JP2018518060A5 - - Google Patents

Download PDF

Info

Publication number
JP2018518060A5
JP2018518060A5 JP2018508613A JP2018508613A JP2018518060A5 JP 2018518060 A5 JP2018518060 A5 JP 2018518060A5 JP 2018508613 A JP2018508613 A JP 2018508613A JP 2018508613 A JP2018508613 A JP 2018508613A JP 2018518060 A5 JP2018518060 A5 JP 2018518060A5
Authority
JP
Japan
Prior art keywords
semiconductor processing
heating
brazing layer
step includes
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018508613A
Other languages
English (en)
Japanese (ja)
Other versions
JP6903262B2 (ja
JP2018518060A (ja
Filing date
Publication date
Priority claimed from US15/133,934 external-priority patent/US9999947B2/en
Application filed filed Critical
Publication of JP2018518060A publication Critical patent/JP2018518060A/ja
Publication of JP2018518060A5 publication Critical patent/JP2018518060A5/ja
Application granted granted Critical
Publication of JP6903262B2 publication Critical patent/JP6903262B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018508613A 2015-05-01 2016-04-22 半導体処理に使用される機器部品を修理する方法 Active JP6903262B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201562155598P 2015-05-01 2015-05-01
US62/155,598 2015-05-01
US201562249559P 2015-11-02 2015-11-02
US62/249,559 2015-11-02
US15/133,934 2016-04-20
US15/133,934 US9999947B2 (en) 2015-05-01 2016-04-20 Method for repairing heaters and chucks used in semiconductor processing
PCT/US2016/029057 WO2016178839A1 (en) 2015-05-01 2016-04-22 Method for repairing an equipment piece used in semiconductor processing

Publications (3)

Publication Number Publication Date
JP2018518060A JP2018518060A (ja) 2018-07-05
JP2018518060A5 true JP2018518060A5 (enExample) 2019-05-30
JP6903262B2 JP6903262B2 (ja) 2021-07-14

Family

ID=57218559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018508613A Active JP6903262B2 (ja) 2015-05-01 2016-04-22 半導体処理に使用される機器部品を修理する方法

Country Status (6)

Country Link
US (2) US9999947B2 (enExample)
EP (1) EP3288914B1 (enExample)
JP (1) JP6903262B2 (enExample)
KR (1) KR102555798B1 (enExample)
CN (1) CN107735386B (enExample)
WO (1) WO2016178839A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6650313B2 (ja) * 2016-03-25 2020-02-19 日本特殊陶業株式会社 基板支持部材の補修方法
EP3602603A4 (en) * 2017-03-21 2020-12-30 Component Re-Engineering Company Inc. CERAMIC MATERIAL KIT FOR USE IN HIGHLY CORROSIVE OR EROSIVE SEMICONDUCTOR TREATMENT APPLICATIONS
KR102558926B1 (ko) * 2017-08-25 2023-07-21 와틀로 일렉트릭 매뉴팩츄어링 컴파니 다수의 전극들을 갖는 반도체 기판 지지부 및 이를 제조하기 위한 방법
US11648620B2 (en) * 2017-11-29 2023-05-16 Watlow Electric Manufacturing Company Semiconductor processing equipment with high temperature resistant nickel alloy joints and methods for making same
US10882130B2 (en) 2018-04-17 2021-01-05 Watlow Electric Manufacturing Company Ceramic-aluminum assembly with bonding trenches
US10892175B2 (en) 2018-07-26 2021-01-12 Samsung Electronics Co., Ltd. Stable heater rebuild inspection and maintenance platform
CN113574653B (zh) * 2019-03-14 2025-04-22 朗姆研究公司 层状陶瓷结构
KR102322926B1 (ko) * 2020-03-04 2021-11-08 손욱철 정전 척 어셈블리의 재생 방법
US12120257B2 (en) * 2020-04-07 2024-10-15 Amosense Co., Ltd. Folding plate and manufacturing method therefor
KR102492500B1 (ko) * 2021-02-24 2023-01-31 (주)티티에스 지그를 통한 질화알루미늄 히터 리페어 장치
CN116060847B (zh) * 2023-03-07 2023-06-16 天津伍嘉联创科技发展股份有限公司 封口环与陶瓷座自动预装设备

