JP2018139322A - Substrate processing system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve productivity of the entire manufacturing line related to substrate processing, by operating the processing unit, used in each of multiple processing processes, efficiently.SOLUTION: A substrate processing system has a first holding section provided for the first processing unit, and loading a first supply roll around which a sheet substrate, before being subjected to first processing, is wound, and a first recovery roll around which the sheet substrate, subjected to the first processing, is wound, removably, a second holding section for loading a second supply roll around which the sheet substrate, before being subjected to second processing, is wound with a prescribed length, and a second recovery roll around which the sheet substrate, subjected to the second processing, is wound, removably, and a cutting mechanism for cutting the sheet substrate, when it is processed in the first processing unit and wound around the first recovery roll. The first recovery roll, loaded to the first holding section and around which the sheet substrate is wound is loaded, as a second supply roll, to a second holding section provided for any one of the multiple second processing units.SELECTED DRAWING: Figure 1

Description

The present invention relates to a substrate processing system.
This application claims priority based on US Provisional Application 61 / 650,712 filed May 23, 2012 and US Provisional Application 61 / 654,500 filed June 1, 2012, and its contents Is hereby incorporated by reference.

  For large-screen display devices such as liquid crystal display devices, a transparent electrode such as ITO (Indium Tin Oxide) or a semiconductor material such as Si is deposited on a flat glass substrate, a metal material is evaporated, and a photoresist is applied. Then, the circuit pattern is transferred. Then, after developing the photoresist, a circuit pattern or the like is formed by etching. However, since the glass substrate is enlarged with an increase in the screen size of the display element, it is difficult to carry the substrate. Therefore, a roll-to-roll method (hereinafter simply “roll method”) in which a display element is formed on a flexible substrate (for example, a film member such as polyimide, PET, metal foil, or an ultrathin glass sheet). Has been proposed (for example, see Patent Document 1).

  Further, in Patent Document 2, a flexible long sheet (substrate) that is wound around a feed roller and traveled is disposed in the vicinity of the outer peripheral portion of a rotatable cylindrical mask, and the mask pattern is continuous. In particular, techniques for exposing a substrate have been proposed.

  Further, in Patent Document 3, a pattern forming region of a flexible long sheet (substrate) sent by a roll method is temporarily held on a flat stage, and a mask projected via an enlargement projection lens is disclosed. A technique for scanning and exposing a pattern image to a pattern formation region has been proposed.

International Publication No. 2008/1229819 Japanese Utility Model Publication No. 60-019037 JP 2011-22584 A

However, the following problems exist in the conventional technology as described above.
When a plurality of processes are sequentially performed on a long sheet-like substrate, the substrate transport speed suitable for the process varies from unit to unit (each processing content) depending on the performance of each processing unit. For example, in the case of exposure processing as in Patent Document 2, the substrate transport speed (tact) is limited by the sensitivity of the photosensitive layer applied to the substrate surface, the brightness of the illumination light for exposure, and the like. Further, even in a wet process such as etching or plating, or a drying / heating process after the wet process, there are obtained advantages that the liquid tank and the drying / heating furnace can be reduced in size by slowly transporting the substrate.

  In addition, there is an optimum substrate transport speed in order to ensure productivity while maintaining high precision (miniaturization) in functional material deposition processing, printing and inkjet printing processes, and the like. However, these optimum substrate transfer speeds are often different from one processing unit to another.

  When constructing a roll-type production line (processing system) that combines a plurality of such processing units and sequentially passes a long sheet-like substrate to perform a series of processes, the substrate transport speed (of the production line) The speed is adjusted to the processing unit having the lowest substrate transport speed during processing.

  For this reason, a processing unit with a high processing speed transports the substrate at a low speed although there is a margin in performance. Therefore, the efficiency of the processing unit is deteriorated and the productivity of the entire production line may not be improved.

  In Patent Document 1, an electronic device is formed on a sheet substrate mainly using a printing (inkjet) method while conveying a flexible sheet substrate by a roll method. However, in a general printing site, when the remaining amount of the sheet substrate wound around the supply roll decreases, the printing apparatus is temporarily stopped, the sheet substrate is cut between the printing apparatus and the collection roll, and the collection roll The printed sheet substrate wound as is sent to the next process. In that case, a sheet substrate in the middle of printing remains in the printing path from the entrance to the exit of the printing apparatus, and this is all discarded as defective products. When printing with color ink on paper or film, the printing cost is extremely low. However, when the electronic device is formed by the roll method, the manufacturing cost per unit length (m) of the sheet substrate is still expensive, and when the sheet substrate remaining in the apparatus is discarded as in a general printing site. This increases waste and increases costs.

  In particular, when an organic EL medium-sized or large-sized display panel is formed on a sheet substrate, the sheet substrate is a series of a plurality of processing apparatuses, for example, a photosensitive layer printing apparatus, an exposure apparatus such as Patent Document 3, a wet processing apparatus, a drying apparatus. After continuously passing through the apparatus or the like, it is wound up on a collection roll. Accordingly, it is assumed that the sheet substrates in a plurality of processing apparatuses (processing steps) from the supply roll to the collection roll are extremely long, and once the conveyance of the sheet substrate is stopped, the sheet substrate is extended over a considerably long distance. Will be wasted.

  According to the first aspect of the present invention, a long sheet substrate having flexibility is transported at a first speed in the first processing unit and subjected to the first processing, and then in the second processing unit. A substrate processing system that transports at a second speed that is slower than the first speed and performs a second process, wherein the second processing unit includes two or more of the first processing units. A first supply roll that is provided for the first processing unit and wound with a predetermined length on the sheet substrate before the first processing, and the sheet after the first processing. The first holding unit for detachably mounting the first collection roll on which the substrate is wound up, and the sheet substrate before the second processing is provided for each of the plurality of second processing units. A second supply roll wound with a predetermined length; A second holding part for detachably mounting a second collection roll on which the sheet substrate after the treatment is wound, and provided between the first processing unit and the first collection roll; When the sheet substrate is processed by the first processing unit and wound on the first collection roll over a predetermined unit length shorter than the total length of the sheet substrate wound on the first supply roll. A cutting mechanism for cutting the sheet substrate, and the plurality of the first collection rolls mounted on the first holding unit and wound up the sheet substrate by the predetermined unit length. There is provided a substrate processing system that is mounted as the second supply roll on the second holding unit provided for any one of the second processing units.

  In the aspect of the present invention, the processing unit used in each of the plurality of processing steps can be efficiently operated, and the productivity of the entire manufacturing line related to substrate processing can be improved.

  Further, according to another aspect of the present invention, it is possible to greatly reduce the waste of the substrate and effectively suppress the increase in cost.

It is the figure which showed typically the substrate processing system which concerns on 1st Embodiment. It is a schematic perspective view of the cutting mechanism concerning a 1st embodiment. It is a schematic external perspective view of the 1st splicer part concerning a 1st embodiment. It is a schematic external perspective view of the 2nd splicer part which concerns on 1st Embodiment. It is a control block diagram in the substrate processing system concerning a 1st embodiment. It is a figure which shows the structure of a part of device manufacturing system which concerns on 1st Embodiment. It is a figure explaining the example of model arrangement of a plurality of processing units which constitute the manufacturing line concerning a 1st embodiment. It is a time chart explaining the tact improvement by the manufacturing line concerning a 1st embodiment. It is a figure which shows the structure of a part of device manufacturing system as a substrate processing apparatus which concerns on 2nd Embodiment. It is a figure which shows schematic structure of the 1st splicer part and 1st buffer mechanism which concern on 2nd Embodiment. It is a figure which shows schematic structure of the 2nd splicer part which concerns on 2nd Embodiment, and a 2nd buffer mechanism. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate supply concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment. It is a figure which shows the joining / cutting operation | movement of the board | substrate by the side of the board | substrate collection | recovery concerning 2nd Embodiment.

First Embodiment Hereinafter, an embodiment of a substrate switching device of the present invention will be described with reference to FIGS.
FIG. 1 is a diagram schematically illustrating a roll-type substrate processing system SYS that sequentially passes a sheet-like substrate P through three processing steps A, B, and C as an example.

  The substrate processing system performs a processing unit UA (first processing unit) that performs processing A (first processing) on the substrate P as step A, and processing B (first processing, second processing) as step B. Processing unit UB (first processing unit, second processing unit) to be applied, processing unit UC (second processing unit) to perform processing C (second processing) as step C, cutting mechanism CU10, joining mechanism PU10, selective charging mechanism ST1 and ST2 and the control unit CT (see FIG. 5) are mainly configured.

  The processing unit UA includes a roll mounting portion RSA on which the supply roll RRA is mounted, and sends the substrate P subjected to the processing A to the cutting mechanism CU10. The processing units UB are each composed of processing units UB1 to UB3 that perform the same processing B, and are, for example, arranged in three rows vertically or three rows horizontally on the downstream side of the processing unit UA in the substrate transport direction.

  Each of the processing units UB1 to UB3 includes mounting portions RSB11 to RSB31 to which the roll of the substrate P subjected to the processing A is mounted, and mounting portions RSB12 to RSB32 to which the roll of the substrate P subjected to the processing B is mounted. The substrate P from the rolls RRB11 to RRB31 (hereinafter referred to as child rolls RRB11 to RRB31 as appropriate) mounted on the mounting portions RSB11 to RSB31 is mounted on the mounting portions RSB12 to RSB32 after being subjected to the processing B. Rolls RRB12 to RRB32 (hereinafter appropriately referred to as child rolls RRB12 to RRB32).

  In FIG. 1, a roll RR <b> 1 that winds up the substrate P subjected to the processing A is provided after the cutting mechanism CU <b> 10 at the rear stage of the processing unit UA. When a predetermined length of the substrate P is wound on the roll RR1, the substrate P is cut there, and the roll RR1 is one of the mounting portions RSB11 to RSB31 of each processing unit UB1 to UB3, and any of the child rolls RRB11 to RRB31. Installed as one.

