JP6386287B2 - プラズマの安定性判定方法及びプラズマ処理装置 - Google Patents
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- 238000012545 processing Methods 0.000 title claims description 232
- 238000000034 method Methods 0.000 title claims description 39
- 238000001514 detection method Methods 0.000 claims description 32
- 230000007246 mechanism Effects 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 8
- 230000006870 function Effects 0.000 description 72
- 239000007789 gas Substances 0.000 description 68
- 235000012431 wafers Nutrition 0.000 description 66
- 230000005856 abnormality Effects 0.000 description 27
- 230000008569 process Effects 0.000 description 16
- 238000005530 etching Methods 0.000 description 10
- 230000010354 integration Effects 0.000 description 10
- 230000007547 defect Effects 0.000 description 9
- 238000007689 inspection Methods 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000004069 differentiation Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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Description
Detection)は、反応生成物の発光の変化に基づいて行われるため、プラズマ処理装置1には処理容器2内の発光を検出するための手段が設けられる。そのため、この発光検出用の手段を発光検出機構26として用いてもよい。
図7に示すように、積分値X、Y、Zがそれぞれ得られた場合、安定性判定部73では、積分値X、Y、Zと閾値Sを順次比較し、積分値が閾値Sを超えているYではプラズマの安定性が十分でないと判定し、閾値S以下であるX、Zではプラズマの安定性が確保されていると判定する。なお、例えば図7では閾値Sが「60000」に設定されている場合を描図しているが、閾値Sの値は本実施の形態の内容に限定されるものではなく、任意に設定が可能である。
2 処理容器
3 ラジアルラインスロットアンテナ
4 制御部
10 サセプタ
11 整合器
12 高周波電源
13 ヒータ
14 フォーカスリング
20 排気室
21 排気機構
22 排気管
23 調整弁
24 バッフル板
31 マイクロ波透過板
32 スロット板
33 遅波板
40 同軸導波管
71 第1の関数生成部
72 第2の関数生成部
73 安定性判定部
W ウェハ
Claims (8)
- 処理容器内に供給した処理ガスをプラズマ化させてプラズマ処理するプラズマ処理装置において、プラズマの安定性を判定する方法であって、
前記処理容器内でプラズマが生成している間に、当該処理容器内におけるプラズマの発光強度を検出し、
前記発光強度の検出結果から、時間と発光強度の関係を表す第1の関数を生成し、
前記第1の関数を時間微分して微分値を算出し、当該微分値の絶対値と時間との関係から第2の関数を生成し、
前記第2の関数を時間で積分して積分値を算出し、当該算出した積分値に基づいて、プラズマの安定性を判定することを特徴とする、プラズマの安定性判定方法。 - 前記算出した積分値を、予め定められた閾値と比較することで、プラズマの安定性を判定することを特徴とする、請求項1に記載のプラズマの安定性判定方法。
- 前記発光強度を複数の波長の光毎に検出し、
前記第1の関数及び前記第2の関数を、前記複数の波長の光毎に生成し、
前記閾値を前記複数の波長の光毎に設定し、
前記複数の波長の光における各積分値の少なくともいずれかが、前記閾値を超えている場合に、プラズマの安定性が無いと判定することを特徴とする、請求項2に記載のプラズマの安定性判定方法。 - 前記プラズマが生成している間に、基板の処理を行うことを特徴とする、請求項1〜3のいずれか一項に記載のプラズマの安定性判定方法。
- 処理容器内に供給した処理ガスをプラズマ化させてプラズマ処理するプラズマ処理装置であって、
前記処理容器内に処理ガスを供給する処理ガス供給部と、
前記処理容器内で前記処理ガスのプラズマを生成するプラズマ生成部と、
当該処理容器内で生成されたプラズマの発光強度を検出する発光検出機構と、
前記発光検出機構による発光強度の検出結果から、時間と発光強度の関係を表す第1の関数を生成する第1の関数生成部と、
前記第1の関数を時間微分して微分値を算出し、当該微分値の絶対値と時間との関係から第2の関数を生成する第2の関数生成部と、
前記第2の関数を時間で積分して積分値を算出し、当該算出した積分値に基づいて、プラズマの安定性を判定する安定性判定部と、を有することを特徴とする、プラズマ処理装置。 - 前記安定性判定部は、前記算出した積分値を、予め定められた閾値と比較することで、プラズマの安定性を判定することを特徴とする、請求項5に記載のプラズマ処理装置。
- 前記発光検出機構は、複数の波長の光毎に設けられ、
前記第1の関数生成部及び前記第2の関数生成部は、前記第1の関数及び前記第2の関数を、前記複数の波長の光毎にそれぞれ生成し、
前記安定性判定部は、前記複数の波長の光における各積分値の少なくともいずれかが、前記複数の波長の光毎に設定された閾値を超えている場合に、プラズマの安定性が無いと判定することを特徴とする、請求項6に記載のプラズマ処理装置。 - 前記プラズマが生成している間に、基板の処理を行うことを特徴とする、請求項5〜7のいずれか一項に記載のプラズマ処理装置。
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JP2014160542A JP6386287B2 (ja) | 2014-08-06 | 2014-08-06 | プラズマの安定性判定方法及びプラズマ処理装置 |
PCT/JP2015/069521 WO2016021355A1 (ja) | 2014-08-06 | 2015-07-07 | プラズマの安定性判定方法及びプラズマ処理装置 |
US15/501,235 US10074550B2 (en) | 2014-08-06 | 2015-07-07 | Plasma stability determination method and plasma processing apparatus |
KR1020177003078A KR102388517B1 (ko) | 2014-08-06 | 2015-07-07 | 플라즈마의 안정성 판정 방법 및 플라즈마 처리 장치 |
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US20200312629A1 (en) | 2019-03-25 | 2020-10-01 | Recarbon, Inc. | Controlling exhaust gas pressure of a plasma reactor for plasma stability |
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