JP2017504174A - 有機電子素子及びその製造方法 - Google Patents
有機電子素子及びその製造方法 Download PDFInfo
- Publication number
- JP2017504174A JP2017504174A JP2016563762A JP2016563762A JP2017504174A JP 2017504174 A JP2017504174 A JP 2017504174A JP 2016563762 A JP2016563762 A JP 2016563762A JP 2016563762 A JP2016563762 A JP 2016563762A JP 2017504174 A JP2017504174 A JP 2017504174A
- Authority
- JP
- Japan
- Prior art keywords
- electronic device
- sealing film
- organic electronic
- organic
- photocurable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 238000007789 sealing Methods 0.000 claims abstract description 101
- 239000000463 material Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 239000000126 substance Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 48
- 239000002184 metal Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 26
- -1 acrylic compound Chemical class 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 13
- 150000002430 hydrocarbons Chemical class 0.000 claims description 10
- 229910010272 inorganic material Inorganic materials 0.000 claims description 10
- 239000011147 inorganic material Substances 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 10
- 150000004706 metal oxides Chemical class 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000011368 organic material Substances 0.000 claims description 8
- 229920000877 Melamine resin Polymers 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 4
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 4
- 238000005137 deposition process Methods 0.000 claims description 3
- YZEZMSPGIPTEBA-UHFFFAOYSA-N 2-n-(4,6-diamino-1,3,5-triazin-2-yl)-1,3,5-triazine-2,4,6-triamine Chemical compound NC1=NC(N)=NC(NC=2N=C(N)N=C(N)N=2)=N1 YZEZMSPGIPTEBA-UHFFFAOYSA-N 0.000 claims description 2
- WDGCBNTXZHJTHJ-UHFFFAOYSA-N 2h-1,3-oxazol-2-id-4-one Chemical group O=C1CO[C-]=N1 WDGCBNTXZHJTHJ-UHFFFAOYSA-N 0.000 claims description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012963 UV stabilizer Substances 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims description 2
- YSKUZVBSHIWEFK-UHFFFAOYSA-N ammelide Chemical compound NC1=NC(O)=NC(O)=N1 YSKUZVBSHIWEFK-UHFFFAOYSA-N 0.000 claims description 2
- 239000003963 antioxidant agent Substances 0.000 claims description 2
- 230000003078 antioxidant effect Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical group C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- MASBWURJQFFLOO-UHFFFAOYSA-N ammeline Chemical compound NC1=NC(N)=NC(O)=N1 MASBWURJQFFLOO-UHFFFAOYSA-N 0.000 claims 1
- 239000003017 thermal stabilizer Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 94
- 239000010410 layer Substances 0.000 description 31
- 239000010409 thin film Substances 0.000 description 27
