JP2016524047A5 - - Google Patents

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Publication number
JP2016524047A5
JP2016524047A5 JP2016522493A JP2016522493A JP2016524047A5 JP 2016524047 A5 JP2016524047 A5 JP 2016524047A5 JP 2016522493 A JP2016522493 A JP 2016522493A JP 2016522493 A JP2016522493 A JP 2016522493A JP 2016524047 A5 JP2016524047 A5 JP 2016524047A5
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JP
Japan
Prior art keywords
gas supply
evaporation
crucibles
supply pipe
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016522493A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016524047A (ja
JP6435325B2 (ja
Filing date
Publication date
Priority claimed from EP13174290.0A external-priority patent/EP2818572B1/en
Application filed filed Critical
Publication of JP2016524047A publication Critical patent/JP2016524047A/ja
Publication of JP2016524047A5 publication Critical patent/JP2016524047A5/ja
Application granted granted Critical
Publication of JP6435325B2 publication Critical patent/JP6435325B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016522493A 2013-06-28 2014-06-26 ガス供給を備えた蒸発装置 Expired - Fee Related JP6435325B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13174290.0A EP2818572B1 (en) 2013-06-28 2013-06-28 Evaporation apparatus with gas supply
EP13174290.0 2013-06-28
PCT/EP2014/063488 WO2014207088A1 (en) 2013-06-28 2014-06-26 Evaporation apparatus with gas supply

Publications (3)

Publication Number Publication Date
JP2016524047A JP2016524047A (ja) 2016-08-12
JP2016524047A5 true JP2016524047A5 (https=) 2017-08-03
JP6435325B2 JP6435325B2 (ja) 2018-12-05

Family

ID=48692385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016522493A Expired - Fee Related JP6435325B2 (ja) 2013-06-28 2014-06-26 ガス供給を備えた蒸発装置

Country Status (6)

Country Link
US (1) US10081866B2 (https=)
EP (1) EP2818572B1 (https=)
JP (1) JP6435325B2 (https=)
KR (1) KR20160025600A (https=)
CN (1) CN105378136B (https=)
WO (1) WO2014207088A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107406969B (zh) * 2015-06-09 2020-06-19 株式会社爱发科 卷取式成膜装置、蒸发源单元和卷取式成膜方法
WO2017121491A1 (en) * 2016-01-15 2017-07-20 Applied Materials, Inc. Evaporation source, apparatus and method for depositing organic material
WO2018024313A1 (en) * 2016-08-01 2018-02-08 Applied Materials, Inc. Deposition apparatus
CN110344002B (zh) * 2019-06-11 2022-03-22 惠科股份有限公司 一种蒸镀装置和蒸镀方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5242500A (en) * 1990-08-27 1993-09-07 Leybold Aktiengesellschaft Apparatus for the continuous coating of band-type substrate
MY139695A (en) * 1996-05-21 2009-10-30 Panasonic Corp Thin film, method and apparatus for forming the same, and electronic component incorporating the same
JPH1053868A (ja) * 1996-08-07 1998-02-24 Kao Corp 薄膜形成装置
JPH11335819A (ja) * 1998-05-22 1999-12-07 Dainippon Printing Co Ltd 真空蒸着装置
US20050147753A1 (en) * 1999-10-22 2005-07-07 Kurt J. Lesker Company Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum
JP2006274308A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 蛍光体シート製造装置
JP2007270251A (ja) * 2006-03-31 2007-10-18 Toray Ind Inc 多層薄膜付き積層体の製造方法および製造装置
JP5194939B2 (ja) * 2008-03-28 2013-05-08 東レ株式会社 金属酸化物薄膜形成装置ならびに金属酸化物薄膜付きシートの製造方法
JP5121638B2 (ja) * 2008-09-05 2013-01-16 パナソニック株式会社 蒸着装置および蒸着装置を用いた蒸着膜の製造方法
EP2702184B1 (en) * 2011-04-29 2018-12-05 Applied Materials, Inc. Gas system for reactive deposition process
JP2013234364A (ja) * 2012-05-09 2013-11-21 Mitsubishi Plastics Inc ガスバリア性フィルムの製造方法

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