JP2016213411A5 - - Google Patents
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- JP2016213411A5 JP2016213411A5 JP2015098286A JP2015098286A JP2016213411A5 JP 2016213411 A5 JP2016213411 A5 JP 2016213411A5 JP 2015098286 A JP2015098286 A JP 2015098286A JP 2015098286 A JP2015098286 A JP 2015098286A JP 2016213411 A5 JP2016213411 A5 JP 2016213411A5
- Authority
- JP
- Japan
- Prior art keywords
- scattered light
- light intensity
- value
- time
- psl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015098286A JP6299668B2 (ja) | 2015-05-13 | 2015-05-13 | ヘイズの評価方法 |
| CN201680027570.7A CN107615468B (zh) | 2015-05-13 | 2016-03-10 | 雾度的评价方法 |
| KR1020177032618A KR102262072B1 (ko) | 2015-05-13 | 2016-03-10 | 헤이즈의 평가 방법 |
| DE112016001802.9T DE112016001802B4 (de) | 2015-05-13 | 2016-03-10 | Verfahren zum Bewerten einer Trübung |
| US15/570,278 US10234281B2 (en) | 2015-05-13 | 2016-03-10 | Method for evaluating haze |
| PCT/JP2016/001315 WO2016181592A1 (ja) | 2015-05-13 | 2016-03-10 | ヘイズの評価方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015098286A JP6299668B2 (ja) | 2015-05-13 | 2015-05-13 | ヘイズの評価方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016213411A JP2016213411A (ja) | 2016-12-15 |
| JP2016213411A5 true JP2016213411A5 (enExample) | 2017-11-30 |
| JP6299668B2 JP6299668B2 (ja) | 2018-03-28 |
Family
ID=57249125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015098286A Active JP6299668B2 (ja) | 2015-05-13 | 2015-05-13 | ヘイズの評価方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10234281B2 (enExample) |
| JP (1) | JP6299668B2 (enExample) |
| KR (1) | KR102262072B1 (enExample) |
| CN (1) | CN107615468B (enExample) |
| DE (1) | DE112016001802B4 (enExample) |
| WO (1) | WO2016181592A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020518812A (ja) | 2017-05-05 | 2020-06-25 | スリーエム イノベイティブ プロパティズ カンパニー | 微小散乱測定システム、及びその使用方法 |
| JP7054634B2 (ja) * | 2018-02-21 | 2022-04-14 | セーレン株式会社 | 測定装置 |
| CN109916945A (zh) * | 2019-04-10 | 2019-06-21 | 浙江众泰汽车制造有限公司 | 一种雾度评价装置及雾度评价方法 |
| KR102758443B1 (ko) * | 2021-06-24 | 2025-01-22 | 베이징 통메이 엑스탈 테크놀로지 컴퍼니 리미티드 | 재료의 표면 헤이즈를 검출하기 위한 방법 및 셋업 |
| JP7700751B2 (ja) * | 2021-09-10 | 2025-07-01 | 株式会社Sumco | 半導体ウェーハの評価方法および半導体ウェーハの製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5198869A (en) * | 1990-10-15 | 1993-03-30 | Vlsi Standards, Inc. | Reference wafer for haze calibration |
| JP2719257B2 (ja) | 1991-12-18 | 1998-02-25 | 住友電気工業株式会社 | 分光分析装置 |
| US5599464A (en) | 1995-10-06 | 1997-02-04 | Vlsi Standards, Inc. | Formation of atomic scale vertical features for topographic instrument calibration |
| US5691812A (en) | 1996-03-22 | 1997-11-25 | Ade Optical Systems Corporation | Calibration standard for calibrating a defect inspection system and a method of forming same |
| TW459390B (en) * | 1998-09-04 | 2001-10-11 | Canon Kk | Semiconductor substrate and method for producing the same |
| JP3341212B2 (ja) * | 2000-06-15 | 2002-11-05 | スガ試験機株式会社 | ヘーズ値測定装置及び測定方法 |
| JP2002310902A (ja) * | 2001-04-16 | 2002-10-23 | Central Glass Co Ltd | 波長選択性のある散乱光測定方法 |
| FR2888833B1 (fr) * | 2005-07-22 | 2007-08-24 | Commissariat Energie Atomique | Procede de realisation d'etalons de bruit de fond diffus comportant des nano-structures sur une couche mince isolante |
| KR100675216B1 (ko) * | 2005-08-23 | 2007-01-29 | 삼성전기주식회사 | 헤이즈 측정 방법 및 그 장치 |
| KR100871876B1 (ko) * | 2006-09-26 | 2008-12-03 | 나노전광 주식회사 | 광검출기를 이용한 포토마스크 표면의 헤이즈 검출장치 및그 검출방법 |
| US8194233B2 (en) * | 2008-04-11 | 2012-06-05 | Microsoft Corporation | Method and system to reduce stray light reflection error in time-of-flight sensor arrays |
| JP5357509B2 (ja) * | 2008-10-31 | 2013-12-04 | 株式会社日立ハイテクノロジーズ | 検査装置、検査方法および検査装置の校正システム |
| WO2012073558A1 (ja) * | 2010-11-29 | 2012-06-07 | 大日本印刷株式会社 | 評価用基板、欠陥検査方法及び欠陥検出装置 |
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2015
- 2015-05-13 JP JP2015098286A patent/JP6299668B2/ja active Active
-
2016
- 2016-03-10 KR KR1020177032618A patent/KR102262072B1/ko active Active
- 2016-03-10 WO PCT/JP2016/001315 patent/WO2016181592A1/ja not_active Ceased
- 2016-03-10 US US15/570,278 patent/US10234281B2/en active Active
- 2016-03-10 CN CN201680027570.7A patent/CN107615468B/zh active Active
- 2016-03-10 DE DE112016001802.9T patent/DE112016001802B4/de active Active