JP2018049908A - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- JP2018049908A JP2018049908A JP2016183918A JP2016183918A JP2018049908A JP 2018049908 A JP2018049908 A JP 2018049908A JP 2016183918 A JP2016183918 A JP 2016183918A JP 2016183918 A JP2016183918 A JP 2016183918A JP 2018049908 A JP2018049908 A JP 2018049908A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 178
- 238000000034 method Methods 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 8
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 229910021478 group 5 element Inorganic materials 0.000 claims description 5
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- 230000005684 electric field Effects 0.000 description 17
- 230000015556 catabolic process Effects 0.000 description 12
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004645 scanning capacitance microscopy Methods 0.000 description 2
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
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- 230000006872 improvement Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- Electrodes Of Semiconductors (AREA)
Abstract
【解決手段】実施形態によれば、半導体装置は、第1導電形の第1、第2、第4、第6半導体領域、第2導電形の第3、第5半導体領域、及び、電極を含む。第1半導体領域は、第1、第2部分領域を含む。第2半導体領域は、第1部分領域からから離れる。第3半導体領域は、第1部分領域と第2半導体領域との間に設けられる。第4半導体領域は、第1部分領域と第3半導体領域との間に設けられる。電極は、第2部分領域から離れ、第2、第3、第4半導体領域から離れる。第6半導体領域は、第1絶縁膜と第5半導体領域との間に設けられる。第6半導体領域における第1導電形の不純物濃度は、第4半導体領域における第1導電形の不純物濃度よりも高い。
【選択図】図1
Description
図面は模式的または概念的なものであり、各部分の厚みと幅との関係、部分間の大きさの比率などは、必ずしも現実のものと同一とは限らない。同じ部分を表す場合であっても、図面により互いの寸法や比率が異なって表される場合もある。
本願明細書と各図において、既出の図に関して前述したものと同様の要素には同一の符号を付して詳細な説明は適宜省略する。
図1(a)及び図1(b)は、第1の実施形態に係る半導体装置を例示する模式図である。
図1(a)は、図1(b)に示すB1−B2線による断面に相当する断面図である。図1(b)は、図1(a)のA1−A2線で切断したときの斜視図である。
図2(a)及び図2(b)は、半導体装置の特性を例示するグラフ図である。
これらの図は、半導体装置の特性のシミュレーション結果の例を示している。図2(a)は、実施形態に係る半導体装置110に対応する。図2(b)は、第1参考例の半導体装置119aに対応する。これらの図の横軸は、Z軸方向に沿った位置pz(μm)である。これらの図の縦軸は、エネルギーE(eV)である。これらの図には、価電子帯のエネルギーEvと、伝導帯のエネルギーEcと、が描かれている。これらの図において、第6半導体領域16のn形の不純物濃度(第1不純物濃度C1)は、8×1017/cm3である。一方、第4半導体領域14のn形の不純物濃度(第2不純物濃度)は、8×1015/cm3である。
図3(a)〜図3(c)は、半導体装置の特性を例示するグラフ図である。
これらの図は、第5半導体領域15及び第6半導体領域16を有する半導体装置における特性のシミュレーション結果の例を示している。横軸は、Z軸方向に沿った位置pz(μm)である。縦軸は、エネルギーE(eV)である。これらの図において、第6半導体領域16におけるn形の不純物濃度(第1不純物濃度C1)が互いに異なる。図3(a)においては、第1不純物濃度C1は、8×1016/cm3である。図3(b)においては、第1不純物濃度C1は、8×1017/cm3である。図3(c)においては、第1不純物濃度C1は、8×1018/cm3である。これらの図において、第4半導体領域14におけるn形の不純物濃度(第2不純物濃度)は、8×1015/cm3である。
これらの図は、第5半導体領域15及び第6半導体領域16を有する半導体装置における特性を例示している。これらの図の横軸は、第6半導体領域16のn形の不純物濃度(第1不純物濃度C1)である。図4(a)の縦軸は、逆方向電圧を印加したときのゲート絶縁膜(例えば、第1絶縁膜31)に加わる最大電界Emax(MV/cm)である。図4(a)には、1.2kVクラスの素子において、1200Vの逆方向電圧が印加された時の最大電界Emaxが示されている。図4(b)の縦軸は、エネルギーバリアハイトΔE(eV)である。
