CN104812939B - 处理腔室气流设备、系统和方法 - Google Patents

处理腔室气流设备、系统和方法 Download PDF

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Publication number
CN104812939B
CN104812939B CN201380061955.1A CN201380061955A CN104812939B CN 104812939 B CN104812939 B CN 104812939B CN 201380061955 A CN201380061955 A CN 201380061955A CN 104812939 B CN104812939 B CN 104812939B
Authority
CN
China
Prior art keywords
processing chamber
valve
tiltable
tiltable valve
gas flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201380061955.1A
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English (en)
Chinese (zh)
Other versions
CN104812939A (zh
Inventor
尼尔·玛利
昌达瑞坎特·M·沙普卡里
卡鲁帕萨米·穆图卡姆特什
杰弗里·C·赫金斯
潘查拉·N·坎卡纳拉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN104812939A publication Critical patent/CN104812939A/zh
Application granted granted Critical
Publication of CN104812939B publication Critical patent/CN104812939B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Lift Valve (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Valve Housings (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanically-Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
CN201380061955.1A 2012-11-30 2013-11-26 处理腔室气流设备、系统和方法 Expired - Fee Related CN104812939B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261732186P 2012-11-30 2012-11-30
US61/732,186 2012-11-30
PCT/US2013/072079 WO2014085497A1 (en) 2012-11-30 2013-11-26 Process chamber gas flow apparatus, systems, and methods

Publications (2)

Publication Number Publication Date
CN104812939A CN104812939A (zh) 2015-07-29
CN104812939B true CN104812939B (zh) 2017-02-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380061955.1A Expired - Fee Related CN104812939B (zh) 2012-11-30 2013-11-26 处理腔室气流设备、系统和方法

Country Status (6)

Country Link
US (1) US9429248B2 (enExample)
JP (1) JP6180541B2 (enExample)
KR (1) KR101800719B1 (enExample)
CN (1) CN104812939B (enExample)
TW (1) TWI587358B (enExample)
WO (1) WO2014085497A1 (enExample)

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JP6606551B2 (ja) 2015-08-04 2019-11-13 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法および記録媒体
EP3258149A1 (de) * 2016-06-14 2017-12-20 VAT Holding AG Vakuumventil zur regelung eines flusses und zur unterbrechung eines fliessweges
EP3406340B1 (de) * 2017-05-26 2021-07-07 Thinxxs Microtechnology Ag Flusszelle mit gehäusebauteil
WO2020033378A1 (en) * 2018-08-07 2020-02-13 Persimmon Technologies Corp. Direct-drive flexure-mechanism vacuum control valve
FI130051B (en) * 2019-04-25 2023-01-13 Beneq Oy DEVICE AND METHOD
GB2584160A (en) * 2019-05-24 2020-11-25 Edwards Ltd Vacuum assembly and vacuum pump with an axial through passage
WO2021181498A1 (ja) * 2020-03-10 2021-09-16 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、排気流量制御装置及び半導体装置の製造方法
TWI890811B (zh) 2020-06-17 2025-07-21 美商應用材料股份有限公司 用於高溫化學氣相沉積的處理腔室蓋及處理方法
RU2747895C1 (ru) * 2020-10-19 2021-05-17 Юрий Иванович Духанин Криогенный запорно-регулирующий клапан
US20230095095A1 (en) * 2021-09-27 2023-03-30 Applied Materials, Inc. Method of isolating the chamber volume to process volume with internal wafer transfer capability
KR102795009B1 (ko) * 2023-09-27 2025-04-15 (주)동헌기업 2-스테이지 액츄에이터

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CN103014661A (zh) * 2011-09-20 2013-04-03 吉富新能源科技(上海)有限公司 设计喷洒气流以镀膜均匀硅薄膜

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JP2006292130A (ja) * 2005-04-14 2006-10-26 Matsushita Electric Ind Co Ltd ゲートバルブ
CN103014661A (zh) * 2011-09-20 2013-04-03 吉富新能源科技(上海)有限公司 设计喷洒气流以镀膜均匀硅薄膜

Also Published As

Publication number Publication date
CN104812939A (zh) 2015-07-29
WO2014085497A1 (en) 2014-06-05
US9429248B2 (en) 2016-08-30
JP6180541B2 (ja) 2017-08-16
KR20150089047A (ko) 2015-08-04
TW201432782A (zh) 2014-08-16
KR101800719B1 (ko) 2017-11-23
JP2016505711A (ja) 2016-02-25
US20140150878A1 (en) 2014-06-05
TWI587358B (zh) 2017-06-11

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Granted publication date: 20170222