JP2019508789A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019508789A5 JP2019508789A5 JP2018534670A JP2018534670A JP2019508789A5 JP 2019508789 A5 JP2019508789 A5 JP 2019508789A5 JP 2018534670 A JP2018534670 A JP 2018534670A JP 2018534670 A JP2018534670 A JP 2018534670A JP 2019508789 A5 JP2019508789 A5 JP 2019508789A5
- Authority
- JP
- Japan
- Prior art keywords
- embodiments described
- acceleration
- inspection
- enable
- image generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001133 acceleration Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562273985P | 2015-12-31 | 2015-12-31 | |
| US62/273,985 | 2015-12-31 | ||
| US15/394,792 US9916965B2 (en) | 2015-12-31 | 2016-12-29 | Hybrid inspectors |
| US15/394,792 | 2016-12-29 | ||
| PCT/US2016/069580 WO2017117568A1 (en) | 2015-12-31 | 2016-12-30 | Accelerated training of a machine learning based model for semiconductor applications |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019508789A JP2019508789A (ja) | 2019-03-28 |
| JP2019508789A5 true JP2019508789A5 (enExample) | 2020-02-13 |
| JP6941103B2 JP6941103B2 (ja) | 2021-09-29 |
Family
ID=59225974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018534670A Active JP6941103B2 (ja) | 2015-12-31 | 2016-12-30 | 半導体用途のための機械学習ベースのモデルの加速トレーニング |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP3398123B1 (enExample) |
| JP (1) | JP6941103B2 (enExample) |
| KR (1) | KR102812577B1 (enExample) |
| CN (1) | CN108475351B (enExample) |
| IL (1) | IL259705B (enExample) |
| WO (1) | WO2017117568A1 (enExample) |
Families Citing this family (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6906058B2 (ja) * | 2017-02-24 | 2021-07-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 機械学習によるプロセスモデルの決定方法 |
| WO2019173170A1 (en) * | 2018-03-05 | 2019-09-12 | Kla-Tencor Corporation | Visualization of three-dimensional semiconductor structures |
| US10677742B2 (en) * | 2018-03-09 | 2020-06-09 | Kla-Tencor Corp. | Detecting die repeating programmed defects located in backgrounds with non-repeating features |
| US10795346B2 (en) | 2018-03-13 | 2020-10-06 | Applied Materials, Inc. | Machine learning systems for monitoring of semiconductor processing |
| US10789703B2 (en) * | 2018-03-19 | 2020-09-29 | Kla-Tencor Corporation | Semi-supervised anomaly detection in scanning electron microscope images |
| DE102018207882A1 (de) | 2018-05-18 | 2019-11-21 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Analyse eines Elements eines Photolithographieprozesses mit Hilfe eines Transformationsmodells |
| DE102018207880A1 (de) | 2018-05-18 | 2019-11-21 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Bewerten einer unbekannten Auswirkung von Defekten eines Elements eines Photolithographieprozesses |
| DE102018209562B3 (de) | 2018-06-14 | 2019-12-12 | Carl Zeiss Smt Gmbh | Vorrichtungen und Verfahren zur Untersuchung und/oder Bearbeitung eines Elements für die Photolithographie |
| US10732130B2 (en) * | 2018-06-19 | 2020-08-04 | Kla-Tencor Corporation | Embedded particle depth binning based on multiple scattering signals |
| DE102018211099B4 (de) | 2018-07-05 | 2020-06-18 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Bewerten eines statistisch verteilten Messwertes beim Untersuchen eines Elements eines Photolithographieprozesses |
| WO2020049974A1 (ja) * | 2018-09-03 | 2020-03-12 | 株式会社Preferred Networks | 学習装置、推論装置、学習モデルの生成方法及び推論方法 |
| US10930531B2 (en) | 2018-10-09 | 2021-02-23 | Applied Materials, Inc. | Adaptive control of wafer-to-wafer variability in device performance in advanced semiconductor processes |
