JP2018527631A - 緩衝層を含む光学コーティング - Google Patents
緩衝層を含む光学コーティング Download PDFInfo
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- 230000003287 optical effect Effects 0.000 title claims abstract description 136
- 238000000576 coating method Methods 0.000 title claims abstract description 89
- 239000011248 coating agent Substances 0.000 title claims abstract description 86
- 239000000758 substrate Substances 0.000 claims abstract description 70
- 239000011521 glass Substances 0.000 claims abstract description 45
- 239000003989 dielectric material Substances 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims description 42
- 230000008021 deposition Effects 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 24
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 12
- 230000005670 electromagnetic radiation Effects 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 8
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 8
- 230000003685 thermal hair damage Effects 0.000 claims description 7
- 150000002222 fluorine compounds Chemical class 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims description 4
- 210000002381 plasma Anatomy 0.000 description 68
- 230000004888 barrier function Effects 0.000 description 23
- 239000000463 material Substances 0.000 description 21
- 230000007423 decrease Effects 0.000 description 9
- 230000006378 damage Effects 0.000 description 8
- 238000002310 reflectometry Methods 0.000 description 8
- 238000012856 packing Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 239000006117 anti-reflective coating Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- -1 SrF 2 Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
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- 230000003595 spectral effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910016569 AlF 3 Inorganic materials 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract
Description
光学系構成部品において、
着色可能なガラス基体、
第1と第2の誘電材料の交互に重なった層を含む光学コーティング、および
前記着色可能なガラス基体と前記光学コーティングとの間で該基体上に配置された緩衝層であって、第3の誘電材料から作られ、厚さが約20nm未満の緩衝層、
を備えた光学系構成部品。
前記着色可能なガラス基体が少なくとも1種類のフッ化物を含み、前記光学系構成部品が光学レンズとして構成されている、実施形態1に記載の光学系構成部品。
前記緩衝層がSiO2から作られ、該緩衝層の厚さが約5nmと約15nmの間である、実施形態1に記載の光学系構成部品。
前記緩衝層および前記光学コーティングを有する前記着色可能なガラス基体が、約400nmから約900nmの電磁波長に亘り約0.2%未満の電磁放射線の透過率損失を有する、実施形態3に記載の光学系構成部品。
前記光学コーティングが、SiO2と、Ta2O5、Nb2O5、TiO2、およびHfO2の少なくとも1つとの交互に重なった層を含む、実施形態1に記載の光学系構成部品。
前記ガラス基板の溶融温度が約500℃未満である、実施形態1に記載の光学系構成部品。
光学系構成部品を形成する方法において、
1種類以上のフッ化物を含み、熱損傷閾値を有するガラス基体を提供する工程、
前記ガラス基体上に第1のプラズマバイアス電圧でプラズマ蒸着によって光学コーティングの第1の層の第1の部分を蒸着する工程、
前記第1の部分上に、前記第1のプラズマバイアス電圧より大きい第2のプラズマバイアス電圧でプラズマ蒸着によって前記光学コーティングの前記第1の層の第2の部分を蒸着する工程、および
前記第1の層上に前記光学コーティングの第2の層を蒸着する工程、
を有してなる方法。
前記ガラス基体の熱損傷閾値が約500℃未満である、実施形態7に記載の方法。
前記第1のプラズマバイアス電圧が約50Vと約90Vの間である、実施形態8に記載の方法。
前記第1の層が、約2.0超の屈折率を有する材料から作られている、実施形態7に記載の方法。
前記第1の部分の厚さが約5nmと約10nmの間であり、前記第1の層の全厚が約20nm超である、実施形態7に記載の方法。