- 229910052760 oxygen Inorganic materials 0.000 description 26
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 24
- 239000001301 oxygen Substances 0.000 description 24
- 230000008569 process Effects 0.000 description 21
- 230000004888 barrier function Effects 0.000 description 14
- 230000035699 permeability Effects 0.000 description 12
- 238000001723 curing Methods 0.000 description 11
- 238000000016 photochemical curing Methods 0.000 description 10
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 125000001072 heteroaryl group Chemical group 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 5
- 229910017107 AlOx Inorganic materials 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 description 4
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004386 diacrylate group Chemical group 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- 238000005019 vapor deposition process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PCLLJCFJFOBGDE-UHFFFAOYSA-N (5-bromo-2-chlorophenyl)methanamine Chemical compound NCC1=CC(Br)=CC=C1Cl PCLLJCFJFOBGDE-UHFFFAOYSA-N 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- LOUPRKONTZGTKE-WZBLMQSHSA-N Quinine Chemical compound C([C@H]([C@H](C1)C=C)C2)C[N@@]1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OC)C=C21 LOUPRKONTZGTKE-WZBLMQSHSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 125000004404 heteroalkyl group Chemical group 0.000 description 2
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- KQMPMWGWJLNKPC-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCC(OC(=O)C(C)=C)OC(=O)C(C)=C KQMPMWGWJLNKPC-UHFFFAOYSA-N 0.000 description 1
- CYAQYDHSEWIVLA-UHFFFAOYSA-N 1-hydroxydodecyl prop-2-enoate Chemical compound CCCCCCCCCCCC(O)OC(=O)C=C CYAQYDHSEWIVLA-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- GKZPEYIPJQHPNC-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GKZPEYIPJQHPNC-UHFFFAOYSA-N 0.000 description 1
- IANYIYFOTQCDBY-UHFFFAOYSA-N 2,2-dimethylbutane prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.CCC(C)(C)C IANYIYFOTQCDBY-UHFFFAOYSA-N 0.000 description 1
- OYKPJMYWPYIXGG-UHFFFAOYSA-N 2,2-dimethylbutane;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(C)(C)C OYKPJMYWPYIXGG-UHFFFAOYSA-N 0.000 description 1
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- JJMOMMLADQPZNY-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanal Chemical compound OCC(C)(C)C=O JJMOMMLADQPZNY-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- RTNUTCOTGVKVBR-UHFFFAOYSA-N 4-chlorotriazine Chemical class ClC1=CC=NN=N1 RTNUTCOTGVKVBR-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- IMJLWKZFJOIXJL-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C=C IMJLWKZFJOIXJL-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- OFXPOJNEGQRTCW-UHFFFAOYSA-N 7-bicyclo[4.2.0]octa-1,3,5-trienyl(7-bicyclo[4.2.0]octa-1,3,5-trienyloxy)silane Chemical compound C12=CC=CC=C2CC1O[SiH2]C1C2=CC=CC=C2C1 OFXPOJNEGQRTCW-UHFFFAOYSA-N 0.000 description 1