Family Cites Families (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3057932B2 (ja) 1992-10-01 2000-07-04 三菱マテリアル株式会社 セラミックス焼結体の接合方法
US5392981A (en) 1993-12-06 1995-02-28 Regents Of The University Of California Fabrication of boron sputter targets
US5463526A (en) * 1994-01-21 1995-10-31 Lam Research Corporation Hybrid electrostatic chuck
JP3082624B2 (ja) * 1994-12-28 2000-08-28 住友金属工業株式会社 静電チャックの使用方法
EP0753494B1 (en) 1995-07-14 2002-03-20 Ngk Insulators, Ltd. Method of joining ceramics
JP3253002B2 (ja) * 1995-12-27 2002-02-04 東京エレクトロン株式会社 処理装置
JP3316167B2 (ja) 1996-10-08 2002-08-19 日本碍子株式会社 窒化アルミニウム質基材の接合体の製造方法およびこれに使用する接合助剤
KR100267784B1 (ko) * 1996-12-26 2001-04-02 김영환 정전척의 정전력 회복방법
US6261703B1 (en) 1997-05-26 2001-07-17 Sumitomo Electric Industries, Ltd. Copper circuit junction substrate and method of producing the same
US6364957B1 (en) * 1997-10-09 2002-04-02 Applied Materials, Inc. Support assembly with thermal expansion compensation
JP3987201B2 (ja) 1998-05-01 2007-10-03 日本碍子株式会社 接合体の製造方法
US6117349A (en) * 1998-08-28 2000-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Composite shadow ring equipped with a sacrificial inner ring
US6490146B2 (en) 1999-05-07 2002-12-03 Applied Materials Inc. Electrostatic chuck bonded to base with a bond layer and method
DE19946645B4 (de) * 1999-09-29 2012-01-26 Protec Carrier Systems Gmbh Verfahren zum Ablösen eines Foliensystems von einem elektrostatischen Haltesystem
JP2002076214A (ja) 2000-08-28 2002-03-15 Toshiba Corp 絶縁基板、その製造方法、およびそれを用いた半導体装置
JP2002293655A (ja) 2001-03-29 2002-10-09 Ngk Insulators Ltd 金属端子とセラミック部材との接合構造、金属部材とセラミック部材との接合構造および金属端子とセラミック部材との接合材
US6483690B1 (en) * 2001-06-28 2002-11-19 Lam Research Corporation Ceramic electrostatic chuck assembly and method of making
CN1484855A (zh) 2001-08-10 2004-03-24 揖斐电株式会社 陶瓷接合体
JP2003264223A (ja) * 2002-03-08 2003-09-19 Rasa Ind Ltd 静電チャック部品および静電チャック装置およびその製造方法
EP1484787A1 (en) 2002-03-13 2004-12-08 Sumitomo Electric Industries, Ltd. Holder for semiconductor production system
MY137585A (en) * 2003-03-19 2009-02-27 Systems On Silicon Mfg Company Pte Ltd A method of repairing a pedestal surface
JP2004349664A (ja) * 2003-05-23 2004-12-09 Creative Technology:Kk 静電チャック
EP1635388A4 (en) * 2003-06-17 2009-10-21 Creative Tech Corp DIPOLAR ELECTROSTATIC CLAMPING DEVICE
JP4008401B2 (ja) 2003-09-22 2007-11-14 日本碍子株式会社 基板載置台の製造方法
US7098428B1 (en) 2004-02-04 2006-08-29 Brent Elliot System and method for an improved susceptor
KR101211576B1 (ko) 2004-11-04 2012-12-12 마이크로칩스 인코포레이티드 압축 및 냉간 용접 밀봉 방법 및 장치
US20060096946A1 (en) * 2004-11-10 2006-05-11 General Electric Company Encapsulated wafer processing device and process for making thereof
JP2006216444A (ja) * 2005-02-04 2006-08-17 Shin Etsu Chem Co Ltd セラミックヒーターの修復方法
JP4425850B2 (ja) * 2005-11-07 2010-03-03 日本碍子株式会社 基板載置部材の分離方法及び再利用方法
US20070169703A1 (en) 2006-01-23 2007-07-26 Brent Elliot Advanced ceramic heater for substrate processing
US20080087710A1 (en) 2006-06-06 2008-04-17 The Regents Of The University Of California RAPID, REDUCED TEMPERATURE JOINING OF ALUMINA CERAMICS WITH Ni/Nb/Ni INTERLAYERS
JP5019811B2 (ja) * 2006-07-20 2012-09-05 東京エレクトロン株式会社 静電吸着電極の補修方法
JP5087561B2 (ja) * 2007-02-15 2012-12-05 株式会社クリエイティブ テクノロジー 静電チャック
US8108981B2 (en) * 2007-07-31 2012-02-07 Applied Materials, Inc. Method of making an electrostatic chuck with reduced plasma penetration and arcing
US7848076B2 (en) * 2007-07-31 2010-12-07 Applied Materials, Inc. Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing
US9202736B2 (en) * 2007-07-31 2015-12-01 Applied Materials, Inc. Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing
US8022718B2 (en) * 2008-02-29 2011-09-20 Lam Research Corporation Method for inspecting electrostatic chucks with Kelvin probe analysis
US9543181B2 (en) * 2008-07-30 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Replaceable electrostatic chuck sidewall shield
JP5063520B2 (ja) * 2008-08-01 2012-10-31 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
US8291565B2 (en) * 2008-10-10 2012-10-23 Lam Research Corporation Method of refurbishing bipolar electrostatic chuck
US9218997B2 (en) * 2008-11-06 2015-12-22 Applied Materials, Inc. Electrostatic chuck having reduced arcing
JP5193886B2 (ja) * 2009-01-14 2013-05-08 株式会社巴川製紙所 静電チャック装置の補修方法および補修装置、ならびに静電チャック装置
JP2011017078A (ja) 2009-06-10 2011-01-27 Denso Corp 溶射膜の形成方法
US8597448B2 (en) * 2009-12-29 2013-12-03 Novellus Systems, Inc. Electrostatic chucks and methods for refurbishing same
CN102906051A (zh) 2010-05-21 2013-01-30 塞拉麦泰克股份有限公司 陶瓷对陶瓷接合件及相关方法
JP5454803B2 (ja) * 2010-08-11 2014-03-26 Toto株式会社 静電チャック
SG188434A1 (en) * 2010-09-08 2013-05-31 Entegris Inc High conductivity electrostatic chuck
US9969022B2 (en) * 2010-09-28 2018-05-15 Applied Materials, Inc. Vacuum process chamber component and methods of making
US20120154974A1 (en) * 2010-12-16 2012-06-21 Applied Materials, Inc. High efficiency electrostatic chuck assembly for semiconductor wafer processing
CN103493194B (zh) * 2011-06-02 2016-05-18 应用材料公司 静电夹盘的氮化铝电介质修复
JP5725455B2 (ja) * 2011-06-08 2015-05-27 国立大学法人 東京大学 複合材構造体の埋込光ファイバ修理方法と修理構造
US9054148B2 (en) * 2011-08-26 2015-06-09 Lam Research Corporation Method for performing hot water seal on electrostatic chuck
US8684256B2 (en) * 2011-11-30 2014-04-01 Component Re-Engineering Company, Inc. Method for hermetically joining plate and shaft devices including ceramic materials used in semiconductor processing
US8932690B2 (en) * 2011-11-30 2015-01-13 Component Re-Engineering Company, Inc. Plate and shaft device
KR102304432B1 (ko) * 2012-09-19 2021-09-17 어플라이드 머티어리얼스, 인코포레이티드 기판들을 접합하기 위한 방법들
US9105676B2 (en) * 2012-09-21 2015-08-11 Lam Research Corporation Method of removing damaged epoxy from electrostatic chuck
CN103794445B (zh) * 2012-10-29 2016-03-16 中微半导体设备(上海)有限公司 用于等离子体处理腔室的静电夹盘组件及制造方法
US9669653B2 (en) * 2013-03-14 2017-06-06 Applied Materials, Inc. Electrostatic chuck refurbishment
KR101784227B1 (ko) * 2013-03-15 2017-10-11 어플라이드 머티어리얼스, 인코포레이티드 정전 척의 수리 및 복원을 위한 방법 및 장치
US9543183B2 (en) * 2013-04-01 2017-01-10 Fm Industries, Inc. Heated electrostatic chuck and semiconductor wafer heater and methods for manufacturing same
KR101876501B1 (ko) * 2013-08-05 2018-07-10 어플라이드 머티어리얼스, 인코포레이티드 인-시츄 제거 가능한 정전 척
US9580806B2 (en) * 2013-08-29 2017-02-28 Applied Materials, Inc. Method of processing a substrate support assembly
KR101385950B1 (ko) * 2013-09-16 2014-04-16 주식회사 펨빅스 정전척 및 정전척 제조 방법
TW201518538A (zh) * 2013-11-11 2015-05-16 Applied Materials Inc 像素化冷卻溫度控制的基板支撐組件
US11158526B2 (en) * 2014-02-07 2021-10-26 Applied Materials, Inc. Temperature controlled substrate support assembly
US9472410B2 (en) * 2014-03-05 2016-10-18 Applied Materials, Inc. Pixelated capacitance controlled ESC
JP6326295B2 (ja) * 2014-06-04 2018-05-16 東京エレクトロン株式会社 冷却処理装置、及び、冷却処理装置の運用方法
WO2016014138A1 (en) * 2014-07-23 2016-01-28 Applied Materials, Inc. Tunable temperature controlled substrate support assembly
US10471531B2 (en) * 2014-12-31 2019-11-12 Component Re-Engineering Company, Inc. High temperature resistant silicon joint for the joining of ceramics
US10020218B2 (en) * 2015-11-17 2018-07-10 Applied Materials, Inc. Substrate support assembly with deposited surface features

