JP6800816B2 - 希土類金属ドープされた石英ガラス、およびその製造方法 - Google Patents

希土類金属ドープされた石英ガラス、およびその製造方法 Download PDF

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Publication number
JP6800816B2
JP6800816B2 JP2017126465A JP2017126465A JP6800816B2 JP 6800816 B2 JP6800816 B2 JP 6800816B2 JP 2017126465 A JP2017126465 A JP 2017126465A JP 2017126465 A JP2017126465 A JP 2017126465A JP 6800816 B2 JP6800816 B2 JP 6800816B2
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Japan
Prior art keywords
quartz glass
plasma
rare earth
earth metal
homogenization
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JP2017126465A
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English (en)
Japanese (ja)
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JP2018027882A5 (https=
JP2018027882A (ja
Inventor
バイアール ハーディ
バイアール ハーディ
グリム シュテファン
グリム シュテファン
シュースター カイ
シュースター カイ
デリト ヤン
デリト ヤン
ラングナー アンドレアス
ラングナー アンドレアス
シェッツ ゲアハート
シェッツ ゲアハート
レーマン ヴァルター
レーマン ヴァルター
カイザー トーマス
カイザー トーマス
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Heraeus Quarzglas GmbH and Co KG
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Heraeus Quarzglas GmbH and Co KG
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
    • C03C2201/3488—Ytterbium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/17—Solid materials amorphous, e.g. glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2017126465A 2016-06-28 2017-06-28 希土類金属ドープされた石英ガラス、およびその製造方法 Active JP6800816B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16176590.4A EP3263533B1 (de) 2016-06-28 2016-06-28 Seltenerdmetall-dotiertes quarzglas sowie verfahren für dessen herstellung
EP16176590.4 2016-06-28

Publications (3)

Publication Number Publication Date
JP2018027882A JP2018027882A (ja) 2018-02-22
JP2018027882A5 JP2018027882A5 (https=) 2020-03-12
JP6800816B2 true JP6800816B2 (ja) 2020-12-16

Family

ID=56289353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017126465A Active JP6800816B2 (ja) 2016-06-28 2017-06-28 希土類金属ドープされた石英ガラス、およびその製造方法

Country Status (4)

Country Link
US (1) US10336645B2 (https=)
EP (1) EP3263533B1 (https=)
JP (1) JP6800816B2 (https=)
CN (1) CN107540201B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020012933A (ja) * 2018-07-17 2020-01-23 住友電気工業株式会社 光ファイバ
EP3643687B1 (de) * 2018-10-26 2022-11-30 Heraeus Quarzglas GmbH & Co. KG Verfahren und vorrichtung zur homogenisierung von glas
EP3643688B1 (de) * 2018-10-26 2022-12-14 Heraeus Quarzglas GmbH & Co. KG Verfahren zur homogenisierung von glas
EP3708547A1 (de) * 2019-03-13 2020-09-16 Heraeus Quarzglas GmbH & Co. KG Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils
CN116947311B (zh) * 2023-07-26 2024-03-08 连云港福京石英制品有限公司 大功率激光器增益介质用掺杂石英玻璃其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3194667B2 (ja) 1994-03-26 2001-07-30 信越石英株式会社 光学用合成石英ガラス成形体及びその製造方法
JP3672592B2 (ja) * 1994-07-13 2005-07-20 信越化学工業株式会社 合成石英ガラス部材の製造方法
US7045737B2 (en) * 2003-03-03 2006-05-16 Sumitomo Electric Industries, Ltd. Glass-processing method and glass-processing apparatus for the method
DE10333059A1 (de) * 2003-07-18 2005-02-17 Heraeus Tenevo Ag Verfahren zur Herstellung eines optischen Bauteils aus Quarzglas sowie Hohlzylinder aus Quarzglas zur Durchführung des Verfahrens
US7637126B2 (en) 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
DE102004006017B4 (de) * 2003-12-08 2006-08-03 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben
DE102004024808B4 (de) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung
US7365037B2 (en) * 2004-09-30 2008-04-29 Shin-Etsu Quartz Products Co., Ltd. Quartz glass having excellent resistance against plasma corrosion and method for producing the same
WO2006104178A1 (en) * 2005-03-29 2006-10-05 Asahi Glass Company, Limited Quartz-type glass and process for its production
DE102005017739B4 (de) * 2005-04-15 2009-11-05 Heraeus Quarzglas Gmbh & Co. Kg Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters
JP4979960B2 (ja) * 2006-02-28 2012-07-18 信越石英株式会社 光学用希土類金属元素含有シリカガラスの製造方法
JP2008056533A (ja) * 2006-08-31 2008-03-13 Shinetsu Quartz Prod Co Ltd 石英ガラス及びその製造方法
DE102007017004A1 (de) * 2007-02-27 2008-08-28 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils
JP2008273798A (ja) * 2007-05-01 2008-11-13 Sumitomo Electric Ind Ltd ガラス体延伸方法
JP2009001471A (ja) * 2007-06-25 2009-01-08 Sumitomo Electric Ind Ltd ガラス延伸体製造方法
JP5777880B2 (ja) * 2010-12-31 2015-09-09 株式会社Sumco シリカガラスルツボの製造方法
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
CN103224318B (zh) * 2013-04-14 2016-03-30 久智光电子材料科技有限公司 一种低羟基大直径大长度实心石英砣的制备方法
JP6310378B2 (ja) * 2013-11-28 2018-04-11 信越化学工業株式会社 光ファイバ用シリカガラス母材の製造方法
DE102014115534A1 (de) * 2014-10-24 2016-04-28 J-Plasma Gmbh Verfahren zum bi-direktionalen und/oder unidirektionalen Abtragen einer Glasmantelschicht eines Glasförmlings und Glasförmling

Also Published As

Publication number Publication date
CN107540201B (zh) 2021-08-27
CN107540201A (zh) 2018-01-05
EP3263533A1 (de) 2018-01-03
JP2018027882A (ja) 2018-02-22
US10336645B2 (en) 2019-07-02
US20170369359A1 (en) 2017-12-28
EP3263533B1 (de) 2019-05-08

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