| US10657214B2 (en) | 2018-10-09 | 2020-05-19 | Applied Materials, Inc. | Predictive spatial digital design of experiment for advanced semiconductor process optimization and control |
| US10705514B2 (en) * | 2018-10-09 | 2020-07-07 | Applied Materials, Inc. | Adaptive chamber matching in advanced semiconductor process control |
| US20220012404A1 (en) * | 2018-12-11 | 2022-01-13 | Tasmit, Inc. | Image matching method and arithmetic system for performing image matching process |
| US11263737B2 (en) * | 2019-01-10 | 2022-03-01 | Lam Research Corporation | Defect classification and source analysis for semiconductor equipment |
| JP7570004B2 (ja) * | 2019-02-19 | 2024-10-21 | パナソニックIpマネジメント株式会社 | 研磨加工システム、学習装置、学習装置の学習方法 |
| US12124247B2 (en) | 2019-05-10 | 2024-10-22 | Sandisk Technologies Llc | Implementation of deep neural networks for testing and quality control in the production of memory devices |
| US11947890B2 (en) | 2019-05-10 | 2024-04-02 | Sandisk Technologies Llc | Implementation of deep neural networks for testing and quality control in the production of memory devices |
| WO2020232460A1 (en) * | 2019-05-14 | 2020-11-19 | Onesubsea Ip Uk Limited | Machine learning technics with system in the loop for oil & gas telemetry systems |
| US12361531B2 (en) * | 2019-05-22 | 2025-07-15 | Applied Materials Israel Ltd. | Machine learning-based classification of defects in a semiconductor specimen |
| US12293279B2 (en) | 2019-08-29 | 2025-05-06 | Synopsys, Inc. | Neural network based mask synthesis for integrated circuits |
| EP3796230B1 (en) * | 2019-09-17 | 2022-03-09 | Imec VZW | A method for determining process limits of a semiconductor process |
| CN110648935A (zh) * | 2019-09-25 | 2020-01-03 | 上海众壹云计算科技有限公司 | 一种运用ai模型的半导体制造缺陷动态随机取样方法 |
| US11341304B2 (en) * | 2019-12-10 | 2022-05-24 | Microchip Technology Inc. | Machine learning based methods and apparatus for integrated circuit design delay calculation and verification |
| US11816411B2 (en) * | 2020-01-29 | 2023-11-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for semiconductor wafer defect review |
| EP3910417A1 (en) * | 2020-05-13 | 2021-11-17 | ASML Netherlands B.V. | Method for determining an inspection strategy for a group of substrates in a semiconductor manufacturing process |
| CN115398345B (zh) * | 2020-04-02 | 2025-11-04 | Asml荷兰有限公司 | 在半导体制造过程中用于确定对于一组衬底的检查策略的方法 |
| CN115428135B (zh) | 2020-04-06 | 2024-01-26 | 诺威有限公司 | 用于基于光谱的计量和过程控制的机器和深度学习方法 |
| US12051183B2 (en) * | 2020-04-30 | 2024-07-30 | KLA Corp. | Training a machine learning model to generate higher resolution images from inspection images |
| JP7492389B2 (ja) * | 2020-07-03 | 2024-05-29 | 株式会社ホロン | 画像検査装置および画像検査方法 |
| US12321876B2 (en) * | 2020-07-21 | 2025-06-03 | UiPath, Inc. | Artificial intelligence / machine learning model drift detection and correction for robotic process automation |
| US11289387B2 (en) | 2020-07-31 | 2022-03-29 | Applied Materials, Inc. | Methods and apparatus for backside via reveal processing |
| US11328410B2 (en) | 2020-08-03 | 2022-05-10 | KLA Corp. | Deep generative models for optical or other mode selection |
| US11562476B2 (en) * | 2020-09-03 | 2023-01-24 | Applied Materials Israel Ltd. | Determination of a simulated image of a specimen |
| JP7527902B2 (ja) | 2020-09-04 | 2024-08-05 | キオクシア株式会社 | 情報処理装置 |
| JP7670959B2 (ja) * | 2021-04-13 | 2025-05-01 | 横浜ゴム株式会社 | 事前学習モデルを利用したターゲットモデル生成方法、評価データ予測方法、事前学習モデルを利用して生成されたターゲットモデルを記録したコンピュータ読取可能な記録媒体並びに事前学習モデルを利用したターゲットモデル生成方法のプログラム及び評価データ予測方法のプログラム |