  The processing unit UC can mount any one of the child rolls RRB12 to RRB32 subjected to the processing B in the processing units UB1 to UB3 as a roll RR2. The substrate P (intermediate product subjected to the processes A and B) wound around the roll RR2 is carried into the processing unit UC via the joining mechanism PU10 and subjected to the process C. The substrate P that has received the process C is wound up and collected by the collection roll RRC mounted on the roll mounting unit RSC.

Processing speed VA (processing speed of substrate P) in processing unit UA in the present embodiment, processing speed VB (processing speed of substrate P) in processing units UB1 to UB3, processing of processing C in processing unit UC The relationship of the speed VC (conveying speed of the substrate P) is as follows.
VA ≒ VC> VB
Since the transport speed of the substrate P is VA> VB between the processing unit UA and any one of the processing units UB1 to UB3, the processing unit UA has a high transport speed (V1). And any one of the processing units UB1 to UB3 corresponds to the second processing unit having a low transport speed (V2). On the other hand, between any one of the processing units UB1 to UB3 and the processing unit UC, since the transport speed of the substrate P is VB <VC, any one of the processing units UB1 to UB3 is transport speed (V1). The processing unit UC corresponds to a second processing unit having a high transport speed (V2).

  In the present embodiment, the processing speeds VA and VC can be set to about three times the processing speed VB. When there is one processing unit UB that performs the processing step B as in the past, the substrate P connected to one from the supply roll RRA to the recovery roll RRC sequentially passes through the processing units UA, UB, UC. The conveyance speed is adjusted to the slowest processing speed VB. That is, the tact (line speed, productivity) of the entire production line is regulated by the slowest processing unit.

  In the present embodiment, a configuration in which the processing unit UB having a low processing speed is double-tracked (here, three units are juxtaposed) can be configured without being restricted by the rule. In order to make this double track (or to provide a plurality), when the substrate P is wound up by a predetermined length on the roll RR1, the substrate P is cut without temporarily stopping the processing step A and the processing step B. A mechanism CU10 is required.

  The cutting mechanism CU10 mainly cuts the substrate P that has been subjected to the processing A by a predetermined length. As shown in FIGS. 1 and 2, the cutting mechanism CU10 and the first buffer mechanism (first buffer unit) BF1 1 splicer part CSa (cutting part). Further, the cutting mechanism CU10 further includes an interlock control unit that links the operation of the first splicer unit CSa (cutting unit) with the accumulated amount of the substrate P in the first buffer mechanism BF1 (buffer unit).

  The first buffer mechanism BF1 is provided between the unit UA that performs the process A as the first process and the first splicer part CSa, and folds the substrate P with a large number of rollers or the like to accumulate a predetermined length. A roller mechanism DR1 is provided, and the substrate P is carried in and out while the accumulation length of the substrate P is variably adjusted by the vertical movement of the dancer roller. The first buffer mechanism BF1 is provided adjacent to the downstream side in the transport direction of the substrate P of the processing unit UA, and adjusts the transport amount (or transport speed) of the substrate P transported to the first splicer unit CSa. And a roller NR1 (see FIG. 5). Driving of the dancer roller mechanism DR1 and driving of the nip driving roller NR1 are controlled by the control unit CT.

Here, the configuration will be described with reference to FIG. 3 showing a schematic external perspective view of the first splicer part CSa.
The first splicer part CSa has a suction pad 1 formed of, for example, a porous material on the upper surface, and includes a slider 2 that is movable in the transport direction of the substrate P (hereinafter simply referred to as the transport direction), and the slider 2. When the elevator 3 with a guide rail that is movably supported in the transport direction, the drive unit 4 that raises and lowers the elevator 3, and when the elevator 3 is in the raised position, it moves in the width direction of the substrate P, The cutter unit 5 capable of cutting the substrate P adsorbed to the suction pad 1 of the slider 2, the adhering unit 6 capable of adhering the adhesive tape TP to the substrate P, and the elevator 3 are provided above the processing A. And a holding portion 8 (movable up and down) that holds the winding shaft 7 for the roll RR1 that winds the substrate P to which the substrate P is applied on both sides.

  The take-up shaft 7 has a resin film or material having a high adhesive force attached to a part (or the entire circumference) of the outer peripheral surface thereof, and the tip end of the substrate P is attached to the outer peripheral surface of the take-up shaft 7. After the contact, the substrate P can be automatically wound by rotating the winding shaft 7.

These slider 2, lift 3, drive unit 4, cutter unit 5, pasting unit 6, and holding unit 8 are configured as an integrated station unit SN, and can be placed on a caster table and transported. And it can be positioned at a predetermined position.
Each drive of these slider 2, the drive part 4, the cutter part 5, and the sticking part 6 is controlled by the control part CT (refer FIG. 5).
The station portion SN is movable in the longitudinal direction while holding the substrate P, and includes a moving portion including the slider 2, the lifting platform 3, the driving portion 4, and the like, a cutting region by the cutting mechanism CU10, or a bonding mechanism PU10. A movement control unit that moves the moving unit to the joining region.

  In addition, although the affixing part 6 in this embodiment shall adhere | attach the board | substrate P with the adhesive tape TP, the other affixing system (mechanism) may be sufficient. For example, a method in which an adhesive is applied in a belt shape in the width direction orthogonal to the conveyance direction of the substrate P and pressed and bonded. When the substrate P is a resin film or the like, a portion to be bonded to the substrate P is A heating and pressure bonding method or a method such as ultrasonic bonding may be used.

  The suction pad 1 provided on the upper surface of the slider 2 holds the substrate P by a vacuum pressure. However, the substrate P is placed on the upper surface of the slider 1 by a mechanical clamping mechanism (clamp band or the like) other than the vacuum pressure. The structure which latches may be sufficient.

  Now, the selective loading mechanism ST1 shown in FIG. 1 is a roll RR1 (hereinafter referred to as a child roll RR1) in which the substrate P on which the process A has been wound is wound around the take-up shaft 7 under the control of the control unit CT. One of the rolls RRB11, RRB21, and RRB31 is selectively introduced into any of the mounting parts RSB11 to RSB31, and the spare roll RR1 is unloaded from the holding part 8 of the first splicer part CSa that is vacant. The take-up shaft 7 is conveyed.

In the present embodiment, the processing speeds VA and VC are about three times the processing speed VC, and three processing units UB are installed. The length of the substrate P taken up by RR2) to be described later is set to about 1/3 of the length of the substrate P wound around the supply roll RRA serving as a parent roll.
Accordingly, the cutting mechanism CU10 cuts the substrate P at every predetermined length that divides the entire length of the substrate P wound around the supply roll RRA into approximately three equal parts.

  1 is one of the child rolls RRB12 to RRB32 of the mounting portions RSB12 to RSB32 in which the substrate P that has been subjected to the process B in any of the processing units UB1 to UB3 is wound up by a predetermined length. Is selected under the control of the control unit CT and put into the joining mechanism PU10 (roll transport), and any of the child rolls RRB12 to RRB32 is transported and spared for the mounting parts RSB12 to RSB32 that are vacant. A take-up shaft is attached.

  The joining mechanism PU10 mainly joins one of the child rolls RRB12 to RRB32 that has been subjected to the processing B and is conveyed as a child roll RR2, near the end of the substrate that has been previously charged and cut, As shown in FIG. 1, a second splicer part CSb (joining part) and a second buffer mechanism (second buffer part) BF2 are provided. In addition, the bonding mechanism PU10 has a variable amount of accumulated substrates according to the second splicer part CSb (bonding part) that bonds the substrates subjected to the processing B and the transport amount of the substrates subjected to the processing B. And a second buffer mechanism (buffer unit) BF2 that adjusts the transport amount of the substrate put into the process B from the bonding unit.

  As shown in FIG. 4, the second splicer unit CSb is installed in a state where the station unit SN installed in the first splicer unit CSa described above reverses the transport direction of the substrate P. That is, the second splicer part CSb has a suction pad 1 on the upper surface, a slider 2 that is movable in the transport direction, a lift 3 with a guide rail that supports the slider 2 so as to be movable in the transport direction, and a lift Drive unit 4 that moves up and down 3, and cutter unit 5 that can move in the width direction of substrate P and cut substrate P adsorbed to adsorption pad 1 of slider 2 when elevating platform 3 is in the raised position. , And an attaching portion 6 on which the adhesive tape TP can be attached to the substrate P, and a take-up shaft 7 for the child roll RR2 that is provided above the lifting platform 3 and takes up the substrate P on which the processing B has been performed. The holding part 8 hold | maintained on both sides is provided.

  The second buffer mechanism BF2 is configured in the same manner as the first buffer mechanism BF1, and variably accumulates the substrate P carried into the processing unit UC within an adjustable length range. The substrate P of the processing unit UC Adjacent to the upstream side in the transport direction.

  The second buffer mechanism BF2 includes a dancer roller mechanism DR2 capable of variably adjusting the accumulated amount of the substrate P by a plurality of rollers adjacent in the transport direction of the substrate P moving up and down in opposite directions, and the second splicer unit CSb. A nip drive roller NR2 (see FIG. 5) that adjusts the transport amount (transport speed) of the substrate P transported to the dancer roller mechanism DR2. Driving of the dancer roller mechanism DR2 and driving of the nip driving roller NR2 are controlled by the control unit CT.

FIG. 5 is a control block diagram of the substrate processing system shown in FIGS.
As shown in FIG. 5, the control unit CT controls the operations of the processing units UA, UB (UB1 to UB3), and UC, and includes a slider 2 and a drive unit 4 provided in each of the cutting mechanism CU10 and the joining mechanism PU10. The driving of the cutter unit 5, the pasting unit 6, the selection loading mechanisms ST1 and ST2, the dancer roller mechanisms DR1 and DR2, the nip driving rollers NR1 and NR2, and the like are comprehensively controlled. In addition, the control unit CT counts and manages the rotation of the supply roll RRA and the collection roll RRC, the transport length of the substrate P in each process (each processing unit), and the substrate of each roll serving as the substrate P supply side. The remaining amount and the substrate winding amount of each roll on the substrate P collection side are counted and managed, the overall tact management from the processing steps A to C, and the processing problems for each roll It also manages information such as the presence / absence and the extent of failure and location. The control unit CT includes an interlock control unit that links the operation of the cutting mechanism CU10 and the amount of accumulated substrate P in the first buffer unit BF1. Similarly, the control unit CT includes an interlocking control unit that links the operation of the bonding mechanism PU10 and the accumulated amount of the substrate P in the second buffer unit BF2.

