JP2016038993A5 - - Google Patents

Download PDF

Info

Publication number
JP2016038993A5
JP2016038993A5 JP2014160542A JP2014160542A JP2016038993A5 JP 2016038993 A5 JP2016038993 A5 JP 2016038993A5 JP 2014160542 A JP2014160542 A JP 2014160542A JP 2014160542 A JP2014160542 A JP 2014160542A JP 2016038993 A5 JP2016038993 A5 JP 2016038993A5
Authority
JP
Japan
Prior art keywords
plasma
processed
substrate
generated
determination method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014160542A
Other languages
English (en)
Japanese (ja)
Other versions
JP6386287B2 (ja
JP2016038993A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014160542A priority Critical patent/JP6386287B2/ja
Priority claimed from JP2014160542A external-priority patent/JP6386287B2/ja
Priority to KR1020177003078A priority patent/KR102388517B1/ko
Priority to PCT/JP2015/069521 priority patent/WO2016021355A1/ja
Priority to US15/501,235 priority patent/US10074550B2/en
Publication of JP2016038993A publication Critical patent/JP2016038993A/ja
Publication of JP2016038993A5 publication Critical patent/JP2016038993A5/ja
Application granted granted Critical
Publication of JP6386287B2 publication Critical patent/JP6386287B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014160542A 2014-08-06 2014-08-06 プラズマの安定性判定方法及びプラズマ処理装置 Active JP6386287B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014160542A JP6386287B2 (ja) 2014-08-06 2014-08-06 プラズマの安定性判定方法及びプラズマ処理装置
KR1020177003078A KR102388517B1 (ko) 2014-08-06 2015-07-07 플라즈마의 안정성 판정 방법 및 플라즈마 처리 장치
PCT/JP2015/069521 WO2016021355A1 (ja) 2014-08-06 2015-07-07 プラズマの安定性判定方法及びプラズマ処理装置
US15/501,235 US10074550B2 (en) 2014-08-06 2015-07-07 Plasma stability determination method and plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014160542A JP6386287B2 (ja) 2014-08-06 2014-08-06 プラズマの安定性判定方法及びプラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2016038993A JP2016038993A (ja) 2016-03-22
JP2016038993A5 true JP2016038993A5 (enExample) 2017-09-28
JP6386287B2 JP6386287B2 (ja) 2018-09-05

Family

ID=55263629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014160542A Active JP6386287B2 (ja) 2014-08-06 2014-08-06 プラズマの安定性判定方法及びプラズマ処理装置

Country Status (4)

Country Link
US (1) US10074550B2 (enExample)
JP (1) JP6386287B2 (enExample)
KR (1) KR102388517B1 (enExample)
WO (1) WO2016021355A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10651017B2 (en) * 2016-06-30 2020-05-12 Tokyo Electron Limited Method for operation instability detection in a surface wave plasma source
JP7183090B2 (ja) * 2019-03-20 2022-12-05 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
US12159768B2 (en) * 2019-03-25 2024-12-03 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
HUP1900246A1 (hu) * 2019-07-05 2021-01-28 Univ Szegedi Eljárás és berendezés szikrakisülési részecskegenerátor monitorozására
JP7489905B2 (ja) * 2020-11-30 2024-05-24 東京エレクトロン株式会社 チャンバーコンディションの診断方法及び基板処理装置
KR102270606B1 (ko) * 2021-02-25 2021-06-30 (주)알티엠 플라즈마의 상태를 확인하는 전자 장치 및 그 동작 방법
US20230113095A1 (en) * 2021-10-13 2023-04-13 Applied Materials, Inc. Verification for improving quality of maintenance of manufacturing equipment

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3893276B2 (ja) * 2001-12-04 2007-03-14 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP2005057122A (ja) * 2003-08-06 2005-03-03 Renesas Technology Corp プラズマ発光強度による異常検出方法
JP4267979B2 (ja) * 2003-08-07 2009-05-27 セメダイン株式会社 二液型ポリウレタンシーリング材組成物及びポリウレタン用遅延剤組成物
JP4620524B2 (ja) 2005-05-17 2011-01-26 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP5059792B2 (ja) * 2009-01-26 2012-10-31 東京エレクトロン株式会社 プラズマ処理装置
JP5699795B2 (ja) * 2011-05-12 2015-04-15 富士通セミコンダクター株式会社 半導体装置の製造方法及半導体製造装置

Similar Documents

Publication Publication Date Title
JP2016515397A5 (enExample)
JP2015520667A5 (enExample)
SI3105328T1 (sl) Multiplo genomsko inženirstvo omogočeno s CRISPR
JP2016028092A5 (enExample)
JP2015053053A5 (enExample)
JP2015127807A5 (enExample)
JP2015053052A5 (enExample)
JP2016065085A5 (enExample)
JP2017500760A5 (enExample)
TWD173653S (zh) 輪圈
JP2016522122A5 (enExample)
JP2016540360A5 (ja) 基板処理システム及び基板処理方法
JP2016038993A5 (enExample)
JP2017524067A5 (enExample)
JP2017537928A5 (enExample)
JP2015501646A5 (enExample)
JP2015186128A5 (enExample)
JP2015057496A5 (enExample)
JP2016540026A5 (enExample)
JP2015173751A5 (enExample)
UY4430S (es) “motocicleta”.
MX387903B (es) Proceso para la preparacion de acidos 3-hidroxipicolinicos.
HUE059378T2 (hu) Szigetelõfólia, valamint szigetelõfólia elõállítására szolgáló eljárás
JP2014229900A5 (enExample)
JP2016011847A5 (enExample)