JP2016505711A5 - - Google Patents
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- Publication number
- JP2016505711A5 JP2016505711A5 JP2015545199A JP2015545199A JP2016505711A5 JP 2016505711 A5 JP2016505711 A5 JP 2016505711A5 JP 2015545199 A JP2015545199 A JP 2015545199A JP 2015545199 A JP2015545199 A JP 2015545199A JP 2016505711 A5 JP2016505711 A5 JP 2016505711A5
- Authority
- JP
- Japan
- Prior art keywords
- tilt angle
- angle adjustable
- adjustable valve
- gas flow
- tilt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 12
- 230000008878 coupling Effects 0.000 claims description 9
- 238000010168 coupling process Methods 0.000 claims description 9
- 238000005859 coupling reaction Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 3
- 239000007787 solid Substances 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261732186P | 2012-11-30 | 2012-11-30 | |
| US61/732,186 | 2012-11-30 | ||
| PCT/US2013/072079 WO2014085497A1 (en) | 2012-11-30 | 2013-11-26 | Process chamber gas flow apparatus, systems, and methods |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016505711A JP2016505711A (ja) | 2016-02-25 |
| JP2016505711A5 true JP2016505711A5 (enExample) | 2017-01-19 |
| JP6180541B2 JP6180541B2 (ja) | 2017-08-16 |
Family
ID=50824243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015545199A Active JP6180541B2 (ja) | 2012-11-30 | 2013-11-26 | 処理チャンバガス流装置、システム、及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9429248B2 (enExample) |
| JP (1) | JP6180541B2 (enExample) |
| KR (1) | KR101800719B1 (enExample) |
| CN (1) | CN104812939B (enExample) |
| TW (1) | TWI587358B (enExample) |
| WO (1) | WO2014085497A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM539571U (zh) * | 2015-07-27 | 2017-04-11 | 應用材料股份有限公司 | 基板材升降杆致動器 |
| JP6606551B2 (ja) | 2015-08-04 | 2019-11-13 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法および記録媒体 |
| EP3258149A1 (de) * | 2016-06-14 | 2017-12-20 | VAT Holding AG | Vakuumventil zur regelung eines flusses und zur unterbrechung eines fliessweges |
| EP3406340B1 (de) * | 2017-05-26 | 2021-07-07 | Thinxxs Microtechnology Ag | Flusszelle mit gehäusebauteil |
| WO2020033378A1 (en) * | 2018-08-07 | 2020-02-13 | Persimmon Technologies Corp. | Direct-drive flexure-mechanism vacuum control valve |
| FI130051B (en) * | 2019-04-25 | 2023-01-13 | Beneq Oy | DEVICE AND METHOD |
| GB2584160A (en) * | 2019-05-24 | 2020-11-25 | Edwards Ltd | Vacuum assembly and vacuum pump with an axial through passage |
| WO2021181498A1 (ja) * | 2020-03-10 | 2021-09-16 | 株式会社Kokusai Electric | 基板処理装置、排気流量制御装置及び半導体装置の製造方法 |
| TWI890811B (zh) | 2020-06-17 | 2025-07-21 | 美商應用材料股份有限公司 | 用於高溫化學氣相沉積的處理腔室蓋及處理方法 |
| RU2747895C1 (ru) * | 2020-10-19 | 2021-05-17 | Юрий Иванович Духанин | Криогенный запорно-регулирующий клапан |
| US20230095095A1 (en) * | 2021-09-27 | 2023-03-30 | Applied Materials, Inc. | Method of isolating the chamber volume to process volume with internal wafer transfer capability |
| KR102795009B1 (ko) * | 2023-09-27 | 2025-04-15 | (주)동헌기업 | 2-스테이지 액츄에이터 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT356989B (de) * | 1975-03-11 | 1980-06-10 | Wurzer Lothar | Vorrichtung zum getrennthalten zweier benachbarter raeume gleichen oder verschiedenen druckes mittels einer membran |
| DE2940239A1 (de) * | 1979-10-04 | 1981-04-16 | Robert Bosch Gmbh, 7000 Stuttgart | Elektromagnetisch betaetigbares ventil |
| DE4119955C2 (de) * | 1991-06-18 | 2000-05-31 | Danfoss As | Miniatur-Betätigungselement |
