JP2017085088A5 - - Google Patents

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Publication number
JP2017085088A5
JP2017085088A5 JP2016192428A JP2016192428A JP2017085088A5 JP 2017085088 A5 JP2017085088 A5 JP 2017085088A5 JP 2016192428 A JP2016192428 A JP 2016192428A JP 2016192428 A JP2016192428 A JP 2016192428A JP 2017085088 A5 JP2017085088 A5 JP 2017085088A5
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JP
Japan
Prior art keywords
precursor
processing chamber
ampoule
flow
time
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JP2016192428A
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English (en)
Japanese (ja)
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JP6804920B2 (ja
JP2017085088A (ja
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Priority claimed from US14/929,073 external-priority patent/US10094018B2/en
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Publication of JP2017085088A5 publication Critical patent/JP2017085088A5/ja
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Publication of JP6804920B2 publication Critical patent/JP6804920B2/ja
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JP2016192428A 2015-10-02 2016-09-30 原子層堆積のための動的前駆体注入 Active JP6804920B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201562236780P 2015-10-02 2015-10-02
US62/236,780 2015-10-02
US14/929,073 US10094018B2 (en) 2014-10-16 2015-10-30 Dynamic precursor dosing for atomic layer deposition
US14/929,073 2015-10-30

Publications (3)

Publication Number Publication Date
JP2017085088A JP2017085088A (ja) 2017-05-18
JP2017085088A5 true JP2017085088A5 (enExample) 2019-11-07
JP6804920B2 JP6804920B2 (ja) 2020-12-23

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Family Applications (1)

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JP2016192428A Active JP6804920B2 (ja) 2015-10-02 2016-09-30 原子層堆積のための動的前駆体注入

Country Status (6)

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US (2) US10094018B2 (enExample)
JP (1) JP6804920B2 (enExample)
KR (2) KR102697645B1 (enExample)
CN (2) CN107068585B (enExample)
SG (2) SG10201608005WA (enExample)
TW (1) TWI737630B (enExample)

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