JP2018074134A5 - - Google Patents
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- Publication number
- JP2018074134A5 JP2018074134A5 JP2017094848A JP2017094848A JP2018074134A5 JP 2018074134 A5 JP2018074134 A5 JP 2018074134A5 JP 2017094848 A JP2017094848 A JP 2017094848A JP 2017094848 A JP2017094848 A JP 2017094848A JP 2018074134 A5 JP2018074134 A5 JP 2018074134A5
- Authority
- JP
- Japan
- Prior art keywords
- frequency component
- insulating layer
- conductive layer
- component according
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010410 layer Substances 0.000 claims 43
- 238000004519 manufacturing process Methods 0.000 claims 11
- 238000000034 method Methods 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 9
- 229910010272 inorganic material Inorganic materials 0.000 claims 6
- 239000011147 inorganic material Substances 0.000 claims 6
- 239000011368 organic material Substances 0.000 claims 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims 3
- 239000003990 capacitor Substances 0.000 claims 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 3
- 230000015556 catabolic process Effects 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- 239000012044 organic layer Substances 0.000 claims 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021047843A JP7211445B2 (ja) | 2016-10-24 | 2021-03-22 | 高周波部品及びその製造方法 |
| JP2023002629A JP7586202B2 (ja) | 2016-10-24 | 2023-01-11 | 高周波部品及びその製造方法 |
| JP2024195376A JP7773719B2 (ja) | 2016-10-24 | 2024-11-07 | 高周波部品及びその製造方法 |
| JP2025189346A JP2026021549A (ja) | 2016-10-24 | 2025-11-10 | 高周波部品及びその製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016208093 | 2016-10-24 | ||
| JP2016208093 | 2016-10-24 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021047843A Division JP7211445B2 (ja) | 2016-10-24 | 2021-03-22 | 高周波部品及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018074134A JP2018074134A (ja) | 2018-05-10 |
| JP2018074134A5 true JP2018074134A5 (https=) | 2020-03-19 |
| JP6857329B2 JP6857329B2 (ja) | 2021-04-14 |
Family
ID=62114404
Family Applications (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017094848A Active JP6857329B2 (ja) | 2016-10-24 | 2017-05-11 | 高周波部品及びその製造方法 |
| JP2021047843A Active JP7211445B2 (ja) | 2016-10-24 | 2021-03-22 | 高周波部品及びその製造方法 |
| JP2023002629A Active JP7586202B2 (ja) | 2016-10-24 | 2023-01-11 | 高周波部品及びその製造方法 |
| JP2024195376A Active JP7773719B2 (ja) | 2016-10-24 | 2024-11-07 | 高周波部品及びその製造方法 |
| JP2025189346A Pending JP2026021549A (ja) | 2016-10-24 | 2025-11-10 | 高周波部品及びその製造方法 |
Family Applications After (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021047843A Active JP7211445B2 (ja) | 2016-10-24 | 2021-03-22 | 高周波部品及びその製造方法 |
| JP2023002629A Active JP7586202B2 (ja) | 2016-10-24 | 2023-01-11 | 高周波部品及びその製造方法 |
| JP2024195376A Active JP7773719B2 (ja) | 2016-10-24 | 2024-11-07 | 高周波部品及びその製造方法 |
| JP2025189346A Pending JP2026021549A (ja) | 2016-10-24 | 2025-11-10 | 高周波部品及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (5) | JP6857329B2 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019244382A1 (ja) * | 2018-06-21 | 2019-12-26 | 大日本印刷株式会社 | 配線基板および半導体装置 |
| JP7287185B2 (ja) * | 2019-04-05 | 2023-06-06 | 株式会社村田製作所 | 電子部品、電子部品実装基板及び電子部品の製造方法 |
| CN114208405B (zh) * | 2019-06-18 | 2024-11-08 | 凸版印刷株式会社 | 具有lc谐振电路的多层配线基板以及利用具有lc谐振电路的多层配线基板的电子元件封装 |
| US12408475B2 (en) | 2020-12-28 | 2025-09-02 | Suzhou Institute Of Nano-Tech And Nano-Bionics (Sinano) , Chinese Academy Of Sciences | Interconnected electrode structure having multi-conductive through hole and method of manufacturing same |
| JP2023012187A (ja) | 2021-07-13 | 2023-01-25 | 株式会社村田製作所 | インダクタ部品およびインダクタ部品の実装構造 |
| JP7786091B2 (ja) * | 2021-09-15 | 2025-12-16 | Ｔｏｐｐａｎホールディングス株式会社 | 配線基板 |
| CN120052061A (zh) * | 2022-11-04 | 2025-05-27 | 大日本印刷株式会社 | 贯通电极基板以及贯通电极基板的制造方法 |
| WO2024122114A1 (ja) * | 2022-12-07 | 2024-06-13 | 株式会社村田製作所 | 電子部品およびその製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000353780A (ja) * | 1999-06-11 | 2000-12-19 | Sony Corp | 容量素子の製造方法及び容量素子 |
| JP4177560B2 (ja) | 2001-03-16 | 2008-11-05 | 株式会社ルネサステクノロジ | 薄膜コンデンサ及び受動素子内蔵電子部品と高周波対応モジュール |
| EP1383146A1 (en) * | 2001-04-27 | 2004-01-21 | Matsushita Electric Industrial Co., Ltd. | Capacitor and its manufacturing method |
| JP4574383B2 (ja) * | 2005-02-16 | 2010-11-04 | 京セラ株式会社 | 薄膜コンデンサおよび配線基板 |
| JP2007142109A (ja) * | 2005-11-17 | 2007-06-07 | Tdk Corp | 電子部品 |
| JP2007300002A (ja) | 2006-05-01 | 2007-11-15 | Tdk Corp | 電子部品 |
| JP4370340B2 (ja) * | 2007-03-26 | 2009-11-25 | Ｔｄｋ株式会社 | 電子部品 |
| EP2286391B1 (en) * | 2008-05-15 | 2019-08-14 | Thin Film Electronics ASA | Surveillance devices with multiple capacitors |
| US9935166B2 (en) * | 2013-03-15 | 2018-04-03 | Qualcomm Incorporated | Capacitor with a dielectric between a via and a plate of the capacitor |
-
2017
- 2017-05-11 JP JP2017094848A patent/JP6857329B2/ja active Active
-
2021
- 2021-03-22 JP JP2021047843A patent/JP7211445B2/ja active Active
-
2023
- 2023-01-11 JP JP2023002629A patent/JP7586202B2/ja active Active
-
2024
- 2024-11-07 JP JP2024195376A patent/JP7773719B2/ja active Active
-
2025
- 2025-11-10 JP JP2025189346A patent/JP2026021549A/ja active Pending
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