JP2018056383A - 基板洗浄装置及び基板処理装置 - Google Patents
基板洗浄装置及び基板処理装置 Download PDFInfo
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- JP2018056383A JP2018056383A JP2016191945A JP2016191945A JP2018056383A JP 2018056383 A JP2018056383 A JP 2018056383A JP 2016191945 A JP2016191945 A JP 2016191945A JP 2016191945 A JP2016191945 A JP 2016191945A JP 2018056383 A JP2018056383 A JP 2018056383A
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- 239000000758 substrate Substances 0.000 title claims abstract description 208
- 238000004140 cleaning Methods 0.000 title claims abstract description 179
- 238000012545 processing Methods 0.000 title claims abstract description 19
- 230000007246 mechanism Effects 0.000 claims abstract description 21
- 238000005259 measurement Methods 0.000 claims abstract description 6
- 238000005498 polishing Methods 0.000 claims description 24
- 230000003028 elevating effect Effects 0.000 claims description 9
- 230000005856 abnormality Effects 0.000 claims description 5
- 238000007517 polishing process Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B13/00—Brushes with driven brush bodies or carriers
- A46B13/02—Brushes with driven brush bodies or carriers power-driven carriers
-
- B08B1/32—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02096—Cleaning only mechanical cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Abstract
【解決手段】 長尺状のロール洗浄部材を平板状の基板に摺接させて基板の洗浄処理を行う基板洗浄装置は、ロール洗浄部材を回転可能に支持するロールホルダと、ロールホルダを支持する連結部材を備え、ロール洗浄部材が基板に所定のロール荷重を加えるようにロールホルダを昇降させる昇降機構と、連結部材に設けられ、ロール洗浄部材と基板との摩擦力を測定するセンサ部材と、センサ部材の測定値に基づき、ロール洗浄部材と基板との摩擦力をフィードバック制御する制御部とを備える。
【選択図】図3
Description
15 制御装置
30,31 基板洗浄装置
40 スピンドル
42 ロールホルダ
46、48 ロール洗浄部材
54 ロードセル
60 昇降機構
64 制御部
70 チルト機構
72 ブラケット
82 センサ部材
Claims (7)
- 長尺状のロール洗浄部材を平板状の基板に摺接させて前記基板の洗浄処理を行う基板洗浄装置において、
前記ロール洗浄部材を回転可能に支持するロールホルダと、
前記ロールホルダを支持する連結部材を備え、前記ロール洗浄部材が前記基板に所定のロール荷重を加えるように前記ロールホルダを昇降させる昇降機構と、
前記連結部材に設けられ、前記ロール洗浄部材と前記基板との摩擦力を測定するセンサ部材と、
前記センサ部材の測定値に基づき、前記ロール洗浄部材と前記基板との摩擦力をフィードバック制御する制御部とを備えたことを特徴とする基板洗浄装置。 - 前記センサ部材は前記連結部材の内部に配置されていることを特徴とする、請求項1記載の基板洗浄装置。
- 前記センサ部材は、前記ロール洗浄部材による前記基板へのロール荷重を測定し、
前記制御部は、前記センサ部材からのロール荷重の測定値に基づき前記ロールホルダの昇降を制御して前記ロール荷重をフィードバックすることを特徴とする、請求項1または2記載の基板洗浄装置。 - 前記制御部は、前記センサ部材により測定されたロール荷重と摩擦力より前記ロール洗浄部材と前記基板との間の摩擦係数を算出し、算出された摩擦係数が所定範囲から外れた場合に前記ロール洗浄部材の異常を検出する、請求項3記載の基板洗浄装置。
- 前記連結部材は、前記ロールホルダの長さ方向に沿ったほぼ中央に配置されていることを特徴とする、請求項1ないし4のいずれか一項に記載の基板洗浄装置。
- 請求項1ないし5のいずれか一項に記載の基板洗浄装置を備えたことを特徴とする基板処理装置。
- 平板状の基板に研磨処理を行う基板研磨装置と、研磨処理後の前記基板を洗浄する基板洗浄装置と、前記基板研磨装置と前記基板洗浄装置の動作を制御する制御装置とを備えた基板処理装置であって、
前記基板洗浄装置は、
前記基板に摺接される長尺状のロール洗浄部材と、
前記ロール洗浄部材を回転可能に支持するロールホルダと、
前記ロールホルダを支持する連結部材を備え、前記ロール洗浄部材が前記基板に所定のロール荷重を加えるように前記ロールホルダを昇降させる昇降機構と、
前記連結部材に設けられ、前記ロール洗浄部材と前記基板との摩擦力を測定するセンサ部材とを備え、
前記制御部は、前記センサ部材の測定値に基づき、前記ロール洗浄部材と前記基板との摩擦力をフィードバック制御することを特徴とする基板処理装置。
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JP2016191945A JP6767834B2 (ja) | 2016-09-29 | 2016-09-29 | 基板洗浄装置及び基板処理装置 |
US15/715,847 US10361101B2 (en) | 2016-09-29 | 2017-09-26 | Substrate cleaning apparatus and substrate processing apparatus X |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2020009882A (ja) * | 2018-07-06 | 2020-01-16 | 株式会社荏原製作所 | 基板洗浄装置および基板洗浄方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US10388548B2 (en) * | 2016-05-27 | 2019-08-20 | Texas Instruments Incorporated | Apparatus and method for operating machinery under uniformly distributed mechanical pressure |
CN110340041B (zh) * | 2018-04-04 | 2022-03-11 | 深圳御烟实业有限公司 | 一种用于清洁电加热烟具的刷头 |
CN110473800A (zh) * | 2018-05-10 | 2019-11-19 | 弘塑科技股份有限公司 | 清洗装置及方法 |
CN109272908B (zh) * | 2018-09-20 | 2021-12-21 | 合肥合大精睿科技有限公司 | 一种全自动显示屏传感器性能检测装置 |
JP7339811B2 (ja) * | 2019-08-27 | 2023-09-06 | 株式会社荏原製作所 | リテーナリングに局所荷重を伝達するローラーの異常検出方法および研磨装置 |
KR20210144071A (ko) | 2020-05-21 | 2021-11-30 | 삼성전자주식회사 | 틸팅 가능한 롤 브러쉬를 갖는 기판 세정 장치 |
Citations (4)
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JP2006332534A (ja) * | 2005-05-30 | 2006-12-07 | Tokyo Seimitsu Co Ltd | 基板洗浄装置 |
JP2008515171A (ja) * | 2004-09-28 | 2008-05-08 | 株式会社荏原製作所 | 基板洗浄装置及び洗浄部材の交換時期判定方法 |
JP2014038983A (ja) * | 2012-08-20 | 2014-02-27 | Ebara Corp | 基板洗浄装置及び基板処理装置 |
JP2015220402A (ja) * | 2014-05-20 | 2015-12-07 | 株式会社荏原製作所 | 基板洗浄装置および基板洗浄装置で実行される方法 |
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JP3328426B2 (ja) * | 1994-05-12 | 2002-09-24 | 東京エレクトロン株式会社 | 洗浄装置 |
KR0171491B1 (ko) * | 1994-09-20 | 1999-03-30 | 이시다 아키라 | 회전식 기판세정장치 |
JP3953716B2 (ja) | 2000-08-01 | 2007-08-08 | 株式会社荏原製作所 | 基板洗浄装置 |
US20140310895A1 (en) * | 2013-04-19 | 2014-10-23 | Applied Materials, Inc. | Scrubber brush force control assemblies, apparatus and methods for chemical mechanical polishing |
JP6328577B2 (ja) * | 2015-02-24 | 2018-05-23 | 株式会社荏原製作所 | 荷重測定装置および荷重測定方法 |
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JP2008515171A (ja) * | 2004-09-28 | 2008-05-08 | 株式会社荏原製作所 | 基板洗浄装置及び洗浄部材の交換時期判定方法 |
JP2006332534A (ja) * | 2005-05-30 | 2006-12-07 | Tokyo Seimitsu Co Ltd | 基板洗浄装置 |
JP2014038983A (ja) * | 2012-08-20 | 2014-02-27 | Ebara Corp | 基板洗浄装置及び基板処理装置 |
JP2015220402A (ja) * | 2014-05-20 | 2015-12-07 | 株式会社荏原製作所 | 基板洗浄装置および基板洗浄装置で実行される方法 |
Cited By (2)
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JP2020009882A (ja) * | 2018-07-06 | 2020-01-16 | 株式会社荏原製作所 | 基板洗浄装置および基板洗浄方法 |
JP7079164B2 (ja) | 2018-07-06 | 2022-06-01 | 株式会社荏原製作所 | 基板洗浄装置および基板洗浄方法 |
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US20180090347A1 (en) | 2018-03-29 |
US10361101B2 (en) | 2019-07-23 |
JP6767834B2 (ja) | 2020-10-14 |
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