/US2019/028464 patent/WO2019209688A1/en unknown
- 2019-04-22 CN CN201980028179.2A patent/CN112534555A/zh active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006522476A (ja) * | 2003-03-11 | 2006-09-28 | アプライド マテリアルズ インコーポレイテッド | ウェーハ担持ロボットを較正するためのビジョンシステムおよび方法 |
JP2004276151A (ja) * | 2003-03-13 | 2004-10-07 | Yaskawa Electric Corp | 搬送用ロボットおよび搬送用ロボットの教示方法 |
JP2005019963A (ja) * | 2003-06-03 | 2005-01-20 | Tokyo Electron Ltd | 基板処理装置及び基板受け渡し位置の調整方法 |
JP2009212130A (ja) * | 2008-02-29 | 2009-09-17 | Tokyo Electron Ltd | 搬送手段のティーチング方法、記憶媒体及び基板処理装置 |
WO2009116383A1 (ja) * | 2008-03-17 | 2009-09-24 | 東京エレクトロン株式会社 | 制御装置及び制御方法 |
JP2010087358A (ja) * | 2008-10-01 | 2010-04-15 | Muratec Automation Co Ltd | 搬送システム及びズレ検出用治具 |
KR20130125158A (ko) * | 2012-05-08 | 2013-11-18 | 세메스 주식회사 | 기판 이송 로봇의 자동 티칭 장치를 구비하는 반도체 제조 설비 및 그의 티칭 방법 |
JP2019102728A (ja) * | 2017-12-06 | 2019-06-24 | 東京エレクトロン株式会社 | ティーチング方法 |
Also Published As
Publication number | Publication date |
---|---|
IL278170B1 (en) | 2024-07-01 |
TWI739093B (zh) | 2021-09-11 |
TW202004950A (zh) | 2020-01-16 |
CN112534555A (zh) | 2021-03-19 |
KR102439438B1 (ko) | 2022-09-01 |
US11468590B2 (en) | 2022-10-11 |
IL278170A (ja) | 2020-11-30 |
US20190325601A1 (en) | 2019-10-24 |
WO2019209688A1 (en) | 2019-10-31 |
EP3785292A1 (en) | 2021-03-03 |
KR20210000718A (ko) | 2021-01-05 |
JP7161236B2 (ja) | 2022-10-26 |
EP3785292A4 (en) | 2022-01-05 |
EP4435840A2 (en) | 2024-09-25 |
SG11202010495QA (en) | 2020-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7161236B2 (ja) | 半導体処理のための無線基板状ティーチングセンサ | |
KR100936085B1 (ko) | 무선 기판형 센서 | |
US9352466B2 (en) | Robot positioning system for semiconductor tools | |
KR101163237B1 (ko) | 웨이퍼 운반 로봇을 교정하기 위한 시각화 시스템 및 방법 | |
JP4257570B2 (ja) | 搬送用ロボットのティーチング装置および搬送用ロボットのティーチング方法 | |
KR20190067105A (ko) | 티칭 방법 | |
JP4163950B2 (ja) | セルフティーチングロボット | |
US20030231950A1 (en) | Semiconductor wafer position shift measurement and correction | |
US20050233770A1 (en) | Wireless substrate-like sensor | |
US10537997B2 (en) | Sensor based auto-calibration wafer | |
EP3711908B1 (en) | Calibration device for robot arm | |
JP2007528611A (ja) | 改良型の基板状無線センサ | |
US20050224902A1 (en) | Wireless substrate-like sensor | |
US20050224899A1 (en) | Wireless substrate-like sensor | |
TW202402484A (zh) | 能夠自動教導的晶圓傳送設備 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20201209 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20211209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20211214 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20220304 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220513 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220920 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221006 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7161236 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |