JP2019019372A - めっき方法 - Google Patents
めっき方法 Download PDFInfo
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- JP2019019372A JP2019019372A JP2017138475A JP2017138475A JP2019019372A JP 2019019372 A JP2019019372 A JP 2019019372A JP 2017138475 A JP2017138475 A JP 2017138475A JP 2017138475 A JP2017138475 A JP 2017138475A JP 2019019372 A JP2019019372 A JP 2019019372A
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- plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
Abstract
Description
実施形態1に係るめっき方法は、インクジェット印刷により被めっき対象物にめっき用マスクを形成し、めっき用マスクが形成された被めっき対象物にめっき処理を行った後、めっき用マスクを除去する方法である。以下、図1及び図2を参照して、めっき方法について説明する。
次に、図3及び図4を参照して、実施形態2に係るめっき方法について説明する。なお、実施形態2では、重複した記載を避けるべく、実施形態1と異なる部分について説明し、実施形態1と同様の構成である部分については、同じ符号を付して説明する。図3は、実施形態2に係るめっき方法を示すフローチャートである。図4は、実施形態2に係るめっき方法を示す説明図である。
次に、図5及び図6を参照して、実施形態3に係るめっき方法について説明する。なお、実施形態3では、重複した記載を避けるべく、実施形態1及び2と異なる部分について説明し、実施形態1及び2と同様の構成である部分については、同じ符号を付して説明する。図5は、実施形態3に係るめっき方法を示すフローチャートである。図6は、実施形態3に係るめっき方法を示す説明図である。
10 インクジェットヘッド
11 紫外線照射部
12 テーブル(プラテンヒーター)
15 第1めっき用マスク
16 第2めっき用マスク
20 めっき層
21 無電解めっき槽
22 電気めっき槽
30 インクジェットヘッド
31 隆起部
32 紫外線照射部
Claims (6)
- UV硬化型インクをインクジェットヘッドからインク液滴として吐出し、吐出された前記インク液滴を被めっき対象物に着弾させて、前記被めっき対象物にめっきを析出させるための触媒の付着を阻止する第1めっき用マスクを形成する第1マスク形成工程と、
前記第1めっき用マスクが形成された前記被めっき対象物に、前記触媒を付加する触媒付加工程と、
前記インク液滴を、前記第1めっき用マスクに着弾させて、前記第1めっき用マスク上に第2めっき用マスクを形成する第2マスク形成工程と、
前記第2マスク形成工程後、前記被めっき対象物に無電解めっき処理を行うめっき処理工程と、
前記めっき処理工程後、前記被めっき対象物の前記第1めっき用マスク及び前記第2めっき用マスクを除去するマスク除去工程と、を備えることを特徴とするめっき方法。 - 被めっき対象物に、めっきを析出させるための触媒を付加する触媒付加工程と、
UV硬化型インクをインクジェットヘッドからインク液滴として吐出し、吐出された前記インク液滴を被めっき対象物に着弾させて、前記被めっき対象物上にめっき用マスクを形成するマスク形成工程と、
前記マスク形成工程後、前記被めっき対象物にめっき処理を行うめっき処理工程と、
前記めっき処理工程後、前記被めっき対象物の前記めっき用マスクを除去するマスク除去工程と、を備えることを特徴とするめっき方法。 - 前記UV硬化型インクは、
紫外線が照射されることにより重合してUV硬化樹脂となるUV硬化化合物と、
溶剤に溶解する易溶剤溶解材料と、を含む、
UV硬化易溶剤溶解性インクであることを特徴とする請求項1または2に記載のめっき方法。 - 前記UV硬化型インクは、
前記UV硬化化合物に対して相溶性を有する有機溶剤を、さらに含む、
SUV硬化易溶剤溶解性インクであることを特徴とする請求項3に記載のめっき方法。 - 前記触媒付加工程前に、前記被めっき対象物に、粗面化処理を行う粗面化処理工程を、さらに備えることを特徴とする請求項1から4のいずれか1項に記載のめっき方法。
- 前記触媒付加工程は、湿式処理であり、
前記めっき処理工程は、湿式処理であることを特徴とする請求項1から5のいずれか1項に記載のめっき方法。
Priority Applications (2)
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JP2017138475A JP6993801B2 (ja) | 2017-07-14 | 2017-07-14 | めっき方法 |
US16/024,913 US10689761B2 (en) | 2017-07-14 | 2018-07-02 | Plating method |
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JP2017138475A JP6993801B2 (ja) | 2017-07-14 | 2017-07-14 | めっき方法 |
Publications (2)
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JP2019019372A true JP2019019372A (ja) | 2019-02-07 |
JP6993801B2 JP6993801B2 (ja) | 2022-01-14 |
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JP2017138475A Active JP6993801B2 (ja) | 2017-07-14 | 2017-07-14 | めっき方法 |
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US (1) | US10689761B2 (ja) |
JP (1) | JP6993801B2 (ja) |
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JP2022167356A (ja) * | 2021-04-23 | 2022-11-04 | トヨタ自動車株式会社 | 溶射方法、被溶射体ユニット |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07212008A (ja) * | 1994-01-25 | 1995-08-11 | Matsushita Electric Works Ltd | 回路板の形成方法 |
JPH1075034A (ja) * | 1996-06-12 | 1998-03-17 | Internatl Business Mach Corp <Ibm> | コンフォーマル・プレーティング用の基板表面の調製方法 |
JP2007291422A (ja) * | 2006-04-21 | 2007-11-08 | Hitachi Maxell Ltd | ポリマー基材のメッキ膜の形成方法及びポリマー基材 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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US590518A (en) * | 1897-09-21 | Coin-controlled apparatus | ||
JPH0694592B2 (ja) * | 1986-04-22 | 1994-11-24 | 日産化学工業株式会社 | 無電解メッキ法 |
US4940608A (en) * | 1988-11-07 | 1990-07-10 | Okuno Chemical Industry Co., Ltd. | Local electroless plating process for plastics |
JP3591767B2 (ja) | 1998-12-01 | 2004-11-24 | 帝国インキ製造株式会社 | プリント配線板の製造方法 |
US20060257633A1 (en) * | 2005-04-27 | 2006-11-16 | Hitachi Maxell, Ltd. | Method for modifying surface of polymer substrate, method for forming plated film on polymer substrate, method for producing polymer member, and coating member |
JP2007057749A (ja) | 2005-08-24 | 2007-03-08 | Seiko Epson Corp | フォトマスク、金属層の製造方法 |
JP2010098232A (ja) | 2008-10-20 | 2010-04-30 | Sharp Corp | 太陽電池および太陽電池の製造方法 |
CN102821960B (zh) | 2010-02-10 | 2014-12-03 | 株式会社御牧工程 | 喷墨打印机 |
JP2012210715A (ja) | 2011-03-30 | 2012-11-01 | Kimoto & Co Ltd | 金属箔の転写方法 |
CN104151938A (zh) | 2014-07-17 | 2014-11-19 | 广东致卓精密金属科技有限公司 | 基于喷墨打印技术的紫外光固化型活化剂的制备方法及利用该活化剂进行活化处理的工艺 |
US9699914B2 (en) | 2014-10-20 | 2017-07-04 | Averatek Corporation | Patterning of electroless metals by selective deactivation of catalysts |
JP2016193565A (ja) | 2015-04-01 | 2016-11-17 | 株式会社ミマキエンジニアリング | 印刷方法、スクリーン版の形成方法、スクリーン版およびスクリーン印刷装置 |
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- 2017-07-14 JP JP2017138475A patent/JP6993801B2/ja active Active
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2018
- 2018-07-02 US US16/024,913 patent/US10689761B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07212008A (ja) * | 1994-01-25 | 1995-08-11 | Matsushita Electric Works Ltd | 回路板の形成方法 |
JPH1075034A (ja) * | 1996-06-12 | 1998-03-17 | Internatl Business Mach Corp <Ibm> | コンフォーマル・プレーティング用の基板表面の調製方法 |
JP2007291422A (ja) * | 2006-04-21 | 2007-11-08 | Hitachi Maxell Ltd | ポリマー基材のメッキ膜の形成方法及びポリマー基材 |
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Publication number | Publication date |
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US10689761B2 (en) | 2020-06-23 |
US20190017173A1 (en) | 2019-01-17 |
JP6993801B2 (ja) | 2022-01-14 |
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