JP2017513032A - 自己組織化を促進するための下層組成物並びに製造及び使用方法 - Google Patents
自己組織化を促進するための下層組成物並びに製造及び使用方法 Download PDFInfo
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- JP2017513032A JP2017513032A JP2016540028A JP2016540028A JP2017513032A JP 2017513032 A JP2017513032 A JP 2017513032A JP 2016540028 A JP2016540028 A JP 2016540028A JP 2016540028 A JP2016540028 A JP 2016540028A JP 2017513032 A JP2017513032 A JP 2017513032A
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- Prior art keywords
- meth
- acrylate
- sulfonate
- styrene
- polymer
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- 239000000203 mixture Substances 0.000 title claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000000034 method Methods 0.000 title claims description 43
- 230000001737 promoting effect Effects 0.000 title claims 2
- 238000001338 self-assembly Methods 0.000 title description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 76
- 239000002253 acid Substances 0.000 claims abstract description 49
- 238000009472 formulation Methods 0.000 claims abstract description 33
- 239000000178 monomer Substances 0.000 claims abstract description 33
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 14
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 75
- -1 alkyl halide compounds Chemical class 0.000 claims description 67
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 60
- 229920001400 block copolymer Polymers 0.000 claims description 53
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 40
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 claims description 36
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 28
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 27
- 230000007935 neutral effect Effects 0.000 claims description 27
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 23
- 238000000576 coating method Methods 0.000 claims description 23
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 22
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 17
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims description 16
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 15
- 239000005977 Ethylene Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 13
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 9
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims description 8
- 239000007983 Tris buffer Substances 0.000 claims description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 6
- 230000001939 inductive effect Effects 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 claims description 5
- 150000003141 primary amines Chemical class 0.000 claims description 5
- 150000003871 sulfonates Chemical class 0.000 claims description 5
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims description 4
- IPDVQPDVQHNZQO-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.C1=CC=C2C(=O)N(O)C(=O)C2=C1 IPDVQPDVQHNZQO-UHFFFAOYSA-N 0.000 claims description 4