前記第1の層の前記第1の部分と第2の部分が同じ誘電材料から作られている、実施形態11に記載の方法。
前記光学コーティングが交互に重なった誘電材料の層を含み、前記第1の層がTa2O5、Nb2O5、TiO2、およびHfO2の少なくとも1つから作られ、前記第2の層がSiO2から作られている、実施形態7に記載の方法。
前記光学コーティングを有する前記ガラス基体が、約350nmから約800nmの電磁波長に亘り約0.1%未満の電磁放射線の透過率損失を有する、実施形態7に記載の方法。
光学コーティングを形成する方法において、
ガラス基体を提供する工程、
第1のプラズマバイアス電圧でプラズマ蒸着によって前記基体上に緩衝層を蒸着する工程、および
第2のプラズマバイアス電圧でプラズマ蒸着によって前記緩衝層上に光学コーティングの少なくとも1つの層を蒸着する工程、
を有してなり、
前記第2のプラズマバイアス電圧は前記第1のプラズマバイアス電圧より大きいものである方法。
前記第1のプラズマバイアス電圧が約50Vから約90Vに及び、前記第2のプラズマバイアス電圧が約100Vから約140Vに及ぶ、実施形態15に記載の方法。
前記ガラス基体が少なくとも1種類のフッ化物を含む、実施形態16に記載の方法。
前記緩衝層の充填密度が約94%超である、実施形態17に記載の方法。
前記緩衝層および前記光学コーティングの少なくとも一方が、前記ガラス基体に亘り不均一な厚さを有する、実施形態18に記載の方法。
前記緩衝層および前記光学コーティングの少なくとも1つの層が同じ材料から作られている、実施形態19に記載の方法。
14 ガラス基体
18 光学コーティング
18A、18B 誘電体層
22 緩衝層
30 障壁層
34 標準層
Claims (11)
- 光学系構成部品において、
着色可能なガラス基体、
第1と第2の誘電材料の交互に重なった層を含む光学コーティング、および
前記着色可能なガラス基体と前記光学コーティングとの間で該基体上に配置された緩衝層であって、第3の誘電材料から作られ、厚さが約20nm未満の緩衝層、
を備えた光学系構成部品。 - 前記着色可能なガラス基体が少なくとも1種類のフッ化物を含み、前記光学系構成部品が光学レンズとして構成されている、請求項1記載の光学系構成部品。
- 前記緩衝層がSiO2から作られ、該緩衝層の厚さが約5nmと約15nmの間である、請求項1記載の光学系構成部品。
- 前記緩衝層および前記光学コーティングを有する前記着色可能なガラス基体が、約400nmから約900nmの電磁波長に亘り約0.2%未満の電磁放射線の透過率損失を有する、請求項3記載の光学系構成部品。
- 前記光学コーティングが、SiO2と、Ta2O5、Nb2O5、TiO2、およびHfO2の少なくとも1つとの交互に重なった層を含む、請求項1記載の光学系構成部品。
- 前記ガラス基板の溶融温度が約500℃未満である、請求項1記載の光学系構成部品。
- 光学系構成部品を形成する方法において、
1種類以上のフッ化物を含み、熱損傷閾値を有するガラス基体を提供する工程、
前記ガラス基体上に第1のプラズマバイアス電圧でプラズマ蒸着によって光学コーティングの第1の層の第1の部分を蒸着する工程、
前記第1の部分上に、前記第1のプラズマバイアス電圧より大きい第2のプラズマバイアス電圧でプラズマ蒸着によって前記光学コーティングの前記第1の層の第2の部分を蒸着する工程、および
前記第1の層上に前記光学コーティングの第2の層を蒸着する工程、
を有してなる方法。 - 前記ガラス基体の熱損傷閾値が約500℃未満である、請求項7記載の方法。
- 前記第1のプラズマバイアス電圧が約50Vと約90Vの間である、請求項8記載の方法。
- 光学コーティングを形成する方法において、
ガラス基体を提供する工程、
第1のプラズマバイアス電圧でプラズマ蒸着によって前記基体上に緩衝層を蒸着する工程、および
第2のプラズマバイアス電圧でプラズマ蒸着によって前記緩衝層上に光学コーティングの少なくとも1つの層を蒸着する工程、
を有してなり、
前記第2のプラズマバイアス電圧は前記第1のプラズマバイアス電圧より大きいものである方法。 - 前記第1のプラズマバイアス電圧が約50Vから約90Vに及び、前記第2のプラズマバイアス電圧が約100Vから約140Vに及ぶ、請求項10記載の方法。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021534457A (ja) * | 2018-10-24 | 2021-12-09 | サン−ゴバン グラス フランス | サイドペインを備える乗物用投影アセンブリ |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10162083B2 (en) * | 2015-09-23 | 2018-12-25 | Apple Inc. | Transparent buffer layer for maintaining coated glass bend strength |
DE102017105372B4 (de) * | 2017-03-14 | 2022-05-25 | Schott Ag | Transparentes Element mit einer Antireflex-Beschichtung und Verfahren zu dessen Herstellung |
US10353123B2 (en) | 2017-08-08 | 2019-07-16 | Apple Inc. | Electronic Devices with glass layer coatings |
US11230098B2 (en) | 2018-05-11 | 2022-01-25 | Hewlett-Packard Development Company, L.P. | Passivation stacks |
US20220357796A1 (en) * | 2019-06-25 | 2022-11-10 | Harman Becker Automotive Systems Gmbh | Touch panel with haptical feedback and reduced reflection |
CN111443406B (zh) * | 2020-05-13 | 2021-06-15 | 温州大学 | 一种提高光学薄膜元件抗激光损伤能力的方法 |