| US12020418B2 (en) * | 2021-04-22 | 2024-06-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image processing method and system, and non-transitory computer readable medium |
| WO2022233546A1 (en) * | 2021-05-06 | 2022-11-10 | Asml Netherlands B.V. | Method for determining a stochastic metric relating to a lithographic process |
| CN113344886A (zh) * | 2021-06-11 | 2021-09-03 | 长江存储科技有限责任公司 | 晶圆表面缺陷检测方法和设备 |
| JP2023005735A (ja) * | 2021-06-29 | 2023-01-18 | 株式会社アルバック | 数理モデル取得装置、推定装置、数理モデル取得方法、推定方法及びプログラム |
| KR20230013995A (ko) * | 2021-07-20 | 2023-01-27 | 삼성전자주식회사 | 공정 시뮬레이션 모델 생성 방법 및 장치 |
| WO2023033884A1 (en) * | 2021-09-02 | 2023-03-09 | Sandisk Technologies Llc | Implementation of deep neural networks for testing and quality control in the production of memory devices |
| US20230089092A1 (en) * | 2021-09-23 | 2023-03-23 | Applied Materials, Inc. | Machine learning platform for substrate processing |
| US20250003899A1 (en) * | 2021-11-12 | 2025-01-02 | Asml Netherlands B.V. | Method and system of image analysis and critical dimension matching for charged-particle inspection apparatus |
| KR20240105405A (ko) * | 2021-11-28 | 2024-07-05 | 디2에스, 인코포레이티드 | 전자 설계 자동화를 위한 상호작용적 압축 툴 |
| CN114664395B (zh) * | 2022-03-25 | 2024-11-22 | 上海交通大学 | 基于神经网络和贝叶斯优化的热辐射材料设计方法及系统 |
| JP7607767B2 (ja) * | 2022-05-20 | 2024-12-27 | 株式会社日立ハイテク | 探索装置および探索方法並びに半導体装置製造システム |
| US20240353759A1 (en) * | 2023-04-19 | 2024-10-24 | Kla Corporation | Full Wafer Measurement Based On A Trained Full Wafer Measurement Model |
| WO2025051477A1 (en) * | 2023-09-05 | 2025-03-13 | Asml Netherlands B.V. | Semi-supervised, self-supervised, and reinforcement learning machine learning models for mask prediction |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5212765A (en) * | 1990-08-03 | 1993-05-18 | E. I. Du Pont De Nemours & Co., Inc. | On-line training neural network system for process control |
| JP3288066B2 (ja) * | 1992-03-10 | 2002-06-04 | 富士通株式会社 | ネットワーク構成データ処理装置の学習処理方法およびシステム |
| US7167583B1 (en) | 2000-06-28 | 2007-01-23 | Landrex Technologies Co., Ltd. | Image processing system for use with inspection systems |
| US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| US6902855B2 (en) | 2002-07-15 | 2005-06-07 | Kla-Tencor Technologies | Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| US7418124B2 (en) | 2002-07-15 | 2008-08-26 | Kla-Tencor Technologies Corp. | Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| US20040267397A1 (en) * | 2003-06-27 | 2004-12-30 | Srinivas Doddi | Optical metrology of structures formed on semiconductor wafer using machine learning systems |
| US7729529B2 (en) | 2004-12-07 | 2010-06-01 | Kla-Tencor Technologies Corp. | Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| US7769225B2 (en) | 2005-08-02 | 2010-08-03 | Kla-Tencor Technologies Corp. | Methods and systems for detecting defects in a reticle design pattern |
| WO2007120279A2 (en) * | 2005-11-18 | 2007-10-25 | Kla-Tencor Technologies Corporation | Methods and systems for utilizing design data in combination with inspection data |
| US7676077B2 (en) | 2005-11-18 | 2010-03-09 | Kla-Tencor Technologies Corp. | Methods and systems for utilizing design data in combination with inspection data |
| US7570796B2 (en) | 2005-11-18 | 2009-08-04 | Kla-Tencor Technologies Corp. | Methods and systems for utilizing design data in combination with inspection data |
| US8102408B2 (en) * | 2006-06-29 | 2012-01-24 | Kla-Tencor Technologies Corp. | Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs |
| US7792353B2 (en) * | 2006-10-31 | 2010-09-07 | Hewlett-Packard Development Company, L.P. | Retraining a machine-learning classifier using re-labeled training samples |
| US8698093B1 (en) | 2007-01-19 | 2014-04-15 | Kla-Tencor Corporation | Objective lens with deflector plates immersed in electrostatic lens field |
| US7483809B2 (en) * | 2007-04-12 | 2009-01-27 | Tokyo Electron Limited | Optical metrology using support vector machine with profile parameter inputs |
| US8213704B2 (en) | 2007-05-09 | 2012-07-03 | Kla-Tencor Corp. | Methods and systems for detecting defects in a reticle design pattern |
| US8126255B2 (en) | 2007-09-20 | 2012-02-28 | Kla-Tencor Corp. | Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions |
| US8041106B2 (en) | 2008-12-05 | 2011-10-18 | Kla-Tencor Corp. | Methods and systems for detecting defects on a reticle |
| US8533222B2 (en) * | 2011-01-26 | 2013-09-10 | Google Inc. | Updateable predictive analytical modeling |
| US8664594B1 (en) | 2011-04-18 | 2014-03-04 | Kla-Tencor Corporation | Electron-optical system for high-speed and high-sensitivity inspections |
| US8692204B2 (en) | 2011-04-26 | 2014-04-08 | Kla-Tencor Corporation | Apparatus and methods for electron beam detection |
| US8468471B2 (en) * | 2011-09-23 | 2013-06-18 | Kla-Tencor Corp. | Process aware metrology |
| US8570531B2 (en) * | 2011-12-11 | 2013-10-29 | Tokyo Electron Limited | Method of regenerating diffraction signals for optical metrology systems |
| US8716662B1 (en) | 2012-07-16 | 2014-05-06 | Kla-Tencor Corporation | Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations |
| CN102937784A (zh) * | 2012-10-30 | 2013-02-20 | 中冶南方工程技术有限公司 | 基于人工神经网络的铸坯质量在线预报的控制方法 |
| US9222895B2 (en) | 2013-02-25 | 2015-12-29 | Kla-Tencor Corp. | Generalized virtual inspector |
| US10502694B2 (en) * | 2013-08-06 | 2019-12-10 | Kla-Tencor Corporation | Methods and apparatus for patterned wafer characterization |
| US20150204799A1 (en) * | 2014-01-21 | 2015-07-23 | International Business Machines Corporation | Computer-based defect root cause and yield impact determination in layered device manufacturing for products and services |
| WO2019183153A1 (en) * | 2018-03-21 | 2019-09-26 | Kla-Tencor Corporation | Training a machine learning model with synthetic images |
-
2016
- 2016-12-30 EP EP16882778.0A patent/EP3398123B1/en active Active
- 2016-12-30 KR KR1020187021817A patent/KR102812577B1/ko active Active
- 2016-12-30 JP JP2018534670A patent/JP6941103B2/ja active Active
- 2016-12-30 CN CN201680075625.1A patent/CN108475351B/zh active Active
- 2016-12-30 WO PCT/US2016/069580 patent/WO2017117568A1/en not_active Ceased
-
2018
- 2018-05-30 IL IL259705A patent/IL259705B/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019508789A5 (enExample) | ||
| JP2014237817A5 (enExample) | ||
| JP2015145496A5 (enExample) | ||
| JP2017507747A5 (enExample) | ||
| JP2013188229A5 (enExample) | ||
| JP2015186128A5 (enExample) | ||
| JP2016176729A5 (enExample) | ||
| CN302490378S (zh) | 尿液分析仪 | |
| JP2017174290A5 (enExample) | ||
| CN302340056S (zh) | 超声波风速风向仪 | |
| TH50041S1 (th) | อุปกรณ์จับชิ้นงาน | |
| TH140778S (th) | อุปกรณ์จับชิ้นงาน | |
| TH50040S1 (th) | อุปกรณ์จับชิ้นงาน | |
| TH50042S1 (th) | อุปกรณ์จับชิ้นงาน | |
| CN302535240S (zh) | 点读笔(d16) | |
| CN302589269S (zh) | U盘笔(20130428) | |
| CN302536002S (zh) | 电气综合实训设备 | |
| CN302552358S (zh) | 玩具顽皮狗(1222) | |
| CN302534900S (zh) | 车头 | |
| TH140898S (th) | เครื่องมือวัด | |
| TH48601S1 (th) | เครื่องมือวัด | |
| JP2018512883A5 (enExample) | ||
| CN302535253S (zh) | 点读笔(d16下蛋笔) | |
| CN302455363S (zh) | 风力发电机机舱罩 | |
| CN302510573S (zh) | 点读笔(x11b) |