JP2018027882A5 - - Google Patents
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- Publication number
- JP2018027882A5 JP2018027882A5 JP2017126465A JP2017126465A JP2018027882A5 JP 2018027882 A5 JP2018027882 A5 JP 2018027882A5 JP 2017126465 A JP2017126465 A JP 2017126465A JP 2017126465 A JP2017126465 A JP 2017126465A JP 2018027882 A5 JP2018027882 A5 JP 2018027882A5
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- rare earth
- earth metal
- blank
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 11
- 238000000034 method Methods 0.000 claims 6
- 229910052761 rare earth metal Inorganic materials 0.000 claims 6
- 150000002910 rare earth metals Chemical class 0.000 claims 6
- 238000000265 homogenisation Methods 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 238000005187 foaming Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 238000009616 inductively coupled plasma Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16176590.4A EP3263533B1 (de) | 2016-06-28 | 2016-06-28 | Seltenerdmetall-dotiertes quarzglas sowie verfahren für dessen herstellung |
| EP16176590.4 | 2016-06-28 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018027882A JP2018027882A (ja) | 2018-02-22 |
| JP2018027882A5 true JP2018027882A5 (https=) | 2020-03-12 |
| JP6800816B2 JP6800816B2 (ja) | 2020-12-16 |
Family
ID=56289353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017126465A Active JP6800816B2 (ja) | 2016-06-28 | 2017-06-28 | 希土類金属ドープされた石英ガラス、およびその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10336645B2 (https=) |
| EP (1) | EP3263533B1 (https=) |
| JP (1) | JP6800816B2 (https=) |
| CN (1) | CN107540201B (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020012933A (ja) * | 2018-07-17 | 2020-01-23 | 住友電気工業株式会社 | 光ファイバ |
| EP3643687B1 (de) * | 2018-10-26 | 2022-11-30 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur homogenisierung von glas |
| EP3643688B1 (de) * | 2018-10-26 | 2022-12-14 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur homogenisierung von glas |
| EP3708547A1 (de) * | 2019-03-13 | 2020-09-16 | Heraeus Quarzglas GmbH & Co. KG | Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils |
| CN116947311B (zh) * | 2023-07-26 | 2024-03-08 | 连云港福京石英制品有限公司 | 大功率激光器增益介质用掺杂石英玻璃其制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3194667B2 (ja) | 1994-03-26 | 2001-07-30 | 信越石英株式会社 | 光学用合成石英ガラス成形体及びその製造方法 |
| JP3672592B2 (ja) * | 1994-07-13 | 2005-07-20 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
| US7045737B2 (en) * | 2003-03-03 | 2006-05-16 | Sumitomo Electric Industries, Ltd. | Glass-processing method and glass-processing apparatus for the method |
| DE10333059A1 (de) * | 2003-07-18 | 2005-02-17 | Heraeus Tenevo Ag | Verfahren zur Herstellung eines optischen Bauteils aus Quarzglas sowie Hohlzylinder aus Quarzglas zur Durchführung des Verfahrens |
| US7637126B2 (en) | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| DE102004006017B4 (de) * | 2003-12-08 | 2006-08-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
| DE102004024808B4 (de) * | 2004-05-17 | 2006-11-09 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung |
| US7365037B2 (en) * | 2004-09-30 | 2008-04-29 | Shin-Etsu Quartz Products Co., Ltd. | Quartz glass having excellent resistance against plasma corrosion and method for producing the same |
| WO2006104178A1 (en) * | 2005-03-29 | 2006-10-05 | Asahi Glass Company, Limited | Quartz-type glass and process for its production |
| DE102005017739B4 (de) * | 2005-04-15 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters |
| JP4979960B2 (ja) * | 2006-02-28 | 2012-07-18 | 信越石英株式会社 | 光学用希土類金属元素含有シリカガラスの製造方法 |
| JP2008056533A (ja) * | 2006-08-31 | 2008-03-13 | Shinetsu Quartz Prod Co Ltd | 石英ガラス及びその製造方法 |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| JP2008273798A (ja) * | 2007-05-01 | 2008-11-13 | Sumitomo Electric Ind Ltd | ガラス体延伸方法 |
| JP2009001471A (ja) * | 2007-06-25 | 2009-01-08 | Sumitomo Electric Ind Ltd | ガラス延伸体製造方法 |
| JP5777880B2 (ja) * | 2010-12-31 | 2015-09-09 | 株式会社Sumco | シリカガラスルツボの製造方法 |
| JP6241276B2 (ja) * | 2013-01-22 | 2017-12-06 | 信越化学工業株式会社 | Ｅｕｖリソグラフィ用部材の製造方法 |
| CN103224318B (zh) * | 2013-04-14 | 2016-03-30 | 久智光电子材料科技有限公司 | 一种低羟基大直径大长度实心石英砣的制备方法 |
| JP6310378B2 (ja) * | 2013-11-28 | 2018-04-11 | 信越化学工業株式会社 | 光ファイバ用シリカガラス母材の製造方法 |
| DE102014115534A1 (de) * | 2014-10-24 | 2016-04-28 | J-Plasma Gmbh | Verfahren zum bi-direktionalen und/oder unidirektionalen Abtragen einer Glasmantelschicht eines Glasförmlings und Glasförmling |
-
2016
- 2016-06-28 EP EP16176590.4A patent/EP3263533B1/de active Active
-
2017
- 2017-06-27 US US15/634,634 patent/US10336645B2/en active Active
- 2017-06-28 JP JP2017126465A patent/JP6800816B2/ja active Active
- 2017-06-28 CN CN201710507245.7A patent/CN107540201B/zh active Active
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