CN113703078B (zh) * | 2021-08-31 | 2022-06-07 | 重庆文理学院 | 一种可见光区宽带增透膜及其制备方法 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4285730A (en) * | 1979-10-05 | 1981-08-25 | Corning Glass Works | Moldable glasses |
DE3942990A1 (de) * | 1989-12-19 | 1991-06-20 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags |
JPH1195003A (ja) * | 1997-09-16 | 1999-04-09 | Canon Inc | 光学部品並びにその製造方法 |
JP2003114303A (ja) * | 2001-10-04 | 2003-04-18 | Olympus Optical Co Ltd | 光学薄膜の製造方法及び光学薄膜 |
US20070099001A1 (en) * | 2005-10-27 | 2007-05-03 | Cymer, Inc. | Blister resistant optical coatings |
JP2007156321A (ja) * | 2005-12-08 | 2007-06-21 | Seiko Epson Corp | 光学多層膜フィルタの製造方法 |
US20090075092A1 (en) * | 2007-09-18 | 2009-03-19 | Guardian Industries Corp. | Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same |
JP2015022187A (ja) * | 2013-07-19 | 2015-02-02 | リコーイメージング株式会社 | 反射防止膜、それを用いた光学部材、及び光学機器 |
WO2015042157A1 (en) * | 2013-09-18 | 2015-03-26 | Guardian Industries Corp. | Dielectric mirror |
WO2015130630A1 (en) * | 2014-02-27 | 2015-09-03 | Corning Incorporated | Durability coating for oxide films for metal fluoride optics |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61193469A (ja) * | 1985-02-20 | 1986-08-27 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
JPH01221914A (ja) * | 1988-02-29 | 1989-09-05 | Nec Corp | 静電誘導トランジスタの励振回路 |
JPH0289346A (ja) * | 1988-09-27 | 1990-03-29 | Toshiba Corp | 半導体装置及びその製造方法 |
JPH07130739A (ja) * | 1993-10-29 | 1995-05-19 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US5789040A (en) * | 1997-05-21 | 1998-08-04 | Optical Coating Laboratory, Inc. | Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition |
US6495202B1 (en) * | 1999-09-08 | 2002-12-17 | Nikon Corporation | Method for manufacturing an optical element containing fluoride in at least its surface portions |
DE19962144A1 (de) | 1999-12-22 | 2001-06-28 | Schott Desag Ag | UV-reflektierendes Interferenzschichtsystem |
US7033679B2 (en) * | 2001-01-25 | 2006-04-25 | Kyocera Optec Co., Ltd. | Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film |
US20030202770A1 (en) * | 2002-01-03 | 2003-10-30 | Garito Anthony F. | Optical waveguide amplifiers |
EP1598681A3 (de) * | 2004-05-17 | 2006-03-01 | Carl Zeiss SMT AG | Optische Komponente mit gekrümmter Oberfläche und Mehrlagenbeschichtung |
JP2007171735A (ja) | 2005-12-26 | 2007-07-05 | Epson Toyocom Corp | 広帯域反射防止膜 |
US20080185041A1 (en) * | 2007-02-02 | 2008-08-07 | Guardian Industries Corp. | Method of making a photovoltaic device with antireflective coating containing porous silica and resulting product |
DE102007020266B3 (de) * | 2007-04-30 | 2008-11-13 | Advanced Micro Devices, Inc., Sunnyvale | Halbleiterstruktur mit einem elektrisch leitfähigen Strukturelement und Verfahren zu ihrer Herstellung |
JP2010537230A (ja) * | 2007-08-16 | 2010-12-02 | ダウ コーニング コーポレーション | 炭化ケイ素系の層を用いて形成した二色性フィルター |
