JP2016507366A - 酸化物被覆基材の形成方法 - Google Patents
酸化物被覆基材の形成方法 Download PDFInfo
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- JP2016507366A JP2016507366A JP2015551781A JP2015551781A JP2016507366A JP 2016507366 A JP2016507366 A JP 2016507366A JP 2015551781 A JP2015551781 A JP 2015551781A JP 2015551781 A JP2015551781 A JP 2015551781A JP 2016507366 A JP2016507366 A JP 2016507366A
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Abstract
Description
本出願は、2013年1月7日に出願された米国特許仮出願第61/749,815号の恩典を請求するものであり、前記仮出願は、その全体が参照により本明細書に援用されている。
[実施例1]
多孔性セラミック上にTi(C,N,O)2:SnおよびTi(C,N,O)2をインサイチューで担持させるための燃焼合成アプローチ
[実施例2](Ex−2)
(比較例1)(CE−1)
(比較例2)
支持されたTi(O,C,N)2:Snを使用する光触媒作用の実験構成
支持されたP−catの特性評価
粉末XRD特性評価:
DRS特性評価:
SEMおよびEDS特性評価:
Claims (54)
- 酸化物被覆基材を形成するための方法であって、
基材の存在下でプレコーティング混合物を加熱して前記基材上に酸化物塗膜を合成する工程を含み;
前記プレコーティング混合物が、可溶化された還元添加剤と可溶化された酸化添加剤と前記基材とを含み;および
前記可溶化された還元添加剤と可溶化された酸化添加剤を発熱反応させることができるほど十分高い温度、かつ前記酸化物の相および組成を制御することができるほど低い温度で加熱を行う、方法。 - 酸化物被覆基材表面生成物をアニーリングする、請求項1に記載の方法。
- 前記酸化物被覆基材表面生成物をアニーリングしない、請求項1または2に記載の方法。
- 前記可溶化された還元添加剤が金属および/または非金属前駆体を含む、請求項1、2または3に記載の方法。
- 前記可溶化された酸化添加剤が金属および/または非金属前駆体を含む、請求項1、2、3または4に記載の方法。
- 前記可溶化された還元添加剤が金属含有前駆体を含む、請求項1、2、3、4または5に記載の方法。
- 前記金属含有前駆体がチタン(IV)ビス(アンモニウムラクタト)ジヒドロキシドを含む、請求項6に記載の方法。
- 可溶化された酸化性前駆体が、過塩素酸アンモニウム(NH4ClO4)、硝酸アンモニウム、塩素酸アンモニウム、過酸化アンモニウム、過酸化水素および/または有機過酸化物を含む、請求項1、2、3、4、5、6または7に記載の方法。
- 前記可溶化された酸化添加剤が硝酸アンモニウムである、請求項1、2、3、4、5、6、7または8に記載の方法。
- 前記基材が多孔性である、請求項1、2、3、4、5、6、7、8または9に記載の方法。
- 前記基材が実質的に非多孔性である、請求項1、2、3、4、5、6、7、8、9または10に記載の方法。
- 多孔性基材が、ムライト、軽石および/またはコンクリートから成る、請求項1、2、3、4、5、6、7、8、9、10または11に記載の方法。
- 前記プレコーティング混合物への前記基材の添加前に、前記可溶化された酸化添加剤および前記可溶化された還元添加剤を約100℃から約200℃で約10分から約30分間、一緒に予熱する、請求項1、2、3、4、5、6、7、8、9、10、11または12に記載の方法。
- 前記基材がムライトセラミックを含む、請求項1、2、3、4、5、6、7、8、9、10、11、12または13に記載の方法。
- 前記基材を前記プレコーティング混合物に浸漬し、予熱された炉内で約40分間、約350℃に加熱する、請求項1、2、3、4、5、6、7、8、9、10、11、12、13または14に記載の方法。
- 雰囲気および圧力条件が周囲条件である、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14または15に記載の方法。
- 前記被覆基材を反応容器から取り出し、そしてその後、前記被覆基材を予熱された炉内に配置し、約400℃で約20分間アニーリングする、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14、15または16に記載の方法。
- 前記被覆基材を、その後、その最長軸に沿って回転させて裏面を暴露し、そしてその後、約400℃でさらに約20分間アニーリングする、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16または17に記載の方法。
- 前記プレコーティング混合物に金属または非金属前駆体をドープする、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17または18に記載の方法。
- ドーパントが、チタン、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素、窒素、またはそれらの組み合わせを含む、請求項19に記載の方法。
- 前記基材に付着させるドープト金属酸化物がTiSn(C,N,O)2を含む、請求項19に記載の方法。