- DOHMLICMWZPMMZ-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(COCCOCCOCCO)O Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(COCCOCCOCCO)O DOHMLICMWZPMMZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 235000001258 Cinchona calisaya Nutrition 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 150000001204 N-oxides Chemical class 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- XRMBQHTWUBGQDN-UHFFFAOYSA-N [2-[2,2-bis(prop-2-enoyloxymethyl)butoxymethyl]-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CC)COCC(CC)(COC(=O)C=C)COC(=O)C=C XRMBQHTWUBGQDN-UHFFFAOYSA-N 0.000 description 1
- VEBCLRKUSAGCDF-UHFFFAOYSA-N ac1mi23b Chemical compound C1C2C3C(COC(=O)C=C)CCC3C1C(COC(=O)C=C)C2 VEBCLRKUSAGCDF-UHFFFAOYSA-N 0.000 description 1
- 150000001266 acyl halides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000002676 chrysenyl group Chemical group C1(=CC=CC=2C3=CC=C4C=CC=CC4=C3C=CC12)* 0.000 description 1
- LOUPRKONTZGTKE-UHFFFAOYSA-N cinchonine Natural products C1C(C(C2)C=C)CCN2C1C(O)C1=CC=NC2=CC=C(OC)C=C21 LOUPRKONTZGTKE-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000003914 fluoranthenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC=C4C1=C23)* 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Chemical class 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 229960000948 quinine Drugs 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000001935 tetracenyl group Chemical group C1(=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C12)* 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 125000003960 triphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C3=CC=CC=C3C12)* 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/80—Constructional details
- H10K10/88—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Abstract
Description
図1は、本発明の一実施形態による有機電子素子の構造を概略的に示す断面図である。図1を参照すると、有機電子素子(100)は、有機光電素子部(120)が配置された基板(110)、第1封止膜(130)、第2封止膜(140)及び第3封止膜(150)を含む。
有機発光素子が適用された基板上に第1封止膜として、AlOx層を0.5μmの厚さで蒸着した。続いて、第2封止膜として、10−2〜10−4torr、150〜200℃に維持された真空条件下で光硬化性物質を前記第1封止膜上に蒸着した。前記光硬化性物質として、1官能性物質としてドデカンジオールアクリレート(dodecanediol acrylate、DA)5〜20重量%、2官能性物質としてドデカンジオールジメタクリルレート(dodecandiol dimethacrylate、DMA)10〜95重量%、3官能性物質としてトリメチロールプロパントリアクリレート(trimethylolpropane triacrylate、A−TMPT)又はトリアリルトリメリテート(Triallyl trimellitate、TATM)5〜40重量%を使用した。
実施例1乃至31、比較例1及び2によって製造された封止膜の薄膜特性として、薄膜均一性、クラック(Crack)発生有無、水分透過度(WVTR)、酸素透過度(OTR)などを測定して表2に結果を示した。