US8399110B2 (en) | 2008-05-29 | 2013-03-19 | Corning Incorporated | Adhesive, hermetic oxide films for metal fluoride optics and method of making same |
CN101640175B (zh) * | 2008-07-31 | 2012-10-10 | 中芯国际集成电路制造(北京)有限公司 | 半导体结构的制造方法 |
US20100180950A1 (en) * | 2008-11-14 | 2010-07-22 | University Of Connecticut | Low-temperature surface doping/alloying/coating of large scale semiconductor nanowire arrays |
US20120307353A1 (en) * | 2011-05-31 | 2012-12-06 | Horst Schreiber | DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS |
WO2013082079A2 (en) * | 2011-11-29 | 2013-06-06 | Corning Incorporated | Yttrium oxide coated optical elements with improved mid-infrared performance |
EP2816379A4 (en) * | 2012-02-17 | 2015-09-23 | Nikon Essilor Co Ltd | OPTICAL COMPONENT, GLASSES OF GLASSES, AND METHODS OF MAKING SAME |
US9164309B2 (en) | 2012-05-25 | 2015-10-20 | Apple Inc. | Display with broadband antireflection film |
US9201172B2 (en) * | 2012-09-14 | 2015-12-01 | Ricoh Imaging Company, Ltd. | Anti-reflection coating, optical member having it, and optical equipment comprising such optical member |
-
2016
- 2016-08-29 US US15/250,076 patent/US20170066684A1/en not_active Abandoned
- 2016-09-08 EP EP16775367.2A patent/EP3347746B1/en active Active
- 2016-09-08 WO PCT/US2016/050652 patent/WO2017044549A1/en active Application Filing
- 2016-09-08 JP JP2018531313A patent/JP2018527631A/ja active Pending
-
2017
- 2017-05-12 US US15/593,961 patent/US10131571B2/en active Active
-
2020
- 2020-11-19 JP JP2020192296A patent/JP2021047422A/ja active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4285730A (en) * | 1979-10-05 | 1981-08-25 | Corning Glass Works | Moldable glasses |
DE3942990A1 (de) * | 1989-12-19 | 1991-06-20 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags |
JPH1195003A (ja) * | 1997-09-16 | 1999-04-09 | Canon Inc | 光学部品並びにその製造方法 |
JP2003114303A (ja) * | 2001-10-04 | 2003-04-18 | Olympus Optical Co Ltd | 光学薄膜の製造方法及び光学薄膜 |
US20070099001A1 (en) * | 2005-10-27 | 2007-05-03 | Cymer, Inc. | Blister resistant optical coatings |
JP2007156321A (ja) * | 2005-12-08 | 2007-06-21 | Seiko Epson Corp | 光学多層膜フィルタの製造方法 |
US20090075092A1 (en) * | 2007-09-18 | 2009-03-19 | Guardian Industries Corp. | Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same |
JP2015022187A (ja) * | 2013-07-19 | 2015-02-02 | リコーイメージング株式会社 | 反射防止膜、それを用いた光学部材、及び光学機器 |
WO2015042157A1 (en) * | 2013-09-18 | 2015-03-26 | Guardian Industries Corp. | Dielectric mirror |
WO2015130630A1 (en) * | 2014-02-27 | 2015-09-03 | Corning Incorporated | Durability coating for oxide films for metal fluoride optics |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021534457A (ja) * | 2018-10-24 | 2021-12-09 | サン−ゴバン グラス フランス | サイドペインを備える乗物用投影アセンブリ |
JP7192091B2 (ja) | 2018-10-24 | 2022-12-19 | サン-ゴバン グラス フランス | サイドペインを備える乗物用投影アセンブリ |
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