JP2016004921A5 - - Google Patents

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Publication number
JP2016004921A5
JP2016004921A5 JP2014124752A JP2014124752A JP2016004921A5 JP 2016004921 A5 JP2016004921 A5 JP 2016004921A5 JP 2014124752 A JP2014124752 A JP 2014124752A JP 2014124752 A JP2014124752 A JP 2014124752A JP 2016004921 A5 JP2016004921 A5 JP 2016004921A5
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JP
Japan
Prior art keywords
light
light source
intensity distribution
optical system
pupil plane
Prior art date
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Granted
Application number
JP2014124752A
Other languages
English (en)
Japanese (ja)
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JP6362095B2 (ja
JP2016004921A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2014124752A external-priority patent/JP6362095B2/ja
Priority to JP2014124752A priority Critical patent/JP6362095B2/ja
Priority to TW104118491A priority patent/TWI587097B/zh
Priority to US14/740,071 priority patent/US9632423B2/en
Priority to KR1020150084943A priority patent/KR101850584B1/ko
Priority to CN201510336459.3A priority patent/CN105278258B/zh
Publication of JP2016004921A publication Critical patent/JP2016004921A/ja
Publication of JP2016004921A5 publication Critical patent/JP2016004921A5/ja
Publication of JP6362095B2 publication Critical patent/JP6362095B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014124752A 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法 Expired - Fee Related JP6362095B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2014124752A JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法
TW104118491A TWI587097B (zh) 2014-06-17 2015-06-08 照明裝置、曝光設備、調整方法及製造物品的方法
US14/740,071 US9632423B2 (en) 2014-06-17 2015-06-15 Illumination device, exposure apparatus, adjusting method, and method for manufacturing object
KR1020150084943A KR101850584B1 (ko) 2014-06-17 2015-06-16 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법
CN201510336459.3A CN105278258B (zh) 2014-06-17 2015-06-17 照明器件、曝光装置、调整方法和用于制造物品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014124752A JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016004921A JP2016004921A (ja) 2016-01-12
JP2016004921A5 true JP2016004921A5 (enExample) 2017-07-27
JP6362095B2 JP6362095B2 (ja) 2018-07-25

Family

ID=54836065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014124752A Expired - Fee Related JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法

Country Status (5)

Country Link
US (1) US9632423B2 (enExample)
JP (1) JP6362095B2 (enExample)
KR (1) KR101850584B1 (enExample)
CN (1) CN105278258B (enExample)
TW (1) TWI587097B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2899026B2 (ja) 1989-11-27 1999-06-02 株式会社日立製作所 マーク検出装置
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JP2890892B2 (ja) * 1991-04-30 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
CN1045103C (zh) 1994-06-18 1999-09-15 兰州炼油化工总厂三星公司 一种烷基水杨酸盐润滑油添加剂
JP2000075496A (ja) * 1998-08-31 2000-03-14 Canon Inc 冷却機構を有する光源、光源装置及びこれを用いた露光装置
JP2000098099A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線照明装置及びｘ線投影露光装置
US6704090B2 (en) * 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
JP2001326171A (ja) * 2000-05-18 2001-11-22 Canon Inc 照明装置
EP1280008B2 (en) 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
JP2004063988A (ja) * 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP4470558B2 (ja) * 2004-03-31 2010-06-02 ウシオ電機株式会社 光照射装置
TWI401538B (zh) 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
EP3617588B1 (en) * 2007-04-12 2021-03-24 Nikon Corporation Discharge lamp, connecting cable. light source apparatus, and exposure apparatus
JP4921512B2 (ja) * 2009-04-13 2012-04-25 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

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