JP2018501405A5 - - Google Patents
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- Publication number
- JP2018501405A5 JP2018501405A5 JP2017532727A JP2017532727A JP2018501405A5 JP 2018501405 A5 JP2018501405 A5 JP 2018501405A5 JP 2017532727 A JP2017532727 A JP 2017532727A JP 2017532727 A JP2017532727 A JP 2017532727A JP 2018501405 A5 JP2018501405 A5 JP 2018501405A5
- Authority
- JP
- Japan
- Prior art keywords
- section
- nozzle
- pressure level
- deposition apparatus
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/078299 WO2016095997A1 (en) | 2014-12-17 | 2014-12-17 | Material deposition arrangement, a vacuum deposition system and method for depositing material |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018501405A JP2018501405A (ja) | 2018-01-18 |
| JP2018501405A5 true JP2018501405A5 (cg-RX-API-DMAC7.html) | 2018-07-05 |
| JP6513201B2 JP6513201B2 (ja) | 2019-05-15 |
Family
ID=52130257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017532727A Active JP6513201B2 (ja) | 2014-12-17 | 2014-12-17 | 材料堆積装置、真空堆積システム、及び材料堆積方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20170314120A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP3234213A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6513201B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20170095371A (cg-RX-API-DMAC7.html) |
| CN (1) | CN107109624B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI619829B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2016095997A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6512543B2 (ja) * | 2015-02-28 | 2019-05-15 | ケニックス株式会社 | 蒸着セル、薄膜作製装置および薄膜作製方法 |
| JP6657239B2 (ja) * | 2016-09-22 | 2020-03-04 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 材料堆積源構成の分配アセンブリのためのノズル、材料堆積源構成、真空堆積システム、及び材料を堆積させるための方法 |
| KR101899678B1 (ko) * | 2016-12-21 | 2018-09-17 | 주식회사 포스코 | 필터유닛 및 이를 포함하는 도금장치 |
| WO2018141365A1 (en) * | 2017-01-31 | 2018-08-09 | Applied Materials, Inc. | Material deposition arrangement, vacuum deposition system and method therefor |
| CN106637091B (zh) * | 2017-02-24 | 2019-08-30 | 旭科新能源股份有限公司 | 用于薄膜太阳能电池制造的高温蒸发炉 |
| JP7102418B2 (ja) * | 2018-04-18 | 2022-07-19 | アプライド マテリアルズ インコーポレイテッド | 蒸発した材料を基板の上に堆積するための蒸発源、堆積装置、蒸発した材料の蒸気圧を測定するための方法、及び蒸発した材料の蒸発速度を決定するための方法 |
| WO2019233601A1 (en) * | 2018-06-08 | 2019-12-12 | Applied Materials, Inc. | Static evaporation source, vacuum processing chamber, and method of depositing material on a substrate |
| CN113166925B (zh) * | 2018-12-11 | 2023-12-22 | 应用材料公司 | 用于沉积已蒸发材料的蒸气源、用于蒸气源的喷嘴、真空沉积系统和用于沉积已蒸发材料的方法 |
| WO2020122944A1 (en) * | 2018-12-14 | 2020-06-18 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate and method therefore |
| KR102219435B1 (ko) * | 2019-05-28 | 2021-02-24 | 경기대학교 산학협력단 | 노즐 및 노즐을 포함한 증착 장치 |
| WO2020242648A1 (en) * | 2019-05-31 | 2020-12-03 | Applied Materials, Inc. | Methods and systems for forming films on substrates |
| JP2021041375A (ja) * | 2019-09-13 | 2021-03-18 | 株式会社東芝 | 導電性流体用吐出ヘッド |
| WO2021085685A1 (en) * | 2019-10-31 | 2021-05-06 | Applied Materials, Inc | Material deposition arrangement, vacuum deposition system, and method for manufacturing a material deposition arrangement |
| CN117396629A (zh) * | 2021-05-21 | 2024-01-12 | 应用材料公司 | 用于材料沉积源的分配器的喷嘴、材料沉积源、真空沉积系统以及用于将材料沉积的方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6015698B2 (ja) * | 1981-09-30 | 1985-04-20 | 日本真空技術株式会社 | ノズル付蒸発器 |
| US4854263B1 (en) * | 1987-08-14 | 1997-06-17 | Applied Materials Inc | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films |
| JP4440837B2 (ja) * | 2005-01-31 | 2010-03-24 | 三星モバイルディスプレイ株式會社 | 蒸発源及びこれを採用した蒸着装置 |
| JP4545010B2 (ja) * | 2005-02-18 | 2010-09-15 | 日立造船株式会社 | 蒸着装置 |
| US20080131587A1 (en) * | 2006-11-30 | 2008-06-05 | Boroson Michael L | Depositing organic material onto an oled substrate |
| WO2011065999A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
| KR20110024223A (ko) * | 2009-09-01 | 2011-03-09 | 주식회사 선익시스템 | 증발 장치 및 이를 포함하는 진공 증착 장치 |
| KR101182265B1 (ko) * | 2009-12-22 | 2012-09-12 | 삼성디스플레이 주식회사 | 증발원 및 이를 포함하는 증착 장치 |
| JP5620137B2 (ja) * | 2010-03-31 | 2014-11-05 | 田中貴金属工業株式会社 | 超音速ノズルおよび切削工具 |
| KR101708420B1 (ko) * | 2010-09-15 | 2017-02-21 | 삼성디스플레이 주식회사 | 기판 증착 시스템 및 이를 이용한 증착 방법 |
| JP2014005478A (ja) * | 2010-10-08 | 2014-01-16 | Kaneka Corp | 蒸着装置 |
| JP5735304B2 (ja) * | 2010-12-21 | 2015-06-17 | 株式会社日立国際電気 | 基板処理装置、基板の製造方法、半導体デバイスの製造方法およびガス供給管 |
| DE102010055285A1 (de) * | 2010-12-21 | 2012-06-21 | Solarion Ag Photovoltaik | Verdampferquelle, Verdampferkammer und Beschichtungsverfahren |
| JP5324010B2 (ja) * | 2011-03-14 | 2013-10-23 | シャープ株式会社 | 蒸着粒子射出装置および蒸着装置並びに蒸着方法 |
| ES2486307T3 (es) * | 2011-05-18 | 2014-08-18 | Riber | Inyector para un sistema de deposición de vapor bajo vacío |
| JP2014015637A (ja) * | 2012-07-06 | 2014-01-30 | Hitachi High-Technologies Corp | 蒸着装置 |
| KR101361917B1 (ko) * | 2012-07-31 | 2014-02-13 | 주식회사 야스 | 대용량 고온 증발원 |
| US9142779B2 (en) * | 2013-08-06 | 2015-09-22 | University Of Rochester | Patterning of OLED materials |
-
2014
- 2014-12-17 JP JP2017532727A patent/JP6513201B2/ja active Active
- 2014-12-17 WO PCT/EP2014/078299 patent/WO2016095997A1/en not_active Ceased
- 2014-12-17 CN CN201480084154.1A patent/CN107109624B/zh not_active Expired - Fee Related
- 2014-12-17 KR KR1020177019900A patent/KR20170095371A/ko not_active Ceased
- 2014-12-17 US US15/531,693 patent/US20170314120A1/en not_active Abandoned
- 2014-12-17 EP EP14815340.6A patent/EP3234213A1/en not_active Withdrawn
-
2015
- 2015-12-16 TW TW104142233A patent/TWI619829B/zh not_active IP Right Cessation
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