JP2017524745A - 樹脂膜及び樹脂膜の製造方法 - Google Patents
樹脂膜及び樹脂膜の製造方法 Download PDFInfo
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- JP2017524745A JP2017524745A JP2016557860A JP2016557860A JP2017524745A JP 2017524745 A JP2017524745 A JP 2017524745A JP 2016557860 A JP2016557860 A JP 2016557860A JP 2016557860 A JP2016557860 A JP 2016557860A JP 2017524745 A JP2017524745 A JP 2017524745A
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- resin film
- fluoropolymer
- silica particles
- photopolymerizable
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Abstract
Description
ΔCA=|CA2−CA1|
P2/P1<0.43
P2/P1<0.43
一具現例の樹脂膜は、最外表面の凹部及び凸部の高低差が約10nm〜約65nmであり、下記の式1で表示される接触角の差(ΔCA)が約10°未満である。
ΔCA=|CA2−CA1|
(Rf1)−[(W1)−(RA1)n]m
[(Rf2)−(W2)]n−SiX(4−n)
P2/P1<0.43
次に、本発明の更に他の具現例に係る樹脂膜10の製造方法について説明する。まず、粒径が約20nm超〜約100nm以下である中空シリカ粒子20aと、平均粒径が約20nm以下である中実シリカ粒子20bと、光開始剤と、バインダ用モノマーと、添加剤40とを溶媒に投入、攪拌することで、コート液を生成するステップを含むことができる。前記添加剤40は、光重合性フッ素ポリマー及び熱重合性フッ素ポリマーを含む。前記コート液の組成は上述した通りである。溶媒の種類は特に限定されないが、例えば、沸点約110℃以上のケトン系溶媒を好適に使用することができる。この溶媒は、各材料を安定して溶解することができ、かつ、光重合性フッ素ポリマー41及び熱重合性フッ素ポリマー42を容易にブリードアウトさせることができるからである。ついで、コート液を任意の基板に塗布、乾燥することで、塗布層を形成するステップを含むことができる。なお、塗布の方法は特に問われず、公知の方法が任意に適用される。このとき、光重合性フッ素ポリマー41及び熱重合性フッ素ポリマー42は、バインダ用モノマーからの反発力によってブリードアウトし、塗布層の表面に偏在する。これにより、前記塗布層の表面にブリードアウトした前記光重合性フッ素ポリマーと熱重合性フッ素ポリマーによる保護層50を形成することができる。ついで、各重合反応を開始させる。これにより、バインダ樹脂30が形成される一方、光重合性フッ素ポリマー41及び熱重合性フッ素ポリマー42は、塗布層の表面に配置された中空シリカ粒子20a、中実シリカ粒子20b、及びバインダ樹脂30に結合する。これにより、樹脂膜10が形成される。
次に、本実施形態の実施例について説明する。実施例1では、以下の製法により樹脂膜10を製造した。
各材料の含有率、及び中実シリカ粒子の平均粒径を変更したほかは、実施例1と同様の処理を行うことで、実施例2〜16、及び比較例1〜7に係る樹脂膜を作成した。
つぎに、各実施例及び比較例に係る樹脂膜について、以下の試験を行った。
樹脂膜がコートされた基板に対して樹脂膜がコートされた表面を垂直方向(上下方向)に500g/cm2の荷重をかけながら消しゴムにて500往復の摩耗を行った。消しゴムは、株式会社トンボ鉛筆社製のMONOPE−04Aを使用した。
各樹脂膜について、以下の評価を行った。
初期(消しゴム擦り試験を行う前)の樹脂膜に海島構造が形成されているかを、上述した形状測定マイクロスコープを用いて判定した。なお、本評価では、測定ポイントの数を5として高低差hを測定し、高低差hが20nm以上となる場合に、海島構造が形成されていると判定した。
