JP2016009857A - 侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料 - Google Patents
侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料 Download PDFInfo
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- JP2016009857A JP2016009857A JP2014175327A JP2014175327A JP2016009857A JP 2016009857 A JP2016009857 A JP 2016009857A JP 2014175327 A JP2014175327 A JP 2014175327A JP 2014175327 A JP2014175327 A JP 2014175327A JP 2016009857 A JP2016009857 A JP 2016009857A
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- 239000000463 material Substances 0.000 title claims abstract description 95
- 239000013078 crystal Substances 0.000 title claims abstract description 43
- 239000002019 doping agent Substances 0.000 title abstract 4
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 7
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 6
- 239000002131 composite material Substances 0.000 claims description 20
- 229910052709 silver Inorganic materials 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 229910052753 mercury Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 230000007547 defect Effects 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 abstract description 2
- 230000003993 interaction Effects 0.000 abstract 1
- 229910002909 Bi-Te Inorganic materials 0.000 description 15
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 15
- 239000004332 silver Substances 0.000 description 15
- 239000002994 raw material Substances 0.000 description 7
- 239000003708 ampul Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002105 nanoparticle Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910018321 SbTe Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000000024 high-resolution transmission electron micrograph Methods 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 240000000907 Musa textilis Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 as shown in FIG. 3 Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/852—Thermoelectric active materials comprising inorganic compositions comprising tellurium, selenium or sulfur
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Powder Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
前記複合結晶構造は、Bi13Te20構造を有する物質であることが好ましい。
前記ドーピング材は、Te系熱電材料に対して0.01〜1重量%添加されることが好ましい。
その構造は、両端に存在するTe(1)を境界として新たに繰り返される5層がファンデルワールス(Van der Waals)結合をしている。
上記の実験的結果に基づいて、理論的証明のための電子構造計算過程を行い、その結果を下記表1に示した。
図2に示す基本的なBi2Te3結晶構造に基づく計算結果より、侵入型Agがn型伝導を示し、c軸方向に格子定数が増加したことが分かる。
Claims (6)
- A−B−A−C−A元素が5層に積層される単位セルからなり、前記単位セルの末端のA元素と他の単位セル末端のA元素が互いにファンデルワールス結合によって繰返し積層される構造を有するTe系熱電材料において、
前記繰返し積層されるA元素と隣接するA元素との間にドーピング材としての侵入型元素が侵入して位置し、繰返し積層される単位セルの積層欠陥が発生して前記単位セルとは異なる複合結晶構造が形成されることを特徴とする、侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料(ここで、AはTeまたはSeであり、BはBiまたはSbであり、CはBiまたはSbである。)。 - 前記Te系熱電材料は、Bi0.5Sb1.5Te3、Bi2Te3、Sb2Te3およびBi2Se3のいずれか一つを基本組成とする物質、またはこれらを2つ以上混合した混合物を使用することを特徴とする、請求項1に記載の侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料。
- 前記複合結晶構造は、Bi13Te20構造を有する物質であることを特徴とする、請求項1に記載の侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料。
- 前記ドーピング材は、Na、K、Zn、Al、Ti、V、Cr、Mn、Fe、Co、Ni、Cu、Pd、Ag、Pt、AuおよびHgのいずれか一つ、またはこれらを2つ以上混合した混合物であることを特徴とする、請求項1に記載の侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料。
- 前記ドーピング材は、Te系熱電材料に対して0.01〜1重量%添加されることを特徴とする、請求項1に記載の侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料。
- 前記複合結晶構造には双晶が形成されることを特徴とする、請求項1に記載の侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2014-0077124 | 2014-06-24 | ||
