JP2016050357A5 - - Google Patents
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- JP2016050357A5 JP2016050357A5 JP2015108025A JP2015108025A JP2016050357A5 JP 2016050357 A5 JP2016050357 A5 JP 2016050357A5 JP 2015108025 A JP2015108025 A JP 2015108025A JP 2015108025 A JP2015108025 A JP 2015108025A JP 2016050357 A5 JP2016050357 A5 JP 2016050357A5
- Authority
- JP
- Japan
- Prior art keywords
- metal film
- film forming
- forming method
- organic solvent
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015108025A JP6945120B2 (ja) | 2014-08-29 | 2015-05-27 | 金属膜形成方法 |
| KR1020150121117A KR101807544B1 (ko) | 2014-08-29 | 2015-08-27 | 금속막 형성방법 |
| US14/838,126 US9828694B2 (en) | 2014-08-29 | 2015-08-27 | Method of forming metal film |
| EP15182652.6A EP2990503B1 (en) | 2014-08-29 | 2015-08-27 | Method of forming metal film |
| TW104128055A TWI597381B (zh) | 2014-08-29 | 2015-08-27 | Metal film formation method |
| CN201911347903.6A CN110952077B (zh) | 2014-08-29 | 2015-08-28 | 金属膜形成方法 |
| CN201510540239.2A CN105386008B (zh) | 2014-08-29 | 2015-08-28 | 金属膜形成方法 |
| JP2020001057A JP6920631B2 (ja) | 2014-08-29 | 2020-01-07 | 金属膜形成方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014176648 | 2014-08-29 | ||
| JP2014176648 | 2014-08-29 | ||
| JP2015108025A JP6945120B2 (ja) | 2014-08-29 | 2015-05-27 | 金属膜形成方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020001057A Division JP6920631B2 (ja) | 2014-08-29 | 2020-01-07 | 金属膜形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016050357A JP2016050357A (ja) | 2016-04-11 |
| JP2016050357A5 true JP2016050357A5 (https=) | 2018-07-05 |
| JP6945120B2 JP6945120B2 (ja) | 2021-10-06 |
Family
ID=54251921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015108025A Active JP6945120B2 (ja) | 2014-08-29 | 2015-05-27 | 金属膜形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9828694B2 (https=) |
| EP (1) | EP2990503B1 (https=) |
| JP (1) | JP6945120B2 (https=) |
| KR (1) | KR101807544B1 (https=) |
| CN (2) | CN110952077B (https=) |
| TW (1) | TWI597381B (https=) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017154937A1 (ja) * | 2016-03-11 | 2017-09-14 | 株式会社ニコン | ミスト発生装置、成膜装置、ミスト発生方法、成膜方法、および、デバイス製造方法 |
| CN107371338B (zh) * | 2016-05-13 | 2019-08-20 | 苏州卫鹏机电科技有限公司 | 一种超薄金属层的印刷线路板的制备方法 |
| WO2018004009A1 (ja) | 2016-06-30 | 2018-01-04 | 株式会社Flosfia | p型酸化物半導体及びその製造方法 |
| CN109417037B (zh) | 2016-06-30 | 2024-03-15 | 株式会社Flosfia | 氧化物半导体膜及其制造方法 |
| JP2018019052A (ja) * | 2016-07-30 | 2018-02-01 | 株式会社Flosfia | インダクタの製造方法 |
| JP2018019050A (ja) * | 2016-07-30 | 2018-02-01 | 株式会社Flosfia | 抵抗体の製造方法 |
| JP6879483B2 (ja) * | 2016-07-30 | 2021-06-02 | 株式会社Flosfia | コンデンサの製造方法 |
| JP7064723B2 (ja) * | 2017-03-31 | 2022-05-11 | 株式会社Flosfia | 成膜方法 |
| CN109628910B (zh) | 2017-10-07 | 2023-06-30 | 株式会社Flosfia | 形成膜的方法 |
| JP2019119931A (ja) * | 2017-12-29 | 2019-07-22 | 株式会社Flosfia | 処理方法 |
| JP6875336B2 (ja) * | 2018-08-27 | 2021-05-26 | 信越化学工業株式会社 | 成膜方法 |
| JP7031564B2 (ja) * | 2018-11-14 | 2022-03-08 | トヨタ自動車株式会社 | 燃料電池用セパレータの製造方法 |
| JP2020092125A (ja) * | 2018-12-03 | 2020-06-11 | トヨタ自動車株式会社 | 成膜装置 |
| CN110318021B (zh) * | 2019-07-26 | 2020-08-25 | 中国科学技术大学 | 一种晶圆级二氧化钒薄膜的制备方法 |
| JP7261410B2 (ja) * | 2019-09-02 | 2023-04-20 | 信越化学工業株式会社 | 金属膜形成方法 |
| US11244803B2 (en) | 2020-01-23 | 2022-02-08 | Hitachi High-Tech Corporation | Plasma processing apparatus and operating method of plasma processing apparatus |
| CN111364020B (zh) * | 2020-04-10 | 2022-01-28 | 南昌航空大学 | 一种气溶胶传输辅助装置及输送方法 |
| JP7380432B2 (ja) * | 2020-06-02 | 2023-11-15 | 株式会社ニコン | ミスト発生装置、薄膜製造装置、及び薄膜製造方法 |
| US12434257B2 (en) * | 2020-08-05 | 2025-10-07 | Shin-Etsu Chemical Co., Ltd. | Film-forming atomizer, film-forming apparatus, and film-forming method |
