JP2016509332A5 - - Google Patents

Download PDF

Info

Publication number
JP2016509332A5
JP2016509332A5 JP2015546533A JP2015546533A JP2016509332A5 JP 2016509332 A5 JP2016509332 A5 JP 2016509332A5 JP 2015546533 A JP2015546533 A JP 2015546533A JP 2015546533 A JP2015546533 A JP 2015546533A JP 2016509332 A5 JP2016509332 A5 JP 2016509332A5
Authority
JP
Japan
Prior art keywords
layer
substrate
conductive layer
item
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015546533A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016509332A (ja
JP6700787B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2013/072624 external-priority patent/WO2014088950A1/en
Publication of JP2016509332A publication Critical patent/JP2016509332A/ja
Publication of JP2016509332A5 publication Critical patent/JP2016509332A5/ja
Application granted granted Critical
Publication of JP6700787B2 publication Critical patent/JP6700787B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015546533A 2012-12-07 2013-12-02 基板上に透明導電体を製作する方法 Expired - Fee Related JP6700787B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261734793P 2012-12-07 2012-12-07
US61/734,793 2012-12-07
US201361782634P 2013-03-14 2013-03-14
US61/782,634 2013-03-14
US201361840876P 2013-06-28 2013-06-28
US61/840,876 2013-06-28
PCT/US2013/072624 WO2014088950A1 (en) 2012-12-07 2013-12-02 Method of making transparent conductors on a substrate

Publications (3)

Publication Number Publication Date
JP2016509332A JP2016509332A (ja) 2016-03-24
JP2016509332A5 true JP2016509332A5 (OSRAM) 2016-12-22
JP6700787B2 JP6700787B2 (ja) 2020-05-27

Family

ID=50883903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015546533A Expired - Fee Related JP6700787B2 (ja) 2012-12-07 2013-12-02 基板上に透明導電体を製作する方法

Country Status (8)