10cmx10cmのガラス基板にAlOx層を蒸着した後、第2封止膜層と第3封止膜を順に蒸着して封止膜薄膜を形成した。蒸着が完了した各基板について、20ポイントずつ厚さを測定して薄膜の均一性を評価した。薄膜の均一性が90%以上の場合「O」、80%以上の場合「△」、80%以下の場合「X」を表記した。
10cmx10cmのガラス基板にAlOx層を蒸着した後、第2封止膜層と第3封止膜を順に蒸着して硬化させて封止膜を形成した。蒸着が完了した10cmx10cm基板で一定に5ポイントをサンプリングして薄膜の表面を電界放出走査電子顕微鏡(FE−SEM)で観察し、クラック(crack)の発生有/無を確認した。薄膜でクラックの発生がなければ「X」、薄膜でクラックが発生すれば「O」と表記した。
温度23℃、湿度0%RHの条件で、米国モコン(MOCON)社製の酸素透過率測定装置(機種名「オックストラン」(登録商標)(「OXTRAN」2/20))を使用してJIS K7126(2000年版)に記載されたB法(等圧法)に基づいて、酸素透過度を測定した。1つのサンプルから2枚の試験片を切り取って、それぞれの試験片に対して測定を1回ずつ行い、2つの測定値の平均値をそのサンプルの酸素透過度の値とした。
温度40℃、湿度90%RHの条件で、米国モコン(MOCON)社製の水蒸気透過率測定装置(機種名、「パーマトラン」(登録商標)(「Permatran」W3/31))を使用してJIS K7129(2000年版)に記載されたB法(赤外線センサー法)に基づいて測定した。1つのサンプルから2枚の試験片を切り取って、それぞれの試験片に対して測定を1回ずつ行い、2つの測定値の平均値をそのサンプルの水分透過度の値とした。
Claims (19)
- 有機光電素子部が配置された基板;前記有機光電素子部を取り囲み、無機物又は有機物を含有する第1封止膜;前記第1封止膜を取り囲み、エチレン不飽和結合を含有する光硬化性物質を含む第2封止膜;及び前記第2封止膜を取り囲み、光硬化性SOG(spin on glass)物質の光硬化物を含有する第3封止膜を含む
ことを特徴とする有機電子素子。 - 前記無機物は、金属、金属酸化物、金属フッ化物、金属窒化物、金属炭化物、金属炭窒化物、金属酸窒化物、金属ホウ化物、金属酸ホウ化物、金属シリサイド、シリコン酸化物及びシリコン窒化物からなる群から選択される1種以上である
請求項1に記載の有機電子素子。 - 前記有機物は、カルド系化合物、メラミン、アンメリン、アンメリド及びメラムからなる群から選択される1種以上である
請求項1に記載の有機電子素子。 - 前記エチレン不飽和結合を具備した光硬化性物質は、アクリル系化合物である
請求項1に記載の有機電子素子。 - 前記アクリル系化合物が、モノ(メタ)アクリレート、ジ(メタ)アクリレート及びトリ(メタ)アクリレートからなる群から選択される2種以上である
請求項4に記載の有機電子素子。 - 前記エチレン不飽和結合を具備した光硬化性物質は、エチレン不飽和結合を1つ以上具備した置換もしくは無置換されたC6乃至C30炭化水素化合物である
請求項1に記載の有機電子素子。 - 前記光硬化性物質は、分子内にマレイミド又はオキサゾリドン構造と光硬化性(メタ)アクリレート官能基を一緒に含む
請求項6に記載の有機電子素子。 - 前記第3封止膜は、ナノ・ゲッターを含む
請求項1に記載の有機電子素子。 - 前記ナノ・ゲッターは、100nm以下のサイズを有する金属酸化物粒子である
請求項9に記載の有機電子素子。 - 前記光硬化性SOG物質100重量部に対して前記ナノ・ゲッターが1乃至30重量部を含む
請求項9に記載の有機電子素子。 - 前記第1封止膜の厚さは0.1乃至5μmで、前記第2封止膜の厚さは0.1乃至10μmであり、前記第3封止膜の厚さは1乃至50μmである
請求項1に記載の有機電子素子。 - 有機光電素子部が配置された基板を提供する段階;前記有機光電素子部を取り囲むように無機物又は有機物を塗布及び乾燥して、第1封止膜を形成する段階;前記第1封止膜を取り囲むように光硬化性組成物を塗布及び硬化して、第2封止膜を形成する段階;及び前記第2封止膜を取り囲むようにSOG(spin on glass)組成物を塗布及び硬化して、第3封止膜を形成する段階を含む
ことを特徴とする有機電子素子の製造方法。 - 前記第1封止膜の形成は、10−2乃至10−8torrの真空下で蒸着工程によって遂行される
請求項13に記載の有機電子素子の製造方法。 - 前記光硬化性組成物は、エチレン不飽和結合を1個以上具備した置換もしくは無置換されたC6乃至C30炭化水素化合物;光開始剤;及び熱安定剤、UV安定剤及び酸化防止剤からなる群から選択される1種以上の添加剤を含む
請求項13に記載の有機電子素子の製造方法。 - 前記エチレン不飽和結合を1個以上具備した置換もしくは無置換されたC6乃至C30炭化水素化合物は、30乃至300℃の範囲で蒸気圧が10−4torr以上であり、重量平均分子量が100乃至600である
請求項15に記載の有機電子素子の製造方法。 - 前記SOG組成物は、光硬化性SOG物質及び光活性物質を含む
請求項13に記載の有機電子素子の製造方法。 - 前記光硬化性SOG物質は、重量平均分子量2,000乃至100,000である
請求項17に記載の有機電子素子の製造方法。 - 前記SOG組成物は100nm以下のサイズを有する金属酸化物粒子を含む
請求項13に記載の有機電子素子の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2014-0005500 | 2014-01-16 | ||
KR1020140005500A KR101402355B1 (ko) | 2014-01-16 | 2014-01-16 | 유기 전자 소자 및 이의 제조방법 |
PCT/KR2014/004973 WO2015108251A1 (ko) | 2014-01-16 | 2014-06-03 | 유기 전자 소자 및 이의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017504174A true JP2017504174A (ja) | 2017-02-02 |