- BHJPEPMMKXNBKV-UHFFFAOYSA-N 4,4-dimethyl-1,3,2-dioxasilolane Chemical compound CC1(C)CO[SiH2]O1 BHJPEPMMKXNBKV-UHFFFAOYSA-N 0.000 claims description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 4
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 claims description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 4
- 229940119545 isobornyl methacrylate Drugs 0.000 claims description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 4
- 239000011976 maleic acid Substances 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 4
- 229920005604 random copolymer Polymers 0.000 claims description 4
- 150000003335 secondary amines Chemical class 0.000 claims description 4
- 150000003512 tertiary amines Chemical class 0.000 claims description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 3
- 239000012456 homogeneous solution Substances 0.000 claims description 3
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 claims description 3
- 239000012487 rinsing solution Substances 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N trifluoromethane acid Natural products FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 3
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- DFMFSSOQMCTCGK-UHFFFAOYSA-N (4-nitrophenyl)methyl trifluoromethanesulfonate Chemical compound [O-][N+](=O)C1=CC=C(COS(=O)(=O)C(F)(F)F)C=C1 DFMFSSOQMCTCGK-UHFFFAOYSA-N 0.000 claims 3
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 claims 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 3
- YSWBUABBMRVQAC-UHFFFAOYSA-N (2-nitrophenyl)methanesulfonic acid Chemical class OS(=O)(=O)CC1=CC=CC=C1[N+]([O-])=O YSWBUABBMRVQAC-UHFFFAOYSA-N 0.000 claims 2
- UJMXMRBISVKKOI-UHFFFAOYSA-N (2-nitrophenyl)methyl trifluoromethanesulfonate Chemical compound [O-][N+](=O)C1=CC=CC=C1COS(=O)(=O)C(F)(F)F UJMXMRBISVKKOI-UHFFFAOYSA-N 0.000 claims 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 2
- CUHCLROITCDERO-UHFFFAOYSA-N (4-nitrophenyl)methyl 9,10-dimethoxyanthracene-2-sulfonate Chemical compound C=1C=C2C(OC)=C3C=CC=CC3=C(OC)C2=CC=1S(=O)(=O)OCC1=CC=C([N+]([O-])=O)C=C1 CUHCLROITCDERO-UHFFFAOYSA-N 0.000 claims 1
- OIHCCWXZFYNOJS-UHFFFAOYSA-N [2,3-bis-(4-methylphenyl)sulfonyloxyphenyl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC1=CC=CC(OS(=O)(=O)C=2C=CC(C)=CC=2)=C1OS(=O)(=O)C1=CC=C(C)C=C1 OIHCCWXZFYNOJS-UHFFFAOYSA-N 0.000 claims 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 claims 1
- BBBXVLCJTNBOIV-UHFFFAOYSA-N fluoro butane-1-sulfonate Chemical compound CCCCS(=O)(=O)OF BBBXVLCJTNBOIV-UHFFFAOYSA-N 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 229950003332 perflubutane Drugs 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 2
- 239000000243 solution Substances 0.000 description 20
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 17
- 239000010408 film Substances 0.000 description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 11
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