KR1020140077124A KR101631858B1 (ko) | 2014-06-24 | 2014-06-24 | 침입형 도핑재 첨가에 의해 복합결정구조가 형성된 Te계 열전재료 |
Publications (2)
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JP2016009857A true JP2016009857A (ja) | 2016-01-18 |
JP6285323B2 JP6285323B2 (ja) | 2018-02-28 |
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JP2014175327A Active JP6285323B2 (ja) | 2014-06-24 | 2014-08-29 | 侵入型ドーピング材の添加によって複合結晶構造が形成されたTe系熱電材料 |
Country Status (3)
Country | Link |
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US (1) | US20150372212A1 (ja) |
JP (1) | JP6285323B2 (ja) |
KR (1) | KR101631858B1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106676635A (zh) * | 2017-01-12 | 2017-05-17 | 山东大学 | 一类碲酸盐晶体及其生长方法与应用 |
JP2020178058A (ja) * | 2019-04-19 | 2020-10-29 | ハイソル株式会社 | 層状物質劈開方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105702847B (zh) * | 2016-01-29 | 2017-12-15 | 合肥工业大学 | 一种提高BiTeSe基N型半导体热电材料性能的方法 |
CN110117817B (zh) * | 2018-02-06 | 2021-01-12 | 中国科学院上海硅酸盐研究所 | 一种塑性半导体材料以及其制备方法 |
Citations (5)
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JPH07211945A (ja) * | 1994-01-14 | 1995-08-11 | Aisin Seiki Co Ltd | P型熱電材料およびp型熱電材料用合金 |
JPH1074983A (ja) * | 1996-08-29 | 1998-03-17 | Aisin Seiki Co Ltd | N型熱電半導体 |
JP2001060727A (ja) * | 1999-08-20 | 2001-03-06 | Sanyo Electric Co Ltd | 熱電素子製造方法 |
JP2006005120A (ja) * | 2004-06-17 | 2006-01-05 | Matsushita Electric Ind Co Ltd | 熱電材料およびそれを用いた熱電素子 |
KR20130078478A (ko) * | 2011-12-30 | 2013-07-10 | 한국전기연구원 | 도핑재 첨가 및 나노입자 소결에 의한 쌍정이 형성된 Te계 열전재료의 제조방법 |
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JP3751764B2 (ja) * | 1999-03-15 | 2006-03-01 | 株式会社東芝 | 複合酸化物焼結体およびその製造法、複合酸化物の薄膜の製造法、ならびに熱電変換素子 |
WO2011022189A2 (en) * | 2009-08-17 | 2011-02-24 | Laird Technologies, Inc. | Synthesis of silver, antimony, and tin doped bismuth telluride nanoparticles and bulk bismuth telluride to form bismuth telluride composites |
US8748726B2 (en) * | 2009-08-17 | 2014-06-10 | Laird Technologies, Inc. | Synthesis of silver, antimony, and tin doped bismuth telluride nanoparticles and bulk bismuth telluride to form bismuth telluride composites |
KR101172802B1 (ko) | 2009-12-31 | 2012-08-09 | 한국전기연구원 | 도핑재 첨가에 의한 쌍정이 형성된 Te계 열전재료의 제조방법 및 그 열전재료 |
KR101249381B1 (ko) * | 2010-11-08 | 2013-04-01 | 이화여자대학교 산학협력단 | 도핑된 Bi₂Te₃-계 열전 재료 및 그의 제조 방법 |
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2014
- 2014-06-24 KR KR1020140077124A patent/KR101631858B1/ko active IP Right Grant
- 2014-08-29 JP JP2014175327A patent/JP6285323B2/ja active Active
- 2014-08-29 US US14/473,029 patent/US20150372212A1/en not_active Abandoned
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JPH07211945A (ja) * | 1994-01-14 | 1995-08-11 | Aisin Seiki Co Ltd | P型熱電材料およびp型熱電材料用合金 |
JPH1074983A (ja) * | 1996-08-29 | 1998-03-17 | Aisin Seiki Co Ltd | N型熱電半導体 |
JP2001060727A (ja) * | 1999-08-20 | 2001-03-06 | Sanyo Electric Co Ltd | 熱電素子製造方法 |
JP2006005120A (ja) * | 2004-06-17 | 2006-01-05 | Matsushita Electric Ind Co Ltd | 熱電材料およびそれを用いた熱電素子 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106676635A (zh) * | 2017-01-12 | 2017-05-17 | 山东大学 | 一类碲酸盐晶体及其生长方法与应用 |
JP2020178058A (ja) * | 2019-04-19 | 2020-10-29 | ハイソル株式会社 | 層状物質劈開方法 |
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JP6285323B2 (ja) | 2018-02-28 |
US20150372212A1 (en) | 2015-12-24 |
KR101631858B1 (ko) | 2016-06-20 |
KR20160000152A (ko) | 2016-01-04 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |