JP6180541B2 - 処理チャンバガス流装置、システム、及び方法 - Google Patents

処理チャンバガス流装置、システム、及び方法 Download PDF

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Publication number
JP6180541B2
JP6180541B2 JP2015545199A JP2015545199A JP6180541B2 JP 6180541 B2 JP6180541 B2 JP 6180541B2 JP 2015545199 A JP2015545199 A JP 2015545199A JP 2015545199 A JP2015545199 A JP 2015545199A JP 6180541 B2 JP6180541 B2 JP 6180541B2
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JP
Japan
Prior art keywords
angle adjustable
tilt angle
adjustable valve
tilt
gas flow
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Active
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JP2015545199A
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English (en)
Japanese (ja)
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JP2016505711A5 (enExample
JP2016505711A (ja
Inventor
ニール メリー，
ニール メリー，
チャンドラカント エム． サプカル，
チャンドラカント エム． サプカル，
カルッパサミー ムトゥカムチ，
カルッパサミー ムトゥカムチ，
ジェフリー シー． ハジェンズ，
ジェフリー シー． ハジェンズ，
ペンチャラ エヌ． カンクナラ，
ペンチャラ エヌ． カンクナラ，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
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Applied Materials Inc
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Publication date
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Publication of JP2016505711A5 publication Critical patent/JP2016505711A5/ja
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Publication of JP6180541B2 publication Critical patent/JP6180541B2/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Lift Valve (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Valve Housings (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanically-Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
JP2015545199A 2012-11-30 2013-11-26 処理チャンバガス流装置、システム、及び方法 Active JP6180541B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261732186P 2012-11-30 2012-11-30
US61/732,186 2012-11-30
PCT/US2013/072079 WO2014085497A1 (en) 2012-11-30 2013-11-26 Process chamber gas flow apparatus, systems, and methods

Publications (3)

Publication Number Publication Date
JP2016505711A JP2016505711A (ja) 2016-02-25
JP2016505711A5 JP2016505711A5 (enExample) 2017-01-19
JP6180541B2 true JP6180541B2 (ja) 2017-08-16

Family

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JP2015545199A Active JP6180541B2 (ja) 2012-11-30 2013-11-26 処理チャンバガス流装置、システム、及び方法

Country Status (6)

Country Link
US (1) US9429248B2 (enExample)
JP (1) JP6180541B2 (enExample)
KR (1) KR101800719B1 (enExample)
CN (1) CN104812939B (enExample)
TW (1) TWI587358B (enExample)
WO (1) WO2014085497A1 (enExample)

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WO2020033378A1 (en) * 2018-08-07 2020-02-13 Persimmon Technologies Corp. Direct-drive flexure-mechanism vacuum control valve
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GB2584160A (en) * 2019-05-24 2020-11-25 Edwards Ltd Vacuum assembly and vacuum pump with an axial through passage
WO2021181498A1 (ja) * 2020-03-10 2021-09-16 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、排気流量制御装置及び半導体装置の製造方法
TWI890811B (zh) 2020-06-17 2025-07-21 美商應用材料股份有限公司 用於高溫化學氣相沉積的處理腔室蓋及處理方法
RU2747895C1 (ru) * 2020-10-19 2021-05-17 Юрий Иванович Духанин Криогенный запорно-регулирующий клапан
US20230095095A1 (en) * 2021-09-27 2023-03-30 Applied Materials, Inc. Method of isolating the chamber volume to process volume with internal wafer transfer capability
KR102795009B1 (ko) * 2023-09-27 2025-04-15 (주)동헌기업 2-스테이지 액츄에이터

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Also Published As

Publication number Publication date
CN104812939A (zh) 2015-07-29
WO2014085497A1 (en) 2014-06-05
US9429248B2 (en) 2016-08-30
KR20150089047A (ko) 2015-08-04
TW201432782A (zh) 2014-08-16
KR101800719B1 (ko) 2017-11-23
JP2016505711A (ja) 2016-02-25
US20140150878A1 (en) 2014-06-05
TWI587358B (zh) 2017-06-11
CN104812939B (zh) 2017-02-22

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