海島構造が確認された樹脂膜について、高低差h(凸部の上端部10b’−凹部の下端部10c’)を測定した。測定には、上述した形状測定マイクロスコープを用いた。また、測定ポイントの数は5とした。
樹脂膜の表面上の各点の傾きと、面方向とがなす角度を測定した。測定には、上述した形状測定マイクロスコープを用いた。すなわち、樹脂膜の表面から任意の領域を観察視野として選択し、観察視野全域の3次元データを取得した。そして、3次元データに基づいて、樹脂膜の表面上の各点の傾きと、面方向とがなす角度を測定した。
全自動接触角計DM700(協和界面科学株式会社製)を使用し、樹脂膜をコートした基板上に2μlの純水を滴下し接触角(CA)を測定した。その後、前記樹脂膜がコートされた基板のコートされた表面に500g/cm2の荷重をかけながら消しゴムにて500往復の摩耗試験を行った後、往復摩耗試験後の接触角(CA1)を測定した。このような方法で得られたCA1及びCA2の値を下記の式1に代入し、接触角の差(ΔCA)を計算した。
ΔCA=|CA2−CA1|
樹脂膜をコートした基板の表面(すなわち、樹脂膜の表面)にマジックペンにて約3cm線を描き、1分間放置した。その後、キムワイプにて円を描くように拭き取った。マジックペンは、ZEBRA社製マッキー黒の細を使用し、キムワイプは、日本製紙クレシア社製のキムワイプワイパーS−200を使用した。その後、目視にて拭き残りの有無を確認した。拭き残りなしの場合を「O」と表示し、拭き残りありの場合を「X」と表示した。
樹脂膜をコートした基板の表面(すなわち、樹脂膜の表面)に指先の指紋を約200g荷重になるように押しつけた。その後、キムワイプにて円を20回描くように拭き取った。キムワイプは、日本製紙クレシア社製のキムワイプワイパーS−200を使用した。その後、指紋の有無を目視で確認した。その後、目視にて拭き残りの有無を確認した。拭き残りなしの場合を「O」と表示し、拭き残りありの場合を「X」と表示した。
10a 低屈折率層
10b 低屈折率層の凸部
10c 低屈折率層の凹部
20a 中空シリカ粒子
20b 中実シリカ粒子
30 バインダ樹脂
40 添加剤
41 光重合性フッ素ポリマー
42 熱重合性フッ素ポリマー
50 保護層
51 保護層の凸部
52 保護層の凹部
Claims (22)
- 最外表面の凹部及び凸部の高低差が約10nm〜約65nmであり、下記の式1で表示される接触角の差(ΔCA)が約10°未満である樹脂膜。
[式1]
ΔCA=|CA2−CA1|
前記式1において、CA1は、樹脂膜がコートされた基板のコートされた表面に500g/cm2の荷重をかけながら消しゴムにて500往復の摩耗試験を行った後の水滴の接触角であり、CA2は、往復摩耗試験以前の初期の水滴の接触角である。 - 前記樹脂膜は、平均粒径が約20nm超〜約100nm以下である中空シリカ粒子、及び平均粒径が約20nm以下である中実シリカ粒子を含有する、請求項1に記載の樹脂膜。
- 前記中空シリカ粒子の含有率は約5重量%超約50重量%未満であり、前記中実シリカ粒子の含有率は約0重量%超約10重量%未満である、請求項2に記載の樹脂膜。
- 前記樹脂膜は、光重合性フッ素ポリマー及び熱重合性フッ素ポリマーを含有する、請求項1に記載の樹脂膜。
- 前記光重合性フッ素ポリマーの含有率及び前記熱重合性フッ素ポリマーの含有率の合計は、約1.5質量%以上約7質量%以下である、請求項4に記載の樹脂膜。
- 前記熱重合性フッ素ポリマーと前記光重合性フッ素ポリマーは、下記の式2を満足する、請求項4に記載の樹脂膜。
[式2]
P2/P1<0.43
前記式2において、P2は、熱重合性フッ素ポリマーの含有率であり、P1は、光重合性フッ素ポリマーの含有率である。 - 平均粒径が約20nm超〜約100nm以下である中空シリカ粒子;
平均粒径が約20nm以下である中実シリカ粒子;
光重合性フッ素ポリマー及び熱重合性フッ素ポリマーを含む添加剤;及び
バインダ用モノマー;を含む樹脂膜形成用組成物。 - 前記中空シリカ粒子約5重量%超約50重量%未満;
前記中実シリカ粒子約0重量%超約10重量%未満;
前記光重合性フッ素ポリマー及び熱重合性フッ素ポリマー約1.5重量%以上約7重量%以下;及び
