TWI587358B - 處理腔室氣體流動的裝置、系統及方法 - Google Patents

處理腔室氣體流動的裝置、系統及方法 Download PDF

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Publication number
TWI587358B
TWI587358B TW102143863A TW102143863A TWI587358B TW I587358 B TWI587358 B TW I587358B TW 102143863 A TW102143863 A TW 102143863A TW 102143863 A TW102143863 A TW 102143863A TW I587358 B TWI587358 B TW I587358B
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TW
Taiwan
Prior art keywords
processing chamber
valve
tiltable
gas flow
tiltable valve
Prior art date
Application number
TW102143863A
Other languages
English (en)
Chinese (zh)
Other versions
TW201432782A (zh
Inventor
馬利尼爾
賽帕寇錢德肯特Ｍ
慕蘇坎齊卡瑞普賽彌
休根斯傑佛瑞Ｃ
肯可那潘契拉Ｎ
Original Assignee
應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司 filed Critical 應用材料股份有限公司
Publication of TW201432782A publication Critical patent/TW201432782A/zh
Application granted granted Critical
Publication of TWI587358B publication Critical patent/TWI587358B/zh

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Lift Valve (AREA)
  • Chemical Vapour Deposition (AREA)
  • Valve Housings (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Fluid-Driven Valves (AREA)
  • Mechanically-Actuated Valves (AREA)
TW102143863A 2012-11-30 2013-11-29 處理腔室氣體流動的裝置、系統及方法 TWI587358B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201261732186P 2012-11-30 2012-11-30

Publications (2)

Publication Number Publication Date
TW201432782A TW201432782A (zh) 2014-08-16
TWI587358B true TWI587358B (zh) 2017-06-11

Family

ID=50824243

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102143863A TWI587358B (zh) 2012-11-30 2013-11-29 處理腔室氣體流動的裝置、系統及方法

Country Status (6)

Country Link
US (1) US9429248B2 (enExample)
JP (1) JP6180541B2 (enExample)
KR (1) KR101800719B1 (enExample)
CN (1) CN104812939B (enExample)
TW (1) TWI587358B (enExample)
WO (1) WO2014085497A1 (enExample)

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EP3258149A1 (de) * 2016-06-14 2017-12-20 VAT Holding AG Vakuumventil zur regelung eines flusses und zur unterbrechung eines fliessweges
EP3406340B1 (de) * 2017-05-26 2021-07-07 Thinxxs Microtechnology Ag Flusszelle mit gehäusebauteil
WO2020033378A1 (en) * 2018-08-07 2020-02-13 Persimmon Technologies Corp. Direct-drive flexure-mechanism vacuum control valve
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WO2021181498A1 (ja) * 2020-03-10 2021-09-16 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、排気流量制御装置及び半導体装置の製造方法
US11447866B2 (en) 2020-06-17 2022-09-20 Applied Materials, Inc. High temperature chemical vapor deposition lid
RU2747895C1 (ru) * 2020-10-19 2021-05-17 Юрий Иванович Духанин Криогенный запорно-регулирующий клапан
US12567565B2 (en) * 2021-09-27 2026-03-03 Applied Materials, Inc. Method of isolating the chamber volume to process volume with internal wafer transfer capability
US12560243B2 (en) * 2023-07-24 2026-02-24 Applied Materials, Inc. Center feed symmetric flow valve for plasma chambers
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Also Published As

Publication number Publication date
KR101800719B1 (ko) 2017-11-23
JP6180541B2 (ja) 2017-08-16
JP2016505711A (ja) 2016-02-25
TW201432782A (zh) 2014-08-16
KR20150089047A (ko) 2015-08-04
WO2014085497A1 (en) 2014-06-05
US9429248B2 (en) 2016-08-30
CN104812939A (zh) 2015-07-29
US20140150878A1 (en) 2014-06-05
CN104812939B (zh) 2017-02-22

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