- 150000007513 acids Chemical class 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 125000005210 alkyl ammonium group Chemical group 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 238000003491 array Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229920000359 diblock copolymer Polymers 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 3
- 238000009482 thermal adhesion granulation Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- XGKKBYCBJYXYMO-UHFFFAOYSA-N 2-(4-ethenylphenyl)ethynyl-trimethylsilane Chemical compound C[Si](C)(C)C#CC1=CC=C(C=C)C=C1 XGKKBYCBJYXYMO-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N N,N-Diethylethanamine Substances CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical class C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical class C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000010550 living polymerization reaction Methods 0.000 description 2
- 238000012705 nitroxide-mediated radical polymerization Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 238000012712 reversible addition−fragmentation chain-transfer polymerization Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003440 styrenes Chemical group 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- GCIYMCNGLUNWNR-UHFFFAOYSA-N (2,4-dinitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O GCIYMCNGLUNWNR-UHFFFAOYSA-N 0.000 description 1
- MCJPJAJHPRCILL-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=C([N+]([O-])=O)C=CC=C1[N+]([O-])=O MCJPJAJHPRCILL-UHFFFAOYSA-N 0.000 description 1
- MCVVDMSWCQUKEV-UHFFFAOYSA-N (2-nitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=CC=CC=C1[N+]([O-])=O MCVVDMSWCQUKEV-UHFFFAOYSA-N 0.000 description 1
- QXTKWWMLNUQOLB-UHFFFAOYSA-N (4-nitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=CC=C([N+]([O-])=O)C=C1 QXTKWWMLNUQOLB-UHFFFAOYSA-N 0.000 description 1
- UIMAOHVEKLXJDO-UHFFFAOYSA-N (7,7-dimethyl-3-oxo-4-bicyclo[2.2.1]heptanyl)methanesulfonate;triethylazanium Chemical compound CCN(CC)CC.C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C UIMAOHVEKLXJDO-UHFFFAOYSA-N 0.000 description 1
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 1
- 125000006835 (C6-C20) arylene group Chemical group 0.000 description 1
- AEBYJSOWHQYRPK-UHFFFAOYSA-N 1,1'-biphenyl;sodium Chemical group [Na].C1=CC=CC=C1C1=CC=CC=C1 AEBYJSOWHQYRPK-UHFFFAOYSA-N 0.000 description 1
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 1
- CFMTUIKADIKXIQ-UHFFFAOYSA-N 1-ethenoxy-3-fluoropropane Chemical compound FCCCOC=C CFMTUIKADIKXIQ-UHFFFAOYSA-N 0.000 description 1
- GBLRMBKJBLNURW-UHFFFAOYSA-N 1-ethenyl-4-ethynylbenzene Chemical compound C=CC1=CC=C(C#C)C=C1 GBLRMBKJBLNURW-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ODDDCGGSPAPBOS-UHFFFAOYSA-N 1-ethoxypropan-2-yl propanoate Chemical compound CCOCC(C)OC(=O)CC ODDDCGGSPAPBOS-UHFFFAOYSA-N 0.000 description 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- IKMBXKGUMLSBOT-UHFFFAOYSA-N 2,3,4,5,6-pentafluorobenzenesulfonic acid Chemical class OS(=O)(=O)C1=C(F)C(F)=C(F)C(F)=C1F IKMBXKGUMLSBOT-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D137/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen; Coating compositions based on derivatives of such polymers