- 前記基材に付着させる金属酸化物がTi(C,N,O)2を含む、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、21または21に記載の方法。
- 前記基材に付着させるドープト金属酸化物がTiM(C,N,O)2を含み、ここでのMが、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素もしくは窒素、またはそれらの組み合わせである、請求項22に記載の方法。
- 前記基材に付着させるドープト金属酸化物がM1M2(C,N,O)2を含み、M1およびM2が、独立して、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素または窒素である、請求項1に記載の方法。
- 前記還元添加剤がヒドラジドを含む、請求項1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、21、21、22、23または24に記載の方法。
- 前記ヒドラジドが、ヒドラジン、カルボヒドラジド、ジホルミルヒドラジン、テトラホルミルトリサジン、ヘキサメチレンテトラミン(hexamethlylenetetramine)、またはそれらの組み合わせを含む、請求項25に記載の方法。
- 有機金属前駆体が金属オクタン酸塩である、請求項6、7、8、9、10、11、12、13、14、15、16、17、18、19、21、21、22、23,24、25または26に記載の方法。
- 光触媒粉末を形成するための方法であって、
可溶化された還元添加剤と可溶化された酸化添加剤を含有する混合物を加熱して酸化物を形成する工程を含み;
前記可溶化された還元添加剤と可溶化された酸化添加剤を発熱反応させることができるほど十分高い温度、かつ前記酸化物の相および組成を制御することができるほど低い温度で加熱を行う、方法。 - 前記酸化物被覆基材表面生成物をアニーリングする、請求項1に記載の方法。
- 前記酸化物被覆基材表面生成物をアニーリングしない、請求項1に記載の方法。
- 前記可溶化された還元添加剤が金属および/または非金属前駆体を含む、請求項1に記載の方法。
- 前記可溶化された酸化添加剤が金属および/または非金属前駆体を含む、請求項1に記載の方法。
- 前記可溶化された還元添加剤が金属含有前駆体を含む、請求項1に記載の方法。
- 前記金属含有前駆体がチタン(IV)ビス(アンモニウムラクタト)ジヒドロキシドを含む、請求項33に記載の方法。
- 前記可溶化された酸化性前駆体が、過塩素酸アンモニウム(NH4ClO4)、硝酸アンモニウム、塩素酸アンモニウム、過酸化アンモニウム、過酸化水素および/または有機過酸化物を含む、請求項1に記載の方法。
- 前記可溶化された酸化添加剤が硝酸アンモニウムである、請求項1に記載の方法。
- 前記基材が多孔性である、請求項1に記載の方法。
- 前記基材が実質的に非多孔性である、請求項1に記載の方法。
- 前記多孔性基材が、ムライト、軽石および/またはコンクリートから成る、請求項1に記載の方法。
- 前記プレコーティング混合物への前記基材の添加前に、前記可溶化された酸化添加剤および前記可溶化された還元添加剤を約100℃から約200℃で約10分から約30分間、一緒に予熱する、請求項1に記載の方法。
- 前記基材がムライトセラミックを含む、請求項1に記載の方法。
- 前記基材を前記プレコーティング混合物に浸漬し、予熱された炉内で約40分間、約350℃に加熱する、請求項1に記載の方法。
- 前記雰囲気および圧力条件が周囲条件である、請求項1に記載の方法。
- 前記被覆基材を前記反応容器から除去し、そしてその後、前記被覆基材を予熱された炉内に配置し、約400℃で約20分間アニーリングする、請求項1に記載の方法。
- 前記被覆基材を、その最長軸に沿って回転させて裏面を曝露し、そしてその後、約400℃でさらに約20分間アニーリングする、請求項1に記載の方法。
- 前記プレコーティング混合物に金属または非金属前駆体をドープする、請求項1に記載の方法。
- 前記ドーパントが、チタン、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素、窒素、またはそれらの組み合わせを含む、請求項46に記載の方法。
- 前記基材に付着させるドープト金属酸化物がTiSn(C,N,O)2を含む、請求項47に記載の方法。
- 前記基材に付着させる金属酸化物がTi(C,N,O)2を含む、請求項1に記載の方法。
- 前記基材に付着させるドープト金属酸化物がTiM(C,N,O)2を含み、ここでのMが、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素もしくは窒素、またはそれらの組み合わせである、請求項47に記載の方法。
- 前記基材に付着させるドープト金属酸化物がM1M2(C,N,O)2を含み、M1およびM2が、独立して、タングステン、セリウム、スズ、亜鉛、ジルコニウム、ビスマス、銅、インジウム、鉄、銀、ストロンチウム、リチウム、カルシウム、炭素または窒素である、請求項1に記載の方法。
- 前記還元添加剤がヒドラジドを含む、請求項1に記載の方法。
- 前記ヒドラジドが、ヒドラジン、カルボヒドラジド、ジホルミルヒドラジン、テトラホルミルトリサジン、ヘキサメチレンテトラミン(hexamethlylenetetramine)、またはそれらの組み合わせを含む、請求項52に記載の方法。
- 前記有機金属前駆体が金属オクタン酸塩である、請求項33に記載の方法。
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