| CN112813406B (zh) * | 2020-12-30 | 2023-07-14 | 武汉工程大学 | 基于cvd技术在异形件表面制备三维金属单质薄膜的设备及方法 |
| TWI911390B (zh) * | 2021-03-02 | 2026-01-11 | 日商信越化學工業股份有限公司 | 製膜方法及製膜裝置 |
| KR102726925B1 (ko) * | 2022-08-25 | 2024-11-11 | 한국표준과학연구원 | 에어로졸 촉매를 이용하여 2차원 나노소재의 결정립을 조절하는 방법 |
| CN115894392B (zh) * | 2022-12-02 | 2024-11-12 | 中国科学院福建物质结构研究所 | (c3h8n6i6)·3h2o化合物、双折射晶体及其制法和用途 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5034372A (en) * | 1987-12-07 | 1991-07-23 | Mitsubishi Denki Kabushiki Kaisha | Plasma based method for production of superconductive oxide layers |
| EP0848658B1 (en) * | 1995-08-04 | 2006-10-11 | nGimat Co. | Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions |
| US6010969A (en) * | 1996-10-02 | 2000-01-04 | Micron Technology, Inc. | Method of depositing films on semiconductor devices by using carboxylate complexes |
| US6482374B1 (en) | 1999-06-16 | 2002-11-19 | Nanogram Corporation | Methods for producing lithium metal oxide particles |
| KR100460746B1 (ko) * | 1999-04-13 | 2004-12-09 | 주식회사 하이닉스반도체 | 반도체 소자의 구리 금속 배선 형성 방법 |
| JP3638487B2 (ja) | 1999-12-10 | 2005-04-13 | 株式会社荏原製作所 | 半導体素子の実装方法 |
| JP4781571B2 (ja) * | 2001-07-31 | 2011-09-28 | エルピーダメモリ株式会社 | 半導体装置の製造方法 |
| WO2003032084A2 (en) | 2001-10-05 | 2003-04-17 | Superior Micropowders Llc | Low viscosity precursor compositions and methods for the deposition of conductive electronic features |
| JP2004277585A (ja) | 2003-03-17 | 2004-10-07 | Canon Inc | 有機顔料分散体製造方法および有機顔料分散体、水性着色液ならびにインクジェット記録用液 |
| DE102004001095A1 (de) * | 2004-01-05 | 2005-07-28 | Blue Membranes Gmbh | Hochfrequenzzerstäubungsvorrichtung |
| JP4841338B2 (ja) * | 2005-07-14 | 2011-12-21 | 株式会社野田スクリーン | 成膜方法、および装置 |
| CN101351868B (zh) * | 2005-12-29 | 2013-03-13 | 3M创新有限公司 | 使用涂覆工艺雾化材料的方法 |
| US8801971B2 (en) | 2007-12-18 | 2014-08-12 | Hitachi Chemical Company, Ltd. | Copper conductor film and manufacturing method thereof, conductive substrate and manufacturing method thereof, copper conductor wiring and manufacturing method thereof, and treatment solution |
| JP2009167522A (ja) * | 2007-12-21 | 2009-07-30 | Shinko Electric Ind Co Ltd | 銅膜の形成方法 |
| KR100976264B1 (ko) | 2008-03-31 | 2010-08-18 | 주식회사 잉크테크 | 금속 박막 형성 장치 및 이를 이용한 금속 박막 형성 방법 |
| US20150004326A1 (en) * | 2008-05-07 | 2015-01-01 | Isaiah O. Oladeji | Apparatus and method for depositing alkali metals |
| US20110151619A1 (en) * | 2008-09-24 | 2011-06-23 | Toshiba Mitsubishi-Electric Industrial Sys. Corp. | Method of forming metal oxide film and apparatus for forming metal oxide film |
| JP5659495B2 (ja) | 2010-01-26 | 2015-01-28 | 三菱マテリアル株式会社 | 電極又は配線パターンの形成方法 |
| DE112010005624T5 (de) * | 2010-06-01 | 2013-03-21 | Kyoto University | Anlage zur Bildung eines Metalloxidfilmes, Verfahren zur Bildung eines Metalloxidfilmes und Metalloxidfilm |
| JP2013129887A (ja) | 2011-12-22 | 2013-07-04 | Nitto Denko Corp | 複合電極の形成方法 |
| JP5343224B1 (ja) * | 2012-09-28 | 2013-11-13 | Roca株式会社 | 半導体装置および結晶 |
| MX374974B (es) * | 2012-10-12 | 2025-03-06 | Vitro Vidrio Y Cristal S A De C V | Un recubrimiento con propiedades de control solar para un substrato y, un metodo y sistema para depositar dicho recubrimiento sobre el substrato. |
-
2015
- 2015-05-27 JP JP2015108025A patent/JP6945120B2/ja active Active
- 2015-08-27 US US14/838,126 patent/US9828694B2/en not_active Expired - Fee Related
- 2015-08-27 KR KR1020150121117A patent/KR101807544B1/ko active Active
- 2015-08-27 TW TW104128055A patent/TWI597381B/zh active
- 2015-08-27 EP EP15182652.6A patent/EP2990503B1/en active Active
- 2015-08-28 CN CN201911347903.6A patent/CN110952077B/zh active Active
- 2015-08-28 CN CN201510540239.2A patent/CN105386008B/zh active Active
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