JP6298177B2 JP6298177B2 (ja) | 2018-03-20 |
Family
ID=51131485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016563762A Active JP6298177B2 (ja) | 2014-01-16 | 2014-06-03 | 有機電子素子及びその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10411221B2 (ja) |
EP (1) | EP3091587B1 (ja) |
JP (1) | JP6298177B2 (ja) |
KR (1) | KR101402355B1 (ja) |
CN (1) | CN105981188B (ja) |
WO (1) | WO2015108251A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018137409A (ja) * | 2017-02-23 | 2018-08-30 | 三菱ケミカル株式会社 | 薄膜太陽電池モジュール |
JP2019220500A (ja) * | 2018-06-15 | 2019-12-26 | キオクシア株式会社 | プラズマ処理装置の再生装置および再生方法 |
JP2020087774A (ja) * | 2018-11-28 | 2020-06-04 | 東洋インキScホールディングス株式会社 | ディスプレイ |
JP7375585B2 (ja) | 2020-01-31 | 2023-11-08 | 日本ゼオン株式会社 | デバイス構造体の製造方法 |
JP7455159B2 (ja) | 2021-06-17 | 2024-03-25 | 三星エスディアイ株式会社 | 有機発光素子封止用組成物、およびこれから製造される有機層を含む有機発光表示装置 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016068415A1 (ko) * | 2014-10-28 | 2016-05-06 | 삼성에스디아이 주식회사 | 광경화 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 장치 |
KR20160049953A (ko) * | 2014-10-28 | 2016-05-10 | 삼성에스디아이 주식회사 | 광경화 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 장치 |
WO2016068414A1 (ko) * | 2014-10-29 | 2016-05-06 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
WO2016068416A1 (ko) * | 2014-10-29 | 2016-05-06 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
KR101871549B1 (ko) * | 2014-10-29 | 2018-07-03 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
KR20180048690A (ko) | 2015-08-31 | 2018-05-10 | 카티바, 인크. | 디- 및 모노(메트)아크릴레이트 기초 유기 박막 잉크 조성물 |
JP6542631B2 (ja) * | 2015-09-30 | 2019-07-10 | 宇部マテリアルズ株式会社 | 太陽電池モジュール及びその製造方法 |
WO2018017541A1 (en) * | 2016-07-21 | 2018-01-25 | Kateeva, Inc. | Methods of forming a polymeric thin film layer on an organic light-emitting diode substrate |
JP2018022624A (ja) * | 2016-08-04 | 2018-02-08 | 株式会社ジャパンディスプレイ | 表示装置、表示装置の製造方法 |
WO2018195066A2 (en) * | 2017-04-21 | 2018-10-25 | Kateeva, Inc. | Compositions and techniques for forming organic thin films |
KR102432383B1 (ko) * | 2017-12-19 | 2022-08-11 | 카티바, 인크. | 개선된 광선 출력커플링을 갖는 발광 장치 |
CN109346622A (zh) * | 2018-10-19 | 2019-02-15 | 武汉华星光电半导体显示技术有限公司 | Oled阵列基板及其制作方法 |
CN111785845A (zh) * | 2019-04-04 | 2020-10-16 | 上海和辉光电有限公司 | 薄膜封装材料及其制造方法、薄膜封装结构和电子器件 |
CN110317425A (zh) * | 2019-06-03 | 2019-10-11 | 浙江华显光电科技有限公司 | 用于oled器件薄膜封装的有机聚合物薄膜及其应用 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264225A (ja) * | 2000-03-15 | 2001-09-26 | Hitachi Ltd | 試料作製方法 |
JP2003323132A (ja) * | 2002-04-30 | 2003-11-14 | Sony Corp | 薄膜デバイスの製造方法および半導体装置 |
WO2005036270A1 (ja) * | 2003-10-07 | 2005-04-21 | Hitachi Chemical Co., Ltd. | 放射線硬化性組成物、その保存方法、硬化膜形成方法、パターン形成方法、パターン使用方法、電子部品及び光導波路 |
