JP2016511057A5 - - Google Patents

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JP2016511057A5
JP2016511057A5 JP2016500442A JP2016500442A JP2016511057A5 JP 2016511057 A5 JP2016511057 A5 JP 2016511057A5 JP 2016500442 A JP2016500442 A JP 2016500442A JP 2016500442 A JP2016500442 A JP 2016500442A JP 2016511057 A5 JP2016511057 A5 JP 2016511057A5
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electromagnetic
electromagnetic beam
deflecting device
eye
location
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JP6338256B2 (ja
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Claims (12)

  1. 眼手術システムであって、
    患者の眼とインターフェースする(interface)よう構成された眼インターフェース装置と、
    前記眼インターフェース装置を支持すると共に電磁線ビームの焦点を前記眼内の異なる場所に対してスキャンするよう動作可能なスキャン組立体と、
    前記電磁線ビームを発生させるよう構成されたビーム源と、
    前記スキャン組立体を支持すると共に前記眼の運動を許容し且つ前記電磁線ビーム及び前記焦点の存在場所から反射された前記電磁線ビームの一部分のための可変光路を提供するよう構成された自由浮動機構体と、
    前記焦点の存在場所から反射された前記電磁線ビームの一部分の強度を表す強度信号を発生させるよう構成された検出組立体と、
    を備え、
    前記可変光路は、前記ビーム源と前記スキャナとの間に設けられ、前記眼の運動に応答して変化する光路長を有する、システム。
  2. 前記スキャン組立体は、前記電磁線ビームの伝搬方向に前記焦点の前記存在場所を変化させるよう動作できるz‐スキャン装置と、前記電磁線ビームの前記伝搬方向に対して横方向に前記焦点の前記存在場所を変化させるよう動作できるxy‐スキャン装置と、を含む、請求項1記載のシステム。
  3. 前記自由浮動機構体は、
    第1の方向に伝搬している前記電磁線ビームを偏向させて前記第1の方向とは異なる第2の方向に伝搬させるよう構成された第1のビーム偏向装置と、
    前記第2の方向に伝搬している前記電磁線ビームを偏向させて前記第2の方向とは異なる第3の方向に伝搬させるよう構成された第2のビーム偏向装置と、
    を含み、
    前記第1のビーム偏向装置は又、前記焦点存在場所から反射されて前記第3の方向とは逆の方向に伝搬している前記電磁線ビームの一部分を偏向させて前記第2の方向とは逆の方向に伝搬させるよう構成されており、
    前記第2のビーム偏向装置は又、前記焦点存在場所から反射されて前記第2の方向とは逆の方向に伝搬している前記電磁線ビームの一部分を偏向させて前記第1の方向とは逆の方向に伝搬させるよう構成されており、
    (1)前記第1のビーム偏向装置と前記第2のビーム偏向装置との間の距離、及び、(2)前記第1のビーム偏向装置と前記第2のビーム偏向装置との間の回転配向状態、のうちの少なくとも一方が、前記眼の運動を許容するべく変化する、請求項1記載のシステム。
  4. 前記自由浮動機構体は、前記第3の方向に伝搬している前記電磁線ビームを偏向させて前記第3の方向とは異なる第4の方向に伝搬させるよう構成された第3のビーム偏向装置を含み、
    前記第3のビーム偏向装置は又、前記焦点存在場所から反射されて前記第4の方向とは逆の方向に伝搬している前記電磁線ビームの一部分を偏向させて前記第3の方向とは逆の方向に伝搬させるよう構成されており、
    (1)前記第2のビーム偏向装置と前記第3のビーム偏向装置との間の距離、及び、(2)前記第2のビーム偏向装置と前記第3のビーム偏向装置との間の回転配向状態、のうちの少なくとも一方が、前記眼の運動を許容するべく変化する、請求項3記載のシステム。
  5. 前記検出組立体は、前記強度信号を発生させるよう構成されたセンサと、前記焦点以外の場所から反射された前記電磁線ビームの部分が当該センサに到達するのを阻止するよう構成されたアパーチュアと、を含む、請求項1記載のシステム。
  6. 偏光敏感性装置及び偏光装置を更に含み、
    前記偏光敏感性装置は、前記ビーム源と前記自由浮動機構体との間で前記電磁線ビームの光路に沿って配置されており、
    前記電磁線ビームは、前記ビーム源から前記自由浮動機構体までの当該電磁線ビームの伝搬中、前記偏光敏感性装置を通り、
    前記偏光装置は、前記電磁線ビーム及び前記焦点存在場所から反射された前記電磁線ビームの一部分のうちの少なくとも一方の偏光を改変し、
    前記偏光敏感性装置は、前記焦点存在場所から反射された前記電磁線ビームの一部分を反射して、前記強度信号を発生させるよう構成されたセンサに入射させる、請求項1記載のシステム。
  7. 前記偏光装置は、四分の一波長板を含む、請求項6記載のシステム。
  8. 前記電磁線ビームは、組織を改変するよう構成されていない、請求項1記載のシステム。
  9. 前記電磁線ビームは、組織を改変するよう構成されている、請求項1記載のシステム。
  10. 前記電磁線ビームは、320ナノメートル〜430ナノメートルの波長を有する複数のレーザパルスを含む、請求項1記載のシステム。
  11. 前記電磁線ビームは、800ナノメートル〜1100ナノメートルの波長を有する複数のレーザパルスを含む、請求項1記載のシステム。
  12. 前記電磁線ビームは、100フェムト秒〜15ナノ秒のパルス持続時間を有する複数のレーザパルスを含む、請求項1記載のシステム。
JP2016500442A 2013-03-13 2014-02-26 レーザ手術システム Active JP6338256B2 (ja)

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US201361780736P 2013-03-13 2013-03-13
US61/780,736 2013-03-13
PCT/US2014/018752 WO2014158615A1 (en) 2013-03-13 2014-02-26 Laser eye surgery system

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EP (2) EP3434235B1 (ja)
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