JP2017521713A - 薄い吸収体を有する極紫外線マスクブランク作製システム及びその製造システム - Google Patents
薄い吸収体を有する極紫外線マスクブランク作製システム及びその製造システム Download PDFInfo
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- JP2017521713A JP2017521713A JP2017500345A JP2017500345A JP2017521713A JP 2017521713 A JP2017521713 A JP 2017521713A JP 2017500345 A JP2017500345 A JP 2017500345A JP 2017500345 A JP2017500345 A JP 2017500345A JP 2017521713 A JP2017521713 A JP 2017521713A
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Abstract
Description
Claims (14)
- 極紫外線(EUV)マスクブランク作製システムであって、
真空を生成するための基板ハンドリング真空チャンバと、
真空内の、前記基板ハンドリング真空チャンバにロードされる超低膨張基板を搬送するための基板ハンドリングプラットフォームと、
EUVマスクブランクを形成するための、前記基板ハンドリングプラットフォームによってアクセスされる複数のサブチャンバであって、前記EUVマスクブランクは、
極紫外線(EUV)光を反射させるための、前記超低膨張基板の上に形成された多層スタックと、
80nm未満の厚さと2%未満の反射率を有する吸収層を含む、前記多層スタックの上に形成され、13.5nmの波長における前記EUV光を吸収するための吸収層と
を含む、複数のサブチャンバと
を備えるシステム。 - 前記EUVマスクブランクが13.5nmの波長における前記EUV光を反射させることが、前記吸収層の厚さを制御することによって反射率の割合を調節することを含む、請求項1に記載のシステム。
- 前記超低膨張基板をロードするための、前記基板ハンドリング真空チャンバの基板ハンドリングプラットフォームを更に備え、
前記EUVマスクブランクを形成するための前記複数のサブチャンバが、
前記超低膨張基板の上に形成された追加の多層スタックを含み、
前記多層スタックが、13.5nmの波長における前記EUV光を反射させるように調整される、請求項1に記載のシステム。 - 前記吸収層が、ニッケル(Ni)又はプラチナ(Pt)の単層を含む、請求項1に記載のシステム。
- 前記吸収層が、銀(Ag)、亜鉛(Zn)、又は錫(Sn)の単層を含む、請求項1に記載のシステム。
- 前記吸収層が、金(Au)、鉛(Pb)、又はインジウム(In)の単層を含む、請求項1に記載のシステム。
- 前記吸収層が、ハフニウム(Hf)、カドミウム(Cd)、ビスマス(Bi)、アンチモン(Sb)、又はテルル(Te)の単層を含む、請求項1に記載のシステム。
- 極紫外線(EUV)マスクブランクシステムであって、
超低膨張基板と、
前記超低膨張基板の上の多層スタックと、
前記多層スタックの上の吸収層であって、80nm未満の厚さと、13.5nmの波長における極紫外線(EUV)光の2%未満の反射率を有する吸収層と
を備えるシステム。 - 前記超低膨張基板と前記吸収層との間に形成された追加の多層スタックを更に備え、前記追加の多層スタックが複数の多層スタックを含む、請求項8に記載のシステム。
- 平坦化層のすぐ上に形成された追加の多層スタックと、前記追加の多層スタックに形成された前記多層スタックとを更に備える、請求項8に記載のシステム。
- 前記吸収層が、ニッケル(Ni)又はプラチナ(Pt)の単層を含む、請求項8に記載のシステム。
- 前記吸収層が、銀(Ag)、亜鉛(Zn),又は錫(Sn)の単層を含む、請求項8に記載のシステム。
- 前記吸収層が、金(Au)、鉛(Pb)、又はインジウム(In)の単層を含む、請求項8に記載のシステム。
- 前記吸収層が、ハフニウム(Hf)、カドミウム(Cd)、ビスマス(Bi)、アンチモン(Sb)、又はテルル(Te)の単層を含む、請求項8に記載のシステム。
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US14/620,114 US9612522B2 (en) | 2014-07-11 | 2015-02-11 | Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor |
US14/620,114 | 2015-02-11 | ||
PCT/US2015/039525 WO2016007610A1 (en) | 2014-07-11 | 2015-07-08 | Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor |
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US20200058213A9 (en) | 2020-02-20 |
US20190130731A1 (en) | 2019-05-02 |
KR20170032378A (ko) | 2017-03-22 |
SG10201913511VA (en) | 2020-03-30 |
JP2021021948A (ja) | 2021-02-18 |
CN106489188A (zh) | 2017-03-08 |
US9612522B2 (en) | 2017-04-04 |
JP2023011647A (ja) | 2023-01-24 |
WO2016007610A1 (en) | 2016-01-14 |
US10197907B2 (en) | 2019-02-05 |
US20160011499A1 (en) | 2016-01-14 |
CN106489188B (zh) | 2020-09-29 |
EP3167473A1 (en) | 2017-05-17 |
TWI654477B (zh) | 2019-03-21 |
SG11201610505UA (en) | 2017-01-27 |
TW201602710A (zh) | 2016-01-16 |
US20170160632A1 (en) | 2017-06-08 |
KR102414135B1 (ko) | 2022-06-27 |
EP3167473B1 (en) | 2021-08-25 |
US10551732B2 (en) | 2020-02-04 |
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