Next, the operation of the substrate processing system configured as described above will be described.
Here, as shown in FIG. 1, immediately after the processing B is completed in the processing unit UB1, the child roll RRB12 is conveyed to the holding unit 8 of the second splicer unit CSb by the selective charging mechanism ST2. Further, in the processing unit UB2, the processing B is performed on the substrate P drawn from the child roll RRB21 mounted on the mounting portion RSB21. Further, it is assumed that the processing unit UB3 stands by until the child roll RRB31 to be processed next is mounted on the mounting unit RSB31.

  Moreover, in the following description, since operation | movement of each component apparatus is controlled by control part CT, the description which shows that is abbreviate | omitted.

  First, when the substrate P subjected to the process A is wound around the child roll RR1 held by the holding unit 8 of the first splicer unit CSa with a predetermined length, the nip driving roller NR1 is driven in the first buffer mechanism BF1. And the supply of the substrate P to the first splicer unit CSa is stopped. At this time, processing A is continuously performed in the processing unit UA, and the substrate P is sent to the first buffer mechanism BF1. Therefore, the dancer roller mechanism DR1 in the first buffer mechanism BF1 is driven in a direction that increases the accumulation amount of the substrate P.

In conjunction with the stop of the supply of the substrate P from the first buffer mechanism BF1, the substrate P is cut in the first splicer unit CSa.
Specifically, first, after the slider 2 moves to a position facing the cutter unit 5, the lift 3 is raised together with the slider 2 by the operation of the drive unit 4. As the slider 2 moves up, the suction pad 1 sucks and holds the substrate P from the back surface (lower surface) and positions it at a cutting position by the cutter unit 5. Thereafter, the cutter unit 5 moves in the width direction of the substrate P and cuts the substrate P. When the substrate P is cut, the selective loading mechanism ST1 loads the child roll RR1 into the mounting portion RSB31 of the processing unit UB3 here as the child roll RRB31. Further, the selective charging mechanism ST1 loads the preliminary winding shaft 7 into the holding portion 8 of the first splicer portion CSa that has become empty after the child roll RR1 is discharged.

  In the first splicer part CSa, when the take-up shaft 7 is attached to the holding part 8, the slider is arranged such that the tip portion of the substrate P sucked and held on the upper surface of the slider 2 is positioned below the take-up shaft 7. 2 moves at the same time (the nip driving roller NR1 also rotates in synchronization with a predetermined amount), the holding portion 8 supporting the winding shaft 7 is lowered by a certain distance, and the tip portion of the substrate P is the outer periphery of the winding shaft 7 Adheres to the adhesive part of the surface. Thus, when the tip portion of the substrate P extending from the first buffer mechanism BF1 side is connected to the new take-up shaft 7, after the suction holding by the suction pad 1 is released, the holding portion 8 is returned to the original height position. The elevator 3 is lowered together with the slider 2 by the operation of the drive unit 4.

  Thereafter, the rotational driving of the nip driving roller NR1 and the new take-up shaft 7 is resumed, the supply of the substrate P from the first buffer mechanism BF1 is resumed, and the substrate P is taken up by the new take-up shaft 7. After resuming the supply of the substrate P, the nip driving roller NR1 is slightly faster than the feed rate of the substrate P corresponding to the processing speed VA in the processing unit UA (that is, the speed at which the substrate P is sent to the first buffer mechanism BF1). It is rotated by. The dancer roller mechanism DR1 is driven in a direction to reduce the accumulation amount of the substrate P in accordance with the driving of the nip driving roller NR1.

  After the length of the substrate P accumulated in the first buffer mechanism BF1 is almost minimized, the nip drive roller NR1 is driven at the same speed as the substrate P feed speed in the processing unit UA.

  On the other hand, the substrate P is pulled out from the child roll RRB31 mounted on the mounting portion RSB31 of the processing unit UB3, sent at a speed corresponding to the processing speed VB, processed B, and mounted on the mounting portion RSB32. It is wound on a roll RRB32.

  In the processing unit UB3, while the processing B for the substrate P drawn from the child roll RRB31 is being performed, the processing unit UB2 completes the processing B for the substrate P drawn from the child roll RRB21. The child roll RRB2 that has wound up is waiting at the mounting portion RSB22.

  When the processing C by the processing unit UC is completed for the substrate P from the child roll RRB12 previously attached to the joining mechanism PU10 as the child roll RR2 by the selective charging mechanism ST2, in the second buffer mechanism BF2 of the joining mechanism PU10 The driving of the nip driving roller NR2 is stopped, and the supply of the substrate P to the dancer roller mechanism DR2 is stopped.

  At this time, the process C is continuously performed in the processing unit UC. Therefore, the dancer roller mechanism DR2 is activated, and the substrate P stored in the second buffer mechanism BF2 is sent out to the processing unit UC at a constant speed according to the feed amount (processing speed VC) of the substrate P in the processing unit UC. .

  In the second splicer part CSb, the lifting platform 3 is lifted together with the slider 2 by the operation of the drive part 4 after the slider 2 has moved to a position facing the cutter part 5 as in the cutting process in the first splicer part CSa. As the slider 2 is raised, the suction pad 1 sucks and holds the substrate P from the child roll RRB 12 from the back surface (lower surface) and positions it at the cutting position by the cutter unit 5. Thereafter, the cutter unit 5 moves in the width direction of the substrate P and cuts the substrate P. When the substrate P is cut, the selective loading mechanism ST2 takes out the take-up shaft 7 around which the child roll RR2 (RRB12) is wound from the holding unit 8, and waits at the mounting unit RSB22 in the empty holding unit 8. The child roll RRB22 is mounted as the child roll RR2.

  When the child roll RRB22 is attached as the child roll RR2 to the holding unit 8 in the second splicer part CSb, the front end portion of the substrate P drawn from the child roll RR2 is the substrate P on the second buffer mechanism BF2 side that has been cut first. The two substrates P are held by the suction pad 1 together with the rear end portion. In this state, the two substrates P are joined by the adhesive tape TP. When the substrate P is bonded, the lift 3 is lowered together with the slider 2 by the operation of the drive unit 4 after releasing the suction holding by the suction pad 1. Thereafter, the supply of the substrate P from the second splicer unit CSb to the second buffer mechanism BF2 is resumed by driving the nip driving roller NR2.

  After the supply of the substrate P is resumed, the nip drive roller NR2 is rotated at a speed slightly higher than the feed speed of the substrate P corresponding to the processing speed VC in the processing unit UC. The dancer roller mechanism DR2 is driven in a direction to increase the accumulation amount of the substrate P according to the driving of the nip driving roller NR2.

  After the length of the substrate P accumulated in the second buffer mechanism BF2 becomes almost maximum, the nip driving roller NR2 is driven at the same speed as the feeding speed of the substrate P in the processing unit UC. Then, the substrate P pulled out from the child roll RRB22 (child roll RR2) sent to the processing unit UC via the second buffer mechanism BF2 is subjected to the processing C at the processing speed VC.

  As described above, the substrate P that has been subjected to the processing A by the processing unit UA is wound as the child roll RR1 having a length divided according to the number of the processing units UB, and then sequentially inserted into the processing units UB1 to UB3. After the processing B is performed, the processing units UB1 to UB3 are sequentially inserted into the processing unit UC as the child roll RR2, and the processing C is performed. Since three processing units UB whose processing speed VB is slower than the processing speed VC are provided according to the ratio of the processing speeds, the three processing units UB1 to UB3 appear to be three times the processing speed VB. The child roll RR2 is input to the processing unit VC at the same cycle as when the processing B is performed at the processing speed of.

  As described above, in this embodiment, when the processing speed VA> the processing speed VB can be set according to the performance of each processing unit UA, UB, the number n of processing units UA and the number m of processing units UB are set. Where n <m, the substrate P is cut into child rolls having a length corresponding to the number m, and selectively fed into any one of the m processing units UB1 to UBm. Therefore, the substrate P can be processed at the processing speed VA when viewed from the entire production line without being restricted by the low processing speed VB.

Further, when the processing speed VB <the processing speed VC can be set according to the performance of each of the processing units UB and UC, the substrate of the child roll RR2 subjected to the processing B by a plurality of (m) processing units UB1 to UBm. P is sequentially joined and supplied to n (n <m) processing units UC. Therefore, the waiting time until the substrate P is carried into the processing unit UC from the processing unit UB can be substantially suppressed.
Therefore, also in this case, the substrate P can be processed at the processing speed VC (≈VA) without being restricted by the low processing speed VB.

  Therefore, in the present embodiment, productivity can be improved even when a plurality of processes A to C having different processing speeds are sequentially performed. In the present embodiment, the number of processing units UB is set in accordance with the processing speed ratio. Therefore, efficient substrate processing can be realized without installing excessive equipment. In addition, in this embodiment, when the processing units UB1 to UB3 to be double-tracked are installed in multiple stages in the vertical direction, efficient substrate processing can be performed without increasing the installation area (footprint).

  In this embodiment, the cutting mechanism CU10 with a buffer mechanism and the joining mechanism PU10 with a buffer mechanism are installed as a station unit SN in a common configuration that can be used for both cutting and joining. Yes. Therefore, it is not necessary to install different types of devices individually, and it is possible to reduce the cost related to production facilities.

  That is, if the processing speed of the processing unit on the downstream side is lower than the processing unit on the upstream side in the transport direction of the substrate P between adjacent processing units among the series of processing units, the station unit SN Is installed as the cutting mechanism CU10, and the relationship between the processing speeds is reversed, the station portion SN may be installed as the joining mechanism PU10 between the adjacent processing units.

  That is, the substrate processing system of the present embodiment is configured to transfer the substrate P in the upstream processing unit (first processing unit) in the substrate P transport direction between adjacent processing units among a plurality of processing units. On the other hand, when reducing the transport speed of the substrate P in the downstream processing unit (second processing unit), the substrate P is placed between the first processing unit and the second processing unit in a predetermined length in the longitudinal direction. And a cutting mechanism CU10 for cutting at the time of increasing the transport speed of the substrate P in the second processing unit relative to the transport speed of the substrate P in the first processing unit, between the first processing unit and the second processing unit. In the meantime, a joining mechanism PU10 for joining the substrate P in the longitudinal direction can be provided.

(Device manufacturing system)
Next, a device manufacturing system to which the substrate processing system is applied will be described with reference to FIG.

  FIG. 6 is a diagram showing a partial configuration of a device manufacturing system (flexible display manufacturing line) as a substrate processing system. Here, the flexible substrate P (sheet, film, etc.) pulled out from the supply roll RR1 is sequentially passed through n processing devices U1, U2, U3, U4, U5,... Un to the recovery roll RR2. An example of winding up is shown. The host control device CONT (control unit) controls the processing devices U1 to Un constituting the production line.

  The processing devices U1 to Un shown in FIG. 6 may be any of the processing units UA to UC shown in FIG. 1, or two or more continuous processing devices in the processing devices U1 to Un. Collectively, it may correspond to any one of the processing units UA to UC.

  In FIG. 6, the orthogonal coordinate system XYZ is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the transport direction (long direction) of the substrate P is the Y-axis direction. It shall be set. The substrate P may be activated by modifying the surface in advance by a predetermined pretreatment, or may have a fine partition structure (uneven structure) for precise patterning formed on the surface.

  The substrate P wound around the supply roll RR1 is pulled out by the nipped driving roller DR10 and conveyed to the processing apparatus U1. The center of the substrate P in the Y-axis direction (width direction) is servo-controlled by the edge position controller EPC1 so as to be within a range of about ± 10 μm to several tens μm with respect to the target position.

  The processing device U1 prints photosensitive functional liquid (photoresist, photosensitive silane coupling material, photosensitive coupling material, photosensitive lyophobic modifier, photosensitive plating reducing agent, UV on the surface of the substrate P by a printing method. This is a coating apparatus that continuously or selectively applies a cured resin liquid or the like) in the transport direction (long direction) of the substrate P. In the processing apparatus U1, a pressure drum DR20 around which the substrate P is wound, a coating roller for uniformly applying the photosensitive functional liquid to the surface of the substrate P on the pressure drum DR20, or a photosensitive functional liquid is provided. A coating mechanism Gp1 including a letterpress or intaglio plate cylinder roller that prints a pattern as ink, a drying mechanism Gp2 that rapidly removes solvent or moisture contained in the photosensitive functional liquid applied to the substrate P, and the like are provided. .

  The processing device U2 heats the substrate P conveyed from the processing device U1 to a predetermined temperature (for example, about several tens to 120 ° C.) to stably fix the photosensitive functional layer applied to the surface. Device. In the processing apparatus U2, a plurality of rollers and an air turn bar for returning and transporting the substrate P, a heating chamber HA1 for heating the substrate P that has been carried in, and the temperature of the heated substrate P are set in a post-process (processing) A cooling chamber HA2 that lowers the ambient temperature of the apparatus U3) and a nipped drive roller DR3 are provided.

  The processing device U3 is an exposure device that irradiates the photosensitive functional layer of the substrate P conveyed from the processing device U2 with ultraviolet patterning light corresponding to the circuit pattern or wiring pattern for display. In the processing apparatus U3, an edge position controller EPC for controlling the center of the substrate P in the Y-axis direction (width direction) to a fixed position, the nipped drive roller DR4, and the substrate P are partially wound with a predetermined tension, There are provided a rotary drum DR5 for supporting a pattern exposed portion on the substrate P in a uniform cylindrical surface, and two sets of drive rollers DR6, DR7 for giving a predetermined slack (play) DL to the substrate P. Yes.

  Further, in the processing apparatus U3, a transmissive cylindrical mask DM, an illumination mechanism IU provided in the cylindrical mask DM and illuminating a mask pattern formed on the outer peripheral surface of the cylindrical mask DM, and a cylinder by a rotating drum DR5 are provided. In order to relatively align (align) the image of a part of the mask pattern of the cylindrical mask DM and the substrate P with a part of the substrate P supported in a planar shape, an alignment mark or the like previously formed on the substrate P is provided. Alignment microscopes AM1 and AM2 for detection are provided.

  The processing apparatus U4 is a wet processing apparatus that performs at least one of various wet processes such as a wet development process and an electroless plating process on the photosensitive functional layer of the substrate P conveyed from the process apparatus U3. It is. In the processing apparatus U4, there are provided three processing tanks BT1, BT2, BT3 layered in the Z-axis direction, a plurality of rollers for bending and transporting the substrate P, a nipped drive roller DR8, and the like. .

  The processing apparatus U5 is a heating and drying apparatus that warms the substrate P conveyed from the processing apparatus U4 and adjusts the moisture content of the substrate P wetted by the wet process to a predetermined value, but the details are omitted. After that, the substrate P that has passed through several processing devices and passed through the last processing device Un of the series of processes is wound up on the collection roll RR2 via the nipped drive roller DR10. Also during the winding, the drive roller DR10 and the collection roll are driven by the edge position controller EPC2 so that the center of the substrate P in the Y-axis direction (width direction) or the substrate end in the Y-axis direction does not vary in the Y-axis direction. The relative position of RR2 in the Y-axis direction is successively corrected and controlled.

  In the device manufacturing system of FIG. 6 described above, the processing units having a low processing speed are double-tracked according to the processing speeds of the processing apparatuses U1, U2, U3, U4, U5,. A cutting mechanism CU10 is provided in front of the processing apparatus, and a selective loading mechanism ST1 for loading the substrate into any of the plurality of processing apparatuses is provided.

  In addition, after a plurality of processing devices having a low processing speed, by providing a joining mechanism PU10 that sequentially joins a plurality of substrates carried out from each processing device, even when sequentially performing a plurality of processes with greatly different processing speeds, Productivity can be improved without being restricted by the processing steps with the lowest processing speed.

  In the case of the production line shown in FIG. 6, the processing apparatus U2 that performs the heat treatment can reduce the volume of the chamber portions HA1 and HA2 by suppressing the transfer speed of the substrate P as much as possible. There is an advantage that the footprint of the apparatus can be reduced.

  On the other hand, when the photosensitive functional liquid is patterned and applied to the surface of the substrate P in the processing device U1 immediately before the processing device U2, a plate cylinder (intaglio or letterpress) roller for pattern printing is used. After the photosensitive functional liquid is applied as ink, the pattern is transferred by pressing the substrate P against the plate cylinder roller. In this case, in order to improve the pattern transfer characteristic from the plate cylinder roller to the substrate P, it is necessary to feed the substrate P at a certain speed.

  Thus, there is a possibility that the desired substrate carrying speed (processing speed) differs greatly depending on the apparatus performance between the processing apparatus U1 and the processing apparatus U2. Therefore, in such a case, if the processing device U1 is the processing unit UA in FIG. 1 and the processing device U2 is double-tracked like the processing units UB1 to UB3 in FIG. 1, efficient and highly productive manufacturing is possible. A line can be constructed.

  Here, in the case of the processing system (manufacturing line) of FIG. 1, how much tact improvement can be expected as compared with the processing by the conventional single line is shown based on the model example shown in FIG. This will be described with reference to the time chart.

  FIG. 7A shows an example of a model in the case where the processing units UA, UB, UC responsible for each of the three processes A, B, C are performed one by one. Here, it is assumed that a substrate P having a total length of 1200 m is wound around the supply roll RRA. Further, it is assumed that each processing unit UA to UC has the following processing capability as the performance of the apparatus. That is, the processing unit UA has the ability to send and process the substrate P at a maximum of 15 cm / s, the processing unit UB has the ability to send and process the substrate P at a maximum of 5 cm / s, and the processing unit UC has Suppose that the substrate P has the ability to send and process at a maximum of 15 cm / s.

  In the case of such a single wire, since the conveyance speed of the substrate P in the entire line is adjusted to the speed of 5 cm / s of the slowest processing unit UB, the production tact time (all processing steps A, B, C on a 1200 m substrate) ) Is 400 minutes (6 hours 40 minutes).

  In contrast, FIG. 7B shows a model example of a production line that has been doubled as shown in FIG. Each performance of each processing unit UA, UB (UB1-UB3), and UC is the same as what was demonstrated by (a) of FIG. As in the previous FIG. 1, the processing unit UB responsible for the processing step B is doubled to provide three units UB1 to UB3, and the cutting processing time in the cutting mechanism CU10 after the processing unit UA and the selective charging mechanism ST1. The setup time including the child roll exchange time and the like is 3 minutes, and the setup time including the joining processing time in the joining mechanism PU10 before the processing unit UC and the child roll exchange time and the like by the selective charging mechanism ST2 is 3 minutes.

  Further, as shown in FIG. 7B, since the processing unit UB having a low processing speed is double-tracked, the processing units UA and UC can transfer the substrate P at a maximum speed of 15 cm / s guaranteed by each performance. Set to transport.

  The time chart of FIG. 8 is an estimate of the tact according to the model example of FIG. 7B, and the lines S1, S2, and S3 are virtually associated with each of the three processing units UB1 to UB3. It represents the processing time. At the start of processing, the substrate P from the supply roll RRA is processed by the processing unit UA. The substrate P is divided by the cutting mechanism CU10 every 1/3 of the total length of 1200 m. Therefore, the first 400 m of the substrate put into the processing unit UA is processed in about 44.4 minutes as shown in the line S1, and then passes through a setup time of 3 minutes in the cutting mechanism CU10. It is sent to the processing unit UB1.

