JP2019074724A5 - - Google Patents

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JP2019074724A5
JP2019074724A5 JP2017202857A JP2017202857A JP2019074724A5 JP 2019074724 A5 JP2019074724 A5 JP 2019074724A5 JP 2017202857 A JP2017202857 A JP 2017202857A JP 2017202857 A JP2017202857 A JP 2017202857A JP 2019074724 A5 JP2019074724 A5 JP 2019074724A5
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frequency component
mark
evaluation method
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JP2017202857A
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Japanese (ja)
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JP2019074724A (ja
JP7041489B2 (ja
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Priority to JP2017202857A priority Critical patent/JP7041489B2/ja
Priority claimed from JP2017202857A external-priority patent/JP7041489B2/ja
Priority to KR1020180121161A priority patent/KR102410822B1/ko
Priority to US16/159,909 priority patent/US10943343B2/en
Priority to CN201811199388.7A priority patent/CN109683449B/zh
Publication of JP2019074724A publication Critical patent/JP2019074724A/ja
Publication of JP2019074724A5 publication Critical patent/JP2019074724A5/ja
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JP2017202857A 2017-10-19 2017-10-19 評価方法、決定方法、リソグラフィ装置、およびプログラム Active JP7041489B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017202857A JP7041489B2 (ja) 2017-10-19 2017-10-19 評価方法、決定方法、リソグラフィ装置、およびプログラム
KR1020180121161A KR102410822B1 (ko) 2017-10-19 2018-10-11 평가 방법, 결정 방법, 리소그래피 장치, 및 비일시적 컴퓨터 판독가능 저장 매체
US16/159,909 US10943343B2 (en) 2017-10-19 2018-10-15 Evaluation method, determination method, lithography apparatus, and non-transitory computer-readable storage medium
CN201811199388.7A CN109683449B (zh) 2017-10-19 2018-10-16 评价方法、确定方法、光刻装置和非暂时性计算机可读存储介质

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017202857A JP7041489B2 (ja) 2017-10-19 2017-10-19 評価方法、決定方法、リソグラフィ装置、およびプログラム

Publications (3)

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JP2019074724A JP2019074724A (ja) 2019-05-16
JP2019074724A5 true JP2019074724A5 (enExample) 2020-11-19
JP7041489B2 JP7041489B2 (ja) 2022-03-24

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JP2017202857A Active JP7041489B2 (ja) 2017-10-19 2017-10-19 評価方法、決定方法、リソグラフィ装置、およびプログラム

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US (1) US10943343B2 (enExample)
JP (1) JP7041489B2 (enExample)
KR (1) KR102410822B1 (enExample)
CN (1) CN109683449B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7659388B2 (ja) * 2020-12-08 2025-04-09 キヤノン株式会社 検出装置、検出方法、露光装置、露光システム、物品製造方法、およびプログラム
KR20230088255A (ko) * 2021-12-10 2023-06-19 캐논 가부시끼가이샤 계측 장치, 리소그래피 장치, 및 물품 제조 방법
JP2024092689A (ja) * 2022-12-26 2024-07-08 キヤノン株式会社 成形方法、成形装置、および物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010053600A (ko) * 1998-07-22 2001-06-25 오노 시게오 마크검지방법, 노광방법, 및 디바이스 제조방법, 및마크검지장치, 노광장치, 및 디바이스
WO2000057126A1 (en) 1999-03-24 2000-09-28 Nikon Corporation Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
IL139368A (en) 2000-10-30 2006-12-10 Nova Measuring Instr Ltd Process control for microlithography
JP2003203846A (ja) 2002-01-08 2003-07-18 Canon Inc 位置合わせ方法及びパラメータ選択方法
US7403265B2 (en) * 2005-03-30 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing data filtering
JP4795300B2 (ja) 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
JP5002221B2 (ja) 2006-09-11 2012-08-15 キヤノン株式会社 マークの位置を検出する装置
US8107051B2 (en) * 2006-12-04 2012-01-31 Canon Kabushiki Kaisha Exposure apparatus with improved alignment mark position measurement condition setting feature, and device manufacturing method using the same
JP5132277B2 (ja) 2006-12-04 2013-01-30 キヤノン株式会社 計測装置、露光装置及びデバイス製造方法
JP2011159753A (ja) * 2010-01-29 2011-08-18 Nikon Corp 検出条件最適化方法、プログラム作成方法、及び露光装置
JP2012059853A (ja) 2010-09-08 2012-03-22 Nikon Corp 検出条件最適化方法、プログラム作成方法、並びに露光装置及びマーク検出装置
JP2015015318A (ja) 2013-07-03 2015-01-22 キヤノン株式会社 処理方法、処理装置、リソグラフィ装置、及び物品の製造方法
US10295409B2 (en) * 2016-02-11 2019-05-21 Toshiba Memory Corporation Substrate measurement system, method of measuring substrate, and computer program product

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