JP2005324406A (ja) * | 2004-05-13 | 2005-11-24 | Dainippon Printing Co Ltd | ガスバリア性フィルム、ならびにこれを用いて構成された液晶表示素子およびel表示素子 |
JP2006326899A (ja) * | 2005-05-24 | 2006-12-07 | Toppan Printing Co Ltd | ガスバリア性積層フィルム |
JP2007153978A (ja) * | 2005-12-02 | 2007-06-21 | Nippon Shokubai Co Ltd | 酸変性エポキシ(メタ)アクリレートおよび画像形成用感光性樹脂組成物 |
JP2007184279A (ja) * | 2005-12-30 | 2007-07-19 | Samsung Sdi Co Ltd | 有機発光素子およびその製造方法 |
JP2008266408A (ja) * | 2007-04-18 | 2008-11-06 | Hitachi Chem Co Ltd | プリプレグ、それを用いた多層基配線板及び電子部品 |
JP2010027500A (ja) * | 2008-07-23 | 2010-02-04 | Tdk Corp | 有機el表示装置及びその製造方法 |
JP2012096409A (ja) * | 2010-10-29 | 2012-05-24 | Dainippon Printing Co Ltd | ガスバリア性フィルムの製造方法及びガスバリア層の形成方法 |
JP2012190612A (ja) * | 2011-03-09 | 2012-10-04 | Sekisui Chem Co Ltd | 有機光デバイスの製造方法 |
JP2013237734A (ja) * | 2012-05-11 | 2013-11-28 | Showa Denko Kk | 透明複合材料及び透明フィルムの製造方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100238252B1 (ko) * | 1996-09-13 | 2000-01-15 | 윤종용 | Sog층 큐어링방법 및 이를 이용한 반도체장치의 절연막제조방법 |
DE19825532A1 (de) | 1998-06-08 | 1999-12-09 | Hydac Process Technology Gmbh | Filtervorrichtung für einen Spinnkopf |
EP1196499B1 (en) | 1999-07-27 | 2003-08-27 | Bausch & Lomb Incorporated | Contact lens material |
US6548912B1 (en) | 1999-10-25 | 2003-04-15 | Battelle Memorial Institute | Semicoductor passivation using barrier coatings |
US6573652B1 (en) * | 1999-10-25 | 2003-06-03 | Battelle Memorial Institute | Encapsulated display devices |
US6867539B1 (en) | 2000-07-12 | 2005-03-15 | 3M Innovative Properties Company | Encapsulated organic electronic devices and method for making same |
KR100351507B1 (ko) | 2000-09-14 | 2002-09-05 | 한국과학기술연구원 | 실시간 제어용 공기조화 장치 및 그 제어방법 |
KR100506148B1 (ko) | 2001-05-29 | 2005-08-05 | 이충훈 | 유기 발광 소자 및 그의 제조 방법 |
KR20030097780A (ko) * | 2001-07-04 | 2003-12-31 | 쇼와 덴코 가부시키가이샤 | 레지스트 경화성 수지 조성물 및 그 경화물 |
KR100413450B1 (ko) * | 2001-07-20 | 2003-12-31 | 엘지전자 주식회사 | 표시소자의 보호막 구조 |
KR100480361B1 (ko) * | 2002-04-18 | 2005-03-30 | 네오뷰코오롱 주식회사 | 박막형 게터층이 형성된 밀봉형 유기 발광 소자 및 그제조방법 |
US20090206328A1 (en) | 2005-01-05 | 2009-08-20 | Kimihiro Matsukawa | Silicon-Containing Photosensitive Composition, Method for Forming Thin Film Pattern Using Same, Protective Film for Electronic Device, Gate Insulating Film And Thin Film Transistor |
US7767498B2 (en) | 2005-08-25 | 2010-08-03 | Vitex Systems, Inc. | Encapsulated devices and method of making |
WO2009029983A1 (en) | 2007-09-04 | 2009-03-12 | Queensland University Of Technology | A feeder cell-free culture medium and system |
CN201861232U (zh) | 2010-05-31 | 2011-06-15 | 胡尔曼 | 插接式长宽高可变双用婴儿摇床 |
KR101253529B1 (ko) * | 2010-06-29 | 2013-04-11 | 차혁진 | 봉지막 및 이를 포함하는 유기전자소자 |
KR101240000B1 (ko) | 2010-07-16 | 2013-03-06 | 박미옥 | 헤어 드라이기 |