図5は、実施形態に係る半導体装置110の第6半導体領域16及び第5半導体領域15における不純物の測定結果の例を示す。横軸は、Z軸方向に沿った位置pz(μm)である。縦軸は、不純物濃度の絶対値AC(/cm3)である。不純物濃度の絶対値ACは、第1導電形の不純物濃度と、第2導電形の不純物濃度と、の差である。第6半導体領域16においては、第1導電形の不純物濃度は、第2導電形の不純物濃度よりも高い。第6半導体領域16において、不純物濃度の絶対値ACは、(「第1導電形の不純物濃度」−「第2導電形の不純物濃度」)である。第5半導体領域15においては、第2導電形の不純物濃度は、第1導電形の不純物濃度よりも高い。第5半導体領域15において、不純物濃度の絶対値ACは、(「第2導電形の不純物濃度」−「第1導電形の不純物濃度」)である。
図6(a)に示すように、積層体SBが用意される。積層体SBは、例えば、第1〜第4半導体膜11F〜14Fを含む。第1半導体膜11Fは、基板18sの上に設けられ、第1導電形である。第4半導体膜14Fは、第1半導体膜11Fの上に設けられ、第1導電形である。第3半導体膜13Fは、第4半導体膜14Fの上に設けられ、第2導電形である。第2半導体膜12Fは、第3半導体膜13Fの上に設けられ、第1導電形である。この例では、第7半導体領域17が設けられている。これらの半導体膜、及び、第7半導体領域17は、例えばSiC膜である。
本製造方法によれば、信頼性を向上できる半導体装置の製造方法を提供できる。
図7(a)に示すように、基板18sの上に設けられた第1半導体領域11の上に、第4半導体領域14の一部14p、及び、第5半導体領域15を形成する。これらの半導体領域は、例えば、エピタキシャル成長により形成しても良い。
図8(a)及び図8(b)は、第2の実施形態に係る半導体装置を例示する模式図である。
図8(a)は、図8(b)に示すB1−B2線による断面に相当する断面図である。図8(b)は、図8(a)のA1−A2線で切断したときの斜視図である。
Claims (8)
- 第1部分領域と第2部分領域とを含み第1導電形の第1半導体領域と、
前記第1部分領域から前記第2部分領域に向かう第1方向と交差する第2方向において前記第1部分領域から離れた前記第1導電形の第2半導体領域と、
前記第1部分領域と前記第2半導体領域との間に設けられた第2導電形の第3半導体領域と、
前記第1部分領域と前記第3半導体領域との間に設けられた前記第1導電形の第4半導体領域と、
前記第2方向において前記第2部分領域から離れ前記第1方向において前記第2半導体領域、前記第3半導体領域、及び、前記第4半導体領域の一部から離れた第1電極と、
前記第2方向において前記第2部分領域と前記第1電極との間、前記第1方向において、前記第2半導体領域と前記第1電極との間、前記第1方向において前記第3半導体領域と前記第1電極との間、及び、前記第1方向において前記第4半導体領域の前記一部と前記第1電極との間に設けられ、前記第3半導体領域と接した第1絶縁膜と、
前記第2方向において前記第1絶縁膜と前記第2部分領域との間に設けられた前記第2導電形の第5半導体領域と、
前記第2方向において前記第1絶縁膜と前記第5半導体領域との間に設けられた前記第1導電形の第6半導体領域と、
を備え、
前記第6半導体領域における前記第1導電形の第1不純物濃度は、前記第4半導体領域における前記第1導電形の第2不純物濃度よりも高い、半導体装置。 - 前記第1不純物濃度は、前記第2不純物濃度の1.2倍以上40倍以下である、請求項1記載の半導体装置。
- 前記第1不純物濃度と、前記第6半導体領域における前記第2導電形の第3不純物濃度と、の第1差は、前記第2不純物濃度と、前記第4半導体領域における前記第2導電形の第4不純物濃度と、の第2差よりも大きい、請求項1または2に記載の半導体装置。
- 前記第1不純物濃度は、8×1016/cm3以上8×1018/cm3以下である、請求項1〜3のいずれか1つに記載の半導体装置。
- 前記第1不純物濃度は、前記第2半導体領域における前記第1導電形の不純物濃度よりも低い、請求項1〜4のいずれか1つに記載の半導体装置。
- 前記第1方向において、前記第5半導体領域の少なくとも一部は、前記第1半導体領域の一部と重なる、請求項1〜5のいずれか1つに記載の半導体装置。
- 前記第1〜第6半導体領域は、炭化珪素を含み、
前記第5半導体領域は、III族元素及びV族元素を含み、
前記第6半導体領域は、前記III族元素及び前記V族元素を含む、請求項1〜6のいずれか1つに記載の半導体装置。 - 基板の上に設けられた第1導電形の第1半導体膜と、前記第1半導体膜の上に設けられた前記第1導電形の第4半導体膜と、前記第4半導体膜の上に設けられた第2導電形の第3半導体膜と、前記第3半導体膜の上に設けられた前記第1導電形の第2半導体膜と、を含む積層体に、前記第2半導体膜から前記第4半導体膜の一部に到達するトレンチを形成し、
前記トレンチの側壁に第1絶縁部を形成し、前記トレンチの底部の少なくとも一部は前記第1絶縁部に覆われず、
前記トレンチの前記底部の前記少なくとも一部に第2導電形の不純物を導入し、
前記トレンチの前記底部の前記少なくとも一部の、前記第2導電形の前記不純物が導入された部分の上側部分に第1導電形の不純物を導入し、前記第1導電形の前記不純物が導入された前記上側部分における前記第1導電形の前記不純物の濃度は、前記第1導電形の前記不純物が導入された前記上側部分における前記第2導電形の前記不純物の濃度よりも高く、
前記第1導電形の前記不純物が導入された前記上側部分の上に第2絶縁部を形成し、
前記第2絶縁部の上の前記トレンチの残余の空間に導電材料を導入して第1電極を形成する、
半導体装置の製造方法。
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