バインダ用モノマー;を含む、請求項7に記載の樹脂膜形成用組成物。 - 前記バインダ用モノマーは、他の官能基と水素結合を形成可能な水素結合形成基を有する、請求項7に記載の樹脂膜形成用組成物。
- 前記水素結合形成基は水酸基を含む、請求項9に記載の樹脂膜形成用組成物。
- 前記バインダ用モノマーの表面張力は、約36dyne/cm〜約45dyne/cmである、請求項7に記載の樹脂膜形成用組成物。
- 前記中空シリカ粒子及び前記中実シリカ粒子は、それぞれ光重合性官能基を含み、光重合性官能基は、アクリロイル基及びメタクリロイル基のうち少なくとも1種以上である、請求項7に記載の樹脂膜形成用組成物。
- 前記中空シリカ粒子及び前記中実シリカ粒子は、それぞれ熱重合性官能基をさらに含む、請求項12に記載の樹脂膜形成用組成物。
- 前記熱重合性フッ素ポリマーの重量平均分子量は、前記光重合性フッ素ポリマーの重量平均分子量よりも大きい、請求項7に記載の樹脂膜形成用組成物。
- 前記熱重合性フッ素ポリマーの重量平均分子量は約10000以上であり、前記光重合性フッ素ポリマーの重量平均分子量は約10000未満である、請求項7に記載の樹脂膜形成用組成物。
- バインダ用モノマー、平均粒径が約20nm超〜約100nm以下である中空シリカ粒子、平均粒径が約20nm以下である中実シリカ粒子、光重合性フッ素ポリマー及び熱重合性フッ素ポリマーを含む樹脂膜形成用コート液を製造するステップ;
前記樹脂膜形成用コート液を基板に塗布することで塗布層を形成するステップ;
前記塗布層の表面にブリードアウトした前記光重合性フッ素ポリマーと熱重合性フッ素ポリマーによる保護層を形成するステップ;及び
重合反応を開始させるステップ;を含む樹脂膜の製造方法。 - 前記中空シリカ粒子の含有率は約5質量%超約50質量%未満であり、前記中実シリカ粒子の含有率は約0質量%超約10質量%未満である、請求項16に記載の樹脂膜の製造方法。
- 前記熱重合性フッ素ポリマーと前記光重合性フッ素ポリマーは、下記の式2を満足し、
前記光重合性フッ素ポリマー及び前記熱重合性フッ素ポリマーの含有率の合計は、約1.5質量%以上約7質量%以下である、請求項16に記載の樹脂膜の製造方法。
[式2]
P2/P1<0.43
前記式2において、P2は、熱重合性フッ素ポリマーの含有率であり、P1は、光重合性フッ素ポリマーの含有率である。 - 前記中空シリカ粒子及び前記中実シリカ粒子は、それぞれ光重合性官能基を含み、光重合性官能基は、アクリロイル基及びメタクリロイル基のうち少なくとも1種以上である、請求項16に記載の樹脂膜の製造方法。
- 前記中空シリカ粒子及び前記中実シリカ粒子は、それぞれ熱重合性官能基をさらに含む、請求項19に記載の樹脂膜の製造方法。
- 前記バインダ用モノマーは水素結合形成基を含み、前記水素結合形成基は水酸基を含む、請求項16に記載の樹脂膜の製造方法。
- 前記熱重合性フッ素ポリマーの重量平均分子量は、前記光重合性フッ素ポリマーの重量平均分子量よりも大きく、
前記熱重合性フッ素ポリマーの重量平均分子量は約10000以上であり、前記光重合性フッ素ポリマーの重量平均分子量は約10000未満である、請求項16に記載の樹脂膜の製造方法。
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US20160304722A1 (en) | 2016-10-20 |
US10450465B2 (en) | 2019-10-22 |
JP2015108733A (ja) | 2015-06-11 |
CN105793741B (zh) | 2017-09-08 |
TWI586534B (zh) | 2017-06-11 |
TW201529312A (zh) | 2015-08-01 |
CN105793741A (zh) | 2016-07-20 |
KR20150065576A (ko) | 2015-06-15 |
JP6494654B2 (ja) | 2019-04-03 |
KR101813748B1 (ko) | 2017-12-29 |
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