EP2445029A1 (en) * | 2010-10-25 | 2012-04-25 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Multilayered protective layer, organic opto-electric device and method of manufacturing the same |
EP2445028A1 (en) * | 2010-10-25 | 2012-04-25 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Opto-electric device and method of manufacturing an opto-electric device |
JP4945681B1 (ja) | 2010-11-24 | 2012-06-06 | 株式会社コスメック | 倍力機構付きシリンダ装置 |
IN2014DN10539A (ja) * | 2012-05-16 | 2015-08-21 | Novopolymers N V | |
KR101596544B1 (ko) | 2012-06-15 | 2016-02-22 | 제일모직주식회사 | 광경화 조성물, 이를 포함하는 장벽층, 및 이를 포함하는 봉지화된 장치 |
EP2960691B1 (en) * | 2013-02-19 | 2017-09-27 | Fujifilm Corporation | Near-infrared absorbing composition, near-infrared blocking filter, method for producing near-infrared blocking filter, camera module and method for manufacturing camera module |
-
2014
- 2014-01-16 KR KR1020140005500A patent/KR101402355B1/ko active IP Right Grant
- 2014-06-03 US US15/110,311 patent/US10411221B2/en active Active
- 2014-06-03 JP JP2016563762A patent/JP6298177B2/ja active Active
- 2014-06-03 WO PCT/KR2014/004973 patent/WO2015108251A1/ko active Application Filing
- 2014-06-03 EP EP14878940.7A patent/EP3091587B1/en active Active
- 2014-06-03 CN CN201480073196.5A patent/CN105981188B/zh active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264225A (ja) * | 2000-03-15 | 2001-09-26 | Hitachi Ltd | 試料作製方法 |
JP2003323132A (ja) * | 2002-04-30 | 2003-11-14 | Sony Corp | 薄膜デバイスの製造方法および半導体装置 |
WO2005036270A1 (ja) * | 2003-10-07 | 2005-04-21 | Hitachi Chemical Co., Ltd. | 放射線硬化性組成物、その保存方法、硬化膜形成方法、パターン形成方法、パターン使用方法、電子部品及び光導波路 |
JP2005324406A (ja) * | 2004-05-13 | 2005-11-24 | Dainippon Printing Co Ltd | ガスバリア性フィルム、ならびにこれを用いて構成された液晶表示素子およびel表示素子 |
JP2006326899A (ja) * | 2005-05-24 | 2006-12-07 | Toppan Printing Co Ltd | ガスバリア性積層フィルム |
JP2007153978A (ja) * | 2005-12-02 | 2007-06-21 | Nippon Shokubai Co Ltd | 酸変性エポキシ(メタ)アクリレートおよび画像形成用感光性樹脂組成物 |
JP2007184279A (ja) * | 2005-12-30 | 2007-07-19 | Samsung Sdi Co Ltd | 有機発光素子およびその製造方法 |
JP2008266408A (ja) * | 2007-04-18 | 2008-11-06 | Hitachi Chem Co Ltd | プリプレグ、それを用いた多層基配線板及び電子部品 |
JP2010027500A (ja) * | 2008-07-23 | 2010-02-04 | Tdk Corp | 有機el表示装置及びその製造方法 |
JP2012096409A (ja) * | 2010-10-29 | 2012-05-24 | Dainippon Printing Co Ltd | ガスバリア性フィルムの製造方法及びガスバリア層の形成方法 |
JP2012190612A (ja) * | 2011-03-09 | 2012-10-04 | Sekisui Chem Co Ltd | 有機光デバイスの製造方法 |
JP2013237734A (ja) * | 2012-05-11 | 2013-11-28 | Showa Denko Kk | 透明複合材料及び透明フィルムの製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018137409A (ja) * | 2017-02-23 | 2018-08-30 | 三菱ケミカル株式会社 | 薄膜太陽電池モジュール |
JP2019220500A (ja) * | 2018-06-15 | 2019-12-26 | キオクシア株式会社 | プラズマ処理装置の再生装置および再生方法 |
JP7096079B2 (ja) | 2018-06-15 | 2022-07-05 | キオクシア株式会社 | プラズマ処理装置の再生装置 |
JP2020087774A (ja) * | 2018-11-28 | 2020-06-04 | 東洋インキScホールディングス株式会社 | ディスプレイ |
JP7375585B2 (ja) | 2020-01-31 | 2023-11-08 | 日本ゼオン株式会社 | デバイス構造体の製造方法 |
JP7455159B2 (ja) | 2021-06-17 | 2024-03-25 | 三星エスディアイ株式会社 | 有機発光素子封止用組成物、およびこれから製造される有機層を含む有機発光表示装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6298177B2 (ja) | 2018-03-20 |
KR101402355B1 (ko) | 2014-06-02 |
EP3091587A1 (en) | 2016-11-09 |
CN105981188B (zh) | 2019-10-11 |
US10411221B2 (en) | 2019-09-10 |
CN105981188A (zh) | 2016-09-28 |
WO2015108251A1 (ko) | 2015-07-23 |
US20160329524A1 (en) | 2016-11-10 |
EP3091587A4 (en) | 2017-10-11 |
EP3091587B1 (en) | 2022-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6298177B2 (ja) | 有機電子素子及びその製造方法 | |
JP5263849B2 (ja) | 酸素及び/又は水分に敏感な電子デバイスをカプセル封じするための多層膜 | |
TWI313918B (en) | Encapsulated devices and method of making | |
US8754407B2 (en) | Gas barrier film, method of manufacturing gas barrier film, and organic photoelectric conversion element | |
CN103958182B (zh) | 气体阻隔膜及电子设备 | |
KR101253528B1 (ko) | 봉지막의 제조방법,이로부터 제조된 봉지막 및 이를 포함하는 유기전자소자 | |
CN104246918A (zh) | 透明导电性膜的制造方法、透明导电性膜及电子器件 | |
WO2012026362A1 (ja) | ガスバリア性フィルムの製造方法及び有機光電変換素子 | |
TW201041736A (en) | Transparent barrier lamination | |
JP6755259B2 (ja) | バリア膜積層体およびそのような積層体を備える電子デバイス | |
JP6170627B2 (ja) | 電子デバイスの製造方法および複合フィルム | |
KR101253529B1 (ko) | 봉지막 및 이를 포함하는 유기전자소자 | |
JP5712509B2 (ja) | バリアフィルムの製造方法 | |
JP6237752B2 (ja) | ガスバリア性フィルム、その製造方法、それを用いた有機光電変換素子及び有機エレクトロルミネッセンス素子 | |
JP2015103389A (ja) | 有機el素子 | |
JPWO2011043315A1 (ja) | ガスバリア性フィルム、ガスバリア性フィルムの製造方法、該ガスバリア性フィルムを有する有機光電変換素子及び該有機光電変換素子を有する太陽電池 | |
KR20160108535A (ko) | 유기 일렉트로루미네센스 소자 및 그것을 사용한 조명 장치, 표시 장치 | |
JP5640976B2 (ja) | ガスバリアフィルムとその製造方法、これを用いた光電変換素子 | |
KR101024353B1 (ko) | 유기 전자 소자 및 그 제조방법 | |
CN114015277A (zh) | 一种用于oled封装的油墨组合物及其应用 | |
JP2011204739A (ja) | 有機電子素子及び有機電子素子の製造方法 | |
WO2017168867A1 (ja) | 光取り出しフィルム、及び、有機エレクトロルミネッセンス発光装置 | |
Hu et al. | Effects of transparent MPTMS/Ag/MoO3 structure as anode on the performance of green organic light-emitting diodes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160708 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170511 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170606 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20170906 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20171102 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171108 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180206 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180222 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6298177 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |