KR101800719B1 - 프로세스 챔버 가스 유동 장치, 시스템들 및 방법들 - Google Patents

프로세스 챔버 가스 유동 장치, 시스템들 및 방법들 Download PDF

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Publication number
KR101800719B1
KR101800719B1 KR1020157016707A KR20157016707A KR101800719B1 KR 101800719 B1 KR101800719 B1 KR 101800719B1 KR 1020157016707 A KR1020157016707 A KR 1020157016707A KR 20157016707 A KR20157016707 A KR 20157016707A KR 101800719 B1 KR101800719 B1 KR 101800719B1
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South Korea
Prior art keywords
process chamber
valve
tiltable
tiltable valve
gas flow
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Expired - Fee Related
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KR1020157016707A
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English (en)
Korean (ko)
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KR20150089047A (ko
Inventor
니르 메리
찬드라칸트 엠. 사프카레
카룹파사미 무투캄트치
제프리 씨. 허진스
펜찰라 엔. 칸카나라
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어플라이드 머티어리얼스, 인코포레이티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/32—Details
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Lift Valve (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Valve Housings (AREA)
  • Mechanically-Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020157016707A 2012-11-30 2013-11-26 프로세스 챔버 가스 유동 장치, 시스템들 및 방법들 Expired - Fee Related KR101800719B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261732186P 2012-11-30 2012-11-30
US61/732,186 2012-11-30
PCT/US2013/072079 WO2014085497A1 (en) 2012-11-30 2013-11-26 Process chamber gas flow apparatus, systems, and methods

Publications (2)

Publication Number Publication Date
KR20150089047A KR20150089047A (ko) 2015-08-04
KR101800719B1 true KR101800719B1 (ko) 2017-11-23

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KR1020157016707A Expired - Fee Related KR101800719B1 (ko) 2012-11-30 2013-11-26 프로세스 챔버 가스 유동 장치, 시스템들 및 방법들

Country Status (6)

Country Link
US (1) US9429248B2 (enExample)
JP (1) JP6180541B2 (enExample)
KR (1) KR101800719B1 (enExample)
CN (1) CN104812939B (enExample)
TW (1) TWI587358B (enExample)
WO (1) WO2014085497A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240021283A (ko) * 2021-09-27 2024-02-16 어플라이드 머티어리얼스, 인코포레이티드 내부 웨이퍼 이송 능력을 이용하여 챔버 용적을 프로세스 용적에 대해 격리시키는 방법

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TWI674168B (zh) * 2015-07-27 2019-10-11 美商應用材料股份有限公司 升降杆致動器、基板材支撐組件、及利用基板材支撐組件的方法
SG11201800143RA (en) 2015-08-04 2018-02-27 Hitachi Int Electric Inc Substrate processing device, semiconductor device manufacturing method, and recording medium
EP3258149A1 (de) * 2016-06-14 2017-12-20 VAT Holding AG Vakuumventil zur regelung eines flusses und zur unterbrechung eines fliessweges
EP3406340B1 (de) * 2017-05-26 2021-07-07 Thinxxs Microtechnology Ag Flusszelle mit gehäusebauteil
US11268630B2 (en) * 2018-08-07 2022-03-08 Persimmon Technologies, Corp. Direct-drive flexure-mechanism vacuum control valve
FI130051B (en) 2019-04-25 2023-01-13 Beneq Oy DEVICE AND METHOD
GB2584160A (en) * 2019-05-24 2020-11-25 Edwards Ltd Vacuum assembly and vacuum pump with an axial through passage
WO2021181498A1 (ja) * 2020-03-10 2021-09-16 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、排気流量制御装置及び半導体装置の製造方法
US11447866B2 (en) 2020-06-17 2022-09-20 Applied Materials, Inc. High temperature chemical vapor deposition lid
RU2747895C1 (ru) * 2020-10-19 2021-05-17 Юрий Иванович Духанин Криогенный запорно-регулирующий клапан
KR102795009B1 (ko) * 2023-09-27 2025-04-15 (주)동헌기업 2-스테이지 액츄에이터

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WO2012121941A2 (en) * 2011-03-07 2012-09-13 Novellus Systems Inc. Reduction of a process volume of a processing chamber using a nested dynamic inert volume

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240021283A (ko) * 2021-09-27 2024-02-16 어플라이드 머티어리얼스, 인코포레이티드 내부 웨이퍼 이송 능력을 이용하여 챔버 용적을 프로세스 용적에 대해 격리시키는 방법
KR102879152B1 (ko) * 2021-09-27 2025-11-03 어플라이드 머티어리얼스, 인코포레이티드 내부 웨이퍼 이송 능력을 이용하여 챔버 용적을 프로세스 용적에 대해 격리시키는 방법

Also Published As

Publication number Publication date
TW201432782A (zh) 2014-08-16
WO2014085497A1 (en) 2014-06-05
JP6180541B2 (ja) 2017-08-16
JP2016505711A (ja) 2016-02-25
KR20150089047A (ko) 2015-08-04
CN104812939A (zh) 2015-07-29
CN104812939B (zh) 2017-02-22
TWI587358B (zh) 2017-06-11
US9429248B2 (en) 2016-08-30
US20140150878A1 (en) 2014-06-05

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