Country Link
US (2) US10254786B2 (OSRAM)
EP (1) EP2929417A4 (OSRAM)
JP (1) JP6700787B2 (OSRAM)
KR (1) KR102145157B1 (OSRAM)
CN (1) CN104838342B (OSRAM)
BR (1) BR112015013033A2 (OSRAM)
SG (1) SG11201504125UA (OSRAM)
WO (1) WO2014088950A1 (OSRAM)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3000917B1 (fr) * 2013-01-11 2015-02-20 Bobst Lyon Procede de commande, pour commander une machine de transformation, machine de transformation et programme d'ordinateur pour realiser un tel procede de commande
JP6426737B2 (ja) 2013-07-31 2018-11-21 スリーエム イノベイティブ プロパティズ カンパニー 電子的構成要素とパターン化ナノワイヤ透明伝導体との接合
SG11201601075PA (en) 2013-08-28 2016-03-30 3M Innovative Properties Co Electronic assembly with fiducial marks for precision registration during subsequent processing steps
SG11201602419WA (en) 2013-09-30 2016-04-28 3M Innovative Properties Co Protective coating for printed conductive pattern on patterned nanowire transparent conductors
BR112016010214A2 (pt) 2013-11-06 2017-08-08 3M Innovative Properties Co ?estampas de impressão por microcontato com características funcionais?
US10166571B2 (en) * 2013-12-10 2019-01-01 Lg Display Co., Ltd. Refining method for microstructure
TWI564762B (zh) * 2015-04-22 2017-01-01 恆顥科技股份有限公司 觸控薄膜疊層卷的製作方法與所製得之觸控薄膜疊層片
US10492305B2 (en) 2015-06-30 2019-11-26 3M Innovative Properties Company Patterned overcoat layer
KR20180022847A (ko) 2015-06-30 2018-03-06 쓰리엠 이노베이티브 프로퍼티즈 캄파니 비아를 포함하는 전자 디바이스 및 그러한 전자 디바이스를 형성하는 방법
WO2017014956A1 (en) 2015-07-21 2017-01-26 3M Innovative Properties Company Electrically conductive films, assemblies, and methods of removing static electric charge from electrically conductive pattern
KR102555869B1 (ko) * 2015-08-06 2023-07-13 삼성전자주식회사 도전체 및 그 제조 방법
WO2017034870A1 (en) 2015-08-21 2017-03-02 3M Innovative Properties Company Transparent conductors including metal traces and methods of making same
CN114686137B (zh) * 2015-12-04 2025-04-15 雷恩哈德库兹基金两合公司 膜以及用于制造膜的方法
JP6956706B2 (ja) * 2016-03-18 2021-11-02 国立大学法人大阪大学 金属ナノワイヤ層が形成された基材及びその製造方法
CN109311288B (zh) 2016-05-25 2021-01-12 3M创新有限公司 用于触摸传感器的基底
US20190235670A1 (en) * 2016-07-08 2019-08-01 Asahi Kasei Kabushiki Kaisha Electrically conductive film, electronic paper, touch panel, and flat panel display
CN110121921A (zh) * 2016-12-29 2019-08-13 3M创新有限公司 用于制备导电图案的方法以及包含导电图案的制品
KR101841946B1 (ko) * 2017-02-24 2018-03-26 동우 화인켐 주식회사 장력 제어를 이용한 터치 센서 필름 제조방법
DE102017106055B4 (de) * 2017-03-21 2021-04-08 Tdk Corporation Trägersubstrat für stressempflindliches Bauelement und Verfahren zur Herstellung
CN110785684B (zh) 2017-06-29 2022-06-03 3M创新有限公司 制品及其制造方法
US11683977B2 (en) 2017-11-30 2023-06-20 3M Innovative Properties Company Substrate including a self-supporting tri-layer stack
US10058014B1 (en) 2017-12-13 2018-08-21 International Business Machines Corporation Conductive adhesive layer for gasket assembly
JP2021003806A (ja) * 2018-01-29 2021-01-14 スリーエム イノベイティブ プロパティズ カンパニー 糸状部材への印刷方法、及び糸状のこぎり
CN109871141B (zh) * 2018-12-29 2023-02-03 赣州市德普特科技有限公司 一种触摸屏制作工艺中的布线区保护方法
KR102755456B1 (ko) * 2019-01-04 2025-01-20 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
US11261529B2 (en) * 2020-03-31 2022-03-01 Futuretech Capital, Inc. Reduced visibility conductive micro mesh touch sensor
KR102461794B1 (ko) * 2020-08-13 2022-11-02 한국과학기술연구원 은 나노와이어 메쉬 전극 및 이의 제조방법
CN114496352A (zh) * 2020-11-12 2022-05-13 天材创新材料科技(厦门)有限公司 纳米银线保护层结构及其制备方法
US12412678B2 (en) 2020-12-04 2025-09-09 Korea Advanced Institute Of Science And Technology Fabrication method of conductive nanonetworks through adaptation of sacrificial layer
KR102628299B1 (ko) 2020-12-04 2024-01-24 한국과학기술원 마스터몰드를 이용한 투명 전도성 네트워크 제조방법
US11961632B2 (en) 2020-12-04 2024-04-16 Korea Advanced Institute Of Science And Technology Fabrication method of conductive nanonetworks using mastermold
KR102722102B1 (ko) 2020-12-04 2024-10-28 한국과학기술원 희생층을 이용한 투명 전도성 네트워크 제조방법
KR102722103B1 (ko) 2020-12-04 2024-10-28 한국과학기술원 나노마스크를 이용한 투명 전도성 네트워크 제조방법
US11513638B2 (en) 2020-12-18 2022-11-29 Cambrios Film Solutions Corporation Silver nanowire protection layer structure and manufacturing method thereof
CN113764564B (zh) * 2021-08-31 2024-01-23 Tcl华星光电技术有限公司 基板制备方法及膜片结构
KR102691766B1 (ko) * 2022-10-25 2024-08-05 서울대학교산학협력단 나노와이어 함유 패턴의 제조방법 및 이를 이용하여 제조된 투명 전극

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654384A (en) 1970-05-25 1972-04-04 Magnavox Co Apparatus for modifying electrical signals
US4895630A (en) 1985-08-28 1990-01-23 W. H. Brady Co. Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates
JPH05224818A (ja) 1992-02-10 1993-09-03 Matsushita Electric Ind Co Ltd タッチパネル装置
TW552243B (en) * 1997-11-12 2003-09-11 Jsr Corp Process of forming a pattern on a substrate
US6037005A (en) 1998-05-12 2000-03-14 3M Innovative Properties Company Display substrate electrodes with auxiliary metal layers for enhanced conductivity
US20030148024A1 (en) 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
TWI268813B (en) * 2002-04-24 2006-12-21 Sipix Imaging Inc Process for forming a patterned thin film conductive structure on a substrate
KR100486915B1 (ko) 2002-09-12 2005-05-03 엘지전자 주식회사 포토필링법을 이용한 플라즈마 디스플레이 패널의 전극제조방법
US6975067B2 (en) 2002-12-19 2005-12-13 3M Innovative Properties Company Organic electroluminescent device and encapsulation method
US7175876B2 (en) 2003-06-27 2007-02-13 3M Innovative Properties Company Patterned coating method employing polymeric coatings
US7416993B2 (en) * 2003-09-08 2008-08-26 Nantero, Inc. Patterned nanowire articles on a substrate and methods of making the same
US20050196707A1 (en) 2004-03-02 2005-09-08 Eastman Kodak Company Patterned conductive coatings
US8420693B2 (en) 2004-12-28 2013-04-16 Gemin X Pharmaceuticals Canada Inc. Dipyrrole compounds, compositions, and methods for treating cancer or viral diseases
EP1912677B1 (en) * 2005-06-20 2013-10-02 Psma Development Company, L.L.C. PSMA antibody-drug conjugates
JP5546763B2 (ja) 2005-08-12 2014-07-09 カンブリオス テクノロジーズ コーポレイション ナノワイヤに基づく透明導電体
WO2007034994A1 (en) 2005-09-22 2007-03-29 Fujifilm Corporation Light-transmittable electromagnetic wave shielding film, process for producing light-transmittable electromagnetic wave shielding film, film for display panel, optical filter for display panel and plasma display panel
US8264137B2 (en) * 2006-01-03 2012-09-11 Samsung Electronics Co., Ltd. Curing binder material for carbon nanotube electron emission cathodes
US8461992B2 (en) 2006-05-12 2013-06-11 Solstice Medical, Llc RFID coupler for metallic implements
US20080048996A1 (en) 2006-08-11 2008-02-28 Unidym, Inc. Touch screen devices employing nanostructure networks
US8018568B2 (en) 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US8094247B2 (en) 2006-10-12 2012-01-10 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US7867907B2 (en) * 2006-10-17 2011-01-11 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
WO2008127313A2 (en) 2006-11-17 2008-10-23 The Regents Of The University Of California Electrically conducting and optically transparent nanowire networks
JP4902344B2 (ja) 2006-12-27 2012-03-21 富士フイルム株式会社 金属パターン材料の製造方法
KR100875168B1 (ko) * 2007-07-26 2008-12-22 주식회사 동부하이텍 반도체 소자의 금속배선 잔류 폴리머 제거방법
US8378046B2 (en) 2007-10-19 2013-02-19 3M Innovative Properties Company High refractive index pressure-sensitive adhesives
JP2011515510A (ja) 2008-02-26 2011-05-19 カンブリオス テクノロジーズ コーポレイション 導電性特徴をスクリーン印刷するための方法および組成物
EP2257969B1 (en) 2008-02-28 2017-12-20 3M Innovative Properties Company Methods of patterning a conductor on a substrate
JP5086886B2 (ja) * 2008-05-15 2012-11-28 富士通コンポーネント株式会社 座標検出装置の製造方法
JP2011530113A (ja) * 2008-08-01 2011-12-15 スリーエム イノベイティブ プロパティズ カンパニー 複合電極を有するタッチ感知装置
KR101156275B1 (ko) 2009-02-06 2012-06-13 주식회사 엘지화학 터치스크린 및 이의 제조방법
US20100238133A1 (en) 2009-03-17 2010-09-23 Wintek Corporation Capacitive touch panel
JP2010271796A (ja) * 2009-05-19 2010-12-02 Optrex Corp 電極間接続構造およびタッチパネル
US8647463B2 (en) 2009-06-30 2014-02-11 Dic Corporation Method for forming transparent conductive layer pattern
TW201132990A (en) 2009-08-24 2011-10-01 Cambrios Technologies Corp Contact resistance measurement for resistance linearity in nanostructure thin films
CN101699376B (zh) * 2009-09-04 2011-09-14 深超光电(深圳)有限公司 触控面板及触控面板的检测方法
US20110057905A1 (en) * 2009-09-04 2011-03-10 Hong-Chih Yu Touch Panel and Inspection Method Thereof
KR101073280B1 (ko) 2010-04-01 2011-10-12 삼성모바일디스플레이주식회사 터치 스크린 패널 및 이를 구비한 영상표시장치
US8236626B2 (en) * 2010-04-15 2012-08-07 The Board Of Trustees Of The Leland Stanford Junior University Narrow graphene nanoribbons from carbon nanotubes
WO2012025847A1 (en) * 2010-08-23 2012-03-01 Koninklijke Philips Electronics N.V. Self-aligned coverage of opaque conductive areas
US8822865B2 (en) * 2010-12-29 2014-09-02 Lg Chem, Ltd. Touch screen and method for manufacturing the same
EP2672369A4 (en) * 2011-02-04 2014-11-12 Shinetsu Polymer Co CAPACITIVE SENSING SHEET AND METHOD FOR MANUFACTURING THE SAME
US8558807B2 (en) 2011-02-15 2013-10-15 Teh-Zheng Lin Transparent touch panel
JP2012182005A (ja) 2011-03-01 2012-09-20 Nitto Denko Corp 有機エレクトロルミネッセンス素子の製法
US8854326B2 (en) 2011-03-10 2014-10-07 Wintek Corporation Touch panel and touch-sensitive display device
JP5774686B2 (ja) * 2011-04-26 2015-09-09 日本メクトロン株式会社 透明プリント配線板の製造方法、および透明タッチパネルの製造方法
KR20120127556A (ko) * 2011-05-14 2012-11-22 정병현 투명 도전막 에칭 방법
JP5806066B2 (ja) 2011-09-30 2015-11-10 富士フイルム株式会社 電極パターン、タッチパネル、液晶表示装置及び、有機elディスプレイ
KR101373044B1 (ko) * 2012-04-19 2014-03-11 삼성디스플레이 주식회사 터치 스크린 패널
US20160244641A1 (en) 2013-10-23 2016-08-25 3M Innovative Properties Company System and method for making a textured film

