JP2018501405A5 - - Google Patents

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Publication number
JP2018501405A5
JP2018501405A5 JP2017532727A JP2017532727A JP2018501405A5 JP 2018501405 A5 JP2018501405 A5 JP 2018501405A5 JP 2017532727 A JP2017532727 A JP 2017532727A JP 2017532727 A JP2017532727 A JP 2017532727A JP 2018501405 A5 JP2018501405 A5 JP 2018501405A5
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JP
Japan
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section
nozzle
pressure level
deposition apparatus
vacuum
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JP2017532727A
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English (en)
Japanese (ja)
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JP6513201B2 (ja
JP2018501405A (ja
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Priority claimed from PCT/EP2014/078299 external-priority patent/WO2016095997A1/en
Publication of JP2018501405A publication Critical patent/JP2018501405A/ja
Publication of JP2018501405A5 publication Critical patent/JP2018501405A5/ja
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JP2017532727A 2014-12-17 2014-12-17 材料堆積装置、真空堆積システム、及び材料堆積方法 Active JP6513201B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/078299 WO2016095997A1 (en) 2014-12-17 2014-12-17 Material deposition arrangement, a vacuum deposition system and method for depositing material

Publications (3)

Publication Number Publication Date
JP2018501405A JP2018501405A (ja) 2018-01-18
JP2018501405A5 true JP2018501405A5 (https=) 2018-07-05
JP6513201B2 JP6513201B2 (ja) 2019-05-15

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ID=52130257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017532727A Active JP6513201B2 (ja) 2014-12-17 2014-12-17 材料堆積装置、真空堆積システム、及び材料堆積方法

Country Status (7)

Country Link
US (1) US20170314120A1 (https=)
EP (1) EP3234213A1 (https=)
JP (1) JP6513201B2 (https=)
KR (1) KR20170095371A (https=)
CN (1) CN107109624B (https=)
TW (1) TWI619829B (https=)
WO (1) WO2016095997A1 (https=)

Families Citing this family (14)

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JP6512543B2 (ja) * 2015-02-28 2019-05-15 ケニックス株式会社 蒸着セル、薄膜作製装置および薄膜作製方法
CN108474102B (zh) * 2016-09-22 2020-10-27 应用材料公司 用于材料沉积源布置的分配组件的喷嘴、材料沉积源布置、真空沉积系统和用于沉积材料的方法
KR101899678B1 (ko) * 2016-12-21 2018-09-17 주식회사 포스코 필터유닛 및 이를 포함하는 도금장치
KR102030683B1 (ko) * 2017-01-31 2019-10-10 어플라이드 머티어리얼스, 인코포레이티드 재료 증착 어레인지먼트, 진공 증착 시스템 및 이를 위한 방법
CN106637091B (zh) * 2017-02-24 2019-08-30 旭科新能源股份有限公司 用于薄膜太阳能电池制造的高温蒸发炉
WO2019201434A1 (en) * 2018-04-18 2019-10-24 Applied Materials, Inc. Evaporation source for deposition of evaporated material on a substrate, deposition apparatus, method for measuring a vapor pressure of evaporated material, and method for determining an evaporation rate of an evaporated material
WO2019233601A1 (en) * 2018-06-08 2019-12-12 Applied Materials, Inc. Static evaporation source, vacuum processing chamber, and method of depositing material on a substrate
KR102680574B1 (ko) * 2018-12-11 2024-07-01 어플라이드 머티어리얼스, 인코포레이티드 증발 재료를 증착하기 위한 증기 소스, 증기 소스를 위한 노즐, 진공 증착 시스템, 및 증발 재료를 증착하기 위한 방법
KR20210078567A (ko) * 2018-12-14 2021-06-28 어플라이드 머티어리얼스, 인코포레이티드 측정 조립체, 증착 소스, 증착 장치 및 방법
KR102219435B1 (ko) * 2019-05-28 2021-02-24 경기대학교 산학협력단 노즐 및 노즐을 포함한 증착 장치
JP7304435B2 (ja) 2019-05-31 2023-07-06 アプライド マテリアルズ インコーポレイテッド 基板上に膜を形成するための方法およびシステム
JP2021041375A (ja) * 2019-09-13 2021-03-18 株式会社東芝 導電性流体用吐出ヘッド
KR102800267B1 (ko) * 2019-10-31 2025-04-23 어플라이드 머티어리얼스, 인코포레이티드 재료 증착 장치, 진공 증착 시스템, 및 재료 증착 장치를 제조하기 위한 방법
US20240247362A1 (en) * 2021-05-21 2024-07-25 Applied Materials, Inc. Nozzle for a distributor of a material deposition source, material deposition source, vacuum deposition system and method for depositing material

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
JPS6015698B2 (ja) * 1981-09-30 1985-04-20 日本真空技術株式会社 ノズル付蒸発器
US4854263B1 (en) * 1987-08-14 1997-06-17 Applied Materials Inc Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films
JP4440837B2 (ja) * 2005-01-31 2010-03-24 三星モバイルディスプレイ株式會社 蒸発源及びこれを採用した蒸着装置
JP4545010B2 (ja) * 2005-02-18 2010-09-15 日立造船株式会社 蒸着装置
US20080131587A1 (en) * 2006-11-30 2008-06-05 Boroson Michael L Depositing organic material onto an oled substrate
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
KR20110024223A (ko) * 2009-09-01 2011-03-09 주식회사 선익시스템 증발 장치 및 이를 포함하는 진공 증착 장치
KR101182265B1 (ko) * 2009-12-22 2012-09-12 삼성디스플레이 주식회사 증발원 및 이를 포함하는 증착 장치
JP5620137B2 (ja) * 2010-03-31 2014-11-05 田中貴金属工業株式会社 超音速ノズルおよび切削工具
KR101708420B1 (ko) * 2010-09-15 2017-02-21 삼성디스플레이 주식회사 기판 증착 시스템 및 이를 이용한 증착 방법
JP2014005478A (ja) * 2010-10-08 2014-01-16 Kaneka Corp 蒸着装置
JP5735304B2 (ja) * 2010-12-21 2015-06-17 株式会社日立国際電気 基板処理装置、基板の製造方法、半導体デバイスの製造方法およびガス供給管
DE102010055285A1 (de) * 2010-12-21 2012-06-21 Solarion Ag Photovoltaik Verdampferquelle, Verdampferkammer und Beschichtungsverfahren
JP5324010B2 (ja) * 2011-03-14 2013-10-23 シャープ株式会社 蒸着粒子射出装置および蒸着装置並びに蒸着方法
ES2486307T3 (es) * 2011-05-18 2014-08-18 Riber Inyector para un sistema de deposición de vapor bajo vacío
JP2014015637A (ja) * 2012-07-06 2014-01-30 Hitachi High-Technologies Corp 蒸着装置
KR101361917B1 (ko) * 2012-07-31 2014-02-13 주식회사 야스 대용량 고온 증발원
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials

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