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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Abstract
Description
(b)少なくとも一種の熱酸発生剤、及び
(c)溶剤、
を含む。構造(I)は、重合してその結果生じる繰り返し単位をポリマー中に得るためのモノマーと定義される。該新規下層調合物のポリマーは、ランダムコポリマーであることができる。
(b)生じた均一な溶液をフィルターを用いて濾過する、
ことを含む。
(a)二種以上の自然に分離するブロックを有するブロックコポリマーを用意し;
(b)基材を用意し;
(c)基材上に、中性層を堆積するための第一の調合物をコーティングし、そしてこの中性層を熱硬化し;
(d)この硬化した中性層の少なくとも一部分上にブロックコポリマーを配置する;
ことを含み、前記第一の調合物が、(i)構造(I)[式中、Xは、構造(II)、(III)、(IV)または(V)から選択される架橋性基であり;これらの式中、nは0〜5であり、pは0〜5であり、qは1〜2であり、mは1〜2であり、そしてRはH、C1〜C4アルキル、トリ(C1〜C4アルキル)シリルである]を有する少なくとも一種のモノマー繰り返し単位を含むポリマー;(ii)少なくとも一種の熱酸発生剤;及び(iii)溶剤を含む。
(e)ブロックコポリマーを配置する前に、リソグラフィプロセスによって中性相中にパターンを形成し;
(f)第二の調合物からパターン中にピン止め材料を提供し;及びこのピン止め材料を熱硬化する;
ことを含み、ここで前記第二の調合物は、(i)構造(I)[式中、Xは、(II)、(III)、(IV)または(V)から選択される架橋性基であり、これらの式中、nは0〜5であり、pは0〜5であり、qは1〜2であり、mは1〜2であり、そしてRはH、C1〜C4アルキル、トリ(C1〜C4アルキル)シリルである]を有する少なくとも一種のモノマー繰り返し単位を含むポリマー;(ii)少なくとも一種の熱酸発生剤;及び(iii)溶剤を含む。
Claims (15)
- 一種以上の熱酸発生剤が、置換されたもしくは置換されていないハロゲン化アルキル化合物、置換されたもしくは置換されていないアルカンスルホネート、置換されたもしくは置換されていない2−ニトロベンジルスルホン酸エステル、第一級アミンの酸塩、第二級アミンの酸塩、第三級アミンの酸塩、ジカルボキシイミジルスルホン酸エステル、またはオキシムスルホネートエステルから選択され、好ましくはトリ−C1〜C8−アルキルアンモニウムp−トルエンスルホネート、トリ−C1〜C8−アルキルアンモニウムドデシルベンゼンスルホネート、トリ−C1〜C8−アルキルアンモニウムパーフルオロブタン−1−スルホネート、トリ−C1〜C8−アルキルアンモニウムトリフルオロメタン−スルホネート、1,2,3−トリス(パーフルオロC1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(C1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(p−トルエンスルホニルオキシ)ベンゼン、4−ニトロベンジル9,10−ジメトキシアントラセン−2−スルホネート、N−ヒドロキシフタルイミドトリフルオロメタン−スルホネート、2−ニトロベンジルトリフルオロメタンスルホネート、4−ニトロベンジルトリフルオロメタンスルホネート、2−ニトロベンジルパーフルオロブタンスルホネート、4−ニトロベンジルパーフルオロブタンスルホネート、または上記のうちの少なくとも一つを含む組み合わせから選択される、請求項1に記載の調合物。
- ポリマーが、C1〜C10アルキル(メタ)アクリレート、スチレン、ビニルピリジン、ブタジエン、イソプレン、エチレン、プロピレン、α−メチルスチレン、無水イタコン酸、無水マレイン酸、マレイン酸、イタコン酸、ヒドロキシエチルメタクリレート、4−ヒドロキシスチレン、イソボルニルメタクリレート、(メタ)アクリルアミド、(メタ)アクリロニトリル、ジメチルシロキサン、エチレンオキシド、エチレン、2−ヒドロキシエチル(メタ)アクリレートまたはイソブチレンから選択される一種以上のモノマー繰り返し単位を更に含み、好ましくはポリマーがランダムコポリマーである、請求項1または2に記載の調合物。
- ポリマーが、スチレンまたはメチルメタクリレートから選択される一種または二種のモノマー繰り返し単位を更に含む、請求項1〜3の何れか一つに記載の調合物。
- 一種以上の熱酸発生剤が、置換されたもしくは置換されていないハロゲン化アルキル化合物、置換されたもしくは置換されていないアルカンスルホネート、置換されたもしくは置換されていない2−ニトロベンジルスルホン酸エステル、第一級アミンの酸塩、第二級アミンの酸塩、第三級アミンの酸塩、ジカルボキシイミジルスルホン酸エステル、またはオキシムスルホネートエステルから選択され、好ましくはトリ−C1〜C8−アルキルアンモニウムp−トルエンスルホネート、トリ−C1〜C8−アルキルアンモニウムドデシルベンゼンスルホネート、トリ−C1〜C8−アルキルアンモニウムパーフルオロブタン−1−スルホネート、トリ−C1〜C8−アルキルアンモニウムトリフルオロメタン−スルホネート、1,2,3−トリス(パーフルオロC1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(C1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(p−トルエンスルホニルオキシ)ベンゼン、4−ニトロベンジル9,10−ジメトキシアントラセン−2−スルホネート、N−ヒドロキシフタルイミドトリフルオロメタン−スルホネート、2−ニトロベンジルトリフルオロメタンスルホネート、4−ニトロベンジルトリフルオロメタンスルホネート、2−ニトロベンジルパーフルオロブタンスルホネート、4−ニトロベンジルパーフルオロブタンスルホネート、または上記のうちの少なくとも一つを含む組み合わせから選択される、請求項5に記載の方法。
- ポリマーが、C1〜C10アルキル(メタ)アクリレート、スチレン、ビニルピリジン、ブタジエン、イソプレン、エチレン、プロピレン、α−メチルスチレン、無水イタコン酸、無水マレイン酸、マレイン酸、イタコン酸、ヒドロキシエチルメタクリレート、4−ヒドロキシスチレン、イソボルニルメタクリレート、(メタ)アクリルアミド、(メタ)アクリロニトリル、ジメチルシロキサン、エチレンオキシド、エチレン、2−ヒドロキシエチル(メタ)アクリレートまたはイソブチレンから選択される一種以上のモノマー繰り返し単位を更に含み、好ましくはポリマーがランダムコポリマーである、請求項5または6に記載の方法。