Similar Documents

Publication Publication Date Title
JP2016509332A5 (OSRAM)
US10831233B2 (en) Method of making transparent conductors on a substrate
US10685203B2 (en) High-performance film-type touch sensor and method of fabricating the same
KR101812606B1 (ko) 투명인쇄회로 제조방법 및 투명터치패널 제조방법
JP2016530622A5 (OSRAM)
TWI634471B (zh) 觸控面板與具有其之觸控裝置
CN105453001B (zh) 将电子部件粘结到图案化纳米线透明导体
US20190114003A1 (en) Nanowire contact pads with enhanced adhesion to metal interconnects
US20150277647A1 (en) Pressure-sensitive element, method of producing the pressure-sensitive element, touch panel equipped with the pressure-sensitive element, and method of producing the pressure-sensitive element
CN110231891B (zh) 一种柔性盖板及其制备方法、柔性oled显示屏
KR20130116784A (ko) 표시장치용 터치 스크린 패널 및 그 제조방법
JP2016534465A5 (OSRAM)
US10705659B2 (en) Film touch sensor and method of preparing the same
TW201734732A (zh) 觸碰感測器及其製備方法
JP2012151095A (ja) 透明導電性フィルム、静電容量式タッチパネルの透明電極及びタッチパネル
US20150036307A1 (en) Circuit board
US9600105B2 (en) Touch panel device and method for manufacturing the same
TWI449479B (zh) 線路之製造方法
CN107209595B (zh) 薄膜触摸传感器及其制造方法
KR101515376B1 (ko) 터치스크린 패널의 제조방법 및 이로부터 제조된 터치스크린 패널
JP2013074025A (ja) 導電パターン形成基板の製造方法及び導電パターン形成基板
KR102211774B1 (ko) 터치 스크린 패널의 제조 방법 및 이에 따라 제조된 터치 스크린 패널
TWI628564B (zh) 感測電極疊層結構、觸控疊層結構與形成電極疊層結構之方法
KR102211768B1 (ko) 필름 터치 센서 및 이의 제조 방법
CN114698254A (zh) 叠构结构及触控感应器