Similar Documents

Publication Publication Date Title
JP2018518060A5 (enExample)
JP6903262B2 (ja) 半導体処理に使用される機器部品を修理する方法
KR101345482B1 (ko) 가열 장치
CN104823274A (zh) 具有金属接合保护层的基板支撑组件
JP5202175B2 (ja) シャフト付きヒータ
CN104937710B (zh) 具有受控的密封间隙的基板支撑件
CN105392758B (zh) 陶瓷板与金属制圆筒部件的接合结构
JP2014068011A5 (enExample)
JP2018537002A5 (enExample)
WO2017101480A1 (zh) 一种钢化真空玻璃的制作方法及其生产线
CN108715997A (zh) 金刚石膜-铜复合散热片的制备方法
RU2696910C2 (ru) Распыляемая мишень
TWI614079B (zh) 接合機加熱冷卻裝置及其製作方法
JP6598132B1 (ja) 成膜構造体の再生方法および再生成膜構造体
CN105174991B (zh) 一种激光熔敷技术用于连接陶瓷与金属的方法
JP2014187213A (ja) 吸着部材、これを用いた真空吸着装置および冷却装置ならびに吸着部材の製造方法
KR20160000970A (ko) 반도체 제조장치용 히터의 제조방법 및 히터 손상부위 처리방법
JP6650313B2 (ja) 基板支持部材の補修方法
JP6287462B2 (ja) プラズマ処理装置用電極板及びその製造方法
KR102001051B1 (ko) 이그조 스퍼터링 타겟의 재생방법 및 그에 따라 재생된 이그조 스퍼터링 타겟
JP2019001695A (ja) 炭化珪素部材の製造方法
KR101499774B1 (ko) 티타늄 다공체와 티타늄 벌크재의 접합 방법
JP6189744B2 (ja) 試料保持具
CN103981471B (zh) 钨金属板、钼金属板、钨合金板或钼合金板的退火方法
CN103042282A (zh) 一种金刚石钻刀钎焊方法