  The tact time for the processing unit UB1 to process the substrate P for 400 m is 133.3 minutes. Thereafter, after about 3 minutes as a predetermined setup time (attachment of child rolls, etc.), the first 400 m substrate is put into the processing unit UC and processed at a transport speed of 15 cm / s. The tact time of the 400 m substrate by the processing unit UC is 44.4 minutes.

  During this time, as shown in line S2, the processing unit UA continues processing the second 400 m substrate for about 44.4 minutes, and then continues to the third 400 m substrate as shown in line S3. The process is continued for about 44.4 minutes at a transfer speed of 15 cm / s. The second 400 m substrate is sent to the processing unit UB2 after a setup time of 3 minutes by the cutting mechanism CU10, where it is processed over about 133.3 minutes.

It is 228.1 minutes after the start time that the processing of the first 400 m substrate is completed in the processing unit UC. However, before that, the processing of the second 400 m substrate is completed in the processing unit UB2, and the second 400 m substrate is set up for about 3 minutes via the joining mechanism PU10 and the selective loading mechanism ST2C. After time, it is bonded to the terminal portion of the first 400 m substrate.
Thereafter, the processing unit UC continuously processes the second 400 m substrate bonded to the first 400 m substrate at a transfer speed of 15 cm / s.

  Similarly, as shown in line S3, the third (last) 400 m substrate cut by the cutting mechanism CU10 is loaded into the processing unit UB3 when the processing in the processing unit UA is completed, and 133.3. After a minute, it is wound on a child roll RRB32. The processing for the third 400 m substrate is completed in the processing unit UB32 before the processing for the second 400 m substrate is completed in the processing unit UC.

  While the second 400 m substrate is being processed in the processing unit UC, the third 400 m substrate passes through the bonding mechanism PU10 and the selective loading mechanism ST2C, after a setup time of about 3 minutes. Bonded to the terminal portion of the substrate for 400 m. Thereafter, the processing unit UC continuously processes the third 400 m substrate bonded to the second 400 m substrate at a transfer speed of 15 cm / s.

  As described above, when the unit of the processing step B is doubled, processing of the substrate P for 1200 m is completed in 317 minutes (5 hours and 17 minutes). This is a tact improvement of about 20% (reduction of production time) compared with the model example of the single line processing shown in FIG.

  In the model example shown in FIG. 7B, the total length of the substrate P wound around the supply roll RRA as the parent roll is 1200 m. However, even if the total length is longer than that, the substrate in the cutting mechanism CU10. If the division is performed every 400 m, the substrate put into the production line can be continuously flowed until the last processing step C.

  In the model example shown in FIG. 7B, the three processing units UB1 to UB3 are all operated at the same processing speed (5 cm / s). The substrate transfer speed in UB3 may be changed by a minute amount.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

  For example, in the above-described embodiment, three processing units UB1 to UB3 are provided. However, two or four or more processing units may be provided as long as they are set according to the processing speed ratio.

  Moreover, in the said embodiment, the one part process in the manufacturing line comprised with a single wire shall be double-tracked. However, even when the original production line (production of the same product and product type) is double-tracked from the first process to the last process, a configuration applying the above embodiment is possible.

  For example, when two production lines for single-line processing as shown in FIG. 7A are originally juxtaposed, the cutting mechanism CU10 (CU101, CU101, CU101, CU2) is placed after each of the two processing units UA (UA1, UA2). CU102), and then the two low-tact processing units UB are doubled as five units UB1 to UB5 by adding three units, followed by two joint mechanisms PU10 (PU101, PU102) Thereafter, two processing units UC (UC1, UC2) may be provided.

  In such a configuration, the substrate having a unit length (for example, 400 m) cut by one of the cutting mechanisms CU101 and CU102 is sent to any one of the five processing units UB1 to UB5. In addition, the selective charging mechanism ST2 is configured, and each of the joining mechanisms PU101 and PU102 is selectively charged so that a substrate having a unit length (for example, 400 m) processed by any of the five processing units UB1 to UB5 can be received. The mechanism ST2 is configured.

  In the processing of the first processing units UA1 and UA2, when the processing unit UA1 processes a substrate from the supply roll RRA for a unit length (for example, 400 m), the processing unit UA2 starts processing the substrate from the supply roll RRA. It is better to give an intentional time difference.

  In this way, it is possible to avoid a roll exchanging work (temporary interruption of production) in which a parent roll (RRA) is simultaneously mounted on each of the two processing units UA1 and UA2, and each processing unit is made efficient. Can be operated automatically.

Second Embodiment Hereinafter, an embodiment of a substrate processing apparatus and a substrate processing method of the present invention will be described with reference to FIGS. In the present embodiment, the same components as those in the above embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 9 is a diagram showing a partial configuration of a device manufacturing system (flexible display manufacturing line) SYS as a substrate processing apparatus of the present embodiment. Here, the device manufacturing system SYS has a first mounting portion RS1 for mounting a supply roll (first roll) RR1, a second mounting portion RS2 (holding portion) for mounting a supply roll (second roll) RR2, and a collection roll ( 3rd roll) It is equipped with 3rd mounting part RS3 which mounts RR3, 4th mounting part RS4 which mounts | wears with collection | recovery roll (4th roll) RR4, and is withdrawn from one of supply rolls RR1 and RR2. Substrate P (sheet, film, etc.) is sequentially connected to first splicer section (substrate connection changing mechanism) CSa, first buffer mechanism BF1, n processing devices U1, U2, U3, U4, U5,. An example is shown in which the buffer mechanism BF2 and the second splicer unit (second substrate connection mechanism) CSb are passed through the recovery rolls RR3 and RR4.

  In the present embodiment, the substrate loaded as the processing substrate into the first and second buffer mechanisms BF1, BF2, and the processing apparatuses U1,. Substrates drawn from the supply rolls RR1 and RR2 before being loaded will be referred to as substrates P1 and P2 as appropriate. Substrates recovered by the recovery rolls RR3 and RR4 after processing by the processing apparatuses U1... Un will be referred to as substrates P3 and P4 as appropriate.

  The host control device CONT (control unit, second control unit) includes the processing devices U1 to Un and the first and second splicer units CSa and CSb, the first and second buffer mechanisms BF1 and BF2 constituting the production line. Take overall control. Further, the host controller CONT controls the rotational drive of the motor shaft MT1 mounted on the supply roll RR1 in the first mounting portion RS1, and the rotational drive of the motor shaft MT2 mounted on the supply roll RR2 in the second mounting portion RS2. To do. The host controller CONT includes an interlock control unit that links the cutting operation of the substrate P1 (first substrate) with the accumulation amount of the substrate P1 in the first buffer mechanism BF1 (buffer mechanism). In addition, the host controller CONT includes an interlock control unit that links the cutting operation of the substrate P (processing substrate) with the accumulated amount of the substrate P in the second buffer mechanism BF2.

  Further, as shown in FIG. 10, a supply sensor S1 for detecting the supply status of the substrate P1 in the supply roll RR1 is provided in the vicinity of the first mounting portion RS1. The supply sensor S1 outputs an end signal to the host controller CONT when the end of the supply of the substrate P1 is detected. Similarly, a supply sensor S2 that detects the supply status of the substrate P2 in the supply roll RR2 is provided in the vicinity of the second mounting portion RS2. The supply sensor S2 outputs an end signal to the host controller CONT when the end of the supply of the substrate P2 is detected.

  In FIG. 9, an orthogonal coordinate system XYZ is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the transport direction (long direction) of the substrate P is the Y-axis direction. It shall be set. The substrate P may be one obtained by modifying and activating the surface in advance by a predetermined pretreatment, or one having a fine partition wall structure (concavo-convex structure) with fine patterning formed on the surface.

  FIG. 10 is a diagram illustrating a schematic configuration of the first splicer unit CSa and the first buffer mechanism BF1.

  The first splicer unit CSa is used to connect the substrate drawn out from one of the supply rolls RR1 and RR2 and sent to the first buffer mechanism BF1 to the substrate drawn out from the other of the supply rolls RR1 and RR2. And a nip driving roller NR1 and cutting and joining units CU1 and CU2. The first splicer unit CSa (substrate connection changing mechanism) is a substrate P2 (second substrate) that is supplied from the supply roll RR2 (second roll) to a position that is a terminal portion of the substrate P1 (first substrate) to be cut. ), The control unit controls the cutting operation and the bonding operation so as to cut the substrate P1 (first substrate).

  The nip driving roller NR1 holds the substrate P1 or the substrate P2 and sends it to the first buffer mechanism BF1 or stops feeding the substrate P under the control of the host controller CONT. It arrange | positions in the substantially middle position of 1 mounting part RS1 and 2nd mounting part RS2.

  The cutting and joining units CU1 and CU2 are arranged symmetrically in the Z-axis direction with a virtual joining surface VF1 parallel to the XY plane passing through the position in the Z-axis direction of the nip driving roller NR1 as a center. The cutting and joining unit CU1 includes a suction pad 1A, a cutter 2A, and a tension roller 3A at a position facing the virtual joining surface VF1. Further, the cutting and joining unit CU1 is connected to the joining position where the cutting and joining unit CU2 and the suction pad 1A face each other as shown by a solid line in FIG. 10 and a two-dot chain line in FIG. The suction pad 1A rotates (oscillates) between the attachment position facing the first mounting part RS1. Furthermore, the cutting / bonding unit CU1 moves in a direction of separating and approaching the virtual bonding surface VF1 (that is, the cutting / bonding unit CU2) by a moving mechanism (not shown) at the bonding position. The suction pad 1A is disposed on the downstream side (+ X axis side) in the feed direction of the substrate P (substrate P1) with respect to the cutter 2A when the cutting and bonding unit CU1 is in the bonding position.

  Similarly, the cutting and joining unit CU2 includes a suction pad 1B, a cutter 2B, and a tension roller 3B at a position facing the virtual joining surface VF1. Further, the cutting / bonding unit CU2 is rotated by a rotation mechanism (not shown), as shown by a solid line in FIG. 10, and at a bonding position where the cutting / bonding unit CU1 and the suction pad 1B face each other, The suction pad 1B rotates (swings) between the attachment position facing the first mounting portion RS2. Furthermore, the cutting / bonding unit CU2 moves in the direction of separating and approaching the virtual bonding surface VF1 (that is, the cutting / bonding unit CU1) by a moving mechanism (not shown) at the bonding position. The suction pad 1B is disposed on the downstream side (+ X axis side) in the feeding direction of the substrate P (substrate P2) relative to the cutter 2B when the cutting and bonding unit CU2 is in the bonding position.

  The movement of these cutting and joining units CU1 and CU2 is controlled by the host controller CONT.

  The first buffer mechanism BF1 is disposed between the processing apparatus (processing mechanism) U1 and the first splicer unit CSa, and temporarily accumulates the substrate P sent from the first splicer unit CSa within a predetermined longest accumulation range. Is sent to the processing device U1, and includes a dancer roller mechanism DR1 and a nip drive roller NR2.

  The nip drive roller NR2 holds the substrate P accumulated in the first buffer mechanism BF1 and sends it to the processing device U1, and is connected to the nip drive roller NR1 on the downstream side of the dancer roller mechanism DR1 in the feed direction of the substrate P. Arranged at substantially the same Z-axis position.

  In the dancer roller mechanism DR1, a plurality of upper rollers RJ1 whose lifting range is relatively above and lower rollers RK1 whose lifting range is relatively below are alternately arranged in the X direction, and each roller RJ1. , RK1 can move independently in the Z-axis direction. The upper dead center position JU1 and the lower dead center position JD1 of the upper roller RJ1 are set to positions above the upper dead center position JU2 and the lower dead center position JD2 of the lower roller RK1. The operation of the dancer roller mechanism DR1 is also controlled by the host controller CONT.

FIG. 11 is a diagram illustrating a schematic configuration of the second splicer unit CSb and the second buffer mechanism BF2.
The second buffer mechanism BF2 is disposed between the processing apparatus (processing mechanism) Un and the second splicer unit CSb, and temporarily accumulates the substrate P sent from the processing apparatus Un within a predetermined longest accumulation range. It is sent to the second splicer section CSb and includes a nip drive roller NR3 and a dancer roller mechanism DR2.

  The dancer roller mechanism DR2 includes a plurality of upper rollers RJ2 whose lifting ranges are positioned relatively upward and lower rollers RK2 whose lifting ranges are positioned relatively downward in the X-axis direction. RJ2 and RK2 can move independently in the Z-axis direction. The top dead center position JU3 and the bottom dead center position JD3 of the upper roller RJ2 are set to positions above the top dead center position JU4 and the bottom dead center position JD4 of the lower roller RK2. The operation of the dancer roller mechanism DR2 is also controlled by the host controller CONT.

  The second splicer unit CSb transfers the substrate P, which is sent from the second buffer mechanism BF2 and is collected by one of the collection rolls RR3 and RRR4, to be collected by either one of the collection rolls RR3 and RRR4. A nip driving roller NR4 and cutting and joining units CU3 and CU4 are provided.

  The nip driving roller NR4 sends the substrate P sent from the second buffer mechanism BF2 toward the cutting and joining units CU3 and CU4 or stops the feeding of the substrate P under the control of the host controller CONT. The position in the Z-axis direction is a substantially intermediate position between the third mounting portion RS3 and the fourth mounting portion RS4, and is disposed at the position of the virtual joint surface VF2 parallel to the XY plane.

  The cutting and joining units CU3 and CU4 are arranged symmetrically in the Z-axis direction with the virtual joining surface VF2 as the center. The cutting and joining unit CU3 includes a suction pad 1C, a cutter 2C, and a tension roller 3C at a position facing the virtual joining surface VF2. Further, the cutting and joining unit CU3 is rotated by a rotation mechanism (not shown), as shown by a solid line in FIG. 11, and at a joining position where the cutting and joining unit CU4 and the suction pad 1C face each other, and as shown by a two-dot chain line in FIG. The suction pad 1C is rotationally moved (oscillated) between the attachment position facing the third mounting portion RS3. Further, the cutting / bonding unit CU3 moves in a direction of separating and approaching the virtual bonding surface VF2 (that is, the cutting / bonding unit CU4) by a moving mechanism (not shown) at the bonding position.

  The suction pad 1C is disposed upstream of the cutter 2C in the feed direction of the substrate P (−X axis side) when the cutting / bonding unit CU3 is in the bonding position.

Similarly, the cutting and joining unit CU4 includes a suction pad 1D, a cutter 2D, and a tension roller 3D at a position facing the virtual joining surface VF2. Further, the cutting and joining unit CU4 is connected to a joining position where the cutting and joining unit CU3 and the suction pad 1D face each other by a rotation mechanism (not shown) as shown by a solid line in FIG. 11, and as shown by a two-dot chain line in FIG. The suction pad 1D is rotationally moved (oscillated) between the attachment position facing the fourth mounting portion RS4. Furthermore, the cutting / bonding unit CU4 moves in the direction of separating and approaching the virtual bonding surface VF2 (that is, the cutting / bonding unit CU3) by a moving mechanism (not shown) at the bonding position. The suction pad 1D is disposed on the upstream side (−X axis side) in the feed direction of the substrate P relative to the cutter 2D when the cutting and joining unit CU4 is at the joining position.
The movement of these cutting and joining units CU3 and CU4 is controlled by the host controller CONT.

  As shown in FIG. 11, in the third mounting portion RS3, the collection roller RR3 is mounted on the motor shaft MT3. In the fourth mounting portion RS4, the collection roller RR4 is mounted on the motor shaft MT4. The rotational drive of the motor shaft MT3 and the rotational drive of the motor shaft MT4 are controlled by the host controller CONT.

  As shown in FIG. 11, a winding sensor S3 for detecting the winding state of the substrate P3 on the collection roller RR3 is provided in the vicinity of the third mounting portion RS3. The winding sensor S3 outputs an end signal to the host control device CONT when the end of winding of the substrate P3 is detected. Similarly, a winding sensor S4 that detects the winding state of the substrate P4 on the collection roller RR4 is provided in the vicinity of the fourth mounting portion RS4. The winding sensor S4 outputs an end signal to the host control device CONT when the end of winding of the substrate P4 is detected.

  The collection rollers RR3 and RR4 have a leading end connected to the roll core and a pull-in pull-in substrate (third substrate) PK (the substrate PK of the collection roller RR4 in FIG. 11) to which the substrate P3 or the substrate 4 is bonded to the terminal end. Only shown). The substrate PK may be the same material as the substrate P that is processed by the processing apparatuses U1 to Un, or may be substantially the same thickness as the substrate P and the material may be different.

  The processing apparatus U5 of the present embodiment warms the substrate P transferred from the processing apparatus U4, adjusts the moisture content of the substrate P moistened by a wet process to a predetermined value, crystallizes semiconductor material, and metal nano Although it is a heat drying apparatus that performs thermal annealing (200 ° or less) for removing the solvent of ink containing particles, the details are omitted. After that, the substrate P that has passed through several processing apparatuses and passed through the last processing apparatus Un of the series of processes is temporarily accumulated in the second buffer mechanism BF2, and is appropriately switched in the second splicer unit CSb. Then, it is wound up on the recovery roll RR3 or the recovery roll RR4.

  Next, operations of the first splicer unit CSa and the first buffer mechanism BF1 in the processing of the substrate P in the device manufacturing system SYS having the above configuration will be described with reference to FIGS. The operations of the various processing devices and component devices constituting the device manufacturing system SYS are controlled by the host control device CONT. In the following description, the description related to the control by the host control device CONT is omitted.

  In FIG. 12, the substrate P1 drawn from the supply roll RR1 is sent to the first buffer mechanism BF1 as the first substrate via the roller 3A and the nip driving roller NR1 of the cutting and joining unit CU1, and the first buffer mechanism BF1 It is the figure accumulate | stored temporarily. As shown in FIG. 12, in the first buffer mechanism BF1, the upper roller RJ1 is located at the top dead center position JU1, and the lower roller RK1 is located at the bottom dead center position JD2, so that the substrate P is in the first buffer mechanism. A length close to the longest in the mechanism BF1 is accumulated.

In the second mounting portion RS2, when the supply roll RR2 wound with the substrate P2 to be reconnected when the substrate P1 of the supply roll RR1 is exhausted is mounted on the motor shaft MT2, the cutting and joining unit CU2 is rotated and sucked. The pad 1B is moved to the attachment position. The tip of the substrate P2 is sucked (connected or connected) and fixed to the suction pad 1B at the sticking position, and then a double-sided tape T is stuck on the surface opposite to the suction side.
The suction of the substrate P2 to the suction pad 1B and the attachment of the double-sided tape T are performed by an operator or using a robot or the like.

  When the suction fixing of the substrate P2 on which the double-sided tape T is stuck to the suction pad 1B is completed, the cutting and joining unit CU2 is rotated to move the substrate P2 to the joining position as shown in FIG. A predetermined tension is applied to the substrate P2 by rotating the supply roll RR2 in the direction opposite to the supply direction of the substrate P2 (counterclockwise in FIG. 13) by rotating the MT2.

  On the other hand, when the supply sensor S1 detects the end of the supply of the substrate P1 from the supply roll RR1, the driving of the nip drive roller NR1 is stopped and the motor shaft MT1 is rotated in the direction opposite to the feeding direction of the substrate P1. A weak tension is applied to the substrate P1 between the nip driving roller NR1 and the supply roll RR1.

  Even after the driving of the nip driving roller NR1 is stopped, the nip driving roller NR2 continues to drive. Therefore, the dancer roller mechanism DR1 is operated, and the upper roller RJ1 is lowered and the lower roller RK1 is appropriately raised according to the driving of the nip driving roller NR2. As a result, the substrate P accumulated in the first buffer mechanism BF1 is continuously sent to the processing device U1 at a constant speed by the nip driving roller NR2.

  Next, as shown in FIG. 14, the cutting and joining units CU1 and CU2 are moved in a direction approaching each other, and the substrates P1 and P2 are pressure-bonded between the suction pads 1A and 1B for a predetermined time with the double-sided tape T interposed therebetween. . Thereby, the board | substrate P2 is bonded and bonded to the board | substrate P1 via the double-sided tape T in the position used as the termination | terminus part of the board | substrate P1 by being cut | disconnected by a post process.

  The nip driving roller NR2 and the dancer roller mechanism DR1 are continuously driven even while the substrates P1 and P2 are bonded, and the substrate P accumulated in the first buffer mechanism BF1 is transferred to the nip driving roller. The signal is continuously sent to the processing unit U1 by NR2.

  When the substrate P1 and the substrate P2 are bonded, after the suction pad 1B in the cutting / bonding unit CU2 is opened to the atmosphere, as shown in FIG. 15, the cutting / bonding unit CU2 is separated from the cutting / bonding unit CU1 (+ Z-axis direction) ). Thereby, the front-end | tip part of the board | substrate P2 pulled out from supply roll RR2 is adsorbed-held by the suction pad 1A of the cutting | disconnection joining unit CU1 in the state joined (connected or connected) to the board | substrate P1 by the double-sided tape T.

  Thereafter, the opposing substrate P1 is cut by the cutter 2A in the cutting and joining unit CU1 in a state where tension is applied to the substrate P1 between the cutting and joining unit CU1 and the supply roll RR1. As the cutter 2A, for example, a configuration in which the substrate P1 is cut by sliding the blade edge in the width direction (Y-axis direction) of the substrate P1 can be adopted.

  While the substrate P1 is being cut, the nip driving roller NR2 and the dancer roller mechanism DR1 are continuously driven, and the substrate P accumulated in the first buffer mechanism BF1 is processed by the nip driving roller NR2. It continues to be sent to U1 at a constant speed.

  When the substrate P1 is cut, the suction pad 1A in the cutting / bonding unit CU1 is opened to the atmosphere, and then, as shown in FIG. 16, the cutting / bonding unit CU1 is separated from the cutting / bonding unit CU2 (virtual bonding surface VF1) (− Move in the Z-axis direction). Thereby, the substrate P1 drawn out from the supply roll RR1 is wound around the supply roll RR1 by rotation in the direction opposite to the feeding direction of the supply roll RR1.

  Further, for the supply roll RR2, the substrate P2 is tensioned between the rotary roll RR2 and the nip drive roller NR1 (and the roller 3B) by the rotational torque in the direction opposite to the feed direction of the supply roll RR2. As a result, the substrate connected to the substrate P stored in the first buffer mechanism BF1 is switched to the substrate P2 as the second substrate drawn out from the supply roll RR2. The substrate P2 as the second substrate may have a standard equivalent to that of the substrate P1 (first group).

  Thereafter, the nip driving roller NR1 rotates at a slightly faster speed than the nip driving roller NR2, and in the dancer roller mechanism DR1, as shown in FIG. 17, the upper roller RJ1 is driven according to the driving of the nip driving roller NR1. Raise and lower the lower roller RK1 as appropriate. Further, when the motor shaft MT2 is rotationally driven in the feeding direction, the substrate P2 drawn from the supply roll RR2 is fed, and the accumulation length of the substrate P in the first buffer mechanism BF1 increases.

  Then, when the accumulation length of the substrate P in the first buffer mechanism BF1 is substantially maximized, the nip drive roller NR1 rotates at the same speed as the nip drive roller NR2, so that the accumulation length of the substrate P in the first buffer mechanism BF1. Balance. Further, the supply roll RR1 almost depleted of the substrate P1 is removed (detachable) from the first mounting portion RS1, and another supply roll RR5 around which the substrate P5 is wound is mounted as shown in FIG.

  When the supply roll RR5 is mounted, based on the detection result of the supply sensor S2, before the substrate P2 in the supply roll RR2 is exhausted, the cutting and joining unit CU1 is rotated to attach the suction pad 1A as shown in FIG. Move to the set position. The tip of the substrate P5 is sucked and fixed (connected or connected) to the suction pad 1A at the sticking position, and then a double-sided tape T is stuck on the surface opposite to the suction side.

  Thereafter, the supply roll RR5 is rotated in the direction opposite to the supply direction of the substrate P5 (counterclockwise in FIG. 18) by rotating the motor shaft MT1, thereby cutting the substrate P5 while applying a predetermined tension. The joining unit CU1 is rotated and moved to the joining position as shown in FIG.

  When the supply sensor S2 detects the end of the supply of the substrate P2 on the supply roll RR2, the driving of the nip drive roller NR1 is stopped and the cutting and joining units CU1 and CU2 are brought closer to each other in the same manner as described above. The substrates P2 and P5 are pressure-bonded between the suction pads 1A and 1B for a certain time with the double-sided tape T interposed therebetween, and the substrate P2 is cut by the cutter 2B in the cutting and joining unit CU2. As a result, the substrate connected to the substrate P accumulated in the first buffer mechanism BF1 is switched to the substrate P5 drawn out from the supply roll RR5.

  In this way, the sequentially switched substrate P is subjected to the photosensitive functional liquid coating process in the processing apparatus U1, the heating process in the processing apparatus U2, the pattern exposure process in the processing apparatus U3, the wet process in the processing apparatus U4, and the processing apparatus U5. After the heat-drying process is performed, it is sequentially sent to the second buffer mechanism BF2 and the second splicer part CSb, and is recovered to the recovery roll RR3 or the recovery roll RR4.

  Next, operations of the second splicer part CSb and the second buffer mechanism BF2 on the collection roll side in the processing of the substrate P in the device manufacturing system SYS having the above configuration will be described with reference to FIGS.

  In FIG. 20, the substrate P, which is a processing substrate, is sent to and accumulated in the second buffer mechanism BF2 via the nip drive roller NR3, and sent (discharged) from the second buffer mechanism BF2 via the nip drive roller NR4. The substrate P is recovered by the recovery roll RR3 mounted on the third mounting portion RS3 via the roller 3C of the cutting and joining unit CU3. As shown in FIG. 20, in the second buffer mechanism BF2, the upper roller RJ2 is positioned at the bottom dead center position JD3, and the lower roller RK2 is positioned at the top dead center position JU4. The length close to the shortest is accumulated in the two-buffer mechanism BF2.

  When the collection roll RR4 for collecting the substrate P is mounted on the motor shaft MT4 after the winding and recovery of the collection roll RR3 is completed in the fourth mounting unit RS4, the cutting and joining unit CU4 is rotated to attach the suction pad 1D. Move to the set position. For the suction pad 1D at the pasting position, the end portion of the drawing substrate PK (hereinafter simply referred to as the substrate PK) whose tip is connected to the recovery roll RR4 is sucked and fixed (connected or connected), Then, the double-sided tape T is stuck on the surface opposite to the suction side. When the double-sided tape T is pasted on the substrate PK, the cutting and joining unit CU4 is rotated and moved to the joining position, and the collection roll RR4 is driven by the rotational drive of the motor shaft MT4 to collect the substrate PK (substrate P) (see FIG. In FIG. 20, a predetermined tension is applied to the substrate PK by rotating it clockwise.

  When the winding sensor S3 detects the end of the recovery of the substrate P by the recovery roll RR3, the driving of the nip drive roller NR4 is stopped and the dancer roller mechanism DR2 is operated to raise the upper roller RJ2 and lower roller RK2. Is lowered as appropriate. As a result, the substrate P sent from the processing device U5 by the nip drive roller NR3 increases the accumulation length in the second buffer mechanism BF2 by a constant amount (feed amount corresponding to the transport speed of the substrate P on the production line). Accumulated.

  On the other hand, when the recovery of the substrate P by the recovery roll RR3 is completed, as shown in FIG. 21, the cutting and joining units CU3 and CU4 are moved toward each other, and the suction pads 1C and 1D are interposed with the double-sided tape T interposed therebetween. The substrates P and PK are pressure-bonded for a certain period of time. As a result, the terminal portion of the substrate PK is bonded to (bonded to or connected to) the substrate P via the double-sided tape T at a position that becomes a tip when the substrate P is cut in a subsequent process.

  When the substrate P and the substrate PK are bonded, after the suction pad 1D in the cutting / bonding unit CU4 is opened to the atmosphere, as shown in FIG. 22, the cutting / bonding unit CU4 is separated from the cutting / bonding unit CU3 (+ Z-axis direction). ). Thereby, the front-end | tip part of the board | substrate PK is adsorbed-held by the suction pad 1C of the cutting | disconnection joining unit CU3 in the state joined to the board | substrate P by the double-sided tape T.

  Then, the substrate P which opposes is cut | disconnected by the cutter 2C in the cutting | disconnection joining unit CU3 in the state which provided the tension | tensile_strength to the board | substrate P between cutting | disconnection joining unit CU3 and collection | recovery roll RR3. When the substrate P is cut, the suction pad 1C in the cutting / bonding unit CU3 is opened to the atmosphere, and then the cutting / bonding unit CU3 is moved away from the cutting / bonding unit CU4 (−Z-axis direction) as shown in FIG. Let As a result, the collection destination of the substrate P sent from the second buffer mechanism BF2 (that is, the substrate P processed by the processing apparatuses U1 to Un) is switched to the collection roll RR4.

  While the joining process and the cutting process in the second splicer part CSb are performed, the upper roller RJ2 and the lower roller RK2 in the second buffer mechanism BF2 are appropriately raised and lowered from the processing device U5. The substrate P sent by the nip drive roller NR3 is accumulated while increasing the accumulation length in the second buffer mechanism BF2 by a certain amount.

  When the switching of the collection destination of the substrate P to the collection roll RR4 is completed, the nip drive roller NR4 rotates at a slightly faster speed than the nip drive roller NR3, and the dancer roller mechanism DR2 drives the nip drive roller NR4. Accordingly, the upper roller RJ2 is lowered and the lower roller RK2 is appropriately moved to reduce the length of the substrate P accumulated in the second buffer mechanism BF2 during the joining process and the cutting process in the second splicer unit CSb. The minimum accumulation length in the initial state is set (see FIG. 24). After the length of the substrate P accumulated in the second buffer mechanism BF2 becomes almost minimum, the nip driving roller NR4 is rotated at the same speed as the nip driving roller NR3.

  On the other hand, in the third mounting portion RS3 in which the recovery of the substrate P is completed, the recovery roll RR3 is removed, and the leading end portion of the drawing substrate PK2 (hereinafter simply referred to as the substrate PK2) is connected (connected) as shown in FIG. (Or bonded) is attached to the motor shaft MT3 and fixed to the suction pad 1C of the cutting and joining unit CU3 rotated to the attaching position by adsorbing the terminal portion of the substrate PK2, and then reverse to the suction side. A double-sided tape T is attached to the side surface.

  When the double-sided tape T is pasted on the substrate PK2, the cutting and joining unit CU3 is rotated and moved to the joining position, and the collecting roller RR6 is rotated by the motor shaft MT3 and the collecting direction of the substrate PK2 (substrate P) (see FIG. In the state in which a predetermined tension is applied to the substrate PK2, the apparatus waits until the end of recovery of the recovery roll RR3 by the winding sensor S4.

  As described above, in the present embodiment, while the substrate P is temporarily accumulated by the first buffer mechanism BF1 and sent to the processing apparatus U1, the substrate P is connected to the substrate P2 drawn from the new supply roll RR2. Instead, it is sent to the first buffer mechanism BF1. Therefore, it becomes possible to change the roll which becomes a supply source, without stopping each process by the processing apparatuses U1 to Un. Therefore, in this embodiment, it is possible to avoid a situation in which the substrate P that has been put into the processing apparatuses U1 to Un at the time of changing the supply roll is wasted and causes an increase in cost.

  Further, in the present embodiment, the substrate collection destination is switched while the substrate P sent from the processing apparatus Un is temporarily stored in the second buffer mechanism BF2. Therefore, even when the collection destination of the substrate P is changed, it is possible to avoid a situation in which the substrate P that has been put into the processing apparatuses U1 to Un at the time of the change is wasted and causes an increase in cost.

  Further, in the present embodiment, in the first splicer unit CSa and the second splicer unit CSb, the new substrate is bonded to the previously used substrate, and then the previous substrate is cut. For this reason, when cutting is performed first, stable substrate processing can be performed without causing problems such as separation of the substrate at the time of cutting due to the applied tension and hindering bonding. .

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

  For example, in the above-described embodiment, the configuration in which the processing mechanism includes the plurality of processing devices U1 to Un is illustrated. However, the present invention is not limited to this, and a configuration in which the above-described substrate switching mechanism is provided in one processing apparatus may be employed.

  Moreover, in the said embodiment, it was set as the structure separately provided with the collection | recovery roll to which the drawing-in board | substrate PK was connected. However, for example, a configuration in which a supply roll that has been used and the tip end substrate is cut may be used.

  Moreover, in the said embodiment, it was set as the structure provided with two roll mounting parts in the supply side and collection | recovery side, respectively. However, you may provide three or more roll mounting parts, respectively.

  In the above embodiment, before the substrate supplied from one of the two supply rolls becomes the roll end, the processing is continued without stopping the production line by automatically adding the substrate from the other roll. I tried to do it. If there is a defect in the pattern formed on the substrate somewhere in the production line, or if a defect occurs in the production apparatus, a large number of defective products may be produced.

  Therefore, in the production line until the final product is made, a number of processes for performing a process with a long substrate are divided into several blocks, and each block performs continuous processing by roll-to-roll. Even if it is a production line (factory) configuration that the process block is transported in roll units wound around the substrate on which the semi-finished product is formed and set in a predetermined mounting portion (RS1 or RS2) good. In that case, substrate transfer can be performed continuously in units of process blocks, and even if a problem (pattern defect, equipment failure, etc.) occurs in a certain process block, only that process block is temporarily stopped. The generation of a large number of defective products can be reduced.

  In the above embodiment, the supply rolls RR1 and RR2 mounted on each of the two mounting portions RS1 and RS2 are formed by winding a sheet-like substrate for product manufacture by an equal length, Immediately before the substrate supply from the supply roll RR1 is completed (roll end), the substrate is switched to the substrate of the other supply roll RR2, and the processing is continued until the end of the substrate of the supply roll RR2. However, the supply roll mounted on one of the mounting portions RS1 and RS2 is used such that the substrate is continuously supplied to the processing apparatuses U1 to Un only while the other supply roll serving as the roll end is replaced with a new roll. May be.

  In this case, for example, the supply roll serving as the roll end is RR2, the roll RR2 is removed from the mounting portion RS2, the new supply roll is mounted on the mounting portion RS2, and the preparation for joining at the first splicer portion CSa is completed ( Assuming that the setup time up to the state of FIG. 13 is 180 seconds, the length of the substrate (P1) put into the processing apparatus U1 (production line) from the other supply roll RR1 during this period is the feed rate of the substrate being processed If it is 50 mm / sec, it will be 9 m.

  Therefore, when the substrate (P1) for 9 m is supplied from the other supply roll RR1, the tip of the substrate (P2) from the new supply roll RR2 mounted on the mounting unit RS2 is immediately removed by the first splicer unit CSa. After joining (connecting or connecting) to the position of the substrate (P1) that has been introduced into the processing unit U1 from the supply roll RR1 by about 9 m, the substrate (P1) is cut and the substrate (P2) from the supply roll RR2 You may change the connection.

  In addition, when the substrate (P1) from the supply roll RR1 loaded in the mounting portion RS1 is used as a temporary connection substrate (for example, about 9 m), it is performed on the substrate (P1). The processing to be performed may be pilot processing for setting the conditions of the processing apparatuses U1 to Un and maintenance management, and the device formed there may not be used as a final product.

  Further, when the substrate is used as a temporary connection substrate (for example, about 9 m), it is not necessary to wind the substrate (P1) around the supply roll RR1, for example, a single substrate cut into a length of 10 m. May be folded and stored in a case or the like, and substrates (10 m) may be taken out one by one from the case and supplied to the first splicer unit CSa.

  The technical scope of the present invention is not limited to the above-described embodiments. For example, one or more of the elements described in the above embodiments may be omitted. The elements described in the above embodiments can be combined as appropriate.

  BF1: first buffer mechanism (first buffer unit, buffer mechanism), BF2: second buffer mechanism (second buffer unit), CSa: first splicer unit (substrate switching mechanism), CSb: second splicer unit (first CU ... cutting mechanism, FS ... substrate, P ... substrate, PK, PK2 ... pull-in substrate (third substrate), PU10 ... joining mechanism, RR1 ... supply roll (first roll), RR2 ... supply Roll (second roll), RR3 ... recovery roll (third roll), RR4 ... recovery roll (fourth roll), RS1 ... first mounting section, RS2 ... second mounting section, RS3 ... third mounting section, RS4 ... 4th mounting part, ST ... selection input mechanism, SYS ... device manufacturing system (substrate processing apparatus), UA, UB, UB1-UB3, UC ... processing unit, U1-U ... processing unit (processing mechanism)

Claims (6)

After a long sheet substrate having flexibility is transported at a first speed in the first processing unit and subjected to the first processing, in the second processing unit, at a second speed that is slower than the first speed. A substrate processing system for transporting and performing a second process,
Two or more of the second processing units are installed for one of the first processing units,
A first supply roll that is provided for the first processing unit and wound with a predetermined length on the sheet substrate before performing the first processing; and the sheet substrate after performing the first processing. A first holding unit that detachably mounts a first collection roll that is wound up;
A second supply roll provided for each of the plurality of second processing units, the sheet substrate before being subjected to the second processing being wound at a predetermined length, and after the second processing has been performed A second holding part for detachably mounting a second collection roll on which the sheet substrate is wound,
The sheet substrate is provided between the first processing unit and the first recovery roll and has a predetermined unit length shorter than the total length of the sheet substrate wound around the first supply roll. A cutting mechanism that cuts the sheet substrate when processed by the first processing unit and wound on the first collection roll,
The first collection roll mounted on the first holding unit and winding the sheet substrate by the predetermined unit length is provided for any one of the plurality of second processing units. Attached to the second holding unit as the second supply roll,
Substrate processing system. The substrate processing system according to claim 1,
When the first speed is VA and the second speed is VB, the number of the second processing units is provided according to the speed ratio VA / VB.
Substrate processing system. The substrate processing system according to claim 2,
After the sheet substrate is cut by the cutting mechanism, the first collection roll that has wound the sheet substrate that has been subjected to the first treatment by the predetermined unit length is removed from the first holding unit. A selection loading mechanism mounted on the second holding unit provided for any one of the plurality of second processing units;
Substrate processing system. The substrate processing system according to any one of claims 1 to 3,
When the number of installed first processing units is 2 or more, the number of the second processing units is set to m more than n, and the cutting mechanism is provided for each of the n first processing units. N units are provided corresponding to
Substrate processing system. The substrate processing system according to any one of claims 1 to 3,
The cutting mechanism includes: a buffer unit that temporarily accumulates the sheet substrate carried out from the first processing unit at a predetermined length; and the sheet substrate between the first collection roll and the buffer unit. A splicer section for cutting,
Substrate processing system. A substrate processing system according to any one of claims 1 to 5,
The first processing unit or the second processing unit is
A coating apparatus that forms a photosensitive functional layer on the surface of the sheet substrate to be carried in; an exposure apparatus that carries in the patterning light to the photosensitive functional layer by carrying in the sheet substrate on which the photosensitive functional layer is formed; A wet processing apparatus that carries in the wet processing by carrying in the sheet substrate irradiated with the patterning light,
Substrate processing system.

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