| JP2729916B2 (ja) * | 1994-04-28 | 1998-03-18 | 大明金属工業株式会社 | 平板栓 |
| JPH09260230A (ja) * | 1996-03-22 | 1997-10-03 | Toshiba Corp | 半導体装置の製造装置および製造方法 |
| US5954079A (en) | 1996-04-30 | 1999-09-21 | Hewlett-Packard Co. | Asymmetrical thermal actuation in a microactuator |
| US5667197A (en) * | 1996-07-09 | 1997-09-16 | Lam Research Corporation | Vacuum chamber gate valve and method for making same |
| US6079693A (en) * | 1998-05-20 | 2000-06-27 | Applied Komatsu Technology, Inc. | Isolation valves |
| US6192827B1 (en) * | 1998-07-03 | 2001-02-27 | Applied Materials, Inc. | Double slit-valve doors for plasma processing |
| JP2001239143A (ja) * | 2000-02-29 | 2001-09-04 | Showa Shinku:Kk | 排気速度調整機能付き防着バッフル搭載真空装置 |
| US6592709B1 (en) | 2000-04-05 | 2003-07-15 | Applied Materials Inc. | Method and apparatus for plasma processing |
| JP3756429B2 (ja) | 2001-07-12 | 2006-03-15 | Smc株式会社 | 流量制御弁 |
| US20030168174A1 (en) | 2002-03-08 | 2003-09-11 | Foree Michael Todd | Gas cushion susceptor system |
| CN1184669C (zh) * | 2002-12-10 | 2005-01-12 | 西安电子科技大学 | 硅锗/硅的化学气相沉积生长方法 |
| US7497414B2 (en) * | 2004-06-14 | 2009-03-03 | Applied Materials, Inc. | Curved slit valve door with flexible coupling |
| JP2006292130A (ja) * | 2005-04-14 | 2006-10-26 | Matsushita Electric Ind Co Ltd | ゲートバルブ |
| JP4491737B2 (ja) * | 2005-05-27 | 2010-06-30 | Smc株式会社 | 真空バルブ |
| US7845618B2 (en) * | 2006-06-28 | 2010-12-07 | Applied Materials, Inc. | Valve door with ball coupling |
| JP4299863B2 (ja) * | 2007-01-22 | 2009-07-22 | エルピーダメモリ株式会社 | 半導体装置の製造方法 |
| US8377213B2 (en) | 2008-05-05 | 2013-02-19 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
| JP2010034505A (ja) * | 2008-06-30 | 2010-02-12 | Canon Anelva Corp | 積層ロードロックチャンバおよびそれを備えた基板処理装置 |
| WO2010033924A2 (en) | 2008-09-22 | 2010-03-25 | Applied Materials, Inc. | Etch reactor suitable for etching high aspect ratio features |
| JP4265815B1 (ja) * | 2008-10-27 | 2009-05-20 | 株式会社シンクロン | 成膜装置 |
| EP2315236B1 (de) * | 2009-10-22 | 2014-05-14 | VAT Holding AG | Klappen-Transferventil |
| EP2336611A1 (en) * | 2009-12-15 | 2011-06-22 | Applied Materials, Inc. | Water cooled valve |
| EP2355132B1 (de) * | 2010-02-04 | 2014-05-21 | VAT Holding AG | Klappen-Transferventil mit schwenkbarem Ventilverschlussbalken |
| US8562742B2 (en) * | 2010-04-30 | 2013-10-22 | Applied Materials, Inc. | Apparatus for radial delivery of gas to a chamber and methods of use thereof |
| US8652297B2 (en) | 2010-08-03 | 2014-02-18 | Applied Materials, Inc. | Symmetric VHF plasma power coupler with active uniformity steering |
| JP5683388B2 (ja) | 2010-08-19 | 2015-03-11 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理方法及び基板処理装置 |
| US9091371B2 (en) * | 2010-12-27 | 2015-07-28 | Kenneth K L Lee | Single axis gate valve for vacuum applications |
| US8801950B2 (en) * | 2011-03-07 | 2014-08-12 | Novellus Systems, Inc. | Reduction of a process volume of a processing chamber using a nested dynamic inert volume |
| CN103014661A (zh) * | 2011-09-20 | 2013-04-03 | 吉富新能源科技(上海)有限公司 | 设计喷洒气流以镀膜均匀硅薄膜 |
-
2013
- 2013-11-26 WO PCT/US2013/072079 patent/WO2014085497A1/en not_active Ceased
- 2013-11-26 CN CN201380061955.1A patent/CN104812939B/zh not_active Expired - Fee Related
- 2013-11-26 KR KR1020157016707A patent/KR101800719B1/ko not_active Expired - Fee Related
- 2013-11-26 US US14/091,130 patent/US9429248B2/en active Active
- 2013-11-26 JP JP2015545199A patent/JP6180541B2/ja active Active
- 2013-11-29 TW TW102143863A patent/TWI587358B/zh active
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