JP2016105462A5 - - Google Patents
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- JP2016105462A5 JP2016105462A5 JP2015205576A JP2015205576A JP2016105462A5 JP 2016105462 A5 JP2016105462 A5 JP 2016105462A5 JP 2015205576 A JP2015205576 A JP 2015205576A JP 2015205576 A JP2015205576 A JP 2015205576A JP 2016105462 A5 JP2016105462 A5 JP 2016105462A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- transfer module
- vacuum transfer
- vacuum
- operable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000758 substrate Substances 0.000 claims description 355
- 239000004065 semiconductor Substances 0.000 claims description 342
- 238000012546 transfer Methods 0.000 claims description 330
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 129
- 238000012545 processing Methods 0.000 claims description 109
- 238000003860 storage Methods 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 37
- 238000001816 cooling Methods 0.000 claims description 35
- 239000007789 gas Substances 0.000 claims description 33
- 238000010438 heat treatment Methods 0.000 claims description 31
- 239000011261 inert gas Substances 0.000 claims description 22
- 239000012530 fluid Substances 0.000 claims description 14
- 238000004891 communication Methods 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000012625 in-situ measurement Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/522,338 | 2014-10-23 | ||
| US14/522,338 US9673071B2 (en) | 2014-10-23 | 2014-10-23 | Buffer station for thermal control of semiconductor substrates transferred therethrough and method of transferring semiconductor substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016105462A JP2016105462A (ja) | 2016-06-09 |
| JP2016105462A5 true JP2016105462A5 (https=) | 2018-11-29 |
Family
ID=55792560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015205576A Pending JP2016105462A (ja) | 2014-10-23 | 2015-10-19 | 搬送される半導体基板の熱制御のためのバッファステーションおよび半導体基板の搬送方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9673071B2 (https=) |
| JP (1) | JP2016105462A (https=) |
| KR (1) | KR102534391B1 (https=) |
| CN (2) | CN115020276A (https=) |
| TW (1) | TWI713471B (https=) |
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| KR102568797B1 (ko) * | 2018-06-21 | 2023-08-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 시스템 |
| US10692759B2 (en) * | 2018-07-17 | 2020-06-23 | Applied Materials, Inc. | Methods for manufacturing an interconnect structure for semiconductor devices |
| WO2020023409A1 (en) * | 2018-07-24 | 2020-01-30 | Applied Materials, Inc. | Optically transparent pedestal for fluidly supporting a substrate |
| US11061417B2 (en) * | 2018-12-19 | 2021-07-13 | Applied Materials, Inc. | Selectable-rate bottom purge apparatus and methods |
| US10886155B2 (en) * | 2019-01-16 | 2021-01-05 | Applied Materials, Inc. | Optical stack deposition and on-board metrology |
| WO2021044581A1 (ja) * | 2019-09-05 | 2021-03-11 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法およびプログラム |
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| US11810805B2 (en) * | 2020-07-09 | 2023-11-07 | Applied Materials, Inc. | Prevention of contamination of substrates during gas purging |
| US11706928B2 (en) * | 2020-10-30 | 2023-07-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory device and method for fabricating the same |
| US12382640B2 (en) * | 2020-10-30 | 2025-08-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory device and method for fabricating the same |
| CN113611633B (zh) * | 2021-07-21 | 2023-01-17 | 北京北方华创微电子装备有限公司 | 晶圆烘烤腔室及其晶圆预清洁方法 |
| KR102606707B1 (ko) | 2021-10-14 | 2023-11-29 | 주식회사 저스템 | 웨이퍼 버퍼용 챔버장치 |
| CN115020308B (zh) * | 2022-08-08 | 2022-11-22 | 上海果纳半导体技术有限公司武汉分公司 | 晶圆传输装置、设备平台系统及其晶圆传输方法 |
| JP2025018726A (ja) * | 2023-07-27 | 2025-02-06 | 株式会社Screenホールディングス | 基板接合装置 |
| CN121510908B (zh) * | 2026-01-13 | 2026-04-10 | 上海微釜半导体设备有限公司 | 晶圆缓存设备、方法及立式批次型外延工艺设备 |
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-
2014
- 2014-10-23 US US14/522,338 patent/US9673071B2/en active Active
-
2015
- 2015-10-19 JP JP2015205576A patent/JP2016105462A/ja active Pending
- 2015-10-20 KR KR1020150145946A patent/KR102534391B1/ko active Active
- 2015-10-20 TW TW104134286A patent/TWI713471B/zh active
- 2015-10-23 CN CN202210407940.7A patent/CN115020276A/zh active Pending
- 2015-10-23 CN CN201510696876.9A patent/CN105551998A/zh active Pending
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