- ポリマーが、スチレンまたはメチルメタクリレートから選択される一種または二種のモノマー繰り返し単位を更に含む、請求項5〜7の何れか一つに記載の方法。
- フィルターが、100nm未満の孔サイズを有するアブソリュートフィルターである、請求項5〜8の何れか一つに記載の方法。
- ブロックコポリマーフィルム中に増倍されたパターンを誘導する方法であって、
a.二つ以上の自発的に分離するブロックを有するブロックコポリマーを用意し;
b.基材を用意し;
c.基材上に、第一のコーティングを堆積するための第一の調合物をコーティングし、そして第一のコーティングを熱硬化し;及び
d.ブロックコポリマーを、硬化した第一のコーティングの少なくとも一部上に配置する;
ことを含み、
ここで、第一の調合物が、(i)次の構造を有する少なくとも一種のモノマー繰り返し単位を含むポリマー、
(ii)少なくとも一種の熱酸発生剤;及び
(iii)溶剤
を含む、前記方法。 - 第一のコーティングがピン止め層でありかつ第二のコーティングが中性層であるか、あるいは第一のコーティングが中性層でありかつ第二のコーティングがピン止め層である、請求項11に記載の方法。
- 第一のポリマーが、モノマー繰り返し単位の少なくとも一つの組み合わせを更に含み、前記組み合わせが、メチル(メタ)アクリレートとスチレン、ブタジエンとブチル(メタ)アクリレート、ブタジエンとジメチルシロキサン、ブタジエンとメチル(メタ)アクリレート、ブタジエンとビニルピリジン、イソプレンとメチル(メタ)アクリレート、イソプレンとビニルピリジン、ブチル(メタ)アクリレートとメチル(メタ)アクリレート、ブチル(メタ)アクリレートとビニルピリジン、ヘキシル(メタ)アクリレートとビニルピリジン、イソブチレンとブチル(メタ)アクリレート、イソブチレンとジメチルシロキサン、イソブチレンとメチル(メタ)アクリレート、イソブチレンとビニルピリジン、イソプレンとエチレンオキシド、ブチル(メタ)アクリレートとビニルピリジン、エチレンとメチル(メタ)アクリレート、メチル(メタ)アクリレートとブチル(メタ)アクリレート、スチレンとブタジエン、スチレンとブチル(メタ)アクリレート、スチレンとジメチルシロキサン、スチレンとイソプレン、スチレンとビニルピリジン、エチレンとビニルピリジン、ビニルピリジンとメチル(メタ)アクリレート、エチレンオキシドとイソプレン、エチレンオキシドとブタジエン、エチレンオキシドとスチレン、エチレンオキシドとメチル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレートとブタジエン、2−ヒドロキシエチル(メタ)アクリレートとブチル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレートとジメチルシロキサン、2−ヒドロキシエチル(メタ)アクリレートとエチレン、2−ヒドロキシエチル(メタ)アクリレートとヘキシル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレートとイソブチレン、2−ヒドロキシエチル(メタ)アクリレートとイソプレン、2−ヒドロキシエチル(メタ)アクリレートとスチレン、2−ヒドロキシエチル(メタ)アクリレートとビニルピリジン、(メタ)アクリロニトリルとブタジエン、(メタ)アクリロニトリルとブチル(メタ)アクリレート、(メタ)アクリロニトリルとジメチルシロキサン、(メタ)アクリロニトリルとエチレンオキシド、(メタ)アクリロニトリルとエチレン、(メタ)アクリロニトリルとヘキシル(メタ)アクリレート、(メタ)アクリロニトリルと2−ヒドロキシエチル(メタ)アクリレート、(メタ)アクリロニトリルとイソブチレン、(メタ)アクリロニトリルとイソプレン、(メタ)アクリロニトリルとメチル(メタ)アクリレート、(メタ)アクリロニトリルとスチレン、または(メタ)アクリロニトリルとビニルピリジンから選択される、請求項10〜12の何れか一つに記載の方法。
- 第二のポリマーが、C1〜C10アルキル(メタ)アクリレート、スチレン、ビニルピリジン、ブタジエン、イソプレン、エチレン、プロピレン、α−メチルスチレン、無水イタコン酸、無水マレイン酸、マレイン酸、イタコン酸、ヒドロキシエチルメタクリレート、4−ヒドロキシスチレン、イソボルニルメタクリレート、(メタ)アクリルアミド、(メタ)アクリロニトリル、ジメチルシロキサン、エチレンオキシド、エチレン、2−ヒドロキシエチル(メタ)アクリレートまたはイソブチレンから選択される少なくとも一種のモノマー繰り返し単位を含む、請求項11〜13の何れか一つに記載の方法。
- 少なくとも一種の熱酸発生剤が、トリ−C1〜C8−アルキルアンモニウムp−トルエンスルホネート、トリ−C1〜C8−アルキルアンモニウムドデシルベンゼンスルホネート、トリ−C1〜C8−アルキルアンモニウムパーフルオロブタン−1−スルホネート、トリ−C1〜C8−アルキルアンモニウムトリフルオロメタン−スルホネート、1,2,3−トリス(パーフルオロC1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(C1〜C8アルカンスルホニルオキシ)ベンゼン、1,2,3−トリス(p−トルエンスルホニルオキシ)ベンゼン、4−ニトロベンジル9,10−ジメトキシアントラセン−2−スルホネート、N−ヒドロキシフタルイミドトリフルオロメタン−スルホネート、2−ニトロベンジルトリフルオロメタンスルホネート、4−ニトロベンジルトリフルオロメタンスルホネート、2−ニトロベンジルパーフルオロブタンスルホネート、4−ニトロベンジルパーフルオロブタンスルホネートまたは上記のうちの少なくとも一つを含む組み合わせから選択される、請求項10〜14の何れか一つに記載の方法。
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KR101820260B1 (ko) | 2018-01-19 |
KR20160095137A (ko) | 2016-08-10 |
WO2015091047A1 (en) | 2015-06-25 |
IL245559A0 (en) | 2016-06-30 |
TW201533122A (zh) | 2015-09-01 |
JP6342002B2 (ja) | 2018-06-13 |
TWI620780B (zh) | 2018-04-11 |
CN105849636A (zh) | 2016-08-10 |
CN105849636B (zh) | 2019-09-27 |
EP3084522A1 (en) | 2016-10-26 |
US20150166821A1 (en) | 2015-06-18 |
US9181449B2 (en) | 2015-11-10 |
EP3084522B1